Abstract: A lithographic process is performed on a set of semiconductor substrates consisting of a plurality of substrates, As part of the process, the set of substrates is partitioned into a number of subsets. The partitioning may be based on a set of characteristics associated with a first layer on the substrates. A fingerprint of a performance parameter is then determined for at least one substrate of the set of substrates. Under some circumstances, the fingerprint is determined for one substrate of each subset of substrates. The fingerprint is associated with at least the first layer. A correction for the performance parameter associated with an application of a subsequent layer is then derived, the derivation being based on the determined fingerprint and the partitioning of the set of substrates.

Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.

Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high- resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.

Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.

Abstract: The invention relates to a solar protection glazing comprising, on at least one of the faces of a glass substrate, a multi-layer stack comprising at least one layer absorbing solar radiation of at least 3 nm and dielectric coatings surrounding said solar radiation absorbing layer. According to the invention, the light reflection of the glass substrate coated with the multi-layer stack, measured on the substrate side, is at least 20% and is at least two times the light reflection of the glass substrate coated with the multi-layer stack measured on the stack side, and the reflection color on the substrate side has a colorimetric coordinate value a* of less than 2 and a colorimetric coordinate value b* of less than 5. The invention is particularly useful as an automobile glazing, in particular on the roof thereof, as a building glazing or as a household oven.

Abstract: The invention relates to low-emissivity and anti-solar glazing systems that change only very little in properties when they are subjected to a heat treatment.

Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.

Abstract: The invention relates to low-emissivity and anti-solar glazing systems that change only very little in properties when they are subjected to a heat treatment. They comprise a stack of thin layers comprising an alternating arrangement of n infrared radiation reflecting functional layers and n+1 dielectric coatings, characterized in that: (i) the first dielectric coating comprises a layer made from an oxide in contact with the substrate, (ii) the portion of the coating stack between two functional layers comprises, in order: a barrier layer, a zinc oxide-based layer, a layer of zinc-tin mixed oxide, a nucleation layer, and (iii) the last dielectric coating comprises a layer made from an oxide other than silicon oxide with a thickness greater than 3 nm overlaid with a layer made from a silicon nitride or a silicon oxide with a thickness greater than 10 nm superposed thereon.

Abstract: The present invention is related to a method and apparatus for cleaning a substrate, in particular a semiconductor substrate such as a silicon wafer. The substrate is placed in a tank containing a cleaning liquid, at an angle with respect to acoustic waves produced in said liquid. The angle corresponds to the angle of transmission, i.e. the angle at which waves are not reflected off the substrate surface. A damping material is provided in the tank, arranged to absorb substantially all waves thus transmitted through the substrate. A significant improvement in terms of cleaning efficiency is obtained by the method of the invention.

Abstract: The invention relates to a solar protection glazing comprising, on at least one of the faces of a glass substrate, a multi-layer stack comprising at least one layer absorbing solar radiation of at least 3 nm and dielectric coatings surrounding said solar radiation absorbing layer. According to the invention, the light reflection of the glass substrate coated with the multi-layer stack, measured on the substrate side, is at least 20% and is at least two times the light reflection of the glass substrate coated with the multi-layer stack measured on the stack side, and the reflection colour on the substrate side has a colorimetric coordinate value a* of less than 2 and a colorimetric coordinate value b* of less than 5. The invention is particularly useful as an automobile glazing, in particular on the roof thereof, as a building glazing or as a household oven.

Abstract: The invention relates to low-emissivity and anti-solar glazing systems that change only very little in properties when they are subjected to a heat treatment.

Abstract: The invention relates to low-emissivity and anti-solar glazing systems that change only very little in properties when they are subjected to a heat treatment. They comprise a stack of thin layers comprising an alternating arrangement of n infrared radiation reflecting functional layers and n+ 1 dielectric coatings, characterised in that: (i) the first dielectric coating comprises a layer made from an oxide in contact with the substrate, (ii) the portion of the coating stack between two functional layers comprises, in order: a barrier layer, a zinc oxide-based layer, a layer of zinc-tin mixed oxide, a nucleation layer, and (iii) the last dielectric coating comprises a layer made from an oxide other than silicon oxide with a thickness greater than 3 nm overlaid with a layer made from a silicon nitride or a silicon oxide with a thickness greater than 10 nm superposed thereon.

Abstract: The present invention is related to a method and apparatus for cleaning a substrate, in particular a semiconductor substrate such as a silicon wafer. The substrate is placed in a tank containing a cleaning liquid, at an angle with respect to acoustic waves produced in said liquid. The angle corresponds to the angle of transmission, i.e. the angle at which waves are not reflected off the substrate surface. A damping material is provided in the tank, arranged to absorb substantially all waves thus transmitted through the substrate. A significant improvement in terms of cleaning efficiency is obtained by the method of the invention.

Abstract: A method for compensating roadway changes in a transmission control system of an automatic vehicle transmission, according to which each change in the roadway is recognized and compensated. Also disclosed is a transmission control system of an automatic vehicle transmission, particularly for carrying out the inventive method, comprising at least one device for detecting and compensating changes in the roadway.

Abstract: A method for compensating roadway changes in a transmission control system of an automatic vehicle transmission, according to which each change in the roadway is recognized and compensated. Also disclosed is a transmission control system of an automatic vehicle transmission, particularly for carrying out the inventive method, comprising at least one device for detecting and compensating changes in the roadway.

Abstract: A method for compensating roadway changes in a transmission control system of an automatic vehicle transmission, according to which each change in the roadway is recognized and compensated. Also disclosed is a transmission control system of an automatic vehicle transmission, particularly for carrying out the inventive method, comprising at least one device for detecting and compensating changes in the roadway.

Abstract: Specific shift positions of an electrically actuated vehicle transmission, such as first to fifth, neutral and reverse gears, are detected by monitoring one or more characteristic electrical variables, e.g., actuator currents, during a shift movement of the transmission and by correlating increased or decreased levels of current with the arrival at or passage through the specific shift positions.

Abstract: Specific shift positions of an electrically actuated vehicle transmission, such as first to fifth, neutral and reverse gears, are detected by monitoring one or more characteristic electrical variables, e.g., actuator currents, during a shift movement of the transmission and by correlating increased or decreased levels of current with the arrival at or passage through the specific shift positions.

Abstract: A motor vehicle transmission is shiftable in a track pattern with a selector track and shift tracks. A shifter element moves along the tracks when the transmission is shifted from one gear ratio to another. The shifts are directed by a control device sending command signals to an actuator device which, in turn, applies an actuating force to the transmission. A main position-detecting device detects the position of the shifter element relative to the selector track and shift tracks, and a redundant position-detecting device performs an additional, redundant determination of the shifter-element position.

Abstract: Specific shift positions of an electrically actuated vehicle transmission, such as first to fifth, neutral and reverse gears, are detected by monitoring one or more characteristic electrical variables, e.g., actuator currents, during a shift movement of the transmission and by correlating increased or decreased levels of current with the arrival at or passage through the specific shift positions.