Abstract: The invention provides a method of preparing a biological tissue sample and a method of observing a biological tissue section sample that enable stereoscopic observation of a biological tissue easily and rapidly without destroying a biological tissue piece. The method of observing a biological tissue sample according to the invention is a method in which stereoscopic morphology of a biological tissue sample is observed, and the method includes: cutting out a sample having a thickness of 15 to 50 ?m from a sample block obtained by fixing, dehydrating, and paraffin-embedding a sample cut out from a biological tissue; transferring the sample to a surface-treated slide glass; stretching the sample on the slide glass; performing deparaffinization processing; then, staining the sample with a heavy metal-based staining agent; and observing the stained sample with a scanning electron microscope.

Abstract: The invention provides a method of preparing a biological tissue sample and a method of observing a biological tissue section sample that enable stereoscopic observation of a biological tissue easily and rapidly without destroying a biological tissue piece. The method of observing a biological tissue sample according to the invention is a method in which stereoscopic morphology of a biological tissue sample is observed, and the method includes: cutting out a sample having a thickness of 15 to 50 ?m from a sample block obtained by fixing, dehydrating, and paraffin-embedding a sample cut out from a biological tissue; transferring the sample to a surface-treated slide glass; stretching the sample on the slide glass; performing deparaffinization processing; then, staining the sample with a heavy metal-based staining agent; and observing the stained sample with a scanning electron microscope.

Abstract: Conventional devices have been difficult to use due to insufficient consideration being given to factors such as the cost necessary for diaphragm replacement and the convenience of the work. In the present invention, a diaphragm mounting member installed in a charged particle beam device for radiating a primary charged particle beam through a diaphragm separating a vacuum space and an atmospheric pressure space onto a sample placed in the atmospheric pressure space is provided with a diaphragm installation portion to which a TEM membrane is mounted and a casing fixing portion mounted on a casing of the charged particle beam device. The diaphragm installation portion has a positioning structure for positioning a platform on which the diaphragm is held.

Abstract: Conventional devices have been difficult to use due to insufficient consideration being given to factors such as the cost necessary for diaphragm replacement and the convenience of the work. In the present invention, a diaphragm mounting member installed in a charged particle beam device for radiating a primary charged particle beam through a diaphragm separating a vacuum space and an atmospheric pressure space onto a sample placed in the atmospheric pressure space is provided with a diaphragm installation portion to which a TEM membrane is mounted and a casing fixing portion mounted on a casing of the charged particle beam device. The diaphragm installation portion has a positioning structure for positioning a platform on which the diaphragm is held.

Abstract: In a SEM device which enables observations under an atmospheric pressure, in the event that a diaphragm is damaged during an observation of a sample, air flows into a charged particle optical barrel from the vicinity of the sample, due to the differential pressure between the inside of the charged particle optical barrel under vacuum and the vicinity of the sample under the atmospheric pressure. At this time, the sample may be sucked into the charged particle optical barrel. In this case, a charged particle optical system and a detector are contaminated thereby, which causes performance degradation or failures of the charged particle microscope. For coping therewith, it is necessary to prevent the charged particle optical barrel from being contaminated, without inducing a time lag, with a simple structure.

Abstract: In a SEM device which enables observations under an atmospheric pressure, in the event that a diaphragm is damaged during an observation of a sample, air flows into a charged particle optical barrel from the vicinity of the sample, due to the differential pressure between the inside of the charged particle optical barrel under vacuum and the vicinity of the sample under the atmospheric pressure. At this time, the sample may be sucked into the charged particle optical barrel. In this case, a charged particle optical system and a detector are contaminated thereby, which causes performance degradation or failures of the charged particle microscope. For coping therewith, it is necessary to prevent the charged particle optical barrel from being contaminated, without inducing a time lag, with a simple structure.

Abstract: A charged particle beam device (1) includes a charged particle optical lens barrel (10), a support housing (20) equipped with the charged particle optical lens barrel (10) thereon, and an insertion housing (30) inserted in the support housing (20). A first aperture member (15) is disposed in the vicinity of the center of the magnetic field of an objective lens, and a second aperture member (15) is disposed so as to externally close an opening part provided at the upper side of the insertion housing (30). Further, when a primary charged particle beam (12) is irradiated to a sample (60) arranged under the lower side of the second aperture member (31), secondary charged particles thus emitted are detected by a detector (16).

Abstract: In a charged particle beam device that performs observation of a sample under a gas environment in atmospheric pressure or pressure substantially equal to the atmospheric pressure, a diaphragm that separates an atmospheric pressure space, in which the sample is placed, and a vacuum space in an interior of an electron optical lens barrel is made very thin in order to allow an electron beam to transmit therethrough and damaged with a high possibility. Although at the time of replacing the diaphragm, it is necessary to adjust a position of a diaphragm, it is impossible to easily perform the adjustment of the position of the diaphragm by a conventional method.

Abstract: All of the conventional charged particle beam devices are designed only for the observation at atmospheric pressure or in gas atmosphere at a pressure substantially equal to the atmospheric pressure, and there is no device enabling easy observation using a typical high-vacuum charged particle microscope at atmospheric pressure or in gas atmosphere at a pressure substantially equal to the atmospheric pressure. Such a conventional technique has another problem that the distance between the diaphragm and a sample cannot be controlled, and so it has a high risk of breakage of the diaphragm.

Abstract: All of the conventional charged particle beam devices are designed only for the observation at atmospheric pressure or in gas atmosphere at a pressure substantially equal to the atmospheric pressure, and there is no device enabling easy observation using a typical high-vacuum charged particle microscope at atmospheric pressure or in gas atmosphere at a pressure substantially equal to the atmospheric pressure. Such a conventional technique has another problem that the distance between the diaphragm and a sample cannot be controlled, and so it has a high risk of breakage of the diaphragm.

Abstract: In a charged particle beam device that performs observation of a sample under a gas environment in atmospheric pressure or pressure substantially equal to the atmospheric pressure, a diaphragm that separates an atmospheric pressure space, in which the sample is placed, and a vacuum space in an interior of an electron optical lens barrel is made very thin in order to allow an electron beam to transmit therethrough and damaged with a high possibility. Although at the time of replacing the diaphragm, it is necessary to adjust a position of a diaphragm, it is impossible to easily perform the adjustment of the position of the diaphragm by a conventional method.

Abstract: The ordinary charged particle beam apparatus works on the assumption that signals are detected while its diaphragm and the sample are being positioned close to each other. This structure is not suitable for observing a sample with a prominently uneven surface in a gas atmosphere at atmospheric pressure or at a pressure substantially equal thereto. The present invention provides a charged particle beam apparatus that separates its charged particle optical tube from the space in which the sample is placed. The apparatus includes a detachable diaphragm that lets a primary charged particle beam permeate or pass therethrough. Installed in the space where the sample is placed is a detector that detects secondary particles discharged from the sample irradiated with the primary charged particle beam.

Abstract: A charged particle beam device (1) includes a charged particle optical lens barrel (10), a support housing (20) equipped with the charged particle optical lens barrel (10) thereon, and an insertion housing (30) inserted in the support housing (20). A first aperture member (15) is disposed in the vicinity of the center of the magnetic field of an objective lens, and a second aperture member (15) is disposed so as to externally close an opening part provided at the upper side of the insertion housing (30). Further, when a primary charged particle beam (12) is irradiated to a sample (60) arranged under the lower side of the second aperture member (31), secondary charged particles thus emitted are detected by a detector (16).

Abstract: A scanning electron microscope includes a main scanning electron microscope unit having an electron optical column and a sample chamber, a controller over the main scanning electron microscope unit, a single housing that houses both the main scanning electron microscope unit and the controller, and a bottom plate disposed under the single housing, the main scanning electron microscope unit and the controller. A first leg member is attached to a bottom face of the bottom plate on a side of the controller with a first opening hole provided through the bottom plate on a side of the main scanning electron microscope unit, and a damper is fixed to a bottom face of the main scanning electron microscope unit and disposed through the first opening hole.

Abstract: A scanning electron microscope includes a main scanning electron microscope unit having an electron optical column and a sample chamber, a controller over the main scanning electron microscope unit, a single housing that houses both the main scanning electron microscope unit and the controller, and a bottom plate disposed under the single housing, the main scanning electron microscope unit and the controller. A first leg member is attached to a bottom face of the bottom plate on a side of the controller with a first opening hole provided through the bottom plate on a side of the main scanning electron microscope unit, and a damper is fixed to a bottom face of the main scanning electron microscope unit and disposed through the first opening hole.