Patents by Inventor Mark O. Neisser
Mark O. Neisser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150227043Abstract: The present invention relates to novel antireflective coating compositions and their use in image processing. The compositions self-segregate to form hydrophobic surfaces of the novel antireflective coating compositions, the composition being situated between a reflective substrate and a photoresist coating. Such compositions are particularly useful in the fabrication of semiconductor devices by photolithographic techniques. The present invention also related to self-segregating polymers useful in image processing and processes of their use.Type: ApplicationFiled: April 21, 2015Publication date: August 13, 2015Inventors: Huirong YAO, JoonYeon CHO, Zachary BOGUSZ, Salem K. MULLEN, Guanyang LIN, Mark O. NEISSER
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Patent number: 9052598Abstract: The present invention relates to novel processes for using the neutral layer compositions for aligning microdomains of directed self-assembling block copolymers (BCP). The processes are useful for fabrication of electronic devices.Type: GrantFiled: February 14, 2014Date of Patent: June 9, 2015Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Hengpeng Wu, Yi Cao, SungEun Hong, Jian Yin, Margareta Paunescu, Mark O Neisser, Guanyang Lin
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Publication number: 20140295349Abstract: The present invention relates to novel antireflective coating compositions and their use in image processing. The compositions self-segregate to form hydrophobic surfaces of the novel antireflective coating compositions, the composition being situated between a reflective substrate and a photoresist coating. Such compositions are particularly useful in the fabrication of semiconductor devices by photolithographic techniques. The present invention also related to self-segregating polymers useful in image processing and processes of their use.Type: ApplicationFiled: March 28, 2013Publication date: October 2, 2014Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Huirong YAO, JoonYeon CHO, Zachary BOGUSZ, Salem K. MULLEN, Guanyang LIN, Mark O. NEISSER
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Publication number: 20140193754Abstract: The present invention relates to novel neutral layer compositions and methods for using the neutral layer compositions for aligning microdomains of directed self-assembling block copolymers (BCP). The compositions and processes are useful for fabrication of electronic devices.Type: ApplicationFiled: February 14, 2014Publication date: July 10, 2014Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Hengpeng WU, Yi CAO, SungEun HONG, Jian YIN, Margareta PAUNESCU, Mark O. NEISSER, Guanyang LIN
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Patent number: 8691925Abstract: The present invention relates to novel neutral layer compositions and methods for using the compositions. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where R1 is selected from the group consisting of a C1-C8 alkyl, C1-C8 fluoroalkyl moiety, C1-C8 partially fluorinated alkyl, C4-C8 cycloalkyl, C4-C8 cyclofluoroalkyl, C4-C8 partially fluorinated cycloalkyl, and a C2-C8 hydroxyalkyl; R2, R3 and R5 are independently selected from a group consisting of H, C1-C4 alkyl, CF3 and F; R4 is selected from the group consisting of H, C1-C8 alkyl, C1-C8 partially fluorinated alkyl and C1-C8 fluoroalkyl, n ranges from 1 to 5, R6 is selected from the group consisting of H, F, C1-C8 alkyl and a C1-C8 fluoroalkyl and m ranges from 1 to 3.Type: GrantFiled: September 23, 2011Date of Patent: April 8, 2014Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.Inventors: Hengpeng Wu, Yi Cao, SungEun Hong, Jian Yin, Margareta Paunescu, Mark O. Neisser, Guanyang Lin
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Patent number: 8632948Abstract: The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.Type: GrantFiled: September 30, 2009Date of Patent: January 21, 2014Assignee: AZ Electronic Materials USA Corp.Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, Francis M. Houlihan, Shinji Miyazaki, Edward Ng, Mark O. Neisser
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Patent number: 8551686Abstract: The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, X is a linking moiety selected from a nonaromatic (A) moiety, aromatic (P) moiety and mixture thereof, R? is a group of structure (2), R? is independently selected from hydrogen, a moiety of structure (2), Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbylene linking moiety, and, Y? is independently a (C1-C20) hydrocarbylene linking moiety, where structure (2) is where R1 and R2 are independently selected from H and C1-C4alkyl and L is an organic hydrocarbyl group. The invention further relates to a process for imaging the antireflective coating composition.Type: GrantFiled: October 30, 2009Date of Patent: October 8, 2013Assignee: AZ Electronic Materials USA Corp.Inventors: Huirong Yao, Guanyang Lin, Mark O. Neisser
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Patent number: 8524441Abstract: A polymer comprising a siloxane polymer having at least one Si—OH group and at least one Si—OR group, where R is condensation stabilizing group optionally having a reactive functional group, wherein the siloxane polymer, when placed into a solvent, has a weight average molecular weight increase of less than or equal to 50% after aging for one week at 40° C. as measured by GPC is provided.Type: GrantFiled: February 25, 2008Date of Patent: September 3, 2013Assignees: AZ Electronic Materials USA Corp., Braggone OyInventors: Ruzhi Zhang, WooKyu Kim, David J. Abdallah, PingHung Lu, Mark O. Neisser, Ralph R. Dammel, Ari Karkkainen
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Publication number: 20130078576Abstract: The present invention relates to novel neutral layer compositions and methods for using the compositions. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where R1 is selected from the group consisting of a C1-C8 alkyl, C1-C8 fluoroalkyl moiety, C1-C8 partially fluorinated alkyl, C4-C8 cycloalkyl, C4-C8 cyclofluoroalkyl, C4-C8 partially fluorinated cycloalkyl, and a C2-C8 hydroxyalkyl; R2, R3 and R5 are independently selected from a group consisting of H, C1-C4 alkyl, CF3 and F; R4 is selected from the group consisting of H, C1-C8 alkyl, C1-C8 partially fluorinated alkyl and C1-C8 fluoroalkyl, n ranges from 1 to 5, R6 is selected from the group consisting of H, F, C1-C8 alkyl and a C1-C8 fluoroalkyl and m ranges from 1 to 3.Type: ApplicationFiled: September 23, 2011Publication date: March 28, 2013Applicant: AZ ELECTRONIC MATERIALS USA CORP.Inventors: Hengpeng WU, Yi CAO, SungEun HONG, Jian YIN, Margareta PAUNESCU, Mark O. NEISSER, Guanyang LIN
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Publication number: 20120108067Abstract: The invention relates to an edge bead remover composition for an organic film disposed on a substrate surface, comprising an organic solvent and at least one polymer having a contact angle with water greater than 70°. The invention also relates to a process for using the composition as an edge bead remover for an organic film.Type: ApplicationFiled: October 29, 2010Publication date: May 3, 2012Inventors: Mark O. Neisser, Srinivasan Chakrapani, Munirathna Padmanaban, Ralph R. Dammel
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Patent number: 8088548Abstract: Developable bottom antireflective coating compositions are provided.Type: GrantFiled: October 23, 2007Date of Patent: January 3, 2012Assignee: AZ Electronic Materials USA Corp.Inventors: Francis M. Houlihan, Shinji Miyazaki, Mark O. Neisser, Alberto D. Dioses, Joseph E. Oberlander
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Patent number: 8039202Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.Type: GrantFiled: October 24, 2007Date of Patent: October 18, 2011Assignee: AZ Electronic Materials USA Corp.Inventors: Yu Sui, Hengpeng Wu, Wenbing Kang, Mark O. Neisser, Tomohide Katayama, Shuji S. Ding-Lee, Aritaka Hishida, Joseph E. Oberlander, Medhat E. Toukhy
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Publication number: 20110104613Abstract: The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, X is a linking moiety selected from a nonaromatic (A) moiety, aromatic (P) moiety and mixture thereof, R? is a group of structure (2), R? is independently selected from hydrogen, a moiety of structure (2), Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbylene linking moiety, and, Y? is independently a (C1-C20) hydrocarbylene linking moiety, where structure (2) is where R1 and R2 are independently selected from H and C1-C4alkyl and L is an organic hydrocarbyl group. The invention further relates to a process for imaging the antireflective coating composition.Type: ApplicationFiled: October 30, 2009Publication date: May 5, 2011Inventors: Huirong Yao, Guanyang Lin, Mark O. Neisser
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Publication number: 20110076626Abstract: The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.Type: ApplicationFiled: September 30, 2009Publication date: March 31, 2011Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, Francis M. Houlihan, Shinji Miyazaki, Edward Ng, Mark O. Neisser
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Patent number: 7824844Abstract: The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3, where, R1, R3, and R4, are selected from H and C1-C6 alkyl, and R2, R5, R6, R7, R8, and R9 are selected from C1-C6 alkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging.Type: GrantFiled: January 19, 2007Date of Patent: November 2, 2010Assignee: AZ Electronic Materials USA Corp.Inventors: Zhong Xiang, Hengpeng Wu, Hong Zhuang, Eleazar Gonzalez, Mark O. Neisser
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Patent number: 7824837Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.Type: GrantFiled: October 22, 2007Date of Patent: November 2, 2010Assignee: AZ Electronic Materials USA Corp.Inventors: Hengpeng Wu, Mark O. Neisser, Shuji S Ding-Lee, Aritaka Hishida, Joseph E. Oberlander, Medhat E. Toukhy
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Patent number: 7816071Abstract: A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing the photoresist with an exposure equipment; and, d) developing the coating with a developer.Type: GrantFiled: January 24, 2006Date of Patent: October 19, 2010Assignee: AZ Electronic Materials USA Corp.Inventors: David J. Abdallah, Mark O. Neisser, Ralph R. Dammel, Georg Pawlowski, John Biafore, Andrew R. Romano
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Patent number: 7553905Abstract: Novel self-crosslinking polymers are provided and which are useful in antireflective coatings to reduce outgassing.Type: GrantFiled: October 31, 2005Date of Patent: June 30, 2009Assignee: AZ Electronic Materials USA Corp.Inventors: David J. Abdallah, Jian Yin, Mark O. Neisser
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Publication number: 20090104559Abstract: Developable bottom antireflective coating compositions are provided.Type: ApplicationFiled: October 23, 2007Publication date: April 23, 2009Inventors: Francis M. Houlihan, Shinjl Miyazaki, Mark O. Neisser, Alberto D. Dioses, Joseph E. Oberlander
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Publication number: 20080176165Abstract: The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3, where, R1, R3, and R4, are selected from H and C1-C6 alkyl, and R2, R5, R6, R7, R8, and R9 are selected from C1-C6 alkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging.Type: ApplicationFiled: January 19, 2007Publication date: July 24, 2008Inventors: Zhong Xiang, Hengpeng Wu, Hong Zhuang, Eleazar Gonzalez, Mark O. Neisser