Abstract: An imprinting apparatus comprises a first carrier for carrying a flexible stamp, a set of carrier actuators for translating the first carrier in a direction parallel to a plane of the first carrier, and a second carrier movable relative to the first carrier and configured to carry a substrate having a resist layer. The second carrier comprises a chuck and a set of chuck actuators for translating a portion of the chuck in a direction perpendicular to a plane of the second carrier. This imprinting apparatus provides alignment between the flexible stamp and the substrate by controlling an in-plane position of the first carrier (so enabling X, Y and Rz position control) and controlling Z axis positions of the second carrier (so enabling Rx, Ry and Z position control). Thus, 6DOF position adjustment is enabled with a simple structure. Thus precise control of X, Y and Z translations and rotations is enabled while also enabling loading of substrates and/or stamps.

Abstract: An imprinting apparatus comprises a first carrier for carrying a flexible stamp and a second carrier movable relative to the first carrier and configured to carry a substrate having a resist layer. The second carrier comprises a chuck and a set of chuck actuators for translating a portion of the chuck in a Z-axis direction. Each chuck actuator comprises an actuator output and a lever arrangement between the actuator output and a chuck drive member. The lever arrangement enables an increase in positioning accuracy and increased stiffness, compared to the direct control of position using the actuator output.

Abstract: An imprinting apparatus comprises a first carrier for carrying a flexible stamp and a second carrier movable relative to the first carrier and configured to carry a substrate having a resist layer. The second carrier comprises a chuck which comprises a hollow cylindrical body having a top face and a bottom face and a lattice arrangement between the top and bottom faces. The chuck has a reduced thermal mass while maintaining the required stiffness for maintaining a uniform imprint gap.

Abstract: An imprinting apparatus comprises a first carrier for carrying a flexible stamp having an imprinting pattern and a second carrier movable relative to the first carrier and configured to carry a substrate having a resist layer. The second carrier comprises a chuck and an interface plate over the chuck, wherein the interface plate comprises an array of openings for receiving already-imprinted areas of one side of a substrate while an opposite side of the substrate is to be imprinted. The chuck comprises a fluid passage arrangement for coupling to the openings of the array.

Abstract: An imprinting apparatus comprises a first carrier for carrying a flexible stamp and a second carrier movable relative to the first carrier and configured to carry a substrate having a resist layer. The first and second carriers are arranged such that the flexible stamp can be made to contact the substrate. The second carrier comprises a main frame which may be moved (relative to a reference frame) in a Z axis direction by a main actuator, and a chuck with a set of three chuck actuators, each with a stroke smaller than the stroke of the main actuator, for translating a portion of the chuck relative to the main frame in the Z-axis direction. The Z axis movement of the chuck is divided into two stages, with separate long stroke and short stroke drivers. This enables a very stiff support to be created with precise imprint gap control.

Abstract: An imprinting apparatus comprises a first carrier for carrying a flexible stamp and a second carrier movable relative to the first carrier and configured to carry a substrate having a resist layer. The second carrier comprises a chuck, a set of chuck actuators for translating a portion of the chuck in a Z-axis direction, a stamp landing device (e.g., ring) around an outside of the chuck and a set of landing ring actuators for translating a portion of the stamp landing ring in a Z-axis direction. Movement of the stamp landing ring in addition to movement of the chuck enables the apparatus to take account of different stamp thicknesses.

Abstract: Disclosed are imprinting ink compositions for use in imprinting techniques such as SCIL. The imprinting ink compositions comprise TMO nanoparticles stabilized by selected polymerization inhibitors that allow for the formation of a stable imprinting ink composition in which polymerization of the TMO nanoparticles is effectively suppressed and from which high refractive index patterned layers can be formed. Imprinting methods using such imprinting ink compositions, optical devices including patterned layers formed from such imprinting ink compositions and lighting devices, optical sensors and photovoltaic devices including such optical elements are also disclosed.

Abstract: A method of imprinting a substrate (180), comprising affixing a flexible stamp (104) carrying an imprinting pattern (106) to a first carrier (102) comprising an array of apertures (112) which, by gas pressure, either pull the flexible stamp towards the first carrier or push it away; pushing it to a second carrier (170) carrying a substrate (180) with a resist layer (182), leaving a gap (190) for creating a controllable contact area between the flexible stamp and the substrate and space (196) between the first carrier and the flexible stamp; progressively pushing areas of the flexible stamp into the resist layer to imprint it; developing the resist layer; and progressively releasing the flexible stamp by applying suction through successive apertures whilst controlling the inward flow of gas to the space (196) through the apertures that are not yet under suction in order to maintain the space (196) there above ambient but below a predetermined maximum pressure.

Abstract: Provided is a method of providing a patterned layer (50). The method comprises providing (2, 3A, 3B) a substrate (10) having a surface (11) to which a compound is applied. The compound has at least one condensable group which is reactive with surface groups on the surface of the substrate by condensation reaction. The compound also has a basic group for accepting protons. A layer of a polycondensable imprinting composition (30) is applied (4) onto the layer of the compound. The imprinting composition layer is imprinted (5A, 5B, 5C) with a patterned stamp. During the imprinting, polycondensation of the imprinting composition leads to forming of the patterned layer. Further provided is the patterned layer itself, as well as an optical element and an etch mask, each of which comprises the patterned layer.

Abstract: Provided is a method of providing a patterned layer (50). The method comprises providing (2, 3A, 3B) a substrate (10) having a surface (11) to which a compound is applied. The compound has at least one condensable group which is reactive with surface groups on the surface of the substrate by condensation reaction. The compound also has a basic group for accepting protons. A layer of a polycondensable imprinting composition (30) is applied (4) onto the layer of the compound. The imprinting composition layer is imprinted (5A, 5B, 5C) with a patterned stamp. During the imprinting, polycondensation of the imprinting composition leads to forming of the patterned layer. Further provided is the patterned layer itself, as well as an optical element and an etch mask, each of which comprises the patterned layer.

Abstract: Disclosed is a stamp (14) for an imprint lithography process, the stamp comprising an elastomer stamp body including a polysiloxane bulk portion (110) and a patterned surface comprising a feature pattern (16) for imprinting an imprinting composition (12) wherein the elastomer stamp body comprises a basic organic amine in an amount of at least 0.1% by weight based on the total weight of the elastomer stamp body. Also disclosed are methods of manufacturing such a stamp, and a method of forming a patterned layer on a substrate using such a stamp.

Abstract: Provided is a method of providing a patterned layer (50). The method comprises providing (2, 3A, 3B) a substrate (10) having a surface (11) to which a compound is applied. The compound has at least one condensable group which is reactive with surface groups on the surface of the substrate by condensation reaction. The compound also has a basic group for accepting protons. A layer of a polycondensable imprinting composition (30) is applied (4) onto the layer of the compound. The imprinting composition layer is imprinted (5A, 5B, 5C) with a patterned stamp. During the imprinting, polycondensation of the imprinting composition leads to forming of the patterned layer. Further provided is the patterned layer itself, as well as an optical element and an etch mask, each of which comprises the patterned layer.

Abstract: A method for forming a relief layer employing a stamp having a stamping surface including a template relief pattern. A solution comprising a siliconoxide compound is sandwiched between a substrate surface and the stamp surface and dried while sandwiched. After removal of the template relief pattern the relief layer obtained has a high inorganic mass content making it robust and directly usable for a number of applications such as semiconductor, optical or micromechanical.

Abstract: A method of manufacturing a patterned stamp for patterning a contoured surface is disclosed. The method comprises providing a pliable stamp layer carrying a pattern of features, forcing the pliable stamp layer onto the contoured surface with said pattern of features facing the contoured surface; applying a fluid support layer over the pliable stamp layer on the contoured surface; solidifying the support layer to form the patterned stamp; and removing the patterned stamp from the contoured surface. A corresponding patterned stamp, imprinting method and imprinted article are also disclosed.

Abstract: A method of imprinting a substrate (180), comprising affixing a flexible stamp (104) carrying an imprinting pattern (106) to a first carrier (102) comprising an array of apertures (112) which, by gas pressure, either pull the flexible stamp towards the first carrier or push it away; pushing it to a second carrier (170) carrying a substrate (180) with a resist layer (182), leaving a gap (190) for creating a controllable contact area between the flexible stamp and the substrate and space (196) between the first carrier and the flexible stamp; progressively pushing areas of the flexible stamp into the resist layer to imprint it; developing the resist layer; and progressively releasing the flexible stamp by applying suction through successive apertures whilst controlling the inward flow of gas to the space (196) through the apertures that are not yet under suction in order to maintain the space (196) there above ambient but below a pre-determined maximum pressure.

Abstract: The present invention relates to fluorescence imaging. In order to enhance compatibility with multiple fluorescence channels for calibrating a fluorescence microscope, a calibration slide is provided that comprises a substrate and a pixel layout. The pixel layout comprises a plurality of spaced apart metal nanostructures arranged on a surface of the substrate. The metal nanostructures are arranged to produce plasmon resonances that allow absorbing light at an excitation wavelength to produce photo-luminescence and/or fluorescence light for generating a fluorescent image. The fluorescent image comprises a plurality of pixel intensity values that are provided for calibration of a fluorescence microscope.

Abstract: Disclosed is a method of manufacturing a polyorganosiloxane-based stamp comprising providing a master including a transfer pattern surface; forming a first layer of a first curable composition onto the transfer pattern surface such that the first layer includes a relief pattern of said transfer pattern; partially curing the first layer; depositing a second layer of a second curable composition onto the partially cured first layer; co-curing the partially cured first layer and the second layer to form a cured first layer having a first Young's modulus, adhered to a cured second layer having a second Young's modulus smaller than the first Young's modulus; depositing a third layer of a third curable composition onto the second layer, and curing the third layer to form a cured third layer adhered to the cured second layer. Further disclosed is a polyorganosiloxane-based stamp obtainable from the method; use of the same for printing process; and an imprinting method using the same.

Abstract: Disclosed is a stamp (14) for an imprint lithography process, the stamp comprising an elastomer stamp body including a polysiloxane bulk portion (110) and a patterned surface comprising a feature pattern (16) for imprinting an imprinting composition (12) wherein the elastomer stamp body comprises a basic organic amine in an amount of at least 0.1% by weight based on the total weight of the elastomer stamp body. Also disclosed are methods of manufacturing such a stamp, and a method of forming a patterned layer on a substrate using such a stamp.

Abstract: Disclosed is a stamp (14) for an imprint lithography process, the stamp comprising an elastomer stamp body including a polysiloxane bulk portion (110) and a patterned surface comprising a feature pattern (16) for imprinting an imprinting composition (12) wherein the elastomer stamp body comprises a basic organic amine in an amount of at least 0.1% by weight based on the total weight of the elastomer stamp body. Also disclosed are methods of manufacturing such a stamp, and a method of forming a patterned layer on a substrate using such a stamp.

Abstract: A method of manufacturing a patterned stamp (100) for patterning a contoured surface (10) is disclosed. The method comprises applying a layer (115) of a pliable material precursor over a master (50) carrying an inverse pattern (52) to form a desired pattern (112) in said layer; curing the pliable material precursor to form a pliable stamp layer (120) comprising said desired pattern; providing an intermediate stamp structure by adhering a porous pliable support layer (130) to the pliable stamp layer; releasing the intermediate stamp structure from the master; forcing the intermediate stamp structure onto the contoured surface with said pattern of features facing the contoured surface; forming the patterned stamp by filling the porous pliable support layer with a filler material to reduce the pliability of the support layer; and removing the patterned stamp from the contoured surface. A corresponding patterned stamp, imprinting method and imprinted article are also disclosed.