Patents by Inventor Maria Peter
Maria Peter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240117049Abstract: The invention relates to novel bispecific antigen binding molecules, comprising at least two antigen binding domains capable of specific binding to OX40 and a particular antigen binding domain capable of specific binding to Fibroblast Activation Protein (FAP), and to methods of producing these molecules and to methods of using the same.Type: ApplicationFiled: August 29, 2023Publication date: April 11, 2024Applicant: Hoffmann-La Roche Inc.Inventors: Maria AMANN, Juergen Peter BACHL, Alexander BUJOTZEK, Carina CANTRILL, Harald DUERR, Janine FAIGLE, Sabine IMHOF-JUNG, Christian KLEIN, Thomas KRAFT, Estelle MARRER-BERGER, Ekkehard MOESSNER, Laurene POUSSE, Petra RUEGER, Johannes SAM, Roland STAACK, Dietrich TUERCK, Pablo UMANA, Joerg ZIELONKA
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Patent number: 11912218Abstract: A bumper crossmember comprising a wave structure oriented in the vertical direction (z direction), wherein the wave structure comprises at least three apex structures which extend in the bumper crossmember longitudinal direction and are adjacent in the vertical direction. This crossmember comprises a first length section that follows its longitudinal extent, at least one second length section that follows its longitudinal extent, and at least one transition section that is arranged respectively between these length sections. In the second length section, the wave structure is inverted with respect to the first length section, in that the opening direction of the apex structures switches in the transition section. In the transition section, there is at least one additional apex-forming structure, the apex of which is offset in the frontal direction (x direction) with respect to a frontal plane (yz-plane) in which at least two apex structures that are adjacent in the longitudinal sections lie.Type: GrantFiled: January 24, 2020Date of Patent: February 27, 2024Assignee: KIRCHHOFF AUTOMOTIVE DEUTSCHLAND GMBHInventors: Patrick Tlauka, Cristina Matthey, Ralf Stegmeyer, Rolf Peter Röttger, Marco Töller, Rolf Schwarzer, Stephan Lagin, Maria Schmitt, Lena Kremer
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Publication number: 20240027893Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: ApplicationFiled: July 11, 2023Publication date: January 25, 2024Applicant: ASML NETHERLANDS B.V.Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Mária PÉTER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
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Publication number: 20240004283Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.Type: ApplicationFiled: July 28, 2023Publication date: January 4, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles ABEGG, Nirupam BANERJEE, Michiel Alexander BLAUW, Derk Servatius Gertruda BROUNS, Paul JANSSEN, Matthias KRUIZINGA, Egbert LENDERINK, Nicolae MAXIM, Andrey NIKIPELOV, Arnoud Willem NOTENBOOM, Claudia PILIEGO, Mária PÉTER, Gijsbert RISPENS, Nadja SCHUH, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Antonius Willem VERBURG, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN, Aleksandar Nikolov ZDRAVKOV
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Publication number: 20230324786Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: ApplicationFiled: June 9, 2023Publication date: October 12, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Adrianus Johannes Maria GIESBERS, Johan Hendrik KLOOTWIJK, Evgenia KURGANOVA, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Leonid Aizikovitsj SJMAENOK, Ties Wouter VAN DER WOORD, David Ferdinand VLES
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Patent number: 11762281Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.Type: GrantFiled: December 22, 2020Date of Patent: September 19, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles Abegg, Nirupam Banerjee, Michiel Alexander Blauw, Derk Servatius Gertruda Brouns, Paul Janssen, Matthias Kruizinga, Egbert Lenderink, Nicolae Maxim, Andrey Nikipelov, Arnoud Willem Notenboom, Claudia Piliego, Mária Péter, Gijsbert Rispens, Nadja Schuh, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Antonius Willem Verburg, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen, Aleksandar Nikolov Zdravkov
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Patent number: 11754918Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: GrantFiled: December 13, 2021Date of Patent: September 12, 2023Assignee: ASML NETHERLANDS B.V.Inventors: David Ferdinand Vles, Chaitanya Krishna Ande, Antonius Franciscus Johannes De Groot, Adrianus Johannes Maria Giesbers, Johannes Joseph Janssen, Paul Janssen, Johan Hendrik Klootwijk, Peter Simon Antonius Knapen, Evgenia Kurganova, Marcel Peter Meijer, Wouter Rogier Meijerink, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Raymond Olsman, Hrishikesh Patel, Mária Péter, Gerrit Van Den Bosch, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, Hendrikus Jan Wondergem, Aleksandar Nikolov Zdravkov
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Patent number: 11686997Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: GrantFiled: March 3, 2022Date of Patent: June 27, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Pieter-Jan Van Zwol, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Publication number: 20230076265Abstract: A piezoelectric device and method of manufacturing are described. A first substrate is provided with an array of pillars comprising piezoelectric material. A second substrate is provided with a piezoelectric layer facing respective ends of the pillars. The respective ends of the pillars are pushed into the piezoelectric layer, while the piezoelectric layer is at least partially liquid. The piezoelectric layer is solidified to form an integral connection between the piezoelectric layer and the pillars. The piezoelectric layer can thus form a bridging structure between the respective ends of the pillars. The integral piezoelectric structure can be poled by high voltage. The bridging structure can act as a platform for depositing electrical contacts. The piezoelectric device can be used for generating or detecting acoustic waves, e.g. in medical imaging.Type: ApplicationFiled: February 4, 2021Publication date: March 9, 2023Inventors: Laurens Christiaan Johannes Maria PETERS, Jan-Laurens Pieter Jacobus VAN DER STEEN, Roy Gerardus Franciscus VERBEEK, Paul Louis Maria Joseph VAN NEER, Gerwin Hermanus GELINCK
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Patent number: 11467486Abstract: A catalyst including: a first layer including a transition metal; a base layer; and an interlayer, wherein the interlayer is disposed between the base layer and the first layer is disclosed. Also disclosed are methods for preparing a catalyst as well as for synthesizing graphene, a pellicle produced using the catalyst or methods disclosed herein, as well as a lithography apparatus including such a pellicle.Type: GrantFiled: February 7, 2019Date of Patent: October 11, 2022Assignee: ASML Netherlands B.V.Inventors: Evgenia Kurganova, Adrianus Johannes Maria Giesbers, Alexander Ludwig Klein, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Pieter-Jan Van Zwol, David Ferdinand Vles, Sten Vollebregt, Willem-Pieter Voorthuijzen
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Publication number: 20220252974Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.Type: ApplicationFiled: April 25, 2022Publication date: August 11, 2022Inventors: David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willlem-Pieter VOORTHUIJZEN, James Norman WILEY
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Publication number: 20220187701Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: ApplicationFiled: March 3, 2022Publication date: June 16, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Publication number: 20220176918Abstract: Rotary vehicle cleaning installation, the installation comprising a vehicle support platform that is rotatable around a central platform axis and is configured to support a number of vehicles on a vehicle surface of the vehicle support platform, and a drive assembly that is operatively connected to the vehicle support platform and that is configured to rotate the vehicle support platform, and a number of cleaning devices that is positioned at a working distance from the vehicle surface of the vehicle support platform. The invention also relates to a method for cleaning a vehicle using a rotary vehicle cleaning installation according to the invention.Type: ApplicationFiled: December 9, 2021Publication date: June 9, 2022Inventor: Alexander Maria Peter Alphonsus Peters
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Patent number: 11347142Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.Type: GrantFiled: March 19, 2021Date of Patent: May 31, 2022Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
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Patent number: 11320731Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and including a stack having: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine.Type: GrantFiled: December 2, 2016Date of Patent: May 3, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Pieter-Jan Van Zwol, Dennis De Graaf, Paul Janssen, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, David Ferdinand Vles, Willem-Pieter Voorthuijzen
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Patent number: 11314163Abstract: A pellicle frame for supporting a pellicle, the frame having a first surface and a second surface opposite the first surface, and a structure provided between the first and the second surfaces, wherein the first and second surfaces and the structure at least partially define at least one volume therebetween that is devoid of the material that forms the frame.Type: GrantFiled: August 28, 2018Date of Patent: April 26, 2022Assignee: ASML Netherlands B.V.Inventors: Anton Wilhelmus Duys, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Pieter-Jan Van Zwol, David Ferdinand Vles
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Publication number: 20220121111Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: ApplicationFiled: December 13, 2021Publication date: April 21, 2022Applicant: ASML NETHERLANDS B.V.Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Mária PÉTER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
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Patent number: 11287737Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: GrantFiled: November 5, 2018Date of Patent: March 29, 2022Inventors: Pieter-Jan Van Zwol, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Patent number: 11231646Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: GrantFiled: June 8, 2018Date of Patent: January 25, 2022Assignee: ASML Netherlands B.V.Inventors: David Ferdinand Vles, Chaitanya Krishna Ande, Antonius Franciscus Johannes De Groot, Adrianus Johannes Maria Giesbers, Johannes Joseph Janssen, Paul Janssen, Johan Hendrik Klootwijk, Peter Simon Antonius Knapen, Evgenia Kurganova, Marcel Peter Meijer, Wouter Rogier Meijerink, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Raymond Olsman, Hrishikesh Patel, Mária Péter, Gerrit Van Den Bosch, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, Hendrikus Jan Wondergem, Aleksandar Nikolov Zdravkov
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Patent number: 11133299Abstract: An ESD protection device including a PNP transistor connected to an input pad, a diode connected to the PNP transistor and connected to an output pad, and an NMOS transistor connected to the PNP transistor and the output pad, wherein the diode, PNP transistor, and NMOS transistor are configured to route different levels of an electrostatic discharge (ESD) current pulse from the input pad to the output pad.Type: GrantFiled: October 4, 2018Date of Patent: September 28, 2021Assignee: NXP B.V.Inventors: Da-Wei Lai, Stephen John Sque, Wilhelmus Cornelis Maria Peters