Abstract: A wafer probe station is equipped with an integrated environment control enclosure substantially surrounding a supporting surface for holding a test device, such enclosure limiting fluid communication between the interior and exterior of the enclosure and preferably also providing EMI shielding and a dark environment. The limited communication between the interior and exterior of the enclosure is kept substantially constant despite positioning movement of either the supporting surface or probe holders. The positioning mechanisms for the supporting surface and probe holders each have portions located at least partially outside of the enclosure for transferring movement mechanically to the surface or holders, respectively.

Abstract: A wafer probe station is equipped with a compact, integrated controlled-environment enclosure providing EMI shielding, substantially hermetic sealing for a dry purge gas for low-temperature testing, and a dark environment. The sealing isolation of the wafer chuck and test probe provided by the enclosure is maintained despite the fact that the probe and chuck positioning mechanisms extend partially outside the enclosure, with positioning members extending movably between the interior and exterior of the enclosure. Sealing is maintained by movable sealing members at the locations where the positioning members penetrate the enclosure.