Patents by Inventor Masaaki Nakabayashi

Masaaki Nakabayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100142053
    Abstract: An element includes a first resin layer and a second resin layer disposed between a first glass lens substrate and a second glass lens substrate, a boundary surface between the first resin layer and the second resin layer having a diffraction grating shape including a plurality of inclined surfaces and wall surfaces. The second resin layer is composed of a fluororesin in which fine metal oxide particles are dispersed. Since a refractive index distribution easily occurs in this material during curing by application of ultraviolet light, by applying ultraviolet light substantially perpendicular to the inclined surfaces of the diffraction grating shape, a refractive index distribution is formed in the thickness direction perpendicularly to the inclined surfaces.
    Type: Application
    Filed: December 4, 2009
    Publication date: June 10, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Masaaki Nakabayashi
  • Publication number: 20100069439
    Abstract: Disclosed is a microorganism control agent containing not less than 1% by weight but less than 10% by weight of N,N?-hexamethylenebis(4-carbamoyl-1-decylpyridinium bromide), not less than 35% by weight but less than 60% by weight of at least one alcohol having 2 or 3 carbon atoms, water and an acid.
    Type: Application
    Filed: November 13, 2007
    Publication date: March 18, 2010
    Applicant: Japan EnviroChemicals, Ltd.
    Inventor: Masaaki Nakabayashi
  • Publication number: 20100053987
    Abstract: A lighting device for a vehicle is provided. The lighting device includes a projection lens disposed on an optical axis and having a focal line, a first light emitting device disposed on a rear side of the focal line, a reflector which reflects light toward the focal line; a shade which shields a part of the light; a second light emitting device disposed on a rear side of the first light emitting device; and a light guide. The light guide includes an incident portion into which light emitted from the second light emitting device is introduced, a light guiding portion which guides the light, a shielding portion which forms a part of the shade, and an emitting portion coupled to the shielding portion and disposed on the focal line or in a vicinity of the focal line. The emitting portion emits the light guided by the light guiding portion.
    Type: Application
    Filed: September 1, 2009
    Publication date: March 4, 2010
    Applicant: KOITO MANUFACTURING CO., LTD.
    Inventor: Masaaki NAKABAYASHI
  • Patent number: 7665872
    Abstract: A first LED unit, a first reflector, a second LED unit, a second reflector, and a light source mount which supports the first LED unit and the second LED unit are provided in a light chamber. The first reflector is formed integrally with a projection lens and forwardly reflects direct light outputted from a first LED to the central axis of the lens. The second reflector is formed integrally with the projection lens and forwardly reflects direct light outputted from a second LED. The light source mount has a fixing portion adapted to perform the positioning of the projection lens, the first reflector and the second reflector, which are formed integrally with a connecting member, in the direction of the central axis of the lens. The light source mount also has a positioning projection and positioning recesses, which are adapted to perform the positioning of the projection lens, the first reflector and the second reflector in a direction perpendicular to the central axis.
    Type: Grant
    Filed: January 26, 2007
    Date of Patent: February 23, 2010
    Assignee: Koito Manufacturing Co., Ltd.
    Inventor: Masaaki Nakabayashi
  • Publication number: 20090316331
    Abstract: A first electrode film containing TiAlN and a main dielectric film containing tantalum oxide are formed over a semiconductor substrate. Anneal is performed in the state that the first electrode film and the main dielectric film are formed, to react aluminum (Al) in the first electrode film with oxygen (O) in the main dielectric film and form a subsidiary dielectric film containing aluminum oxide at an interface between the first electrode film and the main dielectric film. A second electrode film is formed facing the first electrode film via the main dielectric film and the subsidiary dielectric film.
    Type: Application
    Filed: February 4, 2009
    Publication date: December 24, 2009
    Applicant: FUJITSU MICROELECTRONICS LIMITED
    Inventor: Masaaki NAKABAYASHI
  • Patent number: 7550302
    Abstract: The present invention provides a method of manufacturing a semiconductor device. The method includes the steps of forming a first interlayer insulating film over a silicon substrate; forming a first conductive film on the first interlayer insulating film; forming a first ferroelectric film, which is crystallized, on the first conductive film; annealing the first ferroelectric film; after the annealing, forming, on the first ferroelectric film, a second ferroelectric film made of an amorphous material or a microcrystalline material; forming a second conductive film on the second ferroelectric film; and forming a capacitor by patterning the first and second conductive films and the first and second ferroelectric films.
    Type: Grant
    Filed: October 30, 2006
    Date of Patent: June 23, 2009
    Assignee: Fujitsu Microelectronics Limited
    Inventors: Wensheng Wang, Masaaki Nakabayashi, Katsuyoshi Matsuura
  • Publication number: 20080003700
    Abstract: The present invention provides a method of manufacturing a semiconductor device. The method includes the steps of forming a first interlayer insulating film over a silicon substrate; forming a first conductive film on the first interlayer insulating film; forming a first ferroelectric film, which is crystallized, on the first conductive film; annealing the first ferroelectric film; after the annealing, forming, on the first ferroelectric film, a second ferroelectric film made of an amorphous material or a microcrystalline material; forming a second conductive film on the second ferroelectric film; and forming a capacitor by patterning the first and second conductive films and the first and second ferroelectric films.
    Type: Application
    Filed: October 30, 2006
    Publication date: January 3, 2008
    Applicant: FUJITSU LIMITED
    Inventors: Wensheng WANG, Masaaki Nakabayashi, Katsuyoshi Matsuura
  • Patent number: 7294293
    Abstract: A method for manufacturing a diffraction optical element, according to the present invention, includes the steps of: supplying a photocurable resin onto a surface of a light-transmitting molding die in which a grating pattern is formed on the surface; irradiating the photocurable resin with light having a first wavelength through the molding die so as to cure a part of the photocurable resin; irradiating the photocurable resin with light having a second wavelength, which is longer than the firs wavelength, through the molding die so as to cure at least a part of the photocurable resin; and removing the cured resin from the molding die.
    Type: Grant
    Filed: May 15, 2003
    Date of Patent: November 13, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventor: Masaaki Nakabayashi
  • Publication number: 20070177401
    Abstract: A first LED unit, a first reflector, a second LED unit, a second reflector, and a light source mount which supports the first LED unit and the second LED unit are provided in a light chamber. The first reflector is formed integrally with a projection lens and forwardly reflects direct light outputted from a first LED to the central axis of the lens. The second reflector is formed integrally with the projection lens and forwardly reflects direct light outputted from a second LED. The light source mount has a fixing portion adapted to perform the positioning of the projection lens, the first reflector and the second reflector, which are formed integrally with a connecting member, in the direction of the central axis of the lens. The light source mount also has a positioning projection and positioning recesses, which are adapted to perform the positioning of the projection lens, the first reflector and the second reflector in a direction perpendicular to the central axis.
    Type: Application
    Filed: January 26, 2007
    Publication date: August 2, 2007
    Applicant: KOITO MANUFACTURING CO., LTD.
    Inventor: Masaaki Nakabayashi
  • Patent number: 7236302
    Abstract: In a diffraction optical element in which a plurality of diffraction gratings are laminated and the maximum difference of length among optical paths of light passing through the plurality of diffraction gratins is integer multiples of a plurality of wavelengths, diffraction efficiency is further improved and even when an environmental condition changes, a deviation of the diffraction efficiency is reduced. More specifically, a diffraction optical element is disclosed which includes, as the plurality of diffraction gratings, a first diffraction grating made of a resin material, in which inorganic fine particles are dispersed, and a second diffraction grating made of a material whose organic matter composition is substantially same as that of the resin material.
    Type: Grant
    Filed: April 27, 2005
    Date of Patent: June 26, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takehiko Nakai, Hideo Ukuda, Masaaki Nakabayashi
  • Patent number: 7029984
    Abstract: A method is disclosed for fabricating a semiconductor device having a memory employing a ferroelectric capacitor in which the orientation of the ferroelectric film is controlled. The method for fabricating the semiconductor device includes a first film deposition process for forming a first ferroelectric layer, and a second film deposition process for forming a second ferroelectric layer on the first ferroelectric layer. The film deposition temperature of the first film deposition process is set to at least 600° C.
    Type: Grant
    Filed: May 25, 2005
    Date of Patent: April 18, 2006
    Assignee: Fujitsu Limited
    Inventors: Yoshimasa Horii, Masaaki Nakabayashi, Masaki Kurasawa, Kou Nakamura, Kazuaki Takai, Hideyuki Noshiro, Shigeyoshi Umemiya
  • Publication number: 20050243423
    Abstract: In a diffraction optical element in which a plurality of diffraction gratings are laminated and the maximum difference of length among optical paths of light passing through the plurality of diffraction gratins is integer multiples of a plurality of wavelengths, diffraction efficiency is further improved and even when an environmental condition changes, a deviation of the diffraction efficiency is reduced. More specifically, a diffraction optical element is disclosed which includes, as the plurality of diffraction gratings, a first diffraction grating made of a resin material, in which inorganic fine particles are dispersed, and a second diffraction grating made of a material whose organic matter composition is substantially same as that of the resin material.
    Type: Application
    Filed: April 27, 2005
    Publication date: November 3, 2005
    Inventors: Takehiko Nakai, Hideo Ukuda, Masaaki Nakabayashi
  • Publication number: 20050237614
    Abstract: A diffractive optical element having plural diffraction grating surfaces accumulated, wherein a pair of diffraction grating surfaces are positioned so that a protrusion and/or a recess formed on an outside of one diffraction grating surface engages with a recess and/or a protrusion formed on an outside of the other diffraction grating surface, and wherein the pair of diffraction grating surfaces are defined on materials having different refractive indices and different dispersions and being formed into a kinoform, or a shape and a height of blazed or binary, close to it, such that a largest optical path difference to be applied to light rays passing through the diffraction grating surfaces with respect to plural wavelengths becomes equal to a multiple, by an integral number, of the wavelength.
    Type: Application
    Filed: June 22, 2005
    Publication date: October 27, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Masaaki Nakabayashi, Junji Terada, Senichi Hayashi
  • Publication number: 20050215006
    Abstract: A method is disclosed for fabricating a semiconductor device having a memory employing a ferroelectric capacitor in which the orientation of the ferroelectric film is controlled. The method for fabricating the semiconductor device includes a first film deposition process for forming a first ferroelectric layer, and a second film deposition process for forming a second ferroelectric layer on the first ferroelectric layer. The film deposition temperature of the first film deposition process is set to at least 600° C.
    Type: Application
    Filed: May 25, 2005
    Publication date: September 29, 2005
    Applicant: FUJITSU LIMITED
    Inventors: Yoshimasa Horii, Masaaki Nakabayashi, Masaki Kurasawa, Kou Nakamura, Kazuaki Takai, Hideyuki Noshiro, Shigeyoshi Umemiya
  • Patent number: 6908575
    Abstract: The object of this invention is to provide a mold releasing method for a diffraction optical element, which enables stable mass production of a diffraction optical element free from deformation or damage due to mold release. In order to achieve this object, a mold releasing method for a diffraction optical element, of releasing from a mold a diffraction optical element formed by using the mold and having a convex lens function, includes the steps of pressing a central portion of the diffraction optical element toward the mold, and pushing a periphery of the diffraction optical element in a direction to separate from the mold, so that mold release progresses from the periphery toward the central portion of the diffraction optical element. The method also includes the step of adjusting the balance with a plurality of hydraulic cylinders without pressing the central portion, so that mold release progresses toward the center.
    Type: Grant
    Filed: July 2, 2002
    Date of Patent: June 21, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventor: Masaaki Nakabayashi
  • Patent number: 6736999
    Abstract: A method of manufacturing an optical element is disclosed which comprises the steps of providing a molding material onto a mold; giving a local temperature difference to an interface between the mold and the molding material to separate the mold and the molding material from each other in an area; and successively enlarging the area of separation made by the temperature difference to entirely separate the mold and the molding material from each other.
    Type: Grant
    Filed: August 14, 2001
    Date of Patent: May 18, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventor: Masaaki Nakabayashi
  • Patent number: 6670105
    Abstract: A method of manufacturing a micro-structure having a plurality of step-like elements, includes the steps of etching a first region of a substrate, corresponding to a lowest step of the step-like element, with an appropriate depth, whereby a surface of the lowest step of the step-like element is defined, and etching, subsequently, a second region of the substrate, corresponding to another step of the step-like element, with an appropriate depth, whereby a surface of that step of the step-like element is defined.
    Type: Grant
    Filed: September 17, 1999
    Date of Patent: December 30, 2003
    Assignee: Canon Kabushiki Kaisha
    Inventors: Junji Terada, Masaaki Nakabayashi, Senichi Hayashi
  • Publication number: 20030218803
    Abstract: A method for manufacturing a diffraction optical element, according to the present invention, includes the steps of: supplying a photocurable resin onto a surface of a light-transmitting molding die in which a grating pattern is formed on the surface; irradiating the photocurable resin with light having a first wavelength through the molding die so as to cure part of the photocurable resin; irradiating the photocurable resin with light having a second wavelength, which is longer than the firs wavelength, through the molding die so as to cure at least part of the photocurable resin; and removing the cured resin from the molding die.
    Type: Application
    Filed: May 15, 2003
    Publication date: November 27, 2003
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Masaaki Nakabayashi
  • Patent number: 6610579
    Abstract: A high-dielectric capacitor is formed by using a Ru lower electrode having a (002)-oriented principal surface, by depositing thereon a Ta2O5 film such that the Ta2O5 film has a (100)-principal surface.
    Type: Grant
    Filed: April 26, 2001
    Date of Patent: August 26, 2003
    Assignee: Fujitsu Limited
    Inventors: Jun Lin, Masaaki Nakabayashi
  • Patent number: D572402
    Type: Grant
    Filed: August 1, 2006
    Date of Patent: July 1, 2008
    Assignee: Koito Manufacturing Co., Ltd.
    Inventors: Masaaki Nakabayashi, Yasuo Teranishi