Patents by Inventor Masaaki Iwai

Masaaki Iwai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170244201
    Abstract: The present invention provides a protective element including (i) a PTC element having an opening passing through in the thickness direction, and (ii) a first electrode and a second electrode positioned on both main surfaces of the PTC element, the protective element characterized in that the first electrode extends from a main surface of the PTC element over an edge thereof and into the opening. A protective element of the present invention does not prevent the PTC element from expanding even when secured by a screw or caulking.
    Type: Application
    Filed: September 8, 2015
    Publication date: August 24, 2017
    Applicant: Littelfuse Japan G.K.
    Inventors: Arata Tanaka, Masaaki Iwai, Toshiya Ikeno, Tsuyoshi Takizawa
  • Publication number: 20170076900
    Abstract: The present invention proposes a protection device which has a large rated voltage and a large rated current, which is capable of sufficiently suppressing arc generation during activation, and which is also capable of providing suitable protection against overcurrent due to short circuiting or the like of a main circuit. The protection device of the present invention includes (i) a protection element which includes a first thermal fuse and a resistor, and in which the resistor generates heat as a result of current passing through the resistor when there are abnormalities, and the first thermal fuse is activated due to this heat and interrupts the current, (ii) a PTC element and a second thermal fuse which are electrically connected in parallel to the first thermal fuse and which are electrically connected in series to each other, and (iii) a current fuse which is electrically connected in series to the first thermal fuse.
    Type: Application
    Filed: March 4, 2015
    Publication date: March 16, 2017
    Applicant: c/o Littelfuse Japan G.K.
    Inventors: Masaaki IWAI, Takayuki YOKOTA
  • Publication number: 20160241012
    Abstract: The present invention provides a protection device that can more surely protect an electronic or an electric apparatus even when an inrush current value is large and its magnitude has large dispersion, and that has a recovery property. The protection device of the present invention includes a PTC component; a resistive component; and a first terminal and a second terminal, wherein the first terminal, the PTC component, the resistive component, and the second terminal are electrically connected in series in this order.
    Type: Application
    Filed: September 24, 2014
    Publication date: August 18, 2016
    Applicant: Tyco Electronics Japan G.K.
    Inventors: Arata Tanaka, Masaaki Iwai, Tsuyoshi Takizawa
  • Patent number: 7222328
    Abstract: A semiconductor integrated circuit design tool includes a reference data defining module configured to define design data of one of a plurality of transistors implementing the semiconductor integrated circuit as reference data, a simulator configured to simulate each effective channel length of the transistors, based on the design data and a reference channel length based on the reference data, and an adjuster configured to adjust gate lengths of gate electrodes of the transistors to reduce a difference between the effective channel length and the reference channel length.
    Type: Grant
    Filed: August 10, 2005
    Date of Patent: May 22, 2007
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Ryoji Hasumi, Masaaki Iwai
  • Publication number: 20060038171
    Abstract: A semiconductor integrated circuit design tool includes a reference data defining module configured to define design data of one of transistors implementing the semiconductor integrated circuit as reference data, a simulator configured to simulate on each effective channel length of the transistors, based on the design data and a reference channel length based on the reference data, and an adjuster configured to adjust gate lengths of gate electrodes of the transistors to reduce a difference between the effective channel length and the reference channel length.
    Type: Application
    Filed: August 10, 2005
    Publication date: February 23, 2006
    Inventors: Ryoji Hasumi, Masaaki Iwai
  • Patent number: 5256593
    Abstract: For making an isolation region on a semiconductor substrate without forming an unwanted bird beak, after forming an insulating film on the semiconductor substrate, the substate surface is covered with a resist mask. An LPD SiO.sub.2 film is deposited on the unmasked portion of the substrate surface, using a hydrofluoric acid solution containing silicon dioxide so as to be supersaturated. Thereafter, the mask is removed from the substrate surface. Further, after a groove is formed in the semiconductor substrate, it may be filled with the LPD SiO.sub.2 film to provide the isolation region in the substrate.
    Type: Grant
    Filed: October 2, 1992
    Date of Patent: October 26, 1993
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Masaaki Iwai