Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Abstract: A membrane assembly for EUV lithography, the membrane assembly including: a planar membrane; a border configured to hold the membrane; and a frame assembly connected to the border and configured to attach to a patterning device for EUV lithography, wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.

Abstract: A method for manufacturing a thermoelectric generator includes the steps of replicating a structure into a flexible substrate for providing a set of cavities; providing an initiator in the cavities for growing respective piles of thermoelectric materials; growing the respective piles of thermoelectric materials from said initiator; and providing electrical connection between the respective piles of thermoelectric materials for forming thermocouples of the thermoelectric generator.

Abstract: The invention provides a method for preparing a pattern for an electric circuit comprising the steps of: (a) providing a substrate; (b) providing a pattern of an inhibiting material for an electrical circuit onto said substrate by i) applying a layer of the inhibiting material onto said substrate and mechanically removing locally the layer of the inhibiting material to obtain said pattern; or ii) applying a layer of the inhibiting material onto said substrate, wherein said layer has pre-determined pattern which incompletely covers said substrate; (c) establishing a distribution of particles of a first metal or alloy thereof on the layer of the inhibiting material and the pattern as obtained in step.

Abstract: The invention relates to a method 10 for forming a multi-level surface on a substrate 2, wherein said surface comprises areas of different wettability, the method comprising the step (A, B) of applying a multi-level stamp to the substrate for forming the multi-level surface, said multi-level stamp having different structural regions 1a arranged along the multi-level surface for locally altering wettability properties of at least a portion of a level of the multi-level surface 2a, 2b. The invention further relates to a semiconductor device and a method for manufacturing a semiconductor device.

Abstract: This application describes methods and apparatus for monitoring of fluid content that are suitable for in-situ, real time and/or continuous monitoring, especially of bodily fluids and in particular the content of sweat. The application also describes fabrication of such an apparatus. The apparatus comprises a multilayer structure comprising at least two electrode layers for detection of fluid content separated by at least one insulating layer. The multilayer structure defines at least one flow channel which provides a flow path for continuous flow of fluid in use, and the electrode layers form part of the sidewall of the flow channel(s). The flow channel(s) may run in a direction substantially perpendicular to the layers. The electrode layers may employ electrochemical detection and may comprise a reference electrode and an ion-sensitive electrode. The apparatus may be fabricated using various printing or deposition techniques.

Abstract: According to one aspect, the invention provides a table for compensating deformation in flexible foils (1) The table comprises a supportive base (2) and a deformation compensation system (3). This system comprises a plurality of movable elements (4), supported by the base (2), wherein the movable elements form a surface for supporting the flexible foil. The movable elements comprise clamps (6) for clamping the foil (5). The movable elements (4) are individually movable parallel to the surface for supporting the foil, so as to stretch the clamped foil into a predefined shape. The table for compensating deformation in flexible foils may be used in a manufacturing process of flexible functional foils to compensate deformation of the foils during sequential patterning.

Abstract: The invention relates to a method 10 for forming a multi-level surface on a substrate 2, wherein said surface comprises areas of different wettability, the method comprising the step (A, B) of applying a multi-level stamp to the substrate for forming the multi-level surface, said multi-level stamp having different structural regions 1a arranged along the multi-level surface for locally altering wettability properties of at least a portion of a level of the multi-level surface 2a, 2b. The invention further relates to a semiconductor device and a method for manufacturing a semi-conductor device.

Abstract: According to one aspect, the invention provides a table for compensating deformation in flexible foils (1) The table comprises a supportive base (2) and a deformation compensation system (3). This system comprises a plurality of movable elements (4), supported by the base (2), wherein the movable elements form a surface for supporting the flexible foil. The movable elements comprise clamps (6) for clamping the foil (5). The movable elements (4) are individually movable parallel to the surface for supporting the foil, so as to stretch the clamped foil into a predefined shape. The table for compensating deformation in flexible foils may be used in a manufacturing process of flexible functional foils to compensate deformation of the foils during sequential patterning.

Abstract: The invention is directed to a method of providing a plastic substrate with a metallic pattern and to a plastic substrate with a metallic pattern obtainable by said method. The method of the invention comprises i) replicating a pattern of recesses and protrusions on a plastic substrate by pressing a stamp having recesses and protrusions against the substrate, thereby providing said plastic substrate with recesses and protrusions; ii) removing said stamp from said substrate; iii)—applying a layer of seed material capable of initiating an electroless or electrochemical metal deposition process onto said plastic substrate in a selective pattern at least in the recesses of said plastic substrate to yield a substrate wherein said seed material remains selectively in the recesses of said substrate; and thereafter iv) using said seed material to initiate a metal deposition process.

Abstract: A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.

Abstract: The invention relates to method for manufacturing a thermoelectric generator, comprising the steps of replicating a structure into a flexible substrate (4) for providing a set of cavities (4a); providing an initiator (2a) in the cavities for growing respective piles (6, 7) of thermoelectric materials; growing the respective piles of thermoelectric materials from said initiator; providing electrical connection between the respective piles of thermoelectric materials for forming thermocouples of the thermoelectric generator. The invention further relates to a wearable thermoelectric generator and a garment comprising the same.

Abstract: The invention provides a method for preparing a pattern for an electric circuit comprising the steps of: (a) providing a substrate; (b) providing a pattern of an inhibiting material for an electrical circuit onto said substrate by i) applying a layer of the inhibiting material onto said substrate and mechanically removing locally the layer of the inhibiting material to obtain said pattern; or ii) applying a layer of the inhibiting material onto said substrate, wherein said layer has pre-determined pattern which incompletely covers said substrate; (c) establishing a distribution of particles of a first metal or alloy thereof on the layer of the inhibiting material and the pattern as obtained in step.

Abstract: A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic substrate may be handled by a conventional lithographic apparatus.