Abstract: A particle-optical arrangement provides a primary particle-optical beam path for a plurality of first individual particle beams which, emanating from a multi-beam particle generator, are directed at an object positionable in an object plane of the arrangement, and a secondary particle-optical beam path for a plurality of second individual particle beams which emanate from the object. The particle-optical arrangement has a magnet arrangement having a first magnetic field region through which the primary particle-optical beam path and the second particle-optical beam path pass, for separating the primary particle-optical beam path and the secondary particle-optical beam path from one another. The magnet arrangement also has a second magnetic field region arranged in the primary particle-optical beam path and not arranged in the secondary particle-optical beam path, the second magnetic field region being arranged upstream of the first magnetic field region in relation to the primary particle-optical beam path.

Abstract: A method including receiving video data including a plurality of video frames captured during a sporting occasion, wherein each frame of the plurality of video frames includes data corresponding to one or more agents. The method including receiving event data associated with the video data. The method including processing the plurality of video frames and the event data to generate imputed tracking data, wherein the imputed tracking data includes positional data and movement data for each of the one or more agents. The method including determining one or more metrics based on the imputed tracking data, wherein the one or more metrics includes at least one of a pass option, a pressure, a line detection, and a marking. The method including determining an output based on the one or more metrics for the one or more agents.

Abstract: A machining head for thermal and/or mechanical machining of workpieces, which extends along a longitudinal axis L, comprising a front part and a rear part, the front part comprising at least one nozzle with an opening, which during operation has thermal and/or mechanical energy for workpiece machining leaving it, the rear part being connected or connectable to operating-media supply devices and the rear part and the front part being connectable detachably to and separable from one another, wherein the rear part and/or the front part have/has a drive device, which are/is configured to move the front part at least partially along the longitudinal axis L relative to the rear part for connection purposes and in the opposite direction relative to the rear part for separation purposes.

Abstract: A computer-implemented method for assigning a plurality of simulation tasks to a plurality of simulation agents. A simulation task processing list is received, which comprises several simulation tasks to be completed. The simulation tasks to be completed are assigned to the simulation agents such that not all simulation tasks present in the simulation task processing list are assigned to the simulation agents. For the unassigned simulation tasks, it is checked whether simulation task-dependent data of the simulation task are at least partially identical to the simulation task-dependent data of the assigned simulation tasks. At least one unassigned simulation task is assigned to a simulation agent such that after the previously assigned simulation task has been completed, the simulation agent is assigned another simulation task, the simulation task-dependent data of which are at least partially identical to the simulation task-dependent data of the simulation task assigned immediately before it.

Abstract: To determine an imaging quality of an optical system when illuminated by illumination light within an entrance pupil or exit pupil, a test structure is initially arranged in an object plane of the optical system and an illumination angle distribution for illuminating the test structure with the illumination light is specified. The test structure is illuminated at different distance positions relative to the object plane. An intensity of the illumination light is measured in an image plane of the optical system, the illumination light having been guided by the optical system when imaging the test structure at each distance position. An aerial image measured in this way is compared with a simulated aerial image and fit parameters of a function set for describing the simulated aerial image are adapted and a wavefront of the optical system is determined on the basis of the result of a minimized difference.

Abstract: A multi-beam charged particle beam system includes a detection unit configured for a dynamic compensation of charging effects of a sample. The detection unit comprises a relay optical system comprising an adaptive mirror array for keeping signal beams at the position of entrance apertures of lightguides od detection elements. Thereby, beam distortions induced by charging effects can be compensated. The disclosure can be applied to, for example, wafer inspection with multi-beam charged particle beam system.

Abstract: A multi-beam charged particle system with a secondary electron imaging system is configured to dynamically compensate charging effects. The multi-beam charged particle system comprises an improved cross-over detection system and a cross-over actuation mechanism, which are both connected to a contrast control module. The system allows for closed-loop control of an intensity distribution of a plurality of secondary electron beamlets within a cross-over or pupil plane. The disclosure can be applied to wafer inspection with multi-beam charged particle system.

Abstract: Various examples generally pertain to closed-loop control of one or more parameters of a multi-beam charged particle imaging system, e.g., a multi beam scanning electron microscope, mSEM. A pattern of secondary beamlets can be stabilized. A focal position can be stabilized. According to examples, fast algorithms are facilitated by a field-programmable gated array, FPGA, logic.

Abstract: Techniques for generating textual content relating to sporting events using generative machine learning models are disclosed. For example, a machine-learning environment receives, from a client device, a request to generate textual content relating to a sporting event. The environment obtains relevant data and generates a prompt, which is provided to one or more generative machine learning models. In turn, the models output textual content relating to the event. The content may be provided to the client device.

Abstract: A multi-beam charged particle beam system with a secondary electron imaging system is configured to dynamically compensate charging effects of a sample over a large range of landing energies of primary charged particles. The multi-beam charged particle beam system has reduced complexity and comprises a fast electrostatic lens element and a mechanism for compensating charging effects. The mechanism can be a second fast electrostatic lens element or a position actuator. The technology can used in wafer inspection with multi-beam charged particle beam system.

Abstract: When measuring a reflectivity of an object for measurement light, initially the object and a reflectivity measurement apparatus are provided. The latter includes a measurement light source, an object holder for holding the object and a spatially resolving detector for capturing measurement light reflected by the object. A measurement light beam impinges on a section of the object within a field of view of the measurement apparatus. The reflected measurement light coming from the impinged-upon section of the object is captured. A surface area of the captured section is at most 50 ?m×50 ?m. The measurement is performed by the detector. Next, at least one reflectivity parameter of the object is determined on the basis of an intensity of the captured measurement light. The result is a measurement method and a metrology system operating therewith, whereby reflectivities in particular of very finely structured objects, such as lithography masks, can be measured with sufficient precision.

Abstract: A computer-implemented method for generating a modification suggestion for at least one simulation run of a simulation comprising a plurality of simulation runs. An error description of a simulation run of a first simulation is received, whereby the simulation run whose error description is received is based on a first parameter set comprising a plurality of parameter values. A not yet completed simulation runs of the first simulation or a second simulation with a parameter set that matches the first parameter set in at least one parameter value is identified. The modification suggestion for the identified simulation runs, taking into account the received error description, is generated. A data processing device to carry out the above method, a computer program product, and a corresponding computer-readable data carrier are also provided.

Abstract: To determine an imaging quality of an optical system when illuminated by illumination light within a pupil to be measured of the optical system and/or to qualify the phase effect of a test structure, a test structure that is periodic in at least one dimension is initially arranged in an object plane of the optical system. An initial illumination angle distribution for illuminating the test structure with an initial pupil region, whose area is less than 10% of a total pupil area, is specified and the test structure is illuminated thereby in different distance positions relative to the object plane. In this way, an initial measured aerial image of the test structure is determined.

Abstract: A multi-beam charged particle system and a method of operating a multi-beam charged particle system can provide improved image contrast. The multi-beam charged particle system comprises a filter element or an active array element in a detection system, which can provide improved, anisotropic image contrast. The disclosure can be applied for applications of multi-beam charged particle system, where higher desired beam uniformity and throughput may be relevant.

Abstract: An optical system for a metrology system serves to measure an object. An optical focusing component is arranged in the beam path of illumination light between a light source and an object field and serves to create an illumination focus. A detection device serves to capture the illumination light in the beam path downstream of the object field. The optical focusing component is embodied as a zone plate with at least two zones. Portions of the illumination light that are incident on the zones interact with each other by diffraction.

Abstract: A particle-optical arrangement includes a magnet arrangement for separating a primary and a secondary particle-optical beam path. The magnet arrangement includes: a first magnetic field region through which the primary particle-optical beam path and the second particle-optical beam path pass, for the separation of the primary particle-optical beam path and the secondary particle-optical beam path from one another; a second magnetic field region arranged in the primary particle-optical beam path and not arranged in the secondary particle-optical beam path; and a third magnetic field region arranged in the primary particle-optical beam path and not arranged in the secondary particle-optical beam path.

Abstract: Disclosed is a mask inspection device for photomasks of EUV lithography. The mask inspection device comprises here a receiving device for a photomask, a light source for illuminating the photomask with an illumination beam, and a detection unit for recording at least regions of the photomask. Furthermore, the mask inspection device comprises at least one beam-shaping element for adapting the illumination beam and at least one stop in the light path between the photomask and the detection unit. The at least one beam-shaping element and the at least one stop are arranged in a fixed spatial relationship to one another on a common carrier element. Also disclosed is the corresponding carrier element.

Abstract: A metrology system having an optical measurement system serves to simulate illumination and imaging properties of an optical production system when an object is illuminated and imaged. The optical measurement system has an illumination optical unit serving to illuminate the object and having a pupil stop in the region of an illumination pupil in a pupil plane, and an imaging optical unit for imaging the object in an image plane. At least one pupil stop for specifying a plurality of measurement illumination settings created by displacing the pupil stop in the pupil plane is provided within the scope of the simulation method. Measurement aerial images are recorded in the image plane for various displacement positions of the object perpendicular to the object plane with the various measurement illumination settings. The various measurement illumination settings are specified by displacing the pupil stop. A complex mask transfer function is reconstructed from the recorded measurement aerial images.

Abstract: An optical measuring system is used to reproduce a target wavefront of an imaging optical production system when an object is illuminated with illumination light. The optical measuring system comprises an object holder displaceable by actuator means and at least one optical component displaceable by actuator means. Within the scope of the target wavefront reproduction, a starting actuator position set (X0), in which each actuator is assigned a starting actuator position, is initially specified. An expected design wavefront (WD) which approximates the target wavefront and which the optical measuring system produces as a set wavefront is determined. A coarse measurement of a starting wavefront (W0) which the optical measuring system produces as actual wavefront after actually setting the starting actuator position set (X0) is carried out.

Abstract: An optical system for a metrology system for measuring an object has an object holder for holding the object in an object plane. A transmissive optical focusing component is arranged in the beam path of illumination light between a light source of the metrology system and an object field in the object plane. The transmissive optical focusing component is used to generate an illumination focus in the subsequent beam path of the illumination light. The transmissive optical focusing component has a focal length which is smaller than 5 mm. A detection device is used for detecting the illumination light in the beam path downstream of the object field. An imaging optical unit is used for imaging the illumination focus generated by the transmissive optical focusing component into a further illumination focus in the region of the object field. The result is an optical system, the handling of which, in particular with respect to the object arrangement, is facilitated.