Abstract: Provided is a method of providing a patterned layer (50). The method comprises providing (2, 3A, 3B) a substrate (10) having a surface (11) to which a compound is applied. The compound has at least one condensable group which is reactive with surface groups on the surface of the substrate by condensation reaction. The compound also has a basic group for accepting protons. A layer of a polycondensable imprinting composition (30) is applied (4) onto the layer of the compound. The imprinting composition layer is imprinted (5A, 5B, 5C) with a patterned stamp. During the imprinting, polycondensation of the imprinting composition leads to forming of the patterned layer. Further provided is the patterned layer itself, as well as an optical element and an etch mask, each of which comprises the patterned layer.

Abstract: Provided is a method of providing a patterned layer (50). The method comprises providing (2, 3A, 3B) a substrate (10) having a surface (11) to which a compound is applied. The compound has at least one condensable group which is reactive with surface groups on the surface of the substrate by condensation reaction. The compound also has a basic group for accepting protons. A layer of a polycondensable imprinting composition (30) is applied (4) onto the layer of the compound. The imprinting composition layer is imprinted (5A, 5B, 5C) with a patterned stamp. During the imprinting, polycondensation of the imprinting composition leads to forming of the patterned layer. Further provided is the patterned layer itself, as well as an optical element and an etch mask, each of which comprises the patterned layer.

Abstract: Disclosed is a stamp (14) for an imprint lithography process, the stamp comprising an elastomer stamp body including a polysiloxane bulk portion (110) and a patterned surface comprising a feature pattern (16) for imprinting an imprinting composition (12) wherein the elastomer stamp body comprises a basic organic amine in an amount of at least 0.1% by weight based on the total weight of the elastomer stamp body. Also disclosed are methods of manufacturing such a stamp, and a method of forming a patterned layer on a substrate using such a stamp.

Abstract: Provided is a method of providing a patterned layer (50). The method comprises providing (2, 3A, 3B) a substrate (10) having a surface (11) to which a compound is applied. The compound has at least one condensable group which is reactive with surface groups on the surface of the substrate by condensation reaction. The compound also has a basic group for accepting protons. A layer of a polycondensable imprinting composition (30) is applied (4) onto the layer of the compound. The imprinting composition layer is imprinted (5A, 5B, 5C) with a patterned stamp. During the imprinting, polycondensation of the imprinting composition leads to forming of the patterned layer. Further provided is the patterned layer itself, as well as an optical element and an etch mask, each of which comprises the patterned layer.

Abstract: A method for forming a relief layer employing a stamp having a stamping surface including a template relief pattern. A solution comprising a siliconoxide compound is sandwiched between a substrate surface and the stamp surface and dried while sandwiched. After removal of the template relief pattern the relief layer obtained has a high inorganic mass content making it robust and directly usable for a number of applications such as semiconductor, optical or micromechanical.

Abstract: A method of manufacturing a patterned stamp for patterning a contoured surface is disclosed. The method comprises providing a pliable stamp layer carrying a pattern of features, forcing the pliable stamp layer onto the contoured surface with said pattern of features facing the contoured surface; applying a fluid support layer over the pliable stamp layer on the contoured surface; solidifying the support layer to form the patterned stamp; and removing the patterned stamp from the contoured surface. A corresponding patterned stamp, imprinting method and imprinted article are also disclosed.

Abstract: A method of imprinting a substrate (180), comprising affixing a flexible stamp (104) carrying an imprinting pattern (106) to a first carrier (102) comprising an array of apertures (112) which, by gas pressure, either pull the flexible stamp towards the first carrier or push it away; pushing it to a second carrier (170) carrying a substrate (180) with a resist layer (182), leaving a gap (190) for creating a controllable contact area between the flexible stamp and the substrate and space (196) between the first carrier and the flexible stamp; progressively pushing areas of the flexible stamp into the resist layer to imprint it; developing the resist layer; and progressively releasing the flexible stamp by applying suction through successive apertures whilst controlling the inward flow of gas to the space (196) through the apertures that are not yet under suction in order to maintain the space (196) there above ambient but below a pre-determined maximum pressure.

Abstract: The present invention relates to fluorescence imaging. In order to enhance compatibility with multiple fluorescence channels for calibrating a fluorescence microscope, a calibration slide is provided that comprises a substrate and a pixel layout. The pixel layout comprises a plurality of spaced apart metal nanostructures arranged on a surface of the substrate. The metal nanostructures are arranged to produce plasmon resonances that allow absorbing light at an excitation wavelength to produce photo-luminescence and/or fluorescence light for generating a fluorescent image. The fluorescent image comprises a plurality of pixel intensity values that are provided for calibration of a fluorescence microscope.

Abstract: Disclosed is a method of manufacturing a polyorganosiloxane-based stamp comprising providing a master including a transfer pattern surface; forming a first layer of a first curable composition onto the transfer pattern surface such that the first layer includes a relief pattern of said transfer pattern; partially curing the first layer; depositing a second layer of a second curable composition onto the partially cured first layer; co-curing the partially cured first layer and the second layer to form a cured first layer having a first Young's modulus, adhered to a cured second layer having a second Young's modulus smaller than the first Young's modulus; depositing a third layer of a third curable composition onto the second layer, and curing the third layer to form a cured third layer adhered to the cured second layer. Further disclosed is a polyorganosiloxane-based stamp obtainable from the method; use of the same for printing process; and an imprinting method using the same.

Abstract: Disclosed is a stamp (14) for an imprint lithography process, the stamp comprising an elastomer stamp body including a polysiloxane bulk portion (110) and a patterned surface comprising a feature pattern (16) for imprinting an imprinting composition (12) wherein the elastomer stamp body comprises a basic organic amine in an amount of at least 0.1% by weight based on the total weight of the elastomer stamp body. Also disclosed are methods of manufacturing such a stamp, and a method of forming a patterned layer on a substrate using such a stamp.

Abstract: Disclosed is a stamp (14) for an imprint lithography process, the stamp comprising an elastomer stamp body including a polysiloxane bulk portion (110) and a patterned surface comprising a feature pattern (16) for imprinting an imprinting composition (12) wherein the elastomer stamp body comprises a basic organic amine in an amount of at least 0.1% by weight based on the total weight of the elastomer stamp body. Also disclosed are methods of manufacturing such a stamp, and a method of forming a patterned layer on a substrate using such a stamp.

Abstract: A method of manufacturing a patterned stamp (100) for patterning a contoured surface (10) is disclosed. The method comprises applying a layer (115) of a pliable material precursor over a master (50) carrying an inverse pattern (52) to form a desired pattern (112) in said layer; curing the pliable material precursor to form a pliable stamp layer (120) comprising said desired pattern; providing an intermediate stamp structure by adhering a porous pliable support layer (130) to the pliable stamp layer; releasing the intermediate stamp structure from the master; forcing the intermediate stamp structure onto the contoured surface with said pattern of features facing the contoured surface; forming the patterned stamp by filling the porous pliable support layer with a filler material to reduce the pliability of the support layer; and removing the patterned stamp from the contoured surface. A corresponding patterned stamp, imprinting method and imprinted article are also disclosed.

Abstract: The invention relates to creating a nano-sized recess into a layer of material. For that, a first layer (100) is provided, which defines a first recess (101). The first layer (100) is then conformally covered with a second layer (107) such that the second layer evenly covers the boundaries of the first recess. In this way, the second layer defines a nano-sized recess. Furthermore, the invention relates to using such a structure with a second nano-sized recess for etching a nanoslit into a graphene layer. Furthermore, such a graphene layer with a nanoslit is described to be used for creating a crossed-nanoslit device for sequencing molecules.

Abstract: A laminate comprising an abrasion resisting layer that is disposed on a surface of an optically transmissive substrate, wherein the layer comprises a pattern of spatially separated protrusions of an abrasion-resistant material extending away from the surface, and silica interposed between the protrusions. The abrasion-resistant material has a Knoop hardness measured according to ASTM E384 Knoop Hardness Standard that is greater than that of the silica.

Abstract: Disclosed is a stamp (14) for an imprint lithography process, the stamp comprising an elastomer stamp body including a polysiloxane bulk portion (110) and a patterned surface comprising a feature pattern (16) for imprinting an imprinting composition (12) wherein the elastomer stamp body comprises a basic organic amine in an amount of at least 0.1% by weight based on the total weight of the elastomer stamp body. Also disclosed are methods of manufacturing such a stamp, and a method of forming a patterned layer on a substrate using such a stamp.

Abstract: Disclosed is a silane-based composition for forming an imprinting ink for imprint lithography applications in which the crosslinking of the silanes in the composition is suppressed by the inclusion of a compound of Formula 3: wherein R9 is selected from the group consisting of C1-C6 linear or branched alkyl groups and a phenyl group, and wherein n is a positive integer having a value of at least 2. An ink may be formed by adding a PAG, photoinitiator or TAG to the composition such upon their activation, the crosslinking reaction is completed. An imprinting method using 10 such an ink is also disclosed.

Abstract: A method for forming a relief layer employing a stamp having a stamping surface including a template relief pattern. A solution comprising a siliconoxide compound is sandwiched between a substrate surface and the stamp surface and dried while sandwiched. After removal of the template relief pattern the relief layer obtained has a high inorganic mass content making it robust and directly usable for a number of applications such as semiconductor, optical or micromechanical.

Abstract: A method of transferring a flexible layer to a substrate makes use of a partial bulge in the flexible layer, which does not make contact with the substrate. The partial bulge advances to the location of an alignment marker on the substrate. When alignment adjustments are needed, they are made with the partial bulge in place so that more reproducible positioning is possible when fully advancing the flexible layer against the substrate.

Abstract: An illumination device comprising a plurality of solid state light sources and a concentrating wave length converter arranged to inject light from said light sources through at least one entrance surface and to extract wave length converted light from at least one exit surface, comprising a structured layer provided on said exit surface, said structured layer having a structure period less than 5 micrometers, thereby enabling out-coupling through the exit surface by a combination of refraction and diffraction. In a situation where the angle of incidence on a surface is within a limited range, a combination of refraction and diffraction may provide a superior out-coupling from that surface.

Abstract: There is provided an illumination device (100, 150, 200, 300) comprising: a periodic plasmonic antenna array (114), comprising a plurality of individual antenna elements (106) arranged in an antenna array plane, the plasmonic antenna array being configured to support surface lattice resonances at a first wavelength, arising from diffractive coupling of localized surface plasmon resonances in the individual antenna elements; a photon emitter (152) configured to emit photons at the first wavelength, the photon emitter being arranged in close proximity of the plasmonic antenna array such that at least a portion of the emitted photons are emitted by a coupled system comprising said photon emitter and said plasmonic antenna array, wherein the plasmonic antenna array is configured to comprise plasmon resonance modes being out-of plane asymmetric, such that light emitted from the plasmonic antenna array has an anisotropic angle distribution.