Patents by Inventor Marcus Adrianus Van De Kerkhof
Marcus Adrianus Van De Kerkhof has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12287455Abstract: Provided is an optical element for a lithographic apparatus. The optical element includes a capping layer that includes oxygen vacancies therein. The oxygen vacancies prevent attack of the capping layer by preventing hydrogen and other species from penetrating the capping layer and underlying layers. The capping layer provides a low hydrogen recombination rate enabling hydrogen to clean the surface of the optical element. The capping layer may include an alloyed metal, a mixed metal oxide or a doped metal oxide and it may be a ruthenium capping layer that includes one or more dopants therein.Type: GrantFiled: June 26, 2020Date of Patent: April 29, 2025Assignee: ASML Netherlands B.V.Inventors: Yue Ma, Marcus Adrianus Van De Kerkhof, Qiushi Zhu, Klaus Martin Hummler, Peter Matthew Mayer, Kay Hoffmann, Andrew David LaForge, Igor Vladimirovich Fomenkov, Daniel John William Brown
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Patent number: 12271008Abstract: A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.Type: GrantFiled: September 13, 2019Date of Patent: April 8, 2025Assignee: ASML NETHERLANDS B.V.Inventors: Andrey Nikipelov, Marcus Adrianus Van De Kerkhof, Pieter-Jan Van Zwol, Laurentius Cornelius De Winter, Wouter Joep Engelen, Alexey Olegovich Polyakov
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Patent number: 12249480Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer; a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.Type: GrantFiled: April 23, 2024Date of Patent: March 11, 2025Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Jing Zhang, Martijn Petrus Christianus Van Heumen, Patriek Adrianus Alphonsus Maria Bruurs, Erheng Wang, Vineet Sharma, Makfir Sefa, Shao-Wei Fu, Simone Maria Scolari, Johannes Andreas Henricus Maria Jacobs
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Patent number: 12235592Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.Type: GrantFiled: June 9, 2021Date of Patent: February 25, 2025Assignee: ASML NETHERLANDS B.V.Inventors: Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Koos Van Berkel, Marcus Adrianus Van De Kerkhof, Roger Franciscus Mattheus Maria Hamelinck, Shahab Shervin, Marinus Augustinus Christiaan Verschuren, Johannes Bernardus Charles Engelen, Matthias Kruizinga, Tammo Uitterdijk, Oleksiy Sergiyovich Galaktionov, Kjeld Gertrudus Hendrikus Janssen, Johannes Adrianus Cornelis Maria Pijnenburg, Peter Van Delft
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Patent number: 12174552Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.Type: GrantFiled: October 5, 2020Date of Patent: December 24, 2024Assignee: ASML Holding N.V.Inventors: Victor Antonio Perez-Falcon, Marcus Adrianus Van De Kerkhof, Daniel Leslie Hall, Christopher John Mason, Arthur Winfried Eduardus Minnaert, Johannes Hubertus Josephina Moors, Samir A. Nayfeh
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Patent number: 12158706Abstract: A lithographic apparatus including a substrate stage for supporting a structure in a compartment, the compartment having a compartment surface facing a top surface of the substrate in at least one operational configuration; and a soft coating on the compartment surface for capturing particles. A heat shield or component thereof for a lithographic apparatus, the heat shield or component thereof including a soft coating on at least one surface for capturing particles and a lithographic apparatus including such a heat shield.Type: GrantFiled: June 4, 2020Date of Patent: December 3, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Marcus Adrianus Van de Kerkhof, Manish Ranjan
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Publication number: 20240369919Abstract: A patterning device for a lithographic apparatus arranged to project a pattern from the patterning device onto a substrate, the patterning device comprising: an imaging area having opposing first sides extending parallel to a scanning direction of the lithographic apparatus and opposing second sides extending perpendicularly to the scanning direction, and at least one sensing mark located adjacent to at least one second side of the imaging area; wherein the at least one sensing mark is located a predetermined distance in the scanning direction away from the at least one second side of the imaging area and extends a width in the scanning direction such that the at least one sensing mark, when projected onto the substrate, fits within a scribe line on the substrate.Type: ApplicationFiled: March 9, 2022Publication date: November 7, 2024Applicant: ASML Netherlands B.V.Inventor: Marcus Adrianus VAN DE KERKHOF
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Publication number: 20240369920Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.Type: ApplicationFiled: July 16, 2024Publication date: November 7, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Sander Baltussen, Dennis De Graaf, Johannes Christiaan Leonardus Franken, Adrianus Johannes Maria Giesbers, Alexander Ludwig Klein, Johan Hendrik Klootwijk, Peter Simon Antonius Knapen, Evgenia Kurganova, Alexey Sergeevich Kuznetsov, Arnoud Willem Notenboom, Mahdiar Valefi, Marcus Adrianus Van De Kerkhof, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Ties Wouter Van Der Woord, Hendrikus Jan Wondergem, Aleksandar Nikolov Zdravkov
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Publication number: 20240361706Abstract: The invention provides a position measurement system to measure a position of an object in a movement direction relative to a reference, said position measurement system comprising: —a diffraction grating, and —an interferometer, wherein the interferometer is configured to direct a measurement beam to the diffraction grating in a measuring direction that is orthogonal to the movement direction of the object, and wherein the diffraction grating is oriented relative to the interferometer such that the measurement beam is substantially at a Littrow angle of the diffraction grating so that a diffracted beam to be received by the interferometer is substantially parallel to the measuring direction.Type: ApplicationFiled: June 30, 2022Publication date: October 31, 2024Applicant: ASML Netherlands B.V.Inventor: Marcus Adrianus VAN DE KERKHOF
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Publication number: 20240361698Abstract: A plate for use in an imaging system to determine at least two optical properties of an illumination beam of the imaging system, the imaging system configured to illuminate an illumination region with the illumination beam, the plate including a plurality of markers, wherein a first subset of the plurality of markers includes a first type of markers for determining a first optical property of the illumination beam, and a second subset of the plurality of markers includes a second type of markers for determining a second optical property of the illumination beam, wherein the plurality of markers are located within a marker region of the plate and the marker region generally corresponds to the illumination region.Type: ApplicationFiled: June 20, 2022Publication date: October 31, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Albertus HARTGERS, Marco Matheus Louis STEEGHS, Gerardus Hubertus Petrus Maria SWINKELS, Giovanni IMPONENTE, Nicholas William Maria PLANTZ, Wouter Joep ENGELEN, Marcus Adrianus VAN DE KERKHOF
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Patent number: 12117736Abstract: A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.Type: GrantFiled: June 5, 2020Date of Patent: October 15, 2024Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Satish Achanta, Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Stef Marten Johan Janssens, Andrey Nikipelov
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Publication number: 20240337956Abstract: An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus including at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules include a plurality of cleaning mechanisms, and wherein the plurality of cleaning mechanisms include: at least one preparing mechanism for reducing adhesion of the particles to the component and at least one removing mechanism for removing particles from the component, or a plurality of removing mechanisms for removing particles from the component.Type: ApplicationFiled: July 8, 2022Publication date: October 10, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Lucas Christiaan Johan HEIJMANS, Imre Rudolf Richard DEHNER, Raymond Wilhelmus Louis LAFARRE, Cornelis Christiaan OTTENS, Marcus Adrianus VAN DE KERKHOF, Andrey NIKIPELOV, Dennis VANOTTERDIJK, Edwin Johannes Theodorus SMULDERS, Andrei Mikhailovich YAKUNIN, Guido SALMASO, Luc VOORDECKERS, Chaitanya Krishna ANDE, Martinus Jacobus Johannes COENEN
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Publication number: 20240329546Abstract: A system includes a support table having one or more protrusions and a pressure device. The one or more protrusions contact and support a substrate such that the substrate is suspended with respect to the support table. Sagging of the substrate when supported by the support table is based on a material and/or dimensions of the substrate. The pressure adjusts a pressure on a side of the substrate such that the sagging is reduced.Type: ApplicationFiled: June 28, 2022Publication date: October 3, 2024Applicant: ASML Netherlands B.V.Inventor: Marcus Adrianus VAN DE KERKHOF
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Publication number: 20240310742Abstract: A contamination reduction system for reducing contamination of a patterning system in a plasma environment, comprising: a support arranged to hold a patterning system in a radiation beam; a shutter configured to shield a portion of the radiation beam from the patterning system; and an electrode positioned between the shutter and the support, the electrode connected to a voltage source and configured to generate an electric field between the electrode and the patterning system held by the support.Type: ApplicationFiled: December 15, 2021Publication date: September 19, 2024Applicant: ASML Netherlands B.V.Inventors: Vladimir KVON, Andrei Mikhailovich YAKUNIN, Marcus Adrianus VAN DE KERKHOF, Dmitry Igorevich ASTAKHOV
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Publication number: 20240288783Abstract: Systems, apparatuses, and methods are provided for removing heat from a reticle. An example method can include generating, by a cooling controller, a cooling control signal based on timing data for a projection of a patterned radiation beam formed by illuminating an exposed area on a reticle supported by a reticle table, absorption data for the exposed area, and a target heat transfer rate. The cooling control signal can instruct a reticle cooling apparatus to actuate actuators to modify a distance between the reticle and a roof of the reticle cooling apparatus. The method can further include modifying, by the actuators based on the cooling control signal, the distance between the reticle and the roof to modify a heat transfer rate associated with a removal of heat from the reticle towards the target heat transfer rate.Type: ApplicationFiled: May 27, 2022Publication date: August 29, 2024Applicant: ASML Netherlands B.V.Inventors: Marcus Adrianus VAN DE KERKHOF, Victor Antonio PEREZ-FALCON
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Patent number: 12072620Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.Type: GrantFiled: October 2, 2019Date of Patent: August 27, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Pieter-Jan Van Zwol, Sander Baltussen, Dennis De Graaf, Johannes Christiaan Leonardus Franken, Adrianus Johannes Maria Giesbers, Alexander Ludwig Klein, Johan Hendrik Klootwijk, Peter Simon Antonius Knapen, Evgenia Kurganova, Alexey Sergeevich Kuznetsov, Arnoud Willem Notenboom, Mahdiar Valefi, Marcus Adrianus Van de Kerkhof, Wilhelmus Theodorus Anthonius Johannes Van den Einden, Ties Wouter Van der Woord, Hendrikus Jan Wondergem, Aleksandar Nikolov Zdravkov
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Patent number: 12066758Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.Type: GrantFiled: April 25, 2022Date of Patent: August 20, 2024Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
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Publication number: 20240274400Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer; a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.Type: ApplicationFiled: April 23, 2024Publication date: August 15, 2024Inventors: Marcus Adrianus VAN DE KERKHOF, Jing ZHANG, Martijn Petrus Christianus VAN HEUMEN, Patriek Adrianus Alphonsus Maria BRUURS, Erheng WANG, Vineet SHARMA, Makfir SEFA, Shao-Wei FU, Simone Maria SCOLARI, Johannes Andreas Henricus Maria JACOBS
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Publication number: 20240264540Abstract: A substrate holder for holding a substrate comprising a frame and a surface clamping device arranged on an underside of the frame configured to electrostatically attract an upper surface of the substrate from above the substrate. The substrate holder can be used to contactlessly hold and deform the substrate and thereby control a shape of the substrate. The substrate holder is suitable for use in a semiconductor processing apparatus and can operate in a vacuum or near-vacuum environment, such as in an EUV lithographic apparatus.Type: ApplicationFiled: June 15, 2022Publication date: August 8, 2024Inventors: Marcus Adrianus Van de Kerkhof, Adrianus Hendrik Koevoets
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Patent number: 12001149Abstract: A method of protecting a component of a lithographic apparatus, the method including the steps of: providing a protective cover which is shaped to protect at least part of said component, the protective cover having a contact surface which is arranged to adhere to a first surface of at least part of said lithographic apparatus or said component; and bringing the protective cover into proximity with the component so as to cause the contact surface to adhere to the lithographic apparatus or said component and remain adhered without the application of external force. It is also provided a patterning device for use in a lithographic apparatus and a lithographic apparatus.Type: GrantFiled: January 24, 2020Date of Patent: June 4, 2024Assignee: ASML Netherlands B.V.Inventor: Marcus Adrianus Van De Kerkhof