Patents by Inventor Marc Wilhelmus Maria Van Der Wijst
Marc Wilhelmus Maria Van Der Wijst has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230279919Abstract: A vibration isolator (10; 210) for supporting a payload and isolating the payload from vibrations has a contact member (12) configured for supporting the payload, at least two pressurized gas compartments (24) arranged offset from each other to support the contact member at different locations, which pressurized gas compartments are connected to each other via a tubing system (54). The tubing system contains at least one restriction (66) at which a cross section of the tubing system is reduced by at least 50%.Type: ApplicationFiled: March 3, 2023Publication date: September 7, 2023Inventors: Alexander Petrus Josephus VAN LANKVELT, Michiel VERVOORDELDONK, Pavel KAGAN, Marc Wilhelmus Maria VAN DER WIJST, Galip Tuna TURKBEY, Marco HUISKAMP, Ulrich SCHOENHOFF
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Patent number: 11150560Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.Type: GrantFiled: May 22, 2020Date of Patent: October 19, 2021Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Anton Bernhard Van Oosten, Hans Butler, Erik Roelof Loopstra, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal
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Publication number: 20200285155Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.Type: ApplicationFiled: May 22, 2020Publication date: September 10, 2020Applicant: ASML Netherlands B.V.Inventors: Marcus Adrianus VAN DE KERKHOF, Anton Bernhard VAN OOSTEN, Hans BUTLER, Erik Roelof LOOPSTRA, Marc Wilhelmus Maria VAN DER WIJST, Koen Jacobus Johannes Maria ZAAL
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Patent number: 10732511Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.Type: GrantFiled: January 25, 2019Date of Patent: August 4, 2020Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Anton Bernhard Van Oosten, Hans Butler, Erik Roelof Loopstra, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal
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Patent number: 10649347Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.Type: GrantFiled: December 13, 2018Date of Patent: May 12, 2020Assignee: ASML Netherlands B.V.Inventors: Michael Johannes Christiaan Ronde, Lucas Kuindersma, Niels Johannes Maria Bosch, Hans Butler, Cornelius Adrianus Lambertus De Hoon, Marc Wilhelmus Maria Van Der Wijst, Thijs Verhees, Sander Kerssemakers
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Patent number: 10551751Abstract: A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage, and a measurement system including a sensor part and a reference part, the measurement system being configured to determine the position and/or orientation of the support stage, or of a component mounted on the support stage, relative to a reference frame by using the sensor part to interact with the reference part, wherein: the reference frame comprises N sub-frames coupled together so as to behave predominantly as a single rigid body with respect to vibrations below a first reference frequency and predominantly as an N-body system with respect to vibrations above a second reference frequency, where N is an integer greater than 1.Type: GrantFiled: March 18, 2013Date of Patent: February 4, 2020Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst
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Patent number: 10409175Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.Type: GrantFiled: October 22, 2014Date of Patent: September 10, 2019Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Marc Wilhelmus Maria Van Der Wijst, Thijs Verhees, Sander Kerssemakers
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Publication number: 20190171109Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.Type: ApplicationFiled: January 25, 2019Publication date: June 6, 2019Applicant: ASML Netherlands B.V.Inventors: Marcus Adrianus VAN DE KERKHOF, Anton Bernhard Van Oosten, Hans Butler, Erik Roelof Loopstra, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal
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Publication number: 20190129317Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.Type: ApplicationFiled: December 13, 2018Publication date: May 2, 2019Applicant: ASML Netherlands B.VInventors: Michael RONDE, Lucas KUINDERSMA, Niels BOSCH, Hans BUTLER, Cornelius Adrianus Lambertus DE HOON, Marc Wilhelmus Maria VAN DER WIJST, Thijs VERHEES, Sander KERSSEMAKERS
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Patent number: 10216093Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.Type: GrantFiled: December 12, 2013Date of Patent: February 26, 2019Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Anton Bernhard Van Oosten, Hans Butler, Erik Roelof Loopstra, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal
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Patent number: 10191393Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.Type: GrantFiled: February 22, 2016Date of Patent: January 29, 2019Assignee: ASML Netherlands B.V.Inventors: Jan Steven Christiaan Westerlaken, Marcel Koenraad Marie Baggen, Fransiscus Mathijs Jacobs, Jeroen Arnoldus Leonardus Johannes Raaymakers, Frank Pieter Albert Van Den Berkmortel, Marc Wilhelmus Maria Van Der Wijst
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Patent number: 10146133Abstract: A technique involving projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.Type: GrantFiled: June 3, 2016Date of Patent: December 4, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Wilhelmus Patrick Elisabeth Maria Op 'T Root, Herman Philip Godfried, Hubertus Petrus Leonardus Henrica Van Bussel, Arij Jonathan Rijke, Marc Wilhelmus Maria Van Der Wijst, Mathijs Leonardus Johan Verhees
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Patent number: 10114299Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.Type: GrantFiled: May 7, 2015Date of Patent: October 30, 2018Assignee: ASML Netherlands B.V.Inventors: Günes Nakiboglu, Mark Constant Johannes Baggen, Gerard Johannes Boogaard, Nicolaas Rudolf Kemper, Sander Kerssemakers, Robertus Mathijs Gerardus Rijs, Frank Johannes Jacobus Van Boxtel, Erwin Antonius Henricus Franciscus Van Den Boogaert, Marc Wilhelmus Maria Van Der Wijst, Martinus Van Duijnhoven, Jessica Henrica Anna Verdonschot, Hendrikus Herman Marie Cox
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Publication number: 20180203362Abstract: A technique involving projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.Type: ApplicationFiled: June 3, 2016Publication date: July 19, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Wilhelmus Patrick Elisabeth Maria OP 'T ROOT, Herman Philip GODFRIED, Hubertus Petrus Leonardus Henrica VAN BUSSEL, Arij Jonathan RIJKE, Marc Wilhelmus Maria VAN DER WIJST, Mathijs Leonardus Johan VERHEES
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Publication number: 20180101099Abstract: A lithographic apparatus has shield which protects a functional subsystem form acoustic disturbances. The shield comprises a locally resonant sonic material for implementing the protecting. In an embodiment the shield comprises a panel formed by a cell or a plurality of cells comprising: a frame; an elastic membrane whose edge is fixed to the frame; and a mass attached to a location at the membrane at a non-zero distance from the edge.Type: ApplicationFiled: March 8, 2016Publication date: April 12, 2018Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Marc Wilhelmus Maria VAN DER WIJST, Martinus VAN DUIJNHOVEN, Cornelius Adrianus Lambertus DE HOON, Frank Johannes Jacobus VAN BOXTEL
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Publication number: 20180059555Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.Type: ApplicationFiled: February 22, 2016Publication date: March 1, 2018Applicant: ASML Netherlands B.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Marcel Koenraad Marie BAGGEN, Fransiscus Mathijs JACOBS, Jeroen Arnoldus Leonardus Johannes RAAYMAKERS, Frank Pieter Albert VAN DEN BERKMORTEL, Marc Wilhelmus Maria VAN DER WIJST
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Patent number: 9715171Abstract: An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.Type: GrantFiled: December 9, 2010Date of Patent: July 25, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Johannes Petrus Martinus Bernardus Vermeulen, Marc Wilhelmus Maria Van Der Wijst, Jeroen Pieter Starreveld, Cornelius Adrianus Lambertus De Hoon, Francois Xavier Debiesme
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Patent number: 9696630Abstract: Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).Type: GrantFiled: September 14, 2015Date of Patent: July 4, 2017Assignees: ASML Netherlands B.V., Carl Zeiss SMT GMBHInventors: Marc Wilhelmus Maria Van Der Wijst, Hans Butler, Erik Roelof Loopstra, Bernhard Geuppert, Marco Hendrikus Hermanus Oude Nijhuis, Rodolfo Guglielmi Rabe, Yim Bun Patrick Kwan, Dick Antonius Hendrikus Laro
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Publication number: 20170090296Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of Cthrough-holes (102), between the chamber and the compartment.Type: ApplicationFiled: May 7, 2015Publication date: March 30, 2017Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Mark Constant Johannes BAGGEN, Gerard Johannes BOOGAARD, Nicolaas Rudolf KEMPER, Sander KERSSEMAKERS, Robertus Mathijs Gerardus RIJS, Frank Johannes Jacobus VAN BOXTEL, Erwin Antonius Henricus Franciscus VAN DEN BOOGAERT, Marc Wilhelmus Maria VAN DER WIJST, Martinus VAN DUIJNHOVEN, Jessica Henrica Anna VERDONSCHOT, Hendrikus Herman Marie COX
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Patent number: 9494869Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.Type: GrantFiled: December 5, 2012Date of Patent: November 15, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Maria Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch