Abstract: The present invention relates to an active compound combination comprising (a) a 1,3,5 triazine herbicide and (b) pelargonic acid or a derivative thereof, a composition comprising the active compound combination as well as methods for controlling unwanted plants using said combination.

Abstract: The present invention relates to a method for additive manufacturing of a 3D-structured form and to a device for additive manufacturing of a 3D-structured form.

Abstract: Disclosed is a method of conducting chemical reactions below the diffraction limit. The method comprises providing a composition comprising or consisting of at least one photoenol, initiating a reaction which emanates from the photoenol at a selected site by irradiation with light of a first, photoenol-activating wavelength, and concurrently or thereafter, suppressing the reaction emanating from the photoenol in the immediate vicinity of the selected site by irradiation with light of a second, photoenol-deactivating wavelength which creates an interference pattern having an intensity minimum or zero intensity at the selected site.

Abstract: Provided are systems and methods to generate single-cycle THz pulses from a few tens of nanometers thin layer of split ring resonators (SRRs) via optical rectification of femtosecond laser pulses. The emitted THz radiation, with a spectrum ranging from about 0.1 to 4 THz, arises exclusively from pumping the magnetic-dipole resonance of SRRs around 200 THz. This resonant enhancement, together with pump polarization dependence and power scaling of the THz emission, underpins the nonlinearity from optically induced circulating currents in SRRs, with a huge effective nonlinear susceptibility of 0.8×10?16 m2/V that far exceeds surface nonlinearities of both thin films and bulk organic/inorganic crystals and sheet nonlinearities of non-centrosymmetric materials such as ZnTe.

Abstract: The present invention is related to an integrated optical circuit, in particular, to an optical-field writable array, as well as to methods for its manufacturing and reconfiguring. The integrated optical circuit comprises at least one nanophotonic device and at least one photonic wire, wherein the nanophotonic device comprises a substrate equipped with at least one reception for at least one external connector, wherein the reception is coupled to at least one connector waveguide, and at least one set of nano-optic components, wherein the nano-optic component is one of a nanophotonic waveguide or a nanophotonic component, wherein the nano-photonic component is nano-optically coupled to at least one nanophotonic waveguide, wherein at least one of the nanophotonic waveguides is selectively coupleable to at least one of the connector waveguides, wherein the photonic wire connects at least one of the nanophotonic waveguides to at least one of the connector waveguides.

Abstract: Provided are systems and methods to generate single-cycle THz pulses from a few tens of nanometers thin layer of split ring resonators (SRRs) via optical rectification of femtosecond laser pulses. The emitted THz radiation, with a spectrum ranging from about 0.1 to 4 THz, arises exclusively from pumping the magnetic-dipole resonance of SRRs around 200 THz. This resonant enhancement, together with pump polarization dependence and power scaling of the THz emission, underpins the nonlinearity from optically induced circulating currents in SRRs, with a huge effective nonlinear susceptibility of 0.8×10?16 m2/V that far exceeds surface nonlinearities of both thin films and bulk organic/inorganic crystals and sheet nonlinearities of non-centrosymmetric materials such as ZnTe.

Abstract: Second-order optical nonlinear material arranged on a substrate, wherein the second-order optical nonlinear material comprises at least two different materials arranged in layers on the substrate. The layers are arranged on each other in a predetermined order based on the type of material and/or orientation of the layer. The predetermined order is chosen so that the layers of the at least two different materials possess no macroscopic centrosymmetry with respect to their material and/or orientation.

Abstract: The present invention is related to an integrated optical circuit, in particular, to an optical-field writable array, as well as to methods for its manufacturing and reconfiguring. The integrated optical circuit comprises at least one nanophotonic device and at least one photonic wire, wherein the nanophotonic device comprises a substrate equipped with at least one reception for at least one external connector, wherein the reception is coupled to at least one connector waveguide, and at least one set of nano-optic components, wherein the nano-optic component is one of a nanophotonic waveguide or a nanophotonic component, wherein the nano-photonic component is nano-optically coupled to at least one nanophotonic waveguide, wherein at least one of the nanophotonic waveguides is selectively coupleable to at least one of the connector waveguides, wherein the photonic wire connects at least one of the nanophotonic waveguides to at least one of the connector waveguides.

Abstract: The invention relates to a device for determining the position of a first shaft (10) and of a second shaft (12) that is joined to the first shaft by means of a coupling (14), with respect to each other, having a first measurement unit being placed on a circumferential surface of the first shaft and a second measurement unit being placed on a circumferential surface of the second shaft, wherein at least one of the two measurement units has means (20) for producing at least one light beam bundle (22) and at least one of the two measurement units has detection means (24, 25, 26) in order to detect the impingement position of the light beam bundle on at least one detection area (24, 25, 26).

Abstract: An embodiment of the present invention relates to a method of fabricating an optical device, the method comprising the steps of: depositing a photoresist layer on a carrier, said photoresist layer containing at least one optical component, determining the position of the at least one optical component inside the photoresist layer before exposing the photoresist layer to a first radiation, said first radiation being capable of transforming the photoresist layer from an unmodified state to a modified state, elaborating a device pattern based on the position of the at least one optical component, and fabricating the elaborated device pattern by locally exposing the photoresist layer to the first radiation and locally transforming the photoresist layer from the unmodified state to the modified state.

Abstract: An embodiment of the present invention relates to a method of fabricating an optical device, the method comprising the steps of: depositing a photoresist layer on a carrier, said photoresist layer containing at least one optical component, determining the position of the at least one optical component inside the photoresist layer before exposing the photoresist layer to a first radiation, said first radiation being capable of transforming the photoresist layer from an unmodified state to a modified state, elaborating a device pattern based on the position of the at least one optical component, and fabricating the elaborated device pattern by locally exposing the photoresist layer to the first radiation and locally transforming the photoresist layer from the unmodified state to the modified state.

Abstract: The invention relates to a device for determining the position of a first shaft (10) and of a second shaft (12) that is joined to the first shaft by means of a coupling (14), with respect to each other, having a first measurement unit being placed on a circumferential surface of the first shaft and a second measurement unit being placed on a circumferential surface of the second shaft, wherein at least one of the two measurement units has means (20) for producing at least one light beam bundle (22) and at least one of the two measurement units has detection means (24, 25, 26) in order to detect the impingement position of the light beam bundle on at least one detection area (24, 25, 26).

Abstract: An optical arrangement has a laser configured to emit a laser beam, an amplitude mask and a focusing element. The amplitude mask is disposed between the laser and the focusing element in a path of the laser beam such that the laser beam hits the amplitude mask before being modified by the focusing element so as to direct the laser beam to a focal point within a photosensitive material.

Abstract: The invention relates to a process for producing a photonic crystal which consists of a material of high refractive index, comprising the following process steps: a) providing a polymer structure with crosslinked air pores, whose surface has empty interstitial sites, b) applying a homogeneous, isotropic thin coating material to the surface of the polymer structure, c) introducing a high-index material, d) opening up a route to the polymer or to the coating material applied in step b), e) removing the layer applied in step b), f) removing the polymeric structure.

Abstract: An optical arrangement has a laser configured to emit a laser beam, an amplitude mask and a focusing element. The amplitude mask is disposed between the laser and the focusing element in a path of the laser beam such that the laser beam hits the amplitude mask before being modified by the focusing element so as to direct the laser beam to a focal point within a photosensitive material.

Abstract: A method of using a chemical compound as an etchant for the removal of unmodified areas of a chalcogenide-based glass, while leaving the imagewise modified areas un-removed, wherein the compound contains a secondary amine, R1 R2 NH, with R1 and/or R2 having a sterically bulky group with more than 5 atoms.

Abstract: The invention relates to a process for producing photonic crystals by first providing an inorganic photoresist which, on illumination with energy greater than the electronic band gap of the photoresist, exhibits a phase alteration. Illumination of the photoresist with a laser beam whose energy is lower than the electronic band gap of the photoresist but whose intensity at the focal point is so high that nonlinear effects occur there nevertheless results in a phase alteration in the photoresist. Thereafter, the illuminated photoresist is exposed to an etching solution which preferentially dissolves one phase of the photoresist, and the developed photoresist is finally removed therefrom as a photonic crystal. Inorganic photonic crystals produced by the process according to the invention are suitable for completely optical systems, circuits and components for optical telecommunication or computer systems.

Abstract: The invention relates to an optical element, a method for the production thereof, and the usage thereof as an isolator or polarizer. An inventive optical element for a frequency window of the electromagnetic spectrum comprises a first component which has the function of a quarter wavelength plate, and a second component joined thereto which has a circular dichroism. When the first component is exposed to a linearly polarized wave, the optical element can be used as an optical isolator. When, however, the second component is exposed to the linearly polarized wave, the optical element can be used as an optical polarizer. An inventive optical element which is used as an optical isolator can be deployed in laser systems to reduce or suppress the feedback of the laser. In addition, windows can be thus produced which in a specific frequency window are transparent in only one direction. Unidirectional thermal insulation is thereby produced for the infared wavelength region.

Abstract: The invention relates to a process for producing a photonic crystal which consists of a material of high refractive index, comprising the following process steps: a) providing a polymer structure with crosslinked air pores, whose surface has empty interstitial sites, b) applying a homogeneous, isotropic thin coating material to the surface of the polymer structure, c) introducing a high-index material, d) opening up a route to the polymer or to the coating material applied in step b), e) removing the layer applied in step b), f) removing the polymeric structure.

Abstract: The process as claimed in the invention for alignment of machines, machine elements or the like, especially of pipes or hollow cylinders is carried out by means of the pertinent devices such that in one of two measurement phases with the light transmitting and receiving device (20) fixed, rotation of the reflector prism (60) takes place in at least 3 optionally selectable rotary positions together with the pertinent data acquisition, and in the other of the two measurement phases with the reflector prism (60) fixed, rotation of the light transmitting and receiving device (20) takes place in either 2 predefined rotary locations at a right angle to one another, or 3 or more optionally selectable rotary positions together with the pertinent data acquisition.