Abstract: Disclosed are embodiments of a design structure transistor that operates as a capacitor and an associated method of tuning capacitance within such a capacitor. The embodiments of the capacitor comprise a field effect transistor with front and back gates above and below a semiconductor layer, respectively. The capacitance value exhibited by the capacitor can be selectively varied between two different values by changing the voltage condition in a source/drain region of the transistor, e.g., using a switch or resistor between the source/drain region and a voltage supply. Alternatively, the capacitance value exhibited by the capacitor can be selectively varied between multiple different values by changing voltage conditions in one or more of multiple channel regions that are flanked by multiple source/drain regions within the transistor. The capacitor will exhibit different capacitance values depending upon the conductivity in each of the channel regions.

Abstract: Disclosed are integrated circuit design systems and methods, wherein selected functional library elements are placed in a layout to meet product specifications and selected hybrid fill-placeable library elements are placed in that same layout to meet at least one feature density rule. Each hybrid fill-placeable library element comprises fill shapes corresponding to specific features subject to a density rule and a marker shape that provides an instruction to ignore any density rule violations within that element for purposes of design rule checking. Placement of the hybrid fill-placeable library elements is performed to balance out density rule violations in functional library elements elsewhere in the layout, thereby avoiding the need for post-processing of the completed IC design to add fill shapes.

Abstract: In one embodiment, at least one design library element having a design marker shape is applied to a yield checking tool having library element types, each having a yield checking deck threshold and a marker shape. The design marker shape is compared to each of the marker shapes. A determination is made as to whether the design library element satisfies the yield checking deck threshold associated with the library element type having a matching marker shape. In another embodiment, a product design formed from a design library elements each having a design marker shape is applied to the yield checking tool in a similar manner. In instances where the design library elements do not satisfy the yield checking deck threshold, then the design library element is updated by modifying the design library elements, placement of the design library elements in the product design, and/or wiring connecting the design library elements.

Abstract: Systems and methods receive a design of a circuit layout. The circuit layout has some available spaces. Such systems and methods automatically insert capacitor arrays in the specified spaces. Each of the capacitor arrays has capacitor cells, and each of the capacitor cells has capacitor structures and a buried implant. The process of inserting the capacitor arrays comprises a process of forming the capacitor arrays to either: grow the capacitor arrays to the size of the specified spaces; grow the capacitor arrays to a specified capacitance value within the restriction of the length dimension or the width dimension of the specified spaces; or grow the capacitor arrays to a specified capacitance value, irrespective of dimensional length dimension or width dimension limitations (where the only limitations are the dimensions of the specified space).

Abstract: Disclosed is a design structure for an associated first system for extending product life of a second system in the presence of phenomena that cause the exhibition of both performance degradation and recovery properties within system devices. The first system includes duplicate devices incorporated into the second system (e.g., on a shared bus). These duplicate devices are adapted to independently perform the same function within that second system. Reference signal generators, a reference signal comparator, a power controller and a state machine, working in combination, can be adapted to seamlessly switch performance of that same function within the second system between the duplicate devices based on a measurement of performance degradation to allow for device recovery. A predetermined policy accessible by the state machine dictates when and whether or not to initiate a switch.

Abstract: The embodiments of the invention provide a design structure for detection and compensation of negative bias temperature instability (NBTI) induced threshold degradation. A semiconductor device is provided comprising at least one stress device having a voltage applied to its gate node and at least one reference device having a zero gate-to-source voltage. A controller is also provided to configure node voltages of the device and/or the reference device to reflect different regions of device operations found in digital and analog circuit applications. Moreover, the controller measures a difference in current between the stress device and the reference device to determine whether NBTI induced threshold degradation has occurred in the stress device. The controller also adjusts an output power supply voltage of the stress device until a performance of the stress device matches a performance of the reference device to account for the NBTI induced threshold degradation.

Abstract: Disclosed are embodiments of a transistor that operates as a capacitor and an associated method of tuning capacitance within such a capacitor. The embodiments of the capacitor comprise a field effect transistor with front and back gates above and below a semiconductor layer, respectively. The capacitance value exhibited by the capacitor can be selectively varied between two different values by changing the voltage condition in a source/drain region of the transistor, e.g., using a switch or resistor between the source/drain region and a voltage supply. Alternatively, the capacitance value exhibited by the capacitor can be selectively varied between multiple different values by changing voltage conditions in one or more of multiple channel regions that are flanked by multiple source/drain regions within the transistor. The capacitor will exhibit different capacitance values depending upon the conductivity in each of the channel regions.

Abstract: Disclosed are embodiments of a method and an associated first system for extending product life of a second system in the presence of phenomena that cause the exhibition of both performance degradation and recovery properties within system devices. The first system includes duplicate devices incorporated into the second system (e.g., on a shared bus). These duplicate devices are adapted to independently perform the same function within that second system. Reference signal generators, a reference signal comparator, a power controller and a state machine, working in combination, can be adapted to seamlessly switch performance of that same function within the second system between the duplicate devices based on a measurement of performance degradation to allow for device recovery. A predetermined policy accessible by the state machine dictates when and whether or not to initiate a switch.

Abstract: Disclosed are embodiments of a method and an associated first system for extending product life of a second system in the presence of phenomena that cause the exhibition of both performance degradation and recovery properties within system devices. The first system includes duplicate devices incorporated into the second system (e.g., on a shared bus). These duplicate devices are adapted to independently perform the same function within that second system. Reference signal generators, a reference signal comparator, a power controller and a state machine, working in combination, can be adapted to seamlessly switch performance of that same function within the second system between the duplicate devices based on a measurement of performance degradation to allow for device recovery. A predetermined policy accessible by the state machine dictates when and whether or not to initiate a switch.

Abstract: Disclosed are embodiments of a design structure transistor that operates as a capacitor and an associated method of tuning capacitance within such a capacitor. The embodiments of the capacitor comprise a field effect transistor with front and back gates above and below a semiconductor layer, respectively. The capacitance value exhibited by the capacitor can be selectively varied between two different values by changing the voltage condition in a source/drain region of the transistor, e.g., using a switch or resistor between the source/drain region and a voltage supply. Alternatively, the capacitance value exhibited by the capacitor can be selectively varied between multiple different values by changing voltage conditions in one or more of multiple channel regions that are flanked by multiple source/drain regions within the transistor. The capacitor will exhibit different capacitance values depending upon the conductivity in each of the channel regions.

Abstract: The embodiments of the invention provide a design structure for detection and compensation of negative bias temperature instability (NBTI) induced threshold degradation. A semiconductor device is provided comprising at least one stress device having a voltage applied to its gate node and at least one reference device having a zero gate-to-source voltage. A controller is also provided to configure node voltages of the device and/or the reference device to reflect different regions of device operations found in digital and analog circuit applications. Moreover, the controller measures a difference in current between the stress device and the reference device to determine whether NBTI induced threshold degradation has occurred in the stress device. The controller also adjusts an output power supply voltage of the stress device until a performance of the stress device matches a performance of the reference device to account for the NBTI induced threshold degradation.

Abstract: The embodiments of the invention provide an apparatus and method for detection and compensation of negative bias temperature instability (NBTI) induced threshold degradation. A semiconductor device is provided comprising at least one stress device having a voltage applied to its gate node and at least one reference device having a zero gate-to-source voltage. A controller is also provided to configure node voltages of the device and/or the reference device to reflect different regions of device operations found in digital and analog circuit applications. Moreover, the controller measures a difference in current between the stress device and the reference device to determine whether NBTI induced threshold degradation has occurred in the stress device. The controller also adjusts an output power supply voltage of the stress device until a performance of the stress device matches a performance of the reference device to account for the NBTI induced threshold degradation.

Abstract: Disclosed are embodiments of a method and an associated first system for extending product life of a second system in the presence of phenomena that cause the exhibition of both performance degradation and recovery properties within system devices. The first system includes duplicate devices incorporated into the second system (e.g., on a shared bus). These duplicate devices are adapted to independently perform the same function within that second system. Reference signal generators, a reference signal comparator, a power controller and a state machine, working in combination, can be adapted to seamlessly switch performance of that same function within the second system between the duplicate devices based on a measurement of performance degradation to allow for device recovery. A predetermined policy accessible by the state machine dictates when and whether or not to initiate a switch.

Abstract: Disclosed is a design structure for an associated first system for extending product life of a second system in the presence of phenomena that cause the exhibition of both performance degradation and recovery properties within system devices. The first system includes duplicate devices incorporated into the second system (e.g., on a shared bus). These duplicate devices are adapted to independently perform the same function within that second system. Reference signal generators, a reference signal comparator, a power controller and a state machine, working in combination, can be adapted to seamlessly switch performance of that same function within the second system between the duplicate devices based on a measurement of performance degradation to allow for device recovery. A predetermined policy accessible by the state machine dictates when and whether or not to initiate a switch.

Abstract: Disclosed are embodiments of a transistor that operates as a capacitor and an associated method of tuning capacitance within such a capacitor. The embodiments of the capacitor comprise a field effect transistor with front and back gates above and below a semiconductor layer, respectively. The capacitance value exhibited by the capacitor can be selectively varied between two different values by changing the voltage condition in a source/drain region of the transistor, e.g., using a switch or resistor between the source/drain region and a voltage supply. Alternatively, the capacitance value exhibited by the capacitor can be selectively varied between multiple different values by changing voltage conditions in one or more of multiple channel regions that are flanked by multiple source/drain regions within the transistor. The capacitor will exhibit different capacitance values depending upon the conductivity in each of the channel regions.

Abstract: The embodiments of the invention provide an apparatus and method for detection and compensation of negative bias temperature instability (NBTI) induced threshold degradation. A semiconductor device is provided comprising at least one stress device having a voltage applied to its gate node and at least one reference device having a zero gate-to-source voltage. A controller is also provided to configure node voltages of the device and/or the reference device to reflect different regions of device operations found in digital and analog circuit applications. Moreover, the controller measures a difference in current between the stress device and the reference device to determine whether NBTI induced threshold degradation has occurred in the stress device. The controller also adjusts an output power supply voltage of the stress device until a performance of the stress device matches a performance of the reference device to account for the NBTI induced threshold degradation.

Abstract: A structure and associated method to control a flow of data on a semiconductor device. A transmitter, receiver and transmission line are formed within the semiconductor device. The transmitter, receiver, and transmission line are adapted to control data transfer between a first core and a second core within the semiconductor device. The transmitter is adapted to send a signal over the transmission line to the receiver adapted to receive the signal. The receiver is further adapted to create an impedance mismatch to indicate that the second core is unable to transfer the data. The transmitter is adapted to detect the impedance mismatch.

Abstract: A method for providing quality control on wafers running on a manufacturing line is disclosed. The resistances on a group of manufacturing test structures within a wafer running on a wafer manufacturing line are initially measured. Then, an actual distribution value is obtained based on the result of the measured resistances on the group of manufacturing test structures. The difference between the actual distribution value and a predetermined distribution value is recorded. Next, the resistances on a group of design test structures within the wafer are measured. The measured resistances of the group of design test structures are correlated to the measured resistances of the group of manufacturing test structures in order to obtain an offset value. The resistance of an adjustable resistor circuit within the wafer and subsequent wafers running on the wafer manufacturing line are adjusted according to the offset value.

Abstract: A method and structure for comparing an input signal to a reference signal using a comparator comprises a circuit for setting a trip point of a rising edge of an input signal according to a value of an external voltage reference; and at least two transistors, in the circuit, for setting a trip point of a falling edge of an input signal, according to a width-to-length ratio of the at least two transistors. Moreover, the at least two transistors comprises a first transistor of length (Lx) and a width of (Wx); and a second transistor of length (Ly) and a width of (Wy), wherein the width-to-length ratio equals (WxLy)/(WyLx). The trip point of a falling edge of an input signal increases (decreases) by increasing (decreasing) the width-to-length ratio.

Abstract: An apparatus for providing power control to a real-time clock oscillator is disclosed. The apparatus includes a clock oscillator, a set of current limiting resistors and a set of latches. The current limiting resistors are coupled between a power supply and the clock oscillator. Coupled to the clock oscillator and the current limiting resistors, the latches control the current limiting resistors to limit the amount of current flowing from the power supply to the clock oscillator such that the power consumption by the clock oscillator is minimized.