Patents by Inventor Masahiko Kato

Masahiko Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11561394
    Abstract: An information display apparatus and an information display method configured to display video information of a virtual image on a windshield of conveyance is provided. The information display apparatus includes: a display configured to display the video information; and a virtual image optical system configured to display a virtual image at a front of the conveyance by reflecting light emitted from the display by means of the windshield. The virtual image optical system includes a concave mirror and an optical element. A reflective film is formed on a reflecting surface of the concave mirror. A protective film for preventing moisture absorption is formed on a facing surface. By forming end surfaces of the two surfaces as a curved surface or an inclined surface and forming them on the end surfaces to block moisture, moisture absorption of plastic is prevented.
    Type: Grant
    Filed: July 18, 2019
    Date of Patent: January 24, 2023
    Assignee: MAXELL, LTD.
    Inventors: Koji Hirata, Masahiko Yatsu, Shuji Kato, Toshinori Sugiyama, Michiaki Abe, Eiji Kawawa, Hiroyuki Kajikawa
  • Publication number: 20230014434
    Abstract: A light-guiding plate includes a resin base having a parallelism P of 5 ?m or less per an area of 50×100 mm2.
    Type: Application
    Filed: September 8, 2022
    Publication date: January 19, 2023
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Haruki KOSHITOUGE, Kazunori UMEDA, Kazuhisa IWASO, Ayaka OGURI, Masahiko ONO, Yukio KATO, Masaki SUGIHARA, Kouji SHIMIZU
  • Patent number: 11515411
    Abstract: According to one embodiment, a semiconductor device includes first to third electrodes, first and second semiconductor layers, a nitride layer, and an oxide layer. A direction from the second electrode toward the first electrode is aligned with a first direction. A position in the first direction of the third electrode is between the first electrode and the second electrode in the first direction. The first semiconductor layer includes first to fifth partial regions. The first partial region is between the fourth and third partial regions in the first direction. The second partial region is between the third and fifth partial regions in the first direction. The nitride layer includes first and second nitride regions. The second semiconductor layer includes first and second semiconductor regions. The oxide layer includes silicon and oxygen. The oxide layer includes first to third oxide regions.
    Type: Grant
    Filed: April 16, 2021
    Date of Patent: November 29, 2022
    Assignees: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
    Inventors: Yosuke Kajiwara, Daimotsu Kato, Masahiko Kuraguchi
  • Publication number: 20220351967
    Abstract: To dry a substrate formed with a pattern on a front surface satisfactorily and with excellent drying performance, a substrate processing method comprises: a liquid film formation step of forming a liquid film of a processing liquid, in which cyclohexanone oxime is dissolved in a solvent, on a front surface of a substrate formed with a pattern by supplying the processing liquid to the front surface of the substrate; a solidified film formation step of forming a solidified film of the cyclohexanone oxime by solidifying the liquid film of the processing liquid; and a sublimation step of removing the solidified film from the front surface of the substrate by sublimating the solidified film.
    Type: Application
    Filed: July 7, 2022
    Publication date: November 3, 2022
    Inventors: Masayuki OTSUJI, Hiroaki TAKAHASHI, Masahiko KATO, Yu YAMAGUCHI, Yuta SASAKI
  • Patent number: 11476336
    Abstract: According to one embodiment, a semiconductor device includes first, second and third electrodes, first and second semiconductor layers, and a first compound member. A position of the third electrode is between a position of the second electrode and a position of the first electrode. The first semiconductor layer includes first, second, third, fourth, and fifth partial regions. The fourth partial region is between the third and first partial regions. The fifth partial region is between the second and third partial regions. The second semiconductor layer includes first, second, and third semiconductor regions. The third semiconductor region is between the first partial region and the first electrode. The first compound member includes first compound portions between the third semiconductor region and the first electrode. A portion of the first electrode is between one of the first compound portions and an other one of the first compound portions.
    Type: Grant
    Filed: February 11, 2020
    Date of Patent: October 18, 2022
    Assignees: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
    Inventors: Hiroshi Ono, Akira Mukai, Yosuke Kajiwara, Daimotsu Kato, Aya Shindome, Masahiko Kuraguchi
  • Patent number: 11417513
    Abstract: To dry a substrate formed with a pattern on a front surface satisfactorily and with excellent drying performance, a substrate processing method comprises: a liquid film formation step of forming a liquid film of a processing liquid, in which cyclohexanone oxime is dissolved in a solvent, on a front surface of a substrate formed with a pattern by supplying the processing liquid to the front surface of the substrate; a solidified film formation step of forming a solidified film of the cyclohexanone oxime by solidifying the liquid film of the processing liquid; and a sublimation step of removing the solidified film from the front surface of the substrate by sublimating the solidified film.
    Type: Grant
    Filed: June 11, 2020
    Date of Patent: August 16, 2022
    Inventors: Masayuki Otsuji, Hiroaki Takahashi, Masahiko Kato, Yu Yamaguchi, Yuta Sasaki
  • Publication number: 20220231155
    Abstract: According to one embodiment, a semiconductor device includes first to third electrodes, first and second semiconductor regions, first and second insulating members. The third electrode includes a first electrode portion. The first electrode portion is between the first electrode and the second electrode. The first semiconductor region includes first to fifth partial regions. The fourth partial region is between the first and third partial regions. The fifth partial region is between the third and second partial regions. The second semiconductor region includes first and second semiconductor portions. The first insulating member includes a first insulating portion. The first insulating portion is between the third and first electrode portions. The second insulating member includes first and second insulating regions. The first insulating region is between the first electrode and the first electrode portion. The second insulating region is between the first insulating region and the first electrode portion.
    Type: Application
    Filed: August 10, 2021
    Publication date: July 21, 2022
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yosuke KAJIWARA, Hiroshi ONO, Daimotsu KATO, Akira MUKAI, Masahiko KURAGUCHI
  • Publication number: 20220229388
    Abstract: A heater according to an embodiment includes a substrate, a first wiring, a second wiring, and a plurality of first heating elements. Each first heating element includes an inclined portion, a first connecting portion, and a second connecting portion. When viewed from a direction perpendicular to the one surface of the substrate, the inclined portion is provided between the first wiring and the second wiring and inclined with respect to the first direction. An angle between the first (second) connecting portion side and the first (second) wiring side on an inclined portion side is larger than an angle between the first (second) wiring side on the inclined portion side and the inclined portion side on one (the other) side of the first direction where an angle between the inclined portion side and the first (second) wiring side on the inclined portion side is 90° or less.
    Type: Application
    Filed: August 12, 2021
    Publication date: July 21, 2022
    Applicant: Toshiba Lighting & Technology Corporation
    Inventors: Shinjiro Aono, Atsushi Heike, Masahiko Tamai, Yoshitatsu Matsui, Satoko Kato
  • Patent number: 11390788
    Abstract: Provided are a chemical heat storage material having excellent cyclic durability and a method for producing the same. A chemical heat storage material includes: a surface layer formed of silica and/or calcium silicate; and calcium oxide particles with the surface layer.
    Type: Grant
    Filed: March 12, 2019
    Date of Patent: July 19, 2022
    Assignees: SHIRAISHI CENTRAL LABORATORIES CO., LTD., TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Masahiko Tajika, Yukitaka Kato, Naoto Uchiyama, Hiroki Takasu
  • Publication number: 20220218931
    Abstract: This invention provides a mask for an mechanical ventilator, including a first opening portion that takes in inspired air from the mechanical ventilator, a second opening portion that has an edge abutting against a skin of a user to send the inspired air to at least one of a nose and a mouth of the user, and a bellows portion that is formed on at least a part of the edge of the second opening portion, forms a space for temporarily storing the inspired air and expired air of the user between the first opening portion and the second opening: portion, and deforms following a shape of a face of the user.
    Type: Application
    Filed: March 3, 2020
    Publication date: July 14, 2022
    Applicant: iDevice, Inc.
    Inventors: Masahiko HARA, Yuto KIDO, Takashi KATO
  • Publication number: 20210324509
    Abstract: A pre-drying processing liquid containing a sublimable substance that changes to gas without passing through to a liquid and a solvent in which the sublimable substance dissolves is supplied to a front surface of a substrate on which a pattern has been formed. Thereafter, the solvent is evaporated from the pre-drying processing liquid on the front surface of the substrate to thereby form a solidified body containing the sublimable substance on the front surface of the substrate. Thereafter, the solidified body is sublimated and thereby removed from the front surface of the substrate. A value acquired by multiplying a ratio of the thickness of the solidified body to the height of the pattern by 100 is greater than 76 and less than 219.
    Type: Application
    Filed: June 30, 2021
    Publication date: October 21, 2021
    Inventors: Yuta SASAKI, Masayuki OTSUJI, Naozumi FUJIWARA, Masahiko KATO, Yu YAMAGUCHI, Hiroaki TAKAHASHI
  • Patent number: 11124869
    Abstract: A pre-drying processing liquid containing a sublimable substance that changes to gas without passing through to a liquid and a solvent in which the sublimable substance dissolves is supplied to a front surface of a substrate on which a pattern has been formed. Thereafter, the solvent is evaporated from the pre-drying processing liquid on the front surface of the substrate to thereby form a solidified body containing the sublimable substance on the front surface of the substrate. Thereafter, the solidified body is sublimated and thereby removed from the front surface of the substrate. A value acquired by multiplying a ratio of the thickness of the solidified body to the height of the pattern by 100 is greater than 76 and less than 219.
    Type: Grant
    Filed: June 19, 2019
    Date of Patent: September 21, 2021
    Inventors: Yuta Sasaki, Masayuki Otsuji, Naozumi Fujiwara, Masahiko Kato, Yu Yamaguchi, Hiroaki Takahashi
  • Patent number: 10994007
    Abstract: Disclosed is an immunity inducer. The immunity inducer comprises virus like particles; the virus like particles comprise a virus-derived outer coat protein and an antigen-bound protein comprising an exogenous antigen; the outer coat protein constitutes an outer coat of the virus like particles, and the antigen-bound protein is comprised in the outer coat; and the virus like particles induce an immune effect of a living body on the antigen.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: May 4, 2021
    Assignees: Saitama Medical University, SYSMEX CORPORATION
    Inventors: Hiroshi Handa, Masaaki Kawano, Masahiko Kato
  • Publication number: 20200411309
    Abstract: To dry a substrate formed with a pattern on a front surface satisfactorily and with excellent drying performance, a substrate processing method comprises: a liquid film formation step of forming a liquid film of a processing liquid, in which cyclohexanone oxime is dissolved in a solvent, on a front surface of a substrate formed with a pattern by supplying the processing liquid to the front surface of the substrate; a solidified film formation step of forming a solidified film of the cyclohexanone oxime by solidifying the liquid film of the processing liquid; and a sublimation step of removing the solidified film from the front surface of the substrate by sublimating the solidified film.
    Type: Application
    Filed: June 11, 2020
    Publication date: December 31, 2020
    Inventors: Masayuki OTSUJI, Hiroaki TAKAHASHI, Masahiko KATO, Yu YAMAGUCHI, Yuta SASAKI
  • Publication number: 20200381269
    Abstract: A substrate processing method includes a sublimable-substance-containing liquid film forming step of supplying a sublimable-substance-containing liquid to a surface of a substrate on which a pattern is formed, so that a liquid film of the sublimable-substance-containing liquid covering the surface of the substrate is formed on the surface of the substrate, a transition state film forming step of evaporating the solvent from the liquid film to form solids of the sublimable substance, so that a transition state film, that is in a pre-crystal transition state before the solids of the sublimable substance crystallize, is formed on the surface of the substrate, and a transition state film removing step of sublimating the solids of the sublimable substance on the surface of the substrate while maintaining the solids of the sublimable substance in the pre-crystal transition state, so that the transition state film from the surface of the substrate is removed.
    Type: Application
    Filed: May 28, 2020
    Publication date: December 3, 2020
    Inventors: Naozumi FUJIWARA, Masayuki OTSUJI, Masahiko KATO, Yu YAMAGUCHI
  • Patent number: 10586693
    Abstract: A substrate processing apparatus comprises: a liquid film former which forms a liquid film by supplying a liquid on an upper surface of the substrate W held horizontally; a cooling gas discharge nozzle which discharges cooling gas of a temperature lower than a freezing point of the liquid forming the liquid film to the liquid film; a thawing liquid discharge nozzle which discharges a thawing liquid to a frozen film formed by freezing the liquid film; a thawing liquid supplier which supplies the heated thawing liquid to the thawing liquid discharge nozzle via a pipe; and a receiver which receives the cooling gas and the thawing liquid respectively discharged from the cooling gas discharge nozzle and the thawing liquid discharge nozzle at the respective retracted position and guides the cooling gas and the thawing liquid to a common flow passage.
    Type: Grant
    Filed: June 21, 2017
    Date of Patent: March 10, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Masahiko Kato, Katsuhiko Miya, Hiroyuki Yashiki
  • Publication number: 20200001333
    Abstract: The present substrate processing method includes a pre-drying processing liquid supplying step of supplying, to a front surface of a substrate, a pre-drying processing liquid, having a freezing point lower than a freezing point of the solidified body forming substance, a solidified body forming step of solidifying a portion of the pre-drying processing liquid on the front surface of the substrate to form the solidified body, containing the solidified body forming substance, inside the pre-drying processing liquid, a liquid removing step of removing the pre-drying processing liquid on the front surface of the substrate while letting the solidified body remain on the front surface of the substrate, and a solid removing step of removing the solidified body, remaining on the front surface of the substrate, from the front surface of the substrate by making the solidified body change to a gas.
    Type: Application
    Filed: June 28, 2019
    Publication date: January 2, 2020
    Inventors: Masayuki OTSUJI, Hiroaki TAKAHASHI, Masahiko KATO, Naozumi FUJIWARA, Yu YAMAGUCHI, Yuta SASAKI
  • Publication number: 20190390320
    Abstract: A pre-drying processing liquid containing a sublimable substance that changes to gas without passing through to a liquid and a solvent in which the sublimable substance dissolves is supplied to a front surface of a substrate on which a pattern has been formed. Thereafter, the solvent is evaporated from the pre-drying processing liquid on the front surface of the substrate to thereby form a solidified body containing the sublimable substance on the front surface of the substrate. Thereafter, the solidified body is sublimated and thereby removed from the front surface of the substrate. A value acquired by multiplying a ratio of the thickness of the solidified body to the height of the pattern by 100 is greater than 76 and less than 219.
    Type: Application
    Filed: June 19, 2019
    Publication date: December 26, 2019
    Inventors: Yuta SASAKI, Masayuki OTSUJI, Naozumi FUJIWARA, Masahiko KATO, Yu YAMAGUCHI, Hiroaki TAKAHASHI
  • Patent number: 10449887
    Abstract: Provided is a cargo carrying vehicle including; an elevating table 2 elevatable in the vertical direction; a plurality of rotating bodies 31 located on the elevating table 2 and configured to rotate so as to carry a cargo C in a conveyance direction X that is a direction toward a loading-unloading part of an aircraft; and a support 32 configured to support the plurality of rotating bodies 31, wherein the support 32 and the plurality of rotating bodies 31 constitute the conveying unit 3, and the conveying unit 3 is movable on the elevating table 2 in a position adjusting direction Y that is a direction intersecting the vertical direction and the conveyance direction.
    Type: Grant
    Filed: February 4, 2016
    Date of Patent: October 22, 2019
    Assignee: Sinfonia Technology Co., Ltd.
    Inventors: Masahiko Kato, Yosuke Yamada
  • Patent number: 10369218
    Abstract: Disclosed is an immunostimulator containing virus-like particles, in which the virus-like particles contain an outer coat protein containing an amino acid sequence selected from the group consisting of SEQ ID No. 1, SEQ ID No. 26, SEQ ID No. 33, SEQ ID No. 35, SEQ ID No. 37, SEQ ID No. 39, SEQ ID No. 41, SEQ ID No. 43 and SEQ ID No. 45; the outer coat protein constitutes an outer coat of the virus-like particles; and the virus-like particles do not substantially contain a genome DNA of SV40.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: August 6, 2019
    Assignees: Saitama Medical University, SYSMEX CORPORATION
    Inventors: Hiroshi Handa, Masaaki Kawano, Masahiko Kato