Patents by Inventor Masahiro Inoue

Masahiro Inoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240142900
    Abstract: An electrophotographic belt comprising: a substrate and an elastic layer on an outer peripheral surface of the substrate, the elastic layer comprising a cured rubber product including a cured silicone rubber product, an elastic modulus of the elastic layer at a temperature of 23° C. being 1.00 MPa or less, wherein when 1 g sample collected from the elastic layer is immersed in 50 ml of toluene at a temperature of 23° C. for 24 hours in accordance with Japanese Industrial Standard (JIS) K6258:2016, an extract of 3% by mass to 20% by mass with respect to the sample is extracted, and a burning time of the elastic layer in a burn test in accordance with UL94 VTM standard is 30 seconds or less.
    Type: Application
    Filed: October 4, 2023
    Publication date: May 2, 2024
    Inventors: YUSUKE BABA, TAKESHI SUZUKI, MATSUTAKA MAEDA, ATSUSHI HORI, MASAHIRO TAKENAGA, HARUKI MORI, SHOTA INOUE
  • Publication number: 20240134047
    Abstract: A transport possibility determination device comprises a distance measurement unit and a control unit. The distance measurement unit acquires information about the distance to an object. The control unit determines the state of a load when the object is a transport platform on which the load has been placed, on the basis of the information about the distance to the object acquired by the distance measurement unit. The control unit determines whether or not a transportable condition, which is a condition for permitting a forklift to transport the load, is met on the basis of the determined state of the load.
    Type: Application
    Filed: January 17, 2022
    Publication date: April 25, 2024
    Applicant: OMRON CORPORATION
    Inventors: Benika INOUE, Masahiro KINOSHITA, Akihiro ISHII, Mitsunori SUGIURA, Ryoji SHIMIZU
  • Publication number: 20240128717
    Abstract: A two-dimensional photonic crystal laser includes: electrodes; an active layer; and a two-dimensional photonic crystal layer in which modified refractive index regions are disposed to be shifted by different shift amounts from respective lattice points or/and are disposed at the respective lattice points with different areas, the shift amount or/and the area is/are modified with a composite modulation period and expressed by a modulation phase ?(r?) expressed using a vector r? indicating a position of each lattice point of the two-dimensional lattice, a vector kn? indicating a combination of an inclination angle and an azimuthal angle of each of n laser beams mutually differing in the inclination angle and/or the azimuthal angle, and an amplitude An and a phase exp(i?n) determined for each n and the amplitude An and/or the phase exp(i?n) for each value of n differ(s) from each other in at least two different values of n.
    Type: Application
    Filed: February 24, 2022
    Publication date: April 18, 2024
    Applicant: KYOTO UNIVERSITY
    Inventors: Susumu NODA, Menaka DE ZOYSA, Ryoichi SAKATA, Kenji ISHIZAKI, Takuya INOUE, Masahiro YOSHIDA
  • Publication number: 20240120710
    Abstract: A two-dimensional photonic-crystal surface-emitting laser includes: a two-dimensional photonic-crystal layer; an active layer provided on one surface side of the two-dimensional photonic-crystal layer; and a reflection layer provided on the other surface side of the two-dimensional photonic-crystal layer or on a side opposite to the two-dimensional photonic-crystal layer so as to be spaced apart from the two-dimensional photonic-crystal layer, wherein a distance d between surfaces of the two-dimensional photonic-crystal layer and the reflection layer facing each other is set such that a radiation coefficient difference ??v=(?v1??v0), which is a value obtained by subtracting a radiation coefficient ?v0 of a fundamental mode having the smallest loss from a radiation coefficient ?v1 of a first higher order mode having the second smallest loss among the light amplified in the two-dimensional photonic-crystal layer, is 1 cm?1 or more.
    Type: Application
    Filed: February 24, 2022
    Publication date: April 11, 2024
    Applicant: KYOTO UNIVERSITY
    Inventors: Susumu NODA, Takuya INOUE, Masahiro YOSHIDA, Kenji ISHIZAKI
  • Publication number: 20240116027
    Abstract: A chromatography carrier may exhibit high liquid permeability and an excellent pressure-resistant characteristic during liquid passage. A chromatography carrier production method may include: (1) providing a solid phase support, the solid phase support being formed of porous particles on which a ligand has or has not been immobilized; and (2) subjecting the solid phase support to sieve classification, the coefficient of variation of the volume particle size distribution of the porous particles when a ligand has been immobilized being adjusted to 1% to 22%. The skewness of the volume particle size distribution of the porous particles when a ligand has been immobilized may be adjusted to ?0.1 to 5.
    Type: Application
    Filed: March 15, 2022
    Publication date: April 11, 2024
    Applicant: JSR CORPORATION
    Inventors: Kunihiko KOBAYASHI, Minato AKIYAMA, Yukiya INOUE, Masahiro KIKUCHI
  • Patent number: 11933897
    Abstract: A distance measurement device includes: a mirror disposed so as to be tilted relative to a rotation center axis; a drive unit configured to rotate the mirror about the rotation center axis; a photodetector configured to detect reflected light, of laser light, reflected in a distance measurement region; and a condensing lens disposed on the rotation center axis and configured to condense the reflected light reflected by the mirror, on the photodetector. The mirror has a shape elongated in one direction and is disposed such that a short axis thereof is tilted relative to the rotation center axis in a direction parallel to a plane including the rotation center axis. A width in a short-axis direction of the mirror is smaller than a width of a lens portion of the condensing lens as viewed in a direction parallel to the rotation center axis.
    Type: Grant
    Filed: October 1, 2020
    Date of Patent: March 19, 2024
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Kazuhisa Ide, Masaomi Inoue, Hirotaka Ueno, Kouichi Kumamaru, Masahiro Shiihara, Kouichi Bairin, Takashi Haruguchi, Kiyoshi Hibino
  • Patent number: 11932104
    Abstract: A fuel tank (10) includes: a lower panel (12) made of steel and an upper panel (11) made of steel; and at least one pillar (100) made of steel which is disposed in an interior space (V) formed by the lower panel (12) and the upper panel (11) facing each other and of which a first end portion is fixed to the lower panel (12) and a second end portion is fixed to the upper panel (11) in a state where the second end portion is disposed in a hole formed in the upper panel (11).
    Type: Grant
    Filed: June 12, 2020
    Date of Patent: March 19, 2024
    Assignee: NIPPON STEEL CORPORATION
    Inventors: Toshinori Mizuguchi, Masahiro Fuda, Akiyoshi Inoue, Junji Nakano, Yasuaki Naito
  • Publication number: 20230369019
    Abstract: A plasma processing apparatus includes a chamber, a substrate support, a radio-frequency power supply, and a bias power supply controller. The radio-frequency power supply generates source radio-frequency power to generate plasma in the chamber. The bias power supply periodically provides bias energy having a waveform cycle to a bias electrode on the substrate support. The radio-frequency power supply adjusts a source frequency of the source radio-frequency power in an n-th phase period in an m-th waveform cycle of a plurality of waveform cycles based on a change in a degree of reflection of the source radio-frequency power. The change in the degree of reflection is identified with the source frequency being set differently in the n-th phase period in each of two or more waveform cycles preceding the m-th waveform cycle.
    Type: Application
    Filed: July 28, 2023
    Publication date: November 16, 2023
    Applicant: Tokyo Electron Limited
    Inventors: Gen TAMAMUSHI, Chishio KOSHIMIZU, Masahiro INOUE, Shoichiro MATSUYAMA
  • Patent number: 11784067
    Abstract: A holding device includes a ceramic member and a base member joined together via a joining portion. When a second direction is perpendicular to a first direction and a third direction is perpendicular to the first and second directions, the joining portion includes a first joining part which extends through the joining portion in the second direction, as viewed in the first direction, and whose thickness in the first direction is uniform in an arbitrary cross section perpendicular to the second direction and in an arbitrary cross section perpendicular to the third direction, and at least one second joining part which is located between the first joining part and one end of the joining portion in the third direction and whose thickness in the first direction increases from the first joining part side toward the end of the joining portion in an arbitrary cross section perpendicular to the second direction.
    Type: Grant
    Filed: January 8, 2019
    Date of Patent: October 10, 2023
    Assignee: NITERRA CO., LTD.
    Inventors: Makoto Kuribayashi, Masahiro Inoue, Toshimasa Sakakibara
  • Publication number: 20230094655
    Abstract: A plasma processing apparatus includes: a chamber; a substrate support provided in the chamber; a bias power supply that supplies an electrical bias energy to an electrode of the substrate support; a matching box including a matching circuit; a radio-frequency power supply that supplies a radio-frequency power having a variable frequency into the chamber through the matching box, and adjusts the frequency of the radio-frequency power in each of a plurality of phase periods within the cycle of the electrical bias energy; a sensor that detects an electrical signal reflecting a deviation of a load impedance of the radio-frequency power supply from a matching state; and a filter that generates a filtered signal by removing and an intermodulation distortion component of the radio-frequency power and the electrical bias energy from the electrical signal in each of the plurality of phase periods.
    Type: Application
    Filed: September 23, 2022
    Publication date: March 30, 2023
    Applicant: Tokyo Electron Limited
    Inventors: Chishio KOSHIMIZU, Gen TAMAMUSHI, Masahiro INOUE, Yuto KOSAKA, Shoichiro MATSUYAMA
  • Patent number: 11504793
    Abstract: A wire feeding device configured to feed welding wire from a wire feeding source to a welding torch is provided with: an intermediate wire feeding source that is disposed between the wire feeding source and the welding torch and is configured to temporarily store the welding wire fed from the wire feeding source and to feed the stored welding wire to the welding torch; a first feeding part that feeds the welding wire at the wire feeding source to the intermediate wire feeding source; a second feeding part that feeds the welding wire stored in the intermediate wire feeding source to the welding torch; and a feed control unit that controls speed of feeding the welding wire by each of the first feeding part and the second feeding part.
    Type: Grant
    Filed: October 6, 2017
    Date of Patent: November 22, 2022
    Assignee: DAIHEN Corporation
    Inventors: Masahiro Inoue, Yukiya Morita, Hisao Miyahara, Gen Tsujii
  • Patent number: 11370052
    Abstract: An arc welding system of a consumable electrode type comprises: a wire feeding device that feeds welding wire from a wire feeding source to a welding torch; and a power supply device that supplies electric power between the welding wire fed to the welding torch and a base material, the system being configured to weld the base material by arc generated by the supplied electric power. The wire feeding device is provided with: an intermediate wire feeding source that is disposed between the wire feeding source and the welding torch and is configured to temporarily accommodate the welding wire fed from the wire feeding source and to feed the accommodated welding wire to the welding torch; a pull-out feeding part that feeds the welding wire at the wire feeding source to the intermediate wire feeding source; and a push-out feeding part that feeds the welding wire accommodated in the intermediate wire feeding source to the welding torch.
    Type: Grant
    Filed: March 9, 2017
    Date of Patent: June 28, 2022
    Assignee: DAIHEN Corporation
    Inventors: Masahiro Inoue, Yukiya Morita, Hisao Miyahara, Hirokazu Kawai, Songjie Hou, Hayato Baba, Hideo Shiozaki, Tetsuo Era, Tomoyuki Ueyama
  • Patent number: 11273791
    Abstract: A seat belt structure for a center seat of a vehicle is disclosed. The seat belt structure includes a safety belt webbing mounted to a first side of the seat portion and extending to a first end of the back portion and a buckle mounted to a second side of the seat portion. A tongue is movably connected to the safety belt webbing and is adapted to couple with the buckle to restraint an occupant of the central seat. The seat belt structure also includes a grab structure adapted to be held by the occupant. The safety belt webbing defines a lap belt portion adapted to traverse a lap of the occupant, and a shoulder belt portion adapted to extend diagonally across an upper torso of the occupant, when the tongue is engaged with the buckle. The grab structure is engaged with the lap belt portion.
    Type: Grant
    Filed: March 29, 2021
    Date of Patent: March 15, 2022
    Assignee: Honda Motor Co., Ltd.
    Inventors: Michael J Willm, Robert T Wilson, III, Masahiro Inoue
  • Patent number: 11213908
    Abstract: The wire feeding device that feeds welding wire W from the wire source to the welding torch is disposed between the wire source and the welding torch and is configured to temporarily accommodate the welding wire W fed from the wire source and to feed the accommodated welding wire W to the welding torch. In the case where feeding of welding wire W is abnormally stopped, if the acceptance unit accepts instructions for increasing or decreasing, the wire feeding device controls the speed of feeding welding wire W fed by the first feeding part or the second feeding part so that a difference is generated in the feeding speed of the first feeding part and the second feeding part and the accommodated amount of welding wire W is in a range from the lower limit of normal to an upper limit of normal.
    Type: Grant
    Filed: January 17, 2019
    Date of Patent: January 4, 2022
    Assignee: DAIHEN Corporation
    Inventors: Hirokazu Kawai, Futoshi Nishisaka, Haruhiko Manabe, Kazutoshi Nagami, Masahiro Inoue, Hisao Miyahara, Akio Yoshinaga
  • Publication number: 20210358717
    Abstract: A plasma processing apparatus includes a plasma processing chamber, a substrate support, a source RF generator, and a bias RF generator. The substrate support is disposed within the plasma processing chamber. The source RF generator is configured to generate a source RF signal. The source RF signal includes source cycles, and each of the source cycles includes a source ON state and a source OFF state. The source ON state has at least two source power levels. The bias RF generator is coupled to the substrate support and configured to generate a bias RF signal. The bias RF signal includes bias cycles corresponding to the source cycles, respectively. Each of the bias cycles includes a bias ON state and a bias OFF state. The bias ON state has at least two bias power levels.
    Type: Application
    Filed: May 7, 2021
    Publication date: November 18, 2021
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Bongseong KIM, Masahiro INOUE, Mitsunori OHATA, Ken KOBAYASHI
  • Patent number: 11143518
    Abstract: To estimate a more useful destination for users. A destination estimation apparatus 1 comprises a travel route history registration unit 13 storing a positional information history as a history of positional information of a user, a positional information acquisition unit 10 acquiring the positional information of the user, and a destination estimation unit 15 estimating a destination of the user by taking a location indicated by the acquired positional information as a start point based on the stored positional information history. The destination estimation unit 15 calculates a reaching level as a degree the user is reaching the estimated destination based on the stored positional information history, and re-estimates a new destination by taking the estimated destination as a start point when the calculated reaching level is equal to or more than a prescribed threshold value.
    Type: Grant
    Filed: July 6, 2018
    Date of Patent: October 12, 2021
    Assignee: NTT DOCOMO, INC.
    Inventors: Naoharu Yamada, Masahiro Inoue
  • Publication number: 20210285776
    Abstract: To estimate a more useful destination for users. A destination estimation apparatus 1 comprises a travel route history registration unit 13 storing a positional information history as a history of positional information of a user, a positional information acquisition unit 10 acquiring the positional information of the user, and a destination estimation unit 15 estimating a destination of the user by taking a location indicated by the acquired positional information as a start point based on the stored positional information history. The destination estimation unit 15 calculates a reaching level as a degree the user is reaching the estimated destination based on the stored positional information history, and re-estimates a new destination by taking the estimated destination as a start point when the calculated reaching level is equal to or more than a prescribed threshold value.
    Type: Application
    Filed: July 6, 2018
    Publication date: September 16, 2021
    Applicant: NTT DOCOMO, INC.
    Inventors: Naoharu YAMADA, Masahiro INOUE
  • Publication number: 20210233785
    Abstract: A holding device includes a ceramic member and a base member joined together via a joining portion. When a second direction is perpendicular to a first direction and a third direction is perpendicular to the first and second directions, the joining portion includes a first joining part which extends through the joining portion in the second direction, as viewed in the first direction, and whose thickness in the first direction is uniform in an arbitrary cross section perpendicular to the second direction and in an arbitrary cross section perpendicular to the third direction, and at least one second joining part which is located between the first joining part and one end of the joining portion in the third direction and whose thickness in the first direction increases from the first joining part side toward the end of the joining portion in an arbitrary cross section perpendicular to the second direction.
    Type: Application
    Filed: January 8, 2019
    Publication date: July 29, 2021
    Applicant: NGK SPARK PLUG CO., LTD.
    Inventors: Makoto KURIBAYASHI, Masahiro INOUE, Toshimasa SAKAKIBARA
  • Patent number: 11076484
    Abstract: A circuit module (100) includes a substrate (10) having a plurality of internal conductors (2), a first electronic component disposed on one principal surface (S1) of the substrate (10), a first resin layer (40) provided on the one principal surface (S1) and sealing the first electronic component, a plurality of outer electrodes (B1) provided on the other principal surface (S2) of the substrate (10) and including a ground electrode, a conductor film (50) at least provided on an outer surface of the first resin layer (40) and a side surface (S3) of the substrate (10) and connected to the ground electrode via at least one of the plurality of internal conductors (2), and a resin film (60).
    Type: Grant
    Filed: April 28, 2020
    Date of Patent: July 27, 2021
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Tadashi Nomura, Masahiro Inoue, Tetsuya Oda, Hideki Shinkai, Toru Koidesawa
  • Publication number: 20210183622
    Abstract: An apparatus, method, and non-transitory computer-readable medium reduces the power level of a reflected wave from a load coupled to a radio-frequency power supply. A plasma processing apparatus includes a chamber, a substrate support, a radio-frequency power supply, a bias power supply, and a controller. The bias power supply periodically applies a pulsed negative voltage to the substrate support. The controller controls the radio-frequency power supply to provide radio-frequency power with a changed frequency within a period in which the pulsed negative voltage is applied from the bias power supply to the substrate support, to reduce a power level of a reflected wave from a load that is coupled to the radio-frequency power supply.
    Type: Application
    Filed: December 16, 2020
    Publication date: June 17, 2021
    Applicant: Tokyo Electron Limited
    Inventors: Chishio KOSHIMIZU, Gen TAMAMUSHI, Masahiro INOUE