Patents by Inventor Masahiko Kubota

Masahiko Kubota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Liquid ejection apparatus and liquid ejection method
    Patent number: 9358793
    Abstract: The present invention suppresses the spread of a mist of a liquid ejected from a liquid ejection head. Air is blown out toward a printing medium from a blowing-out opening relatively moving together with a print head, as the liquid ejection head, with respect to the printing medium. Air on the printing medium is sucked into a suction opening relatively moving together with the print head with respect to the printing medium. An ink ejection opening of the print head, the blowing-out opening, and the suction opening are arranged in the order from an upstream side to a downstream side in a moving direction of the printing medium with respect to the print head.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: June 7, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Hiroshi Arimizu, Masahiko Kubota, Nobuhito Yamaguchi, Yusuke Imahashi, Arihito Miyakoshi, Yoshinori Itoh, Koichi Ishida
  • PRINTING DEVICE
    Publication number: 20160031218
    Abstract: A printing device includes: a head that ejects an ink on a medium to perform printing; and a mist collection mechanism having: a suction port facing the medium and sucking air near the head; an exhaust port discharging the sucked air; and an airflow path between the suction port and the exhaust port, wherein the airflow path includes a first spatial region located on a side of the suction port, and a second spatial region located on a side of the exhaust port and adjacent to the first spatial region through a communicating port having an opening area smaller than that of the suction port.
    Type: Application
    Filed: July 24, 2015
    Publication date: February 4, 2016
    Inventors: Koichi Ishida, Masahiko Kubota, Nobuhito Yamaguchi, Hiroshi Arimizu, Yusuke Imahashi, Arihito Miyakoshi, Yoshinori Itoh
  • LIQUID EJECTION APPARATUS
    Publication number: 20150352846
    Abstract: A liquid ejection apparatus is provided which serves to simplify a configuration for collection of mist and to suppress the adverse effect, on landing accuracy for a liquid, of an electrostatic force for connection of mist. The ink jet printing apparatus has a blowout mechanism configured to blow out a gas through a blowout port toward a print medium. Furthermore, the ink jet printing apparatus has an electrode disposed on a platen that supports the print medium and configured to attract mist to the print medium when the electrode is supplied with power.
    Type: Application
    Filed: May 21, 2015
    Publication date: December 10, 2015
    Inventors: Arihito Miyakoshi, Masahiko Kubota, Yusuke Imahashi, Nobuhito Yamaguchi, Hiroshi Arimizu, Yoshinori Itoh
  • Liquid ejection apparatus, mist collecting mechanism and mist collection method
    Patent number: 9199472
    Abstract: There are provided a mist collecting mechanism capable of efficiently sucking and collecting an air blown out from a blow-out unit and a liquid ejection apparatus including the mist collecting mechanism. The mist collecting mechanism includes a suction port configured to suck an air containing mists. Moreover, the mist collecting mechanism includes a first blow-out port that blows out an air in order to guide the air containing mists to the suction port. Moreover, the mist collecting mechanism includes a second blow-out port that blows out an air in order to adjust a position, toward which the air blown out from the first blow-out port flows, so that the air blown out from the first blow-out port is appropriately sucked by the suction port.
    Type: Grant
    Filed: September 12, 2014
    Date of Patent: December 1, 2015
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Koichi Ishida, Hiroshi Arimizu, Arihito Miyakoshi, Yoshinori Itoh, Nobuhito Yamaguchi, Masahiko Kubota
  • Printing apparatus
    Patent number: 9150022
    Abstract: Air blown out from one blowing-out opening of a pinch roller which is within a predetermined angle range forms an air flow of a flow rate Fc which heads for a region between a suction mechanism and a print medium. This makes it possible to efficiently guide the air blown out from the blowing-out opening into the region, and as a result, ink mist can be collected satisfactorily even in a case where the amount of air blown from the pinch roller is relatively small. Further, in this case, the flow rate Fe of a flow blown from the pinch roller is appropriately determined, whereby the suction mechanism can collect substantially 100% of air and ink mist flowing into the region.
    Type: Grant
    Filed: September 23, 2014
    Date of Patent: October 6, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Arihito Miyakoshi, Masahiko Kubota, Nobuhito Yamaguchi, Hiroshi Arimizu, Koichi Ishida, Yoshinori Itoh
  • LIQUID EJECTION APPARATUS AND LIQUID EJECTION METHOD
    Publication number: 20150273835
    Abstract: The present invention suppresses the spread of a mist of a liquid ejected from a liquid ejection head. Air is blown out toward a printing medium from a blowing-out opening relatively moving together with a print head, as the liquid ejection head, with respect to the printing medium. Air on the printing medium is sucked into a suction opening relatively moving together with the print head with respect to the printing medium. An ink ejection opening of the print head, the blowing-out opening, and the suction opening are arranged in the order from an upstream side to a downstream side in a moving direction of the printing medium with respect to the print head.
    Type: Application
    Filed: March 10, 2015
    Publication date: October 1, 2015
    Inventors: Hiroshi Arimizu, Masahiko Kubota, Nobuhito Yamaguchi, Yusuke Imahashi, Arihito Miyakoshi, Yoshinori Itoh, Koichi Ishida
  • Liquid ejecting head and method for producing the same
    Patent number: 9102145
    Abstract: A method for producing a liquid ejecting head of the present invention includes the steps of: forming an etching stop layer on a portion corresponding to a region in which an independent supply port is formed, on a first face of a substrate; conducting dry etching treatment for the substrate from a second face side until the etched portion reaches the etching stop layer; and removing the etching stop layer by isotropic etching to form the independent supply port, after having conducted the dry etching treatment, wherein the isotropic etching is conducted in such a state that a side etching stopper portion having etching resistance to the isotropic etching is formed in the side face perimeter of the etching stop layer.
    Type: Grant
    Filed: April 5, 2013
    Date of Patent: August 11, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masahiko Kubota, Ryoji Kanri, Akihiko Okano, Atsushi Hiramoto, Masataka Sakurai, Yoshiyuki Fukumoto
  • Liquid ejection head and method of manufacturing same
    Patent number: 9096063
    Abstract: A method of manufacturing a liquid ejection head includes the steps of (1) forming a recess in a second surface of a substrate to form a common supply port, (2) forming an etching mask, which specifies opening positions of independent supply ports, on a bottom surface of the common supply port, and (3) performing ion etching using plasma with the etching mask employed as a mask, thereby forming the independent supply ports. The etching mask has an opening pattern formed therein such that respective distances from an ejection energy generation element to openings of two independent supply ports adjacent to the ejection energy generation element on the first surface side of the substrate are equal to each other.
    Type: Grant
    Filed: January 22, 2013
    Date of Patent: August 4, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masahiko Kubota, Ken Tsuchii, Masataka Sakurai, Yoshiyuki Nakagawa, Akiko Saito, Shinji Kishikawa, Ryoji Kanri, Atsunori Terasaki, Akihiko Okano, Atsushi Hiramoto
  • INK MIST COLLECTION APPARATUS, INK JET PRINTING APPARATUS, AND INK MIST COLLECTION METHOD
    Publication number: 20150165770
    Abstract: An ink mist collection apparatus capable of suppressing adhesion of ink mist to an inner surface of a suction path, an ink jet printing apparatus, and an ink mist collection method are provided. Air above a print medium is sucked with the ink mist from a suction port through a suction path, the suction port being located downstream with respect to a print head in a conveying direction of the print medium and being opposite to the print medium. Gas is discharged from a discharge port into the inside of the suction path.
    Type: Application
    Filed: December 10, 2014
    Publication date: June 18, 2015
    Inventors: Arihito Miyakoshi, Masahiko Kubota, Nobuhito Yamaguchi, Hiroshi Arimizu, Koichi Ishida, Yoshinori Itoh
  • Processing method of silicon substrate and liquid ejection head manufacturing method
    Patent number: 9023669
    Abstract: A processing method of a silicon substrate including forming a second opening in a bottom portion of a first opening using a patterning mask having a pattern opening by plasma reactive ion etching. The reactive ion etching is performed with a shield structure formed in or on the silicon substrate, the shield structure preventing inside of the first opening from being exposed to the plasma.
    Type: Grant
    Filed: July 20, 2011
    Date of Patent: May 5, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Atsushi Hiramoto, Masahiko Kubota, Ryoji Kanri, Akihiko Okano, Yoshiyuki Fukumoto, Atsunori Terasaki
  • PRINTING APPARATUS
    Publication number: 20150085015
    Abstract: Air blown out from one blowing-out opening of a pinch roller which is within a predetermined angle range forms an air flow of a flow rate Fc which heads for a region between a suction mechanism and a print medium. This makes it possible to efficiently guide the air blown out from the blowing-out opening into the region, and as a result, ink mist can be collected satisfactorily even in a case where the amount of air blown from the pinch roller is relatively small. Further, in this case, the flow rate Fe of a flow blown from the pinch roller is appropriately determined, whereby the suction mechanism can collect substantially 100% of air and ink mist flowing into the region.
    Type: Application
    Filed: September 23, 2014
    Publication date: March 26, 2015
    Inventors: Arihito MIYAKOSHI, Masahiko Kubota, Nobuhito Yamaguchi, Hiroshi Arimizu, Koichi Ishida, Yoshinori Itoh
  • LIQUID EJECTION APPARATUS, MIST COLLECTING MECHANISM AND MIST COLLECTION METHOD
    Publication number: 20150085014
    Abstract: There are provided a mist collecting mechanism capable of efficiently sucking and collecting an air blown out from a blow-out unit and a liquid ejection apparatus including the mist collecting mechanism. The mist collecting mechanism includes a suction port configured to suck an air containing mists. Moreover, the mist collecting mechanism includes a first blow-out port that blows out an air in order to guide the air containing mists to the suction port. Moreover, the mist collecting mechanism includes a second blow-out port that blows out an air in order to adjust a position, toward which the air blown out from the first blow-out port flows, so that the air blown out from the first blow-out port is appropriately sucked by the suction port.
    Type: Application
    Filed: September 12, 2014
    Publication date: March 26, 2015
    Inventors: Koichi Ishida, Hiroshi Arimizu, Arihito Miyakoshi, Yoshinori Itoh, Nobuhito Yamaguchi, Masahiko Kubota
  • Method for manufacturing microstructure, and method for manufacturing liquid jetting head
    Patent number: 8869401
    Abstract: A liquid ejection head or microstructure manufacturing method includes providing a substrate with an organic resin material layer for forming a flow passage wall member, and forming a flow path and ejection outlet by partly removing the organic resin material layer by illumination with a laser beam having a pulse width between 2 and 20 picosecs and having a focal point inside the organic resin material layer, with movement of the focal point of the laser beam. The ejection outlet is formed by exposure of the organic resin material to the laser beam condensed by a first lens having a numerical aperture of not less than 0.3, and the liquid flow path is formed by exposure of the organic resin material to the laser beam condensed by a second lens having a numerical aperture which is larger than that of the first lens and which is not less than 0.5.
    Type: Grant
    Filed: March 26, 2009
    Date of Patent: October 28, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masahiko Kubota, Satoshi Kokubo
  • LIQUID EJECTING HEAD AND LIQUID EJECTING APPARATUS
    Publication number: 20140313259
    Abstract: The present invention provides a liquid ejecting head provided with a suction port capable of avoiding the return of mists, which have once sucked through a suction port, to the suction port. In view of this, the inner diameter L of a suction tube for allowing liquid mists taken in through the suction port to pass is designed such that a meniscus is formed before a liquid droplet adhering to the inside of the suction tube grows enough to move toward the suction port.
    Type: Application
    Filed: March 18, 2014
    Publication date: October 23, 2014
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hiroshi Arimizu, Masahiko Kubota, Nobuhito Yamaguchi, Arihito Miyakoshi, Koichi Ishida, Yoshinori Itoh
  • Laser processing method
    Patent number: 8829391
    Abstract: A laser processing method of processing an object to be processed. The object to be processed has a modified portion and a non-modified portion. A modified layer forming step forms a modified layer of the object to be processed by scanning an inner portion of the object with a condensing point of first laser light. The modified layer (i) has a processing speed with second laser light that is lower than a processing speed of a non-modified portion and (ii) is formed below the non-modified portion. A removing step removes a portion of the non-modified portion. The portion of the non-modified portion ranges from a surface of the object to the modified layer. The removing step includes irradiating the portion of the non-modified portion with the second laser light.
    Type: Grant
    Filed: October 19, 2010
    Date of Patent: September 9, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kosuke Kurachi, Masahiko Kubota, Akihiko Okano, Atsushi Hiramoto
  • Method for manufacturing liquid discharge head
    Patent number: 8778200
    Abstract: A method for manufacturing a liquid discharge head including a substrate on which supply ports for supplying a liquid are provided, includes forming a first supply port among the supply ports by performing crystal anisotropic etching on the substrate from one surface of the substrate, and forming a plurality of second supply ports among the supply ports by performing dry etching on the substrate using a crystal anisotropic etching method from a surface exposed toward the one surface of the substrate to a rear surface so that the independent second supply ports are respectively opened on the rear surface.
    Type: Grant
    Filed: October 14, 2008
    Date of Patent: July 15, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masahiko Kubota, Akihiko Okano
  • Method of manufacturing substrate for liquid discharge head
    Patent number: 8709266
    Abstract: A method of manufacturing a substrate for a liquid discharge head having a supply port passing through a silicon substrate provided with an energy-generating element generating the energy used to discharge a liquid and allowing liquid to be supplied to the energy-generating element, includes preparing a silicon substrate in which a first etching mask having a first opening is provided on a first face, and a second etching mask having a second opening is provided on a second face that is the rear face of the first face; forming a first recess towards the second face from the first face within the first opening, and forming a second recess towards the first face from the second face within in the second opening; and performing crystalline anisotropic etching using the first and second etching masks as masks from both of the first and second faces, to form the supply port.
    Type: Grant
    Filed: March 10, 2010
    Date of Patent: April 29, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Satoshi Kokubo, Masahiko Kubota
  • Liquid discharge head and method of manufacturing the same
    Patent number: 8622523
    Abstract: Provided is a method of manufacturing a liquid discharge head including: forming a first pattern for forming the flow path on the substrate; forming a first coating layer which covers the first pattern; forming a hole in the first coating layer, through which the first pattern is exposed; forming a second pattern for forming the flow path on the first coating layer, such that the second pattern contacts with the first pattern through the hole; forming a second coating layer for covering the second pattern; forming the discharge port in the second coating layer; and removing the first pattern and the second pattern to form the flow path.
    Type: Grant
    Filed: November 1, 2012
    Date of Patent: January 7, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuhiro Asai, Takumi Suzuki, Masahiko Kubota, Tamaki Sato, Maki Kato
  • Manufacturing method of liquid ejection head
    Patent number: 8613141
    Abstract: A manufacturing method of a liquid ejection head provided with a flow passage communicating with an ejection outlet for ejecting liquid includes steps of preparing a substrate on which a flow passage wall forming member for forming a part of a wall of the flow passage and a solid layer having a shape of a part of the flow passage contact each other, wherein the flow passage wall forming member has a height, from a surface of the substrate, substantially equal to that of the solid layer; providing on the solid layer a pattern having a shape of another part of the flow passage; providing a coating layer, for forming another part of the wall of the flow passage, so as to coat the pattern; providing the ejection outlet to the coating layer; and forming the flow passage by removing the solid layer and the pattern.
    Type: Grant
    Filed: November 11, 2008
    Date of Patent: December 24, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventors: Akihiko Okano, Maki Kato, Masaki Ohsumi, Yoshinori Tagawa, Kazuhiro Asai, Masahiko Kubota, Tamaki Sato
  • Method for processing substrate and method for producing liquid ejection head and substrate for liquid ejection head
    Patent number: 8597529
    Abstract: A method for processing a substrate includes preparing a substrate having a first layer on a first surface side thereof, the first layer having a material capable of suppressing transmission of laser light, processing the substrate with laser light from a second surface that is opposite the first surface of the substrate toward the first surface of the substrate, and allowing the laser light to reach the first layer to form a hole in the substrate, and performing etching of the substrate from the second surface through the hole.
    Type: Grant
    Filed: June 15, 2009
    Date of Patent: December 3, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventors: Keisuke Kishimoto, Satoshi Ibe, Takuya Hatsui, Shimpei Otaka, Hiroto Komiyama, Hiroyuki Morimoto, Masahiko Kubota, Toshiyasu Sakai