Patents by Inventor Marc Wilhelmus Maria Van Der Wijst

Marc Wilhelmus Maria Van Der Wijst has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 6788386
    Abstract: A reaction mass and an actuator are used to reduce unwanted vibrations of an optical element in the projection system of a lithographic projection apparatus. The reaction mass may be mechanically connected only to the optical element or may be compliantly mounted to the projection system frame.
    Type: Grant
    Filed: December 19, 2002
    Date of Patent: September 7, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Hendrikus Herman Marie Cox, Frank Auer, Marc Wilhelmus Maria Van Der Wijst, Bastiaan Stephanus Hendrikus Jansen, Dominicus Jacobus Petrus Adrianus Franken
  • Lithographic apparatus and device manufacturing method
    Publication number: 20040065847
    Abstract: A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
    Type: Application
    Filed: July 9, 2003
    Publication date: April 8, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Dominicus Jacobus Petrus Adrianus Franken, Erik Roelof Loopstra, Pertrus Rutgerus Bartray, Marc Wilhelmus Maria Van Der Wijst, Michael Jozefa Mathijs Renkens, Gerard Van Schothorst, Johan Juliana Dries
  • Lithographic apparatus and device manufacturing method
    Publication number: 20030197914
    Abstract: A reaction mass and an actuator are used to reduce unwanted vibrations of an optical element in the projection system of a lithographic projection apparatus. The reaction mass may be mechanically connected only to the optical element or may be compliantly mounted to the projection system frame.
    Type: Application
    Filed: December 19, 2002
    Publication date: October 23, 2003
    Inventors: Hendrikus Herman Marie Cox, Frank Auer, Marc Wilhelmus Maria Van Der Wijst, Bastiaan Stephanus Hendrikus Jansen, Dominicus Jacobus Petrus Adrianus Franken