Patents by Inventor Marcus Adrianus Van De Kerkhof

Marcus Adrianus Van De Kerkhof has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11906907
    Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.
    Type: Grant
    Filed: November 27, 2018
    Date of Patent: February 20, 2024
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Derk Servatius Gertruda Brouns, Joshua Adams, Aage Bendiksen, Richard Jacobs, Andrew Judge, Veera Venkata Narasimha Narendra Phani Kottapalli, Joseph Harry Lyons, Theodorus Marinus Modderman, Manish Ranjan, Marcus Adrianus Van De Kerkhof, Xugang Xiong
  • Publication number: 20240027925
    Abstract: A method of protecting a component of a lithographic apparatus, the method including the steps of: providing a protective cover which is shaped to protect at least part of said component, the protective cover having a contact surface which is arranged to adhere to a first surface of at least part of said lithographic apparatus or said component; and bringing the protective cover into proximity with the component so as to cause the contact surface to adhere to the lithographic apparatus or said component and remain adhered without the application of external force. It is also provided a patterning device for use in a lithographic apparatus and a lithographic apparatus.
    Type: Application
    Filed: September 29, 2023
    Publication date: January 25, 2024
    Applicant: ASML Netherlands B.V.
    Inventor: Marcus Adrianus VAN DE KERKHOF
  • Publication number: 20240004283
    Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
    Type: Application
    Filed: July 28, 2023
    Publication date: January 4, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles ABEGG, Nirupam BANERJEE, Michiel Alexander BLAUW, Derk Servatius Gertruda BROUNS, Paul JANSSEN, Matthias KRUIZINGA, Egbert LENDERINK, Nicolae MAXIM, Andrey NIKIPELOV, Arnoud Willem NOTENBOOM, Claudia PILIEGO, Mária PÉTER, Gijsbert RISPENS, Nadja SCHUH, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Antonius Willem VERBURG, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN, Aleksandar Nikolov ZDRAVKOV
  • Publication number: 20230311173
    Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.
    Type: Application
    Filed: June 7, 2023
    Publication date: October 5, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrey NIKIPELOV, Dmitry KURILOVICH, Fabio SBRIZZAI, Marcus Adrianus VAN DE KERKHOF, Ties Wouter VAN DER WOORD, Willem Joan VAN DER ZANDE, Jeroen VAN DUIVENBODE, David Ferdinand VLES
  • Publication number: 20230314930
    Abstract: An apparatus for reducing a partially oxidized reticle and pellicle assembly, the apparatus including: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable to supply hydrogen in the vicinity of a pellicle of a reticle and pellicle assembly when supported by the support. The electron source is operable to direct electrons so as to be incident on a pellicle of a reticle and pellicle assembly when supported by the support.
    Type: Application
    Filed: July 29, 2021
    Publication date: October 5, 2023
    Inventors: Vadim Yevgenyevich BANINE, Paul Alexander VERMEULEN, Cornelis Adrianus DE MEIJERE, Johnnes Hubertus Josephina MOORS, Andrey NIKIPELOV, Guido SALMASO, Marcus Adrianus VAN DE KERKHOF, Parham YAGHOOBI
  • Publication number: 20230296986
    Abstract: A lithographic system and a method for exposing a substrate are provided. The method includes providing a plurality of mask sets. Each mask set includes complementary masks corresponding to a respective pattern. The method further comprises exposing the substrate with the plurality of mask sets. A stitch location between the complementary masks of a mask set is different than a stitch location between the complementary masks of each other mask set of the plurality of mask sets.
    Type: Application
    Filed: July 19, 2021
    Publication date: September 21, 2023
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Timothy Allan BRUNNER, Marcus Adrianus VAN DE KERKHOF
  • Patent number: 11762281
    Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
    Type: Grant
    Filed: December 22, 2020
    Date of Patent: September 19, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles Abegg, Nirupam Banerjee, Michiel Alexander Blauw, Derk Servatius Gertruda Brouns, Paul Janssen, Matthias Kruizinga, Egbert Lenderink, Nicolae Maxim, Andrey Nikipelov, Arnoud Willem Notenboom, Claudia Piliego, Mária Péter, Gijsbert Rispens, Nadja Schuh, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Antonius Willem Verburg, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen, Aleksandar Nikolov Zdravkov
  • Publication number: 20230236518
    Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.
    Type: Application
    Filed: June 9, 2021
    Publication date: July 27, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Koos VAN BERKEL, Marcus Adrianus VAN DE KERKHOF, Roger Franciscus Mattheus Maria HAMELINCK, Shahab SHERVIN, Marinus Augustinus Christiaan VERSCHUREN, Johannes Bernardus Charles ENGELEN, Matthias KRUIZINGA, Tammo UITTERDIJK, Oleksiy Sergiyovich GALAKTIONOV, Kjeld Gertrudus Hendrikus JANSSEN, Johannes Adrianus Cornelis Maria PIJNENBURG, Peter VAN DELFT
  • Patent number: 11673169
    Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.
    Type: Grant
    Filed: November 22, 2019
    Date of Patent: June 13, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrey Nikipelov, Dmitry Kurilovich, Fabio Sbrizzai, Marcus Adrianus Van de Kerkhof, Ties Wouter Van der Woord, Willem Joan Van der Zande, Jeroen Van Duivenbode, David Ferdinand Vles
  • Publication number: 20230063156
    Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
    Type: Application
    Filed: December 24, 2020
    Publication date: March 2, 2023
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Ronald Peter ALBRIGHT, Kursat BAL, Vadim Yevgenyevich BANINE, Richard Joseph BRULS, Sjoerd Frans DE VRIES, Olav Waldemar Vladimir FRIJNS, Yang-Shan HUANG, Zhuangxiong HUANG, Johannes Henricus Wilhelmus JACOBS, Johannes Hubertus Josephina MOORS, Georgi Nanchev NENCHEV, Andrey NIKIPELOV, Thomas Maarten RAASVELD, Manish RANJAN, Edwin TE SLIGTE, Karl Robert UMSTADTER, Eray UZGÖREN, Marcus Adrianus VAN DE KERKHOF, Parham YAGHOOBI
  • Publication number: 20230008474
    Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.
    Type: Application
    Filed: October 5, 2020
    Publication date: January 12, 2023
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Victor Antonio PEREZ-FALCON, Marcus Adrianus VAN DE KERKHOF, Daniel Leslie HALL, Christopher John MASON, Arthur Winfried Eduardus MINNAERT, Johannes Hubertus Josephina MOORS, Samir A. NAYFEH
  • Publication number: 20220342315
    Abstract: A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.
    Type: Application
    Filed: June 5, 2020
    Publication date: October 27, 2022
    Inventors: Marcus Adrianus Van De Kerkhof, Satish Achanta, Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Stef Marten Johan Janssens, Andrey Nikipelov
  • Publication number: 20220342322
    Abstract: A substrate handling system comprising a substrate holder comprising a main body with a main body surface, and a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface, clamping means, the clamping means being configured to clamp and/or unclamp the substrate onto the substrate holder, and conveying means, the conveying means being configured to load and/or unload the substrate onto the substrate holder, wherein the conveying means is further configured to physically contact the substrate during the clamping and/or unclamping to the substrate holder. It is also described methods for clamping and unclamping a substrate, a computer program, a computer-readable medium and a lithography apparatus.
    Type: Application
    Filed: May 19, 2020
    Publication date: October 27, 2022
    Inventor: Marcus Adrianus Van De Kerkhof
  • Publication number: 20220276553
    Abstract: A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.
    Type: Application
    Filed: August 20, 2020
    Publication date: September 1, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrey NIKIPELOV, Sander BALTUSSEN, Vadim Yevgenyevich BANINE, Alexandr DOLGOV, DONMEZ NOYAN, Zomer Silvester HOUWELING, Arnoud Willem NOTENBOOM, Marcus Adrianus VAN DE KERKHOF, Ties Wouter VAN DER WOORD, Paul Alexander VERMEULEN, David Ferdinand VLES, Victoria VORONINA, Halil Gökay YEGEN
  • Publication number: 20220276573
    Abstract: A lithographic apparatus including a substrate stage for supporting a structure in a compartment, the compartment having a compartment surface facing a top surface of the substrate in at least one operational configuration; and a soft coating on the compartment surface for capturing particles. A heat shield or component thereof for a lithographic apparatus, the heat shield or component thereof including a soft coating on at least one surface for capturing particles and a lithographic apparatus including such a heat shield.
    Type: Application
    Filed: June 4, 2020
    Publication date: September 1, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcus Adrianus VAN DE KERKHOF, Manish RANJAN
  • Publication number: 20220260756
    Abstract: Provided is an optical element for a lithographic apparatus. The optical element includes a capping layer that includes oxygen vacancies therein. The oxygen vacancies prevent attack of the capping layer by preventing hydrogen and other species from penetrating the capping layer and underlying layers. The capping layer provides a low hydrogen recombination rate enabling hydrogen to clean the surface of the optical element. The capping layer may include an alloyed metal, a mixed metal oxide or a doped metal oxide and it may be a ruthenium capping layer that includes one or more dopants therein.
    Type: Application
    Filed: June 26, 2020
    Publication date: August 18, 2022
    Inventors: Yue Ma, Marcus Adrianus Van De Kerkhof, Qiushi Zhu, Klaus Martin Hummler, Peter Matthew Mayer, Kay Hoffmann, Andrew David LaForge, Igor Vladimirovich Fomenkov, Daniel John William Brown
  • Publication number: 20220252974
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
    Type: Application
    Filed: April 25, 2022
    Publication date: August 11, 2022
    Inventors: David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willlem-Pieter VOORTHUIJZEN, James Norman WILEY
  • Patent number: 11347142
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
    Type: Grant
    Filed: March 19, 2021
    Date of Patent: May 31, 2022
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
  • Patent number: 11320731
    Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and including a stack having: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine.
    Type: Grant
    Filed: December 2, 2016
    Date of Patent: May 3, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pieter-Jan Van Zwol, Dennis De Graaf, Paul Janssen, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, David Ferdinand Vles, Willem-Pieter Voorthuijzen
  • Patent number: 11294291
    Abstract: A component of a lithographic apparatus, the component having a contaminant trap surface provided with recesses configured to trap contaminant particles and to reduce specular reflection of DUV radiation. The recesses can have at least one dimension less than or equal to about 2 ?m, desirably less than 1 ?m.
    Type: Grant
    Filed: March 11, 2019
    Date of Patent: April 5, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Adrianus Van De Kerkhof, Johannes Hubertus Josephina Moors