Patents by Inventor Masafumi Yamamoto
Masafumi Yamamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6676527Abstract: When forcibly mounting a fixture attached with a joint boot on an outer circumferential surface of an outer cup, a thick-walled section is pressed between an inclined surface of the outer cup and an annular stepped section of the fixture. Accordingly, the thick-walled section is elastically deformed and in close contact with the inclined surface for effecting sealing function.Type: GrantFiled: January 3, 2002Date of Patent: January 13, 2004Assignee: Honda Giken Kogyo Kabushiki KaishaInventors: Satoru Kudo, Yasuhisa Nagayama, Masafumi Yamamoto
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Patent number: 6677419Abstract: A scaleable and high-yielding method of preparing copolymers that is useful as a component of a radiation sensitive resin composition is provided. The method includes the step of reacting at least one monomer A which is an unsaturated alicyclic monomer and forms a polymer main chain by dissociation of the unsaturated bond, and at least one unsaturated monomer B, which also forms a polymer chain by dissociation of an unsaturated bond, wherein less than two electron-withdrawing groups are directly appended to said unsaturation, and where said monomer B is other than the unsaturated alicyclic monomer and forms a polymer main chain, in the presence of a free radical initiator. The reacting step is carried out in a stoichiometric excess of monomer A as compared to monomer B. By carrying out the reacting step in an excess of monomer A as compared to monomer B, the resultant copolymer will have a greater molar concentration of monomer A than is obtainable using other methods.Type: GrantFiled: November 13, 2002Date of Patent: January 13, 2004Assignees: International Business Machines Corporation, JSR CorporationInventors: Phillip J. Brock, Eiichi Kobayashi, Isao Nishimura, Yukio Nishimura, Thomas I. Wallow, Masafumi Yamamoto
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Publication number: 20030203309Abstract: 1. A radiation-sensitive resin composition comprising: (A) a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid and (B) a photoacid generator.Type: ApplicationFiled: March 13, 2003Publication date: October 30, 2003Inventors: Yukio Nishimura, Hiroyuki Ishii, Masafumi Yamamoto, Isao Nishimura
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Patent number: 6623907Abstract: A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replaced by a t-butoxycarbonyl group, (B) a photoacid generator, and (C-1) a resin insoluble or scarcely soluble in alkali which is protected by an acid-dissociable group and becomes soluble in alkali when the acid-dissociable group dissociates or (C-2) an alkali-soluble resin and an alkali solubility control agent is disclosed. Also disclosed is a negative-tone radiation-sensitive resin composition comprising the low molecular weight compound (A), the photoacid generator (B), an alkali-soluble resin (D), and a compound capable of crosslinking with the alkali-soluble resin in the presence of an acid(E).Type: GrantFiled: February 1, 2001Date of Patent: September 23, 2003Assignee: JSR CorporationInventors: Jun Numata, Aki Suzuki, Hiromichi Hara, Norihiro Natsume, Kiyoshi Murata, Masafumi Yamamoto, Akimasa Soyano, Toru Kajita, Tsutomu Shimokawa
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Patent number: 6506537Abstract: A positive-type radiation-sensitive resin composition is provided. The composition includes: (A) a low-molecular compound comprising a compound having at least one amino group having one or two hydrogen atom(s) bonded to the nitrogen atom; at least one hydrogen atom the amino group has having been substituted with a t-butoxycarbonyl group; (B) a radiation-sensitive acid generator; and (C) a silicon-atom-containing resin comprising an alkali-insoluble or alkali-slightly-soluble resin having been protected with an acid-cleavable group; the resin being capable of turning soluble in alkali upon cleavage of the acid-cleavable group. This radiation-sensitive resin composition is effectively responsive to radiations of various types, has superior sensitivity and resolution and also a superior long-term storage stability, and is useful as a positive-type chemically amplified resist.Type: GrantFiled: June 12, 2001Date of Patent: January 14, 2003Assignee: JSR CorporationInventors: Eiichi Kobayashi, Jun Numata, Mikio Yamachika, Masafumi Yamamoto
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Publication number: 20020132181Abstract: A radiation-sensitive resin composition comprising: (A) an acid-dissociable group-containing resin, insoluble or scarcely soluble in alkali but becoming soluble in alkali when the acid-dissociable group dissociates, and containing recurring units with specific structures and (B) a photoacid generator of the formula (3), 1Type: ApplicationFiled: January 16, 2002Publication date: September 19, 2002Inventors: Yukio Nishimura, Masafumi Yamamoto, Atsuko Kataoka, Toru Kajita
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Publication number: 20020094875Abstract: When forcibly mounting a fixture attached with a joint boot on an outer circumferential surface of an outer cup, a thick-walled section is pressed between an inclined surface of the outer cup and an annular stepped section of the fixture. Accordingly, the thick-walled section is elastically deformed and in close contact with the inclined surface for effecting sealing function.Type: ApplicationFiled: January 3, 2002Publication date: July 18, 2002Inventors: Satoru Kudo, Yasuhisa Nagayama, Masafumi Yamamoto
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Publication number: 20020058201Abstract: A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), 1Type: ApplicationFiled: September 18, 2001Publication date: May 16, 2002Inventors: Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, Toru Kajita, Tsutomu Shimokawa
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Publication number: 20020012872Abstract: A positive-type radiation-sensitive resin composition is provided.Type: ApplicationFiled: June 12, 2001Publication date: January 31, 2002Inventors: Eiichi Kobayashi, Jun Numata, Mikio Yamachika, Masafumi Yamamoto
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Publication number: 20020009668Abstract: A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed.Type: ApplicationFiled: June 14, 2001Publication date: January 24, 2002Inventors: Yukio Nishimura, Noboru Yamahara, Masafumi Yamamoto, Toru Kajita, Tsutomu Shimokawa, Hiroshi Ito
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Publication number: 20010023050Abstract: A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replaced by a t-butoxycarbonyl group, (B) a photoacid generator, and (C-1) a resin insoluble or scarcely soluble in alkali which is protected by an acid-dissociable group and becomes soluble in alkali when the acid-dissociable group dissociates or (C-2) an alkali-soluble resin and an alkali solubility control agent is disclosed. Also disclosed is a negative-tone radiation-sensitive resin composition comprising the low molecular weight compound (A), the photoacid generator (B), an alkali-soluble resin (D), and a compound capable of crosslinking with the alkali-soluble resin in the presence of an acid(E).Type: ApplicationFiled: February 1, 2001Publication date: September 20, 2001Inventors: Jun Numata, Aki Suzuki, Hiromichi Hara, Norihiro Natsume, Kiyoshi Murata, Masafumi Yamamoto, Akimasa Soyano, Toru Kajita, Tsutomu Shimokawa
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Patent number: 6232116Abstract: Oral or peroral administration, including intragastrically, of killed whole pneumococci, lysate of pneumococci and isolated and purified PspA, as well as immunogenic fragments thereof, particularly when administered with an adjuvant such as cholera toxin provides protection in a host, animal or human, against pneumococcal infection, including colonization, and systemic infection, such as sepsis. The ability to elicit protection against pneumococcal colonization in a host prevents carriage among immunized individuals, which can lead to elimination of disease from the population as a whole.Type: GrantFiled: June 7, 1995Date of Patent: May 15, 2001Assignee: University of Alabama at Birmingham Research FoundationInventors: David E. Briles, Larry S. McDaniel, Masafumi Yamamoto, Hiroshi Kiyono
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Patent number: 6231870Abstract: Oral or peroral administration, including intragastrically, of killed whole pneumococci, lysate of pneumococci and isolated and purified PspA, as well as immunogenic fragments thereof, particularly when administered with an adjuvant such as cholera toxin provides protection in a host, animal or human, against pneumococcal infection, including colonization, and systemic infection, such as sepsis. The ability to elicit protection against pneumococcal colonization in a host prevents carriage among immunized individuals, which can lead to elimination of disease from the population as a whole.Type: GrantFiled: June 2, 1995Date of Patent: May 15, 2001Assignee: UAB Research FoundationInventors: David E. Briles, Larry S. McDaniel, Masafumi Yamamoto, Hiroshi Kiyono
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Patent number: 6180316Abstract: A radiation-sensitive resin composition which comprises, (A) a polymer containing, (a) a recurring unit (I) of the following formula (1): or a recurring unit (I) of the formula (1) and a recurring unit (II) of the following formula (2), and (b) a recurring unit (III) which is derived from a monomer having at least two polymerizable carbon—carbon double bonds by cleavage of the carbon—carbon double bonds, wherein the monomer has, in addition to said at least two polymerizable carbon—carbon double bonds, at least one acid-decomposable divalent group of the following formula (3) or (4), said at least two polymerizable carbon—carbon double bonds being linked via the least one acid-decomposable divalent group of the formula (3) or (4), and (B) a photoacid generator.Type: GrantFiled: January 15, 1999Date of Patent: January 30, 2001Assignee: JSR CorporationInventors: Toru Kajita, Mitsuhito Suwa, Haruo Iwasawa, Masafumi Yamamoto
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Patent number: 6044520Abstract: A vacuum cleaner comprises a floor nozzle housing an agitator for stirring dust, a handle sector containing a dust bag and a fan motor for sucking dust, and a power transmission device for transmitting the driving force of the fan motor to the agitator. The handle sector is tiltably attached to the floor nozzle at a rear section. The power transmission device comprises a driving pulley fixed to the agitator, an idling pulley attached adjacent to the driving pulley and rotating free from the agitator, and a belt provided between the fan motor and one of the driving pulley and the idling pulley. A switching lever is provided for switching the position of the belt to the driving pulley or to the idling pulley, which motion is coupled with the tilting motion of the handle sector. The driving force of the fan motor is conveyed to the agitator in accordance with the tilting motion of the handle sector.Type: GrantFiled: April 29, 1998Date of Patent: April 4, 2000Assignee: Matsushita Electrical Industrial Co., Ltd.Inventor: Masafumi Yamamoto
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Patent number: 6004802Abstract: Oral or peroral administration, including intragastrically, of killed whole pneumococci, lysate of pneumococci and isolated and purified PspA, as well as immunogenic fragments thereof, particularly when administered with an adjuvant such as cholera toxin provides protection in a host, animal or human, against pneumococcal infection, including colonization, and systemic infection, such as sepsis. The ability to elicit protection against pneumococcal colonization in a host prevents carriage among immunized individuals, which can lead to elimination of disease from the population as a whole.Type: GrantFiled: May 30, 1996Date of Patent: December 21, 1999Assignee: University of Alabama at BirminghamInventors: David E. Briles, Larry S. McDaniel, Masafumi Yamamoto, Hiroshi Kiyono
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Patent number: 5934136Abstract: A compression head for a hydraulic compression tool comprises a fixed die and movable dies, the fixed die being mounted on a stationary head attached to a tool body and the movable dies being positioned within the stationary head and actuated by a piston of a pump mechanism equipped in the tool body. The piston is attached at its front end to a guide plate having a center support and two side supports. The guide plate is provided at both front and reverse sides with guide grooves. Each of the movable dies rests on the upper surface of each side support through a roller means, while it is interposed between two guide plates slidably engaging with said guide grooves of each side support. Further, each of the movable dies is supported against the center support by a return spring, which is received at one end by an insertion hole of each movable die and at the other end by a cutout on the center support.Type: GrantFiled: March 6, 1998Date of Patent: August 10, 1999Assignee: Izumi Products CompanyInventors: L'orient Bracher, Masafumi Yamamoto
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Patent number: 5813837Abstract: An axial-flow impeller having a maximum blade width less than 20% of the impeller diameter, the pitch angle at the radial position 0.6 is 12.degree.-22.degree., the width at the tip end portion of the blade is 12-75% of the width at the radial position 0.6, the pitch angle at the tip end portion of the blade is 5.degree.-10.degree. smaller than the pitch angle at the radial position 0.6, the width at the root of the blade is 40% or more of the width at the radial position 0.6, and the pitch angle at the root of the blade is 25.degree.-50.degree.. An axial-flow impeller having a maximum width of the blade 20% or more of the impeller diameter, the radial position of the maximum width portion is 0.4-0.8, the pitch angle of the maximum width portion is 12.degree.-22.degree., the width at the tip end portion of the blade is 12-75% of the maximum width, and the pitch angle at the tip end portion of the blade is 5.degree.-10.degree.Type: GrantFiled: October 17, 1996Date of Patent: September 29, 1998Assignee: Shinko Pantec Kabushiki KaishaInventors: Masafumi Yamamoto, Yukimichi Okamoto
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Patent number: 5453627Abstract: A quantum interference device has semiconductor heterojunctions laminated on a semiconductor substrate for forming a two-dimensional electron gas channel. On the semiconductor heterojunctions are formed a first, a second and a third electrode which, upon the application of a negative voltage, form a depletion region within the semiconductor heterojunctions, thereby making the resulting two-dimensional electron gas channel a quantum wire of a stub structure comprising an entrance and an exit for electron waves, and a stub formed between the entrance and the exit. The second and third electrodes each have a first side substantially parallel to a side of the first electrode. The second and third electrodes also have a second side parallel to each other's second side. On a site near the edge of said stub is provided a fourth electrode for defining the effective length of the stub by a voltage applied thereto.Type: GrantFiled: May 12, 1993Date of Patent: September 26, 1995Assignee: Nippon Telegraph and Telephone CorporationInventors: Kimihisa Aihara, Masafumi Yamamoto, Takashi Mizutani
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Patent number: D408242Type: GrantFiled: January 6, 1998Date of Patent: April 20, 1999Assignee: Izumi Products CompanyInventor: Masafumi Yamamoto