Abstract: The invention relates to a method for producing a large variety of photoresist structures, wherein a volume of photosensitive material (5) is exposed at least once by means of at least two light beams (1, 2), which are superposed inside the photosensitive material (5), and is subsequently subjected to a developing process, wherein the light beams (1, 2) penetrate at least one transparent optical element (3). The optical element (3) is a polyhedron with planar or curved surfaces which largely prevents refraction of the light beams on the surface of the volume of photosensitive material (5) when the beams are fed-in and/or fed-out of the volume of photosensitive material (5), so that the angle of refraction for the light beams (1, 2) can be greater in the volume of photosensitive material (5) than the critical angle of the total reflection, which has a limiting effect without optical element (3).

Abstract: A method of using a chemical compound as an etchant for the removal of unmodified areas of a chalcogenide-based glass, while leaving the imagewise modified areas un-removed, wherein the compound contains a secondary amine, R1 R2 NH, with R1 and/or R2 having a sterically bulky group with more than 5 atoms.

Abstract: The invention relates to a process for producing photonic crystals by first providing an inorganic photoresist which, on illumination with energy greater than the electronic band gap of the photoresist, exhibits a phase alteration. Illumination of the photoresist with a laser beam whose energy is lower than the electronic band gap of the photoresist but whose intensity at the focal point is so high that nonlinear effects occur there nevertheless results in a phase alteration in the photoresist. Thereafter, the illuminated photoresist is exposed to an etching solution which preferentially dissolves one phase of the photoresist, and the developed photoresist is finally removed therefrom as a photonic crystal. Inorganic photonic crystals produced by the process according to the invention are suitable for completely optical systems, circuits and components for optical telecommunication or computer systems.

Abstract: The invention relates to a process for producing a three-dimensional photonic crystal which consists of a material with high refractive index. To this end, a photonic crystal which consists of a polymer is first provided, through whose surface there are empty interstitial sites. As a result of introduction of a filler into the interstitial sites, a network forms there from the filler. After the removal of the polymer, cavities form in the network formed from the filler, into which the material with high refractive index is introduced, so that a structure of the material with high refractive index forms therein. After the removal of the filler, the structure of the material with high refractive index remains, which can be removed as the photonic crystal which consists of a material with high refractive index. Photonic crystals produced by the process according to the invention have complete band gaps in the region of telecommunications wavelengths.

Abstract: The process as claimed in the invention for alignment of machines, machine elements or the like, especially of pipes or hollow cylinders is carried out by means of the pertinent devices such that in one of two measurement phases with the light transmitting and receiving device (20) fixed, rotation of the reflector prism (60) takes place in at least 3 optionally selectable rotary positions together with the pertinent data acquisition, and in the other of the two measurement phases with the reflector prism (60) fixed, rotation of the light transmitting and receiving device (20) takes place in either 2 predefined rotary locations at a right angle to one another, or 3 or more optionally selectable rotary positions together with the pertinent data acquisition.

Abstract: The invention relates to a method for producing a large variety of photoresist structures, wherein a volume of photosensitive material (5) is exposed at least once by means of at least two light beams (1, 2), which are superposed inside the photosensitive material (5), and is subsequently subjected to a developing process, wherein the light beams (1, 2) penetrate at least one transparent optical element (3). The optical element (3) is a polyhedron with planar or curved surfaces which largely prevents refraction of the light beams on the surface of the volume of photosensitive material (5) when the beams are fed-in and/or fed-out of the volume of photosensitive material (5), so that the angle of refraction for the light beams (1, 2) can be greater in the volume of photosensitive material (5) than the critical angle of the total reflection, which has a limiting effect without optical element (3).

Abstract: A system and method for detecting a soft foot condition of one or more machines. Several measurements of a soft foot condition of a machine to be tested are made and the numerical output of the measuring device is stored in a memory of the device of the present invention. This information is used to systematically diagnose (or assist in diagnosing) possible causes of such soft foot condition and to provide general or numerical advice on possible corrective action. Such advice will be systematically derived by a computer and will relate to remedies considered to be most effective or important, and will be provided to the operator of such instrument either by a readout on a screen or a display of an instrument employed for this purpose.