Patents by Inventor Mari Sasaki
Mari Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220140265Abstract: The present disclosure provides an organic semiconductor single crystal film that can be disposed on a desired substrate and has a thickness thinner than that of a conventional film. The present disclosure is directed to an organic semiconductor device comprising: a substrate; and an organic semiconductor single crystal film on the substrate, wherein an average film thickness of the organic semiconductor single crystal film is 2 to 100 nm, and at least a portion of a surface of the substrate in contact with the organic semiconductor single crystal film is hydrophobic, solvent soluble, non-heat resistant, or a combination thereof.Type: ApplicationFiled: February 19, 2020Publication date: May 5, 2022Inventors: Junichi TAKEYA, Shunichiro WATANABE, Mari SASAKI, Tatsuyuki MAKITA
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Patent number: 10287961Abstract: Provided is a construction machine including an exhaust-gas after-treatment device and capable of supporting the exhaust-gas after-treatment device in a limited space. The construction machine includes an upper frame, an engine mounted on the upper frame via a plurality of engine mounts, a hydraulic pump coupled to the engine, the exhaust-gas after-treatment device, and a support cradle supporting the exhaust-gas after-treatment device over the hydraulic pump. The upper frame includes a plurality of mount support portions and a leg support portion. The support cradle includes a support stage on which the exhaust-gas after-treatment device is mounted, and a plurality of legs. The plurality of mount support portions include a space-defining mount support portion defining a horizontal space against the hydraulic pump. The plurality of legs include an in-space leg extending in the space. The leg support portion is located to overlap the space in a plan view.Type: GrantFiled: April 18, 2017Date of Patent: May 14, 2019Assignee: KOBELCO CONSTRUCTION MACHINERY CO., LTD.Inventors: Toshiro Ueta, Tatsuya Shiraishi, Mari Sasaki, Takashi Tazoe
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Patent number: 10147554Abstract: Provided is an energy storage dye-sensitized solar cell having a simple structure. An energy storage dye-sensitized solar cell of the present invention has a photoelectrode and a charge storage electrode on the same surface of a conductive substrate such that the photoelectrode and the charge storage electrode act as one electrode. Hence, the energy storage dye-sensitized solar cell comprises two electrodes: the above-described one electrode and a counter electrode covered with a catalyst, thus having a simple structure.Type: GrantFiled: November 21, 2014Date of Patent: December 4, 2018Assignee: The University of TokyoInventors: Hiroshi Segawa, Mari Sasaki, Takaya Kubo, Satoshi Uchida
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Publication number: 20170314449Abstract: Provided is a construction machine including an exhaust-gas after-treatment device and capable of supporting the exhaust-gas after-treatment device in a limited space. The construction machine includes an upper frame, an engine mounted on the upper frame via a plurality of engine mounts, a hydraulic pump coupled to the engine, the exhaust-gas after-treatment device, and a support cradle supporting the exhaust-gas after-treatment device over the hydraulic pump. The upper frame includes a plurality of mount support portions and a leg support portion. The support cradle includes a support stage on which the exhaust-gas after-treatment device is mounted, and a plurality of legs. The plurality of mount support portions include a space-defining mount support portion defining a horizontal space against the hydraulic pump. The plurality of legs include an in-space leg extending in the space. The leg support portion is located to overlap the space in a plan view.Type: ApplicationFiled: April 18, 2017Publication date: November 2, 2017Applicant: KOBELCO CONSTRUCTION MACHINERY CO., LTD.Inventors: Toshiro UETA, Tatsuya Shiraishi, Mari Sasaki, Takashi Tazoe
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Publication number: 20170018370Abstract: Provided is an energy storage dye-sensitized solar cell having a simple structure. An energy storage dye-sensitized solar cell (1) of the present invention has a photoelectrode (2) and a charge storage electrode (3) on the same surface of a conductive substrate (5) such that the photoelectrode (2) and the charge storage electrode (3) act as one electrode. Hence, the energy storage dye-sensitized solar cell comprises two electrodes: the above-described one electrode and a counter electrode (9) covered with a catalyst (4), thus having a simple structure.Type: ApplicationFiled: November 21, 2014Publication date: January 19, 2017Inventors: Hiroshi Segawa, Mari Sasaki, Takaya Kubo, Satoshi Uchida
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Patent number: 8891023Abstract: A display device includes: a monitor and receiving set having a video signal receiving section, a display section, an image quality control section, a first control signal transceiver, and a first control section; and a control and transmission set having a television broadcast receiving section, a video signal input section, a video signal transmitting section, a second control signal transceiver, a key input section, and a second control section. The Power consumption of a first radio transmission path formed by the video signal transmitting section and the video signal receiving section is larger than that of a second radio transmission path formed by the first and second control signal transceivers. A control signal for a user interface is communicated by the first and second control signal transceivers. Only the second radio transmission path of the first and second radio transmission paths is communicable in a standby state.Type: GrantFiled: September 17, 2009Date of Patent: November 18, 2014Assignee: Sony CorporationInventors: Naoki Hasegawa, Yoshinori Ota, Kaoru Kamiyama, Masanobu Kimoto, Hiroshige Hayakawa, Hideyuki Yoshimura, Masayuki Miyamoto, Takeshi Ono, Atsuro Hirakawa, Mari Sasaki, Akihiro Shironouchi, Kazuya Shimomura, Yuji Anami, Masato Hirose
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Patent number: 8815604Abstract: A microchannel chip having a microchannel formed in a substrate and a gas-liquid phase separation microchannel whose upper part is covered with a porous film, the gas-liquid phase separation microchannel being connected to the downstream end of the microchannel and having a depth of 10 ?m to 100 ?m. Also, a gas-liquid phase separation method which is a method for separating a liquid-phase flow from a two-phase flow flowing through a microchannel by removing a gas phase, the two-phase flow composed of the gas phase and the liquid phase, which liquid phase flows in the periphery of the above-described microchannel and which gas phase flows interiorly of the liquid-phase flow.Type: GrantFiled: March 31, 2010Date of Patent: August 26, 2014Assignees: Institute of Microchemical Technology Co., Ltd., The University of Tokyo, Kanagawa Academy of Science and TechnologyInventors: Arata Aota, Yuko Kihira, Mari Sasaki, Takehiko Kitamori, Kazuma Mawatari
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Patent number: 8642364Abstract: A high-performance thin film transistor structure which is easily manufactured is provided. The thin film transistor structure includes: a first electrode; second and third electrodes apart from each other in a hierarchical level different from that of the first electrode; first, second, and third wirings connected to the first, second, and third electrodes, respectively; a main stack body disposed so as to be opposed to the first electrode with an interlayer insulating layer in between, between the first electrode, and the second and third electrodes; and a sub stack body including an insulating layer and a semiconductor layer, disposed so as to be opposed to the first wiring with the interlayer insulating layer in between, between the first and second wirings in a position where the first and second wirings overlap and/or between the first and third wirings in a position where the first and third wirings overlap.Type: GrantFiled: April 24, 2013Date of Patent: February 4, 2014Assignee: Sony CorporationInventors: Iwao Yagi, Hideki Ono, Mari Sasaki
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Patent number: 8546796Abstract: A semiconductor device including a gate electrode, a gate insulating layer, source/drain electrodes, and a channel-forming region that are disposed on a base is provided. The method includes the steps of forming a thin film by application of a mixed solution including a polymeric insulating material and a dioxaanthanthrene compound represented by structural formula (1) below; and subsequently drying the thin film to induce phase separation of the polymeric insulating material and the dioxaanthanthrene compound, thereby forming the gate insulating layer from the polymeric insulating material and the channel-forming region from the dioxaanthanthrene compound: wherein at least one of R3 and R9 represents a substituent other than hydrogen.Type: GrantFiled: February 20, 2013Date of Patent: October 1, 2013Assignee: Sony CorporationInventors: Norihito Kobayashi, Mari Sasaki, Takahiro Ohe
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Publication number: 20130237020Abstract: A high-performance thin film transistor structure which is easily manufactured is provided. The thin film transistor structure includes: a first electrode; second and third electrodes apart from each other in a hierarchical level different from that of the first electrode; first, second, and third wirings connected to the first, second, and third electrodes, respectively; a main stack body disposed so as to be opposed to the first electrode with an interlayer insulating layer in between, between the first electrode, and the second and third electrodes; and a sub stack body including an insulating layer and a semiconductor layer, disposed so as to be opposed to the first wiring with the interlayer insulating layer in between, between the first and second wirings in a position where the first and second wirings overlap and/or between the first and third wirings in a position where the first and third wirings overlap.Type: ApplicationFiled: April 24, 2013Publication date: September 12, 2013Applicant: Sony CorporationInventors: Iwao Yagi, Hideki Ono, Mari Sasaki
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Patent number: 8445912Abstract: A high-performance thin film transistor structure which is easily manufactured is provided. The thin film transistor structure includes: a first electrode; second and third electrodes apart from each other in a hierarchical level different from that of the first electrode; first, second, and third wirings connected to the first, second, and third electrodes, respectively; a main stack body disposed so as to be opposed to the first electrode with an interlayer insulating layer in between, between the first electrode, and the second and third electrodes; and a sub stack body including an insulating layer and a semiconductor layer, disposed so as to be opposed to the first wiring with the interlayer insulating layer in between, between the first and second wirings in a position where the first and second wirings overlap and/or between the first and third wirings in a position where the first and third wirings overlap.Type: GrantFiled: February 16, 2011Date of Patent: May 21, 2013Assignee: Sony CorporationInventors: Iwao Yagi, Hideki Ono, Mari Sasaki
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Patent number: 8399288Abstract: A method of manufacturing a semiconductor device including a gate electrode, a gate insulating layer, source/drain electrodes, and a channel-forming region that are disposed on a base is provided. The method includes the steps of forming a thin film by application of a mixed solution including a polymeric insulating material and a dioxaanthanthrene compound represented by structural formula (1) below; and subsequently drying the thin film to induce phase separation of the polymeric insulating material and the dioxaanthanthrene compound, thereby forming the gate insulating layer from the polymeric insulating material and the channel-forming region from the dioxaanthanthrene compound: wherein at least one of R3 and R9 represents a substituent other than hydrogen.Type: GrantFiled: August 2, 2010Date of Patent: March 19, 2013Assignee: Sony CorporationInventors: Norihito Kobayashi, Mari Sasaki, Takahiro Ohe
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Publication number: 20120164743Abstract: A microchannel chip having a microchannel formed in a substrate and a gas-liquid phase separation microchannel whose upper part is covered with a porous film, the gas-liquid phase separation microchannel being connected to the downstream end of the microchannel and having a depth of 10 ?m to 100 ?m. Also, a gas-liquid phase separation method which is a method for separating a liquid-phase flow from a two-phase flow flowing through a microchannel by removing a gas phase, the two-phase flow composed of the gas phase and the liquid phase, which liquid phase flows in the periphery of the above-described microchannel and which gas phase flows interiorly of the liquid-phase flow.Type: ApplicationFiled: March 31, 2010Publication date: June 28, 2012Applicants: INSTITUTE OF MICROCHEMICAL TECHNOLOGY CO., LTD., KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY, THE UNIVERSITY OF TOKYOInventors: Arata Aota, Yuko Kihira, Mari Sasaki, Takehiko Kitamori, Kazuma Mawatari
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Publication number: 20120025173Abstract: A method of manufacturing a semiconductor device including a gate electrode, a gate insulating layer, source/drain electrodes, and a channel-forming region that are disposed on a base is provided. The method includes the steps of forming a thin film by application of a mixed solution including a polymeric insulating material and a dioxaanthanthrene compound represented by structural formula (1) below; and subsequently drying the thin film to induce phase separation of the polymeric insulating material and the dioxaanthanthrene compound, thereby forming the gate insulating layer from the polymeric insulating material and the channel-forming region from the dioxaanthanthrene compound: wherein at least one of R3 and R9 represents a substituent other than hydrogen.Type: ApplicationFiled: August 2, 2010Publication date: February 2, 2012Applicant: SONY CORPORATIONInventors: Norihito Kobayashi, Mari Sasaki, Takahiro Ohe
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Publication number: 20110204375Abstract: A high-performance thin film transistor structure which is easily manufactured is provided. The thin film transistor structure includes: a first electrode; second and third electrodes apart from each other in a hierarchical level different from that of the first electrode; first, second, and third wirings connected to the first, second, and third electrodes, respectively; a main stack body disposed so as to be opposed to the first electrode with an interlayer insulating layer in between, between the first electrode, and the second and third electrodes; and a sub stack body including an insulating layer and a semiconductor layer, disposed so as to be opposed to the first wiring with the interlayer insulating layer in between, between the first and second wirings in a position where the first and second wirings overlap and/or between the first and third wirings in a position where the first and third wirings overlap.Type: ApplicationFiled: February 16, 2011Publication date: August 25, 2011Applicant: Sony CorporationInventors: Iwao YAGI, Hideki ONO, Mari SASAKI
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Publication number: 20100097530Abstract: A display device includes: a monitor and receiving set having a video signal receiving section, a display section, an image quality control section, a first control signal transceiver, and a first control section; and a control and transmission set having a television broadcast receiving section, a video signal input section, a video signal transmitting section, a second control signal transceiver, a key input section, and a second control section. The Power consumption of a first radio transmission path formed by the video signal transmitting section and the video signal receiving section is larger than that of a second radio transmission path formed by the first and second control signal transceivers. A control signal for a user interface is communicated by the first and second control signal transceivers. Only the second radio transmission path of the first and second radio transmission paths is communicable in a standby state.Type: ApplicationFiled: September 17, 2009Publication date: April 22, 2010Applicant: Sony CorporationInventors: Naoki HASEGAWA, Yoshinori Ota, Kaoru Kamiyama, Masanobu Kimoto, Hiroshige Hayakawa, Hideyuki Yoshimura, Masayuki Miyamoto, Takeshi Ono, Atsuro Hirakawa, Mari Sasaki, Akihiro Shironouchi, Kazuya Shimomura, Yuji Anami, Masato Hirose
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Publication number: 20090289248Abstract: A dioxaanthanthrene compound is represented by structural formula (1): wherein at least one of R3 and R9 represents a substituent other than hydrogen.Type: ApplicationFiled: May 20, 2009Publication date: November 26, 2009Applicant: SONY CORPORATIONInventors: Norihito Kobayashi, Mari Sasaki
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Patent number: 6756670Abstract: An electronic device comprising a substrate having a frame, a metal lead and an electronic parts in a bonding structure, and a molding of an organic resin formed on the substrate, wherein the surface of the organic resin is provided with a hardened water-resistant or carbonaceous film or wherein pores at the surface of the organic resin are filled within an inactive gas such as argon because of a plasma treatment of the resin surface with the inactive gas whereby impurities are prevented from entering into the organic resin through the pores.Type: GrantFiled: October 30, 2000Date of Patent: June 29, 2004Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shunpei Yamazaki, Mitsunori Tsuchiya, Kazuo Urata, Itaru Koyama, Shinji Imatou, Shigenori Hayashi, Naoki Hirose, Mari Sasaki, Noriya Ishida, Kouhei Wada
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Patent number: 6191492Abstract: An electronic device comprising a substrate having a frame, a metal lead and an electronic parts in a bonding structure, and a molding of an organic resin formed on the substrate, wherein the surface of the organic resin is provided with a hardened water-resistant or carbonaceous film or wherein pores at the surface of the organic resin are filled within an inactive gas such as argon because of a plasma treatment of the resin surface with the inactive gas whereby impurities are prevented from entering into the organic resin through the pores.Type: GrantFiled: December 6, 1993Date of Patent: February 20, 2001Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shunpei Yamazaki, Mitsunori Tsuchiya, Kazuo Urata, Itaru Koyama, Shinji Imatou, Shigenori Hayashi, Naoki Hirose, Mari Sasaki, Noriya Ishida, Kouhei Wada
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Patent number: 5185179Abstract: Carbonaceous films are coated on a surface by chemical vapor reation. In advance of the deposition of carbonaceous film, a silicon nitride film as coated on the surface to prevent interdiffusion between the carbonaceous film and the underlying surface.Type: GrantFiled: October 5, 1989Date of Patent: February 9, 1993Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shunpei Yamazaki, Shigenori Hayashi, Noriya Ishida, Mari Sasaki, Junichi Takeyama, Kenji Itou, Masahiro Kojima, Masaya Kadono