Patents by Inventor Marcus Adrianus Van De Kerkhof
Marcus Adrianus Van De Kerkhof has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11320731Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and including a stack having: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine.Type: GrantFiled: December 2, 2016Date of Patent: May 3, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Pieter-Jan Van Zwol, Dennis De Graaf, Paul Janssen, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, David Ferdinand Vles, Willem-Pieter Voorthuijzen
-
Patent number: 11294291Abstract: A component of a lithographic apparatus, the component having a contaminant trap surface provided with recesses configured to trap contaminant particles and to reduce specular reflection of DUV radiation. The recesses can have at least one dimension less than or equal to about 2 ?m, desirably less than 1 ?m.Type: GrantFiled: March 11, 2019Date of Patent: April 5, 2022Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Johannes Hubertus Josephina Moors
-
Patent number: 11287753Abstract: The present application relates to a carbon dioxide snow cleaning apparatus comprising: a carbon dioxide source; a carbon dioxide snow nozzle in fluid communication with the carbon dioxide source; a charging element; and a collection surface. Also described is a method of cleaning a surface, the method comprising the steps of: (i) passing a stream of carbon dioxide out of a carbon dioxide snow nozzle to form a carbon dioxide snow stream; (ii) charging the carbon dioxide snow stream; (iii) directing the charged carbon dioxide snow stream onto the surface to be cleaned; (iv) collecting particles removed by the charged carbon dioxide snow stream from the surface to be cleaned on a collection surface. Also described is the use of such apparatus in a lithographic apparatus and the use of such an apparatus or method.Type: GrantFiled: January 22, 2019Date of Patent: March 29, 2022Assignee: ASML Netherlands B.V.Inventor: Marcus Adrianus Van de Kerkhof
-
Publication number: 20220075279Abstract: A method of protecting a component of a lithographic apparatus, the method including the steps of: providing a protective cover which is shaped to protect at least part of said component, the protective cover having a contact surface which is arranged to adhere to a first surface of at least part of said lithographic apparatus or said component; and bringing the protective cover into proximity with the component so as to cause the contact surface to adhere to the lithographic apparatus or said component and remain adhered without the application of external force. It is also provided a patterning device for use in a lithographic apparatus and a lithographic apparatus.Type: ApplicationFiled: January 24, 2020Publication date: March 10, 2022Applicant: ASML Netherlands B.V.Inventor: Marcus Adrianus VAN DE KERKHOF
-
Publication number: 20220035239Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.Type: ApplicationFiled: October 2, 2019Publication date: February 3, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Sander BALTUSSEN, Dennis DE GRAAF, Johannes Christiaan Leonardus FRANKEN, Adrianus Johannes Maria GIESBERS, Alexander Ludwig KLEIN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Alexey Sergeevich KUZNETSOV, Arnoud Willem NOTENBOOM, Mahdiar VALEFI, Marcus Adrianus VAN DE KERKHOF, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Ties Wouter VAN DER WOORD, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
-
Publication number: 20220008963Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.Type: ApplicationFiled: November 22, 2019Publication date: January 13, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Andrey NIKIPELOV, Dmitry KURILOVICH, Fabio SBRIZZAI, Marcus Adrianus VAN DE KERKHOF, Ties Wouter VAN DER WOORD, Willem Joan VAN DER ZANDE, Jeroen VAN DUIVENBODE, David Ferdinand VLES
-
Publication number: 20210382209Abstract: A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.Type: ApplicationFiled: September 13, 2019Publication date: December 9, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Andrey NIKIPELOV, Marcus Adrianus VAN DE KERKHOF, Pieter-Jan VAN ZWOL, Laurentius Cornelius DE WINTER, Wouter Joep ENGELEN, Alexey Olegovich POLYAKOV
-
Patent number: 11163240Abstract: A system for heating an optical component of a lithographic apparatus, the system comprising a heating radiation source, the heating radiation source being configured to emit heating radiation for heating of the optical component, wherein the system is configured to direct the heating radiation emitted by the heating radiation source onto the optical component, a portion of the heating radiation being absorbed by the optical component and another portion of the heating radiation being reflected by optical component, and wherein the system is configured to vary or change a property of the heating radiation emitted by the heating radiation source such that the other portion of the heating radiation that is reflected by the optical component is constant during operation of the lithographic apparatus.Type: GrantFiled: March 4, 2020Date of Patent: November 2, 2021Assignee: ASML Netherlands B.V.Inventors: Franciscus Johannes Joseph Janssen, Marcus Adrianus Van De Kerkhof
-
Publication number: 20210333723Abstract: The present application relates to a carbon dioxide snow cleaning apparatus comprising: a carbon dioxide source; a carbon dioxide snow nozzle in fluid communication with the carbon dioxide source; a charging element; and a collection surface. Also described is a method of cleaning a surface, the method comprising the steps of: (i) passing a stream of carbon dioxide out of a carbon dioxide snow nozzle to form a carbon dioxide snow stream; (ii) charging the carbon dioxide snow stream; (iii) directing the charged carbon dioxide snow stream onto the surface to be cleaned; (iv) collecting particles removed by the charged carbon dioxide snow stream from the surface to be cleaned on a collection surface. Also described is the use of such apparatus in a lithographic apparatus and the use of such an apparatus or method.Type: ApplicationFiled: January 22, 2019Publication date: October 28, 2021Inventor: Marcus Adrianus Van de Kerkhof
-
Patent number: 11150560Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.Type: GrantFiled: May 22, 2020Date of Patent: October 19, 2021Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Anton Bernhard Van Oosten, Hans Butler, Erik Roelof Loopstra, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal
-
Publication number: 20210257181Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer; a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.Type: ApplicationFiled: February 18, 2021Publication date: August 19, 2021Inventors: Marcus Adrianus VAN DE KERKHOF, Jing ZHANG, Martijn Petrus Christianus VAN HEUMEN, Patriek Adrianus Alphonsus Maria BRUURS, Erheng WANG, Vineet SHARMA, Makfir SEFA, Shao-Wei FU, Simone Maria SCOLARI, Johannes Andreas Henricus Maria JACOBS
-
Publication number: 20210208500Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.Type: ApplicationFiled: March 19, 2021Publication date: July 8, 2021Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, James Norman WILEY
-
Patent number: 11048180Abstract: A component for use in a patterning device environment including a patterning device, wherein the component is treated to suppress EUV plasma-induced contaminant release and/or atomic hydrogen or other radicals induced defectivity. A conduit array comprising at least one conduit, wherein the at least one conduit has been treated to promote adhesion of a contaminant to the at least one conduit.Type: GrantFiled: September 16, 2019Date of Patent: June 29, 2021Assignee: ASML Netherlands B.V.Inventors: Andrey Nikipelov, Vadim Yevgenyevich Banine, Christian Gerardus Norbertus Hendricus Marie Cloin, Edwin Te Sligte, Marcus Adrianus Van De Kerkhof, Ferdinandus Martinus Jozef Henricus Van De Wetering
-
Patent number: 11003096Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.Type: GrantFiled: December 18, 2019Date of Patent: May 11, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
-
Patent number: 10983431Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.Type: GrantFiled: October 30, 2019Date of Patent: April 20, 2021Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
-
Publication number: 20210109438Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.Type: ApplicationFiled: December 22, 2020Publication date: April 15, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles Abegg, Nirupam Banerjee, Michiel Alexander Blauw, Derk Servatius Gertruda Brouns, Paul Janssen, Matthias Kruizinga, Egbert Lenderink, Nicolae Maxim, Andrey Nikipelov, Arnoud Willem Notenboom, Claudia Piliego, Mária Péter, Gijsbert Rispens, Nadja Schuh, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Antonius Willem Verburg, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen, Aleksandar Nikolov Zdravkov
-
Patent number: 10935673Abstract: A radiation analysis system comprising a target comprising two marks which are separated from each other, the target being configured to undergo thermal expansion when illuminated with radiation; a position measurement system configured to measure a change in the separation of the marks; and a processor configured to determine a power of the radiation using the measured change in separation of the marks.Type: GrantFiled: October 2, 2017Date of Patent: March 2, 2021Assignee: ASML Netherlands B.V.Inventor: Marcus Adrianus Van De Kerkhof
-
Patent number: 10928735Abstract: A patterning device for use with a lithographic apparatus, the device comprising an absorber portion configured to absorb incident radiation and to reflect a portion of incident radiation, the absorber portion comprising a first layer and a second layer, the first layer of the absorber portion comprising a first material that is different from a second material of the second layer of the absorber portion; a reflector portion arranged beneath the absorber portion, the reflector portion being configured to reflect incident radiation; and a phase tune portion arranged between the reflector portion and the absorber portion, the phase tune portion being configured to induce a phase shift between the radiation reflected by the reflector portion and the portion of radiation reflected by the absorber portion such that the radiation reflected by the reflector portion destructively interferes with the portion of radiation reflected by the absorber portion.Type: GrantFiled: November 27, 2019Date of Patent: February 23, 2021Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Laurentius Cornelius De Winter, Eelco Van Setten
-
Publication number: 20210048757Abstract: The present application relates to a carbon dioxide snow cleaning apparatus comprising: a carbon dioxide source; a carbon dioxide snow nozzle in fluid communication with the carbon dioxide source; a charging element; and a collection surface. Also described is a method of cleaning a surface, the method comprising the steps of: (i) passing a stream of carbon dioxide out of a carbon dioxide snow nozzle to form a carbon dioxide snow stream; (ii) charging the carbon dioxide snow stream; (iii) directing the charged carbon dioxide snow stream onto the surface to be cleaned; (iv) collecting particles removed by the charged carbon dioxide snow stream from the surface to be cleaned on a collection surface. Also described is the use of such apparatus in a lithographic apparatus and the use of such an apparatus or method.Type: ApplicationFiled: January 20, 2019Publication date: February 18, 2021Inventor: Marcus Adrianus Van de Kerkhof
-
Patent number: 10908496Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.Type: GrantFiled: April 12, 2017Date of Patent: February 2, 2021Assignee: ASML Netherlands B.V.Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles Abegg, Nirupam Banerjee, Michiel Alexander Blauw, Derk Servatius Gertruda Brouns, Paul Janssen, Matthias Kruizinga, Egbert Lenderink, Nicolae Maxim, Andrey Nikipelov, Arnoud Willem Notenboom, Claudia Piliego, Mária Péter, Gijsbert Rispens, Nadja Schuh, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Antonius Willem Verburg, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen, Aleksandar Nikolov Zdravkov