Patents by Inventor Maria Peter
Maria Peter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12298663Abstract: Methods of manufacturing a pellicle for a lithographic apparatus including a method involving depositing at least one graphene layer on a planar surface of a substrate. The substrate has a first substrate portion and a second substrate portion. The method further includes removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.Type: GrantFiled: October 11, 2016Date of Patent: May 13, 2025Assignee: ASML NETHERLANDS B.V.Inventors: Mária Péter, Erik Achilles Abegg, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Maxim Aleksandrovich Nasalevich, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen
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Patent number: 12117726Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: GrantFiled: July 11, 2023Date of Patent: October 15, 2024Assignee: ASML NETHERLANDS B.V.Inventors: David Ferdinand Vles, Chaitanya Krishna Ande, Antonius Franciscus Johannes De Groot, Adrianus Johannes Maria Giesbers, Johannes Joseph Janssen, Paul Janssen, Johan Hendrik Klootwijk, Peter Simon Antonius Knapen, Evgenia Kurganova, Marcel Peter Meijer, Wouter Rogier Meijerink, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Raymond Olsman, Hrishikesh Patel, Mária Péter, Gerrit van den Bosch, Wilhelmus Theodorus Anthonius Johannes van den Einden, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, Hendrikus Jan Wondergem, Aleksandar Nikolov Zdravkov
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Publication number: 20240302734Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: ApplicationFiled: March 26, 2024Publication date: September 12, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Arianus Johannes Maria GIESBERS, Johan Hendrik KLOOTWIJK, Evgenia KURGANOVA, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mària PÉTER, Leonid Aizikovitsj SJMAENOK, Ties Wouter VAN DER WOORD, David Ferdinand VLES
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Patent number: 12066758Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.Type: GrantFiled: April 25, 2022Date of Patent: August 20, 2024Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
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Patent number: 11971654Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: GrantFiled: June 9, 2023Date of Patent: April 30, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Pieter-Jan Van Zwol, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Patent number: 11947256Abstract: A method of manufacturing a pellicle for a lithographic apparatus, the method including locally heating the pellicle using radiative heating, and depositing coating material simultaneously on both sides of the pellicle, and pellicles manufactured according to this method. Also disclosed is the use of a multilayer graphene pellicle with a double-sided hexagonal boron nitride coating in a lithographic apparatus.Type: GrantFiled: June 26, 2018Date of Patent: April 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Evgenia Kurganova, Adrianus Johannes Maria Giesbers, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Pieter-Jan Van Zwol, David Ferdinand Vles, Willem-Pieter Voorthuijzen
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Publication number: 20240027893Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: ApplicationFiled: July 11, 2023Publication date: January 25, 2024Applicant: ASML NETHERLANDS B.V.Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Mária PÉTER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
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Publication number: 20240004283Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.Type: ApplicationFiled: July 28, 2023Publication date: January 4, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles ABEGG, Nirupam BANERJEE, Michiel Alexander BLAUW, Derk Servatius Gertruda BROUNS, Paul JANSSEN, Matthias KRUIZINGA, Egbert LENDERINK, Nicolae MAXIM, Andrey NIKIPELOV, Arnoud Willem NOTENBOOM, Claudia PILIEGO, Mária PÉTER, Gijsbert RISPENS, Nadja SCHUH, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Antonius Willem VERBURG, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN, Aleksandar Nikolov ZDRAVKOV
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Publication number: 20230324786Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: ApplicationFiled: June 9, 2023Publication date: October 12, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Adrianus Johannes Maria GIESBERS, Johan Hendrik KLOOTWIJK, Evgenia KURGANOVA, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Leonid Aizikovitsj SJMAENOK, Ties Wouter VAN DER WOORD, David Ferdinand VLES
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Patent number: 11762281Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.Type: GrantFiled: December 22, 2020Date of Patent: September 19, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles Abegg, Nirupam Banerjee, Michiel Alexander Blauw, Derk Servatius Gertruda Brouns, Paul Janssen, Matthias Kruizinga, Egbert Lenderink, Nicolae Maxim, Andrey Nikipelov, Arnoud Willem Notenboom, Claudia Piliego, Mária Péter, Gijsbert Rispens, Nadja Schuh, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Antonius Willem Verburg, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen, Aleksandar Nikolov Zdravkov
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Patent number: 11754918Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: GrantFiled: December 13, 2021Date of Patent: September 12, 2023Assignee: ASML NETHERLANDS B.V.Inventors: David Ferdinand Vles, Chaitanya Krishna Ande, Antonius Franciscus Johannes De Groot, Adrianus Johannes Maria Giesbers, Johannes Joseph Janssen, Paul Janssen, Johan Hendrik Klootwijk, Peter Simon Antonius Knapen, Evgenia Kurganova, Marcel Peter Meijer, Wouter Rogier Meijerink, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Raymond Olsman, Hrishikesh Patel, Mária Péter, Gerrit Van Den Bosch, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, Hendrikus Jan Wondergem, Aleksandar Nikolov Zdravkov
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Patent number: 11686997Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: GrantFiled: March 3, 2022Date of Patent: June 27, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Pieter-Jan Van Zwol, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Patent number: 11467486Abstract: A catalyst including: a first layer including a transition metal; a base layer; and an interlayer, wherein the interlayer is disposed between the base layer and the first layer is disclosed. Also disclosed are methods for preparing a catalyst as well as for synthesizing graphene, a pellicle produced using the catalyst or methods disclosed herein, as well as a lithography apparatus including such a pellicle.Type: GrantFiled: February 7, 2019Date of Patent: October 11, 2022Assignee: ASML Netherlands B.V.Inventors: Evgenia Kurganova, Adrianus Johannes Maria Giesbers, Alexander Ludwig Klein, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Pieter-Jan Van Zwol, David Ferdinand Vles, Sten Vollebregt, Willem-Pieter Voorthuijzen
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Publication number: 20220252974Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.Type: ApplicationFiled: April 25, 2022Publication date: August 11, 2022Inventors: David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willlem-Pieter VOORTHUIJZEN, James Norman WILEY
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Publication number: 20220187701Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: ApplicationFiled: March 3, 2022Publication date: June 16, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Publication number: 20220176918Abstract: Rotary vehicle cleaning installation, the installation comprising a vehicle support platform that is rotatable around a central platform axis and is configured to support a number of vehicles on a vehicle surface of the vehicle support platform, and a drive assembly that is operatively connected to the vehicle support platform and that is configured to rotate the vehicle support platform, and a number of cleaning devices that is positioned at a working distance from the vehicle surface of the vehicle support platform. The invention also relates to a method for cleaning a vehicle using a rotary vehicle cleaning installation according to the invention.Type: ApplicationFiled: December 9, 2021Publication date: June 9, 2022Inventor: Alexander Maria Peter Alphonsus Peters
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Patent number: 11347142Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.Type: GrantFiled: March 19, 2021Date of Patent: May 31, 2022Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: David Ferdinand Vles, Erik Achilles Abegg, Aage Bendiksen, Derk Servatius Gertruda Brouns, Pradeep K. Govil, Paul Janssen, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Johannes Petrus Martinus Bernardus Vermeulen, Willem-Pieter Voorthuijzen, James Norman Wiley
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Patent number: 11320731Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and including a stack having: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine.Type: GrantFiled: December 2, 2016Date of Patent: May 3, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Pieter-Jan Van Zwol, Dennis De Graaf, Paul Janssen, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, David Ferdinand Vles, Willem-Pieter Voorthuijzen
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Patent number: 11314163Abstract: A pellicle frame for supporting a pellicle, the frame having a first surface and a second surface opposite the first surface, and a structure provided between the first and the second surfaces, wherein the first and second surfaces and the structure at least partially define at least one volume therebetween that is devoid of the material that forms the frame.Type: GrantFiled: August 28, 2018Date of Patent: April 26, 2022Assignee: ASML Netherlands B.V.Inventors: Anton Wilhelmus Duys, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Pieter-Jan Van Zwol, David Ferdinand Vles
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Publication number: 20220121111Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.Type: ApplicationFiled: December 13, 2021Publication date: April 21, 2022Applicant: ASML NETHERLANDS B.V.Inventors: David Ferdinand VLES, Chaitanya Krishna ANDE, Antonius Franciscus Johannes DE GROOT, Adrianus Johannes Maria GIESBERS, Johannes Joseph JANSSEN, Paul JANSSEN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Marcel Peter MEIJER, Wouter Rogier MEIJERINK, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Raymond OLSMAN, Hrishikesh PATEL, Mária PÉTER, Gerrit VAN DEN BOSCH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV