Patents by Inventor Masaaki Kotake

Masaaki Kotake has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemically amplified positive resist composition and pattern forming process
    Patent number: 9720323
    Abstract: A resist composition comprising a resin adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium or iodonium salt of nitrogen-containing carboxylic acid has a high resolution. By lithography, a pattern with minimal LER can be formed.
    Type: Grant
    Filed: February 16, 2016
    Date of Patent: August 1, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaaki Kotake, Takayuki Fujiwara, Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe
  • POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, LAMINATE, PATTERNING PROCESS, AND COMPOUND
    Publication number: 20170210836
    Abstract: The present invention provides a polymer compound containing a repeating unit shown by the following general formula (1). There can be provided a polymer compound usable in a negative resist composition that can achieve high resolution of 50 nm or less and small LER and cause very few defects, a negative resist composition using the polymer compound, and a patterning process using the negative resist composition.
    Type: Application
    Filed: January 5, 2017
    Publication date: July 27, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke DOMON, Koji HASEGAWA, Keiichi MASUNAGA, Masaaki KOTAKE
  • POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, LAMINATE, AND RESIST PATTERNING PROCESS
    Publication number: 20170037167
    Abstract: A polymer compound containing a repeating unit shown by the formula (1c) and one or more repeating units selected from a repeating unit shown by the formula (2) and a repeating unit shown by the formula (3), wherein Mb+ represents a sulfonium cation shown by the formula (a) or an iodonium cation shown by the formula (b), This polymer compound is suitable as a base resin of a resist composition capable of forming a resist film that allows pattern formation with extremely high resolution, small LER, and excellent rectangularity.
    Type: Application
    Filed: July 11, 2016
    Publication date: February 9, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke DOMON, Satoshi WATANABE, Keiichi MASUNAGA, Masaaki KOTAKE
  • CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION USING NOVEL ONIUM SALT AND RESIST PATTERN FORMING PROCESS
    Publication number: 20160299428
    Abstract: A chemically amplified negative resist composition is defined as comprising (A) an onium salt having an anion moiety which is a nitrogen-containing carboxylate of fused ring structure, (B) a base resin, and (C) a crosslinker. The resist composition is effective for controlling acid diffusion during the exposure step, exhibits a very high resolution during pattern formation, and forms a pattern with minimal LER.
    Type: Application
    Filed: April 8, 2016
    Publication date: October 13, 2016
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Satoshi Watanabe, Masaaki Kotake, Daisuke Domon, Takayuki Fujiwara
  • CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
    Publication number: 20160246175
    Abstract: A resist composition comprising a resin adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium or iodonium salt of nitrogen-containing carboxylic acid has a high resolution. By lithography, a pattern with minimal LER can be formed.
    Type: Application
    Filed: February 16, 2016
    Publication date: August 25, 2016
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaaki Kotake, Takayuki Fujiwara, Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe