Abstract: A seal member for sealing a conveyor belt is a monolithic homogeneous piece of material having opposite first and second halves and comprises first and second primary seals and first and second secondary seals. The first secondary seal is resiliently movable relative to the first primary seal. The second secondary seal is resiliently movable relative to the second primary seal. The first primary seal and the first secondary seal are part of the first half of the seal member. The second primary seal and the second secondary seal are part of the second half of the seal member. When the seals on one of the first and second halves of the seal member become excessively worn, the seal member can be flipped so that the seals on the other half of the seal member can be utilized.

Abstract: A method for the detection of the presence or risk of cancer in a patient, comprises the steps of: (i) isolating a sample of the patient's genome; and (ii) detecting the presence or expression of the gene characterized by any of the nucleotide sequences identified as SEQ ID No 1, SEQ ID No. 10 and SEQ ID No. 13 wherein the presence or expression of the gene indicates the presence of or the risk of cancer.

Abstract: A method of detecting one or more scratches on a surface of a wafer made of a non-semiconductor material is provided. A UV beam is produced from a UV illumination source. The UV beam is incident on a front surface of the wafer. The UV beam being characterized that for scratches of a given material having a UV cutoff wavelength ?cutoff, over 90% of the spectral system response SSR is at wavelengths below ?cutoff?5 nm and expressed as: ? 0 ? cutoff - 5 ? ? nm ? S ? ? S ? ? R ? ( ? ) > 0.90 · ? 0 ? ? S ? ? S ? ? R ? ( ? ) A reflected beam of scattering of the UV beam is detected in response to scratches on a surface of the wafer. The scattering is captured.

Abstract: A method of detecting one or more scratches on a surface of a wafer made of a non-semiconductor material is provided. A UV beam is produced from a UV illumination source. The UV beam is incident on a front surface of the wafer. The UV beam being characterized that for scratches of a given material having a UV cutoff wavelength ?cutoff, over 90% of the spectral system response SSR is at wavelengths below ?cutoff?5 nm and expressed as: ? 0 ? cutoff - 5 ? nm ? SSR ? ( ? ) > 0.90 · ? 0 ? ? SSR ? ( ? ) A reflected beam of scattering of the UV beam is detected in response to scratches on a surface of the wafer. The scattering is captured.

Abstract: A diagnostic method is disclosed which can he used to predict the risk of cancer, in particular breast cancer. The method comprises: (i) isolating a sample of the patient's genome: and (ii) detecting the presence or expression of the gene comprised within the sequence identified herein as SEQ ID No. 1, wherein the presence or expression of the gene indicates the presence of or the risk of cancer.

Abstract: Method and apparatus (121) for providing temperature flow rate compensation for a Coriolis flow meter. The described compensation compensates both flow calibration factor and the nominal time delay, commonly called “zero” in the art. After a Coriolis flow meter is installed into a process, whether for calibration or for actual process use, it need only be zeroed once over its lifetime following its installation. This is a significant improvement over prior Coriolis flow meters that may need to be re-zeroed after minor changes in pressure, temperature, or installation.