Abstract: Nickel powder batches including coated nickel-containing particles and methods for producing the same. The coated nickel-containing particles having have a small particle size, narrow size distribution and a spherical morphology. The present invention is also directed to devices incorporating the coated nickel-containing particles.

Abstract: Chemical-mechanical planarization slurries and methods for using the slurries wherein the slurry includes abrasive particles. The abrasive particles have a small particle size, narrow size distribution and a spherical morphology and the particles are substantially unagglomerated.

Abstract: Metal-carbon composite powders and methods for producing metal-carbon composite powders. The powders have a well-controlled microstructure and morphology and preferably have a small average particle size. The method includes forming the particles from an aerosol of powder precursors. The invention also includes novel devices and products formed from the composite powders.

Abstract: Glass powders, methods for producing glass powders and compositions comprising glass powders. The powders preferably have a small particle size, narrow size distribution and a spherical morphology. The method includes forming the particles by a spray pyrolysis technique. The invention also includes novel devices and products formed from the glass powders. The compositions may be deposited on a substrate using various techniques including ink-jet printing.

Abstract: Provided are silver-containing powders and a method and apparatus for manufacturing the silver-containing particles of high quality, of a small size and narrow size distribution. An aerosol is generated from liquid feed and sent to a furnace, where liquid in droplets in the aerosol is vaporized to permit formation of the desired particles, which are then collected in a particle collector. The aerosol generation involves preparation of a high quality aerosol, with a narrow droplet size distribution, with close control over droplet size and with a high droplet loading suitable for commercial applications.

Abstract: Provided is an aerosol manufacture facility including an aerosol generator (600), an aerosol heater (604), an aerosol cooler (604), a particle collector (606), a precursor liquid supply system (608), a carrier gas supply system (610), and a cooling gas supply system (612), and optionally other components. Also provided is an aerosol method for manufacturing particles in the aerosol manufacture facility, which, in one embodiment, involves automated process control.

Abstract: A method of forming a thin film of a metal oxide on a substrate by coating the substrate with a solution comprising metal-organic precursors is disclosed. This method is applicable to, e.g., forming thin films of perovskite-phase titanates, zirconates, and/or niobates of divalent metals such as Ba, Sr, Pb and/or Ca. In one embodiment, a first precursor comprises a divalent metal coordinated to one or more organic ligands, and a second precursor comprises a tetravalent metal coordinated to one or more organic ligands are supplied in a common solution. A substrate 14 is coated with this solution (e.g. by spin coating) to form a preliminary thin film 10. Substrate heater 22 preferably heats substrate 14 to a temperature sufficient to react ligands from the first and second precursors in an ester elimination reaction which forms a volatile precursor 16. This reaction leaves an intermediate compound film 12 comprising the divalent metal and the tetravalent metal on the substrate.

Abstract: In a method of depositing a metal sulfide film on a substrate a solution containing at least one metal compound precursor comprising at least one thiocarboxylate ligand SECR, wherein E is selected from the group consisting of O and S and wherein R is selected from the group consisting of alkyl, aryl, substituted alkyl, substituted aryl, halogenated alkyl, and halogenated aryl is prepared. The substrate is heated to a reaction temperature. The solution is evaporated to form vapors of the metal compound precursor. The vapors and the substrate heated to the reaction temperature are contacted. The reaction temperature is sufficient to decompose the metal compound precursor to form a metal sulfide film of at least one metal on the substrate.

Abstract: In a method of depositing a metal sulfide film on a substrate, at least one metal compound precursor comprising at least one thiocarboxylate ligand SECR and at least one solubility-improving ligand L is dissolved in a solvent to produce a solution, wherein a) E is selected from the group consisting of O and S and R is selected from the group consisting of alkyl, aryl, substituted alkyl, substituted aryl, halogenated alkyl, and halogenated aryl; and wherein b) L is selected from the group of monodentate ligands, multidentate ligands, and R.sup.1 O ligands. The solution is coated onto a substrate and the substrate is heated to a reaction temperature sufficient to decompose the metal compound precursor to form a metal sulfide film of at least one metal on the substrate.

Abstract: A method of depositing a thin film of a metal oxide by chemical vapor deposition is disclosed. This method is applicable to, e.g., forming thin films of perovskite-phase titanates, zirconates, and/or niobates of divalent metals such as Ba, Sr, and/or Ca. In one example, a first precursor comprises a divalent metal coordinated to carboxylate and polyether ligands, and a second precursor comprises a tetravalent metal coordinated to one or more alkoxide ligands. These precursors are delivered in a mixed stable vapor phase 12 to a preferably heated substrate 14, where a surface-mediated reaction between the two precursors releases a volatile ester and deposits an intermediate compound film 18 comprising the divalent metal, the tetravalent metal and oxygen on the substrate. The substrate may be subsequently annealed to drive off unreacted ligands and/or fully crystallize the intermediate compound film into a perovskite-phase film 20.

Abstract: Metal oxides are formed at low temperatures by the process of providing a class of divalent metal hydroxycarboxylates designed to react with metal alkoxide compounds such as B(OR').sub.4, where B=Ti, Zr, Sn and R'=an alkyl group with the elimination of two equivalents of alcohol to form species with integral or non-integral stoichiometry. The reaction produces an intermediate compound which after thermolysis at 350.degree. C. in O.sub.2, results in formation of crystalline perovskite phase materials of general formula ABO.sub.3, A.sub.x A'.sub.1-x BO.sub.3 and AB.sub.x B'.sub.1-x O.sub.3.