Abstract: A semiconductor light emitting device includes a substrate a semiconductor light emitting element that is disposed on the substrate and that emits light along a direction substantially parallel to a main surface of the substrate a wavelength conversion element that is disposed on a light emitting side of the semiconductor light emitting element, that absorbs a portion of the light emitted from the semiconductor light emitting element, and that emits light having a wavelength different from that of the absorbed light; and a holding member that is disposed on the substrate and holds the wavelength conversion element.

Abstract: The present invention provides a positive-electrode active material for non-aqueous secondary battery comprising a sodium transition metal composite oxide represented by Formula: NaxFe1-yMyO2, wherein 0.4?x?0.7, 0.25?y<1.0, and M is at least one element selected from the group consisting of manganese, cobalt and nickel, the sodium transition metal composite oxide having a crystal structure substantially composed of P63/mmc alone.

Abstract: There is provided a semiconductor light emitting element that is excellent in reliability and is capable of being driven by a lower voltage and a semiconductor light emitting device that includes the semiconductor light emitting element. The semiconductor light emitting element includes: a semiconductor layer; an electrode layer; a metal layer that contains a hydrogen storage metal; and a plated layer in order.

Abstract: There is provided a semiconductor light emitting element that is excellent in reliability and is capable of being driven by a lower voltage and a semiconductor light emitting device that includes the semiconductor light emitting element. The semiconductor light emitting element includes: a semiconductor layer; an electrode layer; a metal layer that contains a hydrogen storage metal; and a plated layer in order.

Abstract: The present invention provides a positive-electrode active material for non-aqueous secondary battery comprising a sodium transition metal composite oxide represented by Formula: NaxFe1-yMyO2, wherein 0.4?x?0.7, 0.25?y<1.0, and M is at least one element selected from the group consisting of manganese, cobalt and nickel, the sodium transition metal composite oxide having a crystal structure substantially composed of P63/mmc alone.

Abstract: A nitride based semiconductor device includes: an n-type cladding layer; an n-type GaN based guide layer placed on the n-type cladding layer; an active layer placed on the n-type GaN based guide layer; a p-type GaN based guide layer placed on the active layer; an electron block layer placed on the p-type GaN based guide layer; a stress relaxation layer placed on the electron block layer; and a p-type cladding layer placed on the stress relaxation layer, and the nitride based semiconductor device alleviates the stress occurred under the influence of the electron block layer, does not affect light distribution by the electron block layer, reduces threshold current, can suppress the degradation of reliability, can suppress degradation of the emitting end surface of the laser beam, can improve the far field pattern, and is long lasting, and fabrication method of the device is also provided.

Abstract: A nitride based semiconductor device includes: an n-type cladding layer; an n-type GaN based guide layer placed on the n-type cladding layer; an active layer placed on the n-type GaN based guide layer; a p-type GaN based guide layer placed on the active layer; an electron block layer placed on the p-type GaN based guide layer; a stress relaxation layer placed on the electron block layer; and a p-type cladding layer placed on the stress relaxation layer, and the nitride based semiconductor device alleviates the stress occurred under the influence of the electron block layer, does not affect light distribution by the electron block layer, reduces threshold current, can suppress the degradation of reliability, can suppress degradation of the emitting end surface of the laser beam, can improve the far field pattern, and is long lasting, and fabrication method of the device is also provided.

Abstract: A nitride based semiconductor device includes: an n-type cladding layer; an n-type GaN based guide layer placed on the n-type cladding layer; an active layer placed on the n-type GaN based guide layer; a p-type GaN based guide layer placed on the active layer; an electron block layer placed on the p-type GaN based guide layer; a stress relaxation layer placed on the electron block layer; and a p-type cladding layer placed on the stress relaxation layer, and the nitride based semiconductor device alleviates the stress occurred under the influence of the electron block layer, does not affect light distribution by the electron block layer, reduces threshold current, can suppress the degradation of reliability, can suppress degradation of the emitting end surface of the laser beam, can improve the far field pattern, and is long lasting, and fabrication method of the device is also provided.

Abstract: A nitride based semiconductor device includes: an n-type cladding layer; an n-type GaN based guide layer placed on the n-type cladding layer; an active layer placed on the n-type GaN based guide layer; a p-type GaN based guide layer placed on the active layer; an electron block layer placed on the p-type GaN based guide layer; a stress relaxation layer placed on the electron block layer; and a p-type cladding layer placed on the stress relaxation layer, and the nitride based semiconductor device alleviates the stress occurred under the influence of the electron block layer, does not affect light distribution by the electron block layer, reduces threshold current, can suppress the degradation of reliability, can suppress degradation of the emitting end surface of the laser beam, can improve the far field pattern, and is long lasting, and fabrication method of the device is also provided.

Abstract: A method for manufacturing a semiconductor device includes setting cut lines in parallel to a normal direction of a (1-100) plane orthogonal to the principal plane and in parallel to a normal direction of a (11-20) plane orthogonal to the (1-100) plane; forming, along the cut line parallel to the normal direction of the (1-100) plane, a trench from the principal plane of the semiconductor layer to a midpoint of a boundary plane between the semiconductor layer and the substrate; and cutting the wafer along the cut lines to divide the wafer into the plurality of semiconductor device where four side faces which are nonpolar planes orthogonal to the principal plane are set adjacent to the principal plane.

Abstract: A semiconductor light-emitting device and method for manufacturing the semiconductor light-emitting device includes a mask layer etching process on first and second mask layers provided on a Group-III nitride-based compound semiconductor substrate, the mask layer with a higher etching rate being closer to the p-type semiconductor layer; a semiconductor layer etching process; a side-etching process that selectively etches the side of the mask layer with the high etching rate to define a groove portion with a portion of the p-type semiconductor layer exposed; a ZrO2 film forming process that forms a ZrO2 film so as to cover the exposed p-type semiconductor layer; an Al2O3 film forming process that forms an Al2O3 film so as to cover the ZrO2 film; a mask layer removing process; and an electrode layer forming process.

Abstract: A semiconductor light-emitting device and method for manufacturing the semiconductor light-emitting device includes a mask layer etching process on first and second mask layers provided on a Group-III nitride-based compound semiconductor substrate, the mask layer with a higher etching rate being closer to the p-type semiconductor layer; a semiconductor layer etching process; a side-etching process that selectively etches the side of the mask layer with the high etching rate to define a groove portion with a portion of the p-type semiconductor layer exposed; a ZrO2 film forming process that forms a ZrO2 film so as to cover the exposed p-type semiconductor layer; an Al2O3 film forming process that forms an Al2O3 film so as to cover the ZrO2 film; a mask layer removing process; and an electrode layer forming process.

Abstract: A manufacturing method for a semiconductor device according to the present invention includes the steps of: growing a p-type contact layer formed of a p-type GaN layer; forming an insulating film on a surface of the p-type contact layer, on which a p-side electrode is to be formed, by coating an insulating film material on the surface and thereafter baking the insulating film material; and annealing the p-type semiconductor layer in a state where the insulating film is formed on the p-type contact layer.

Abstract: A semiconductor light-emitting device and method for manufacturing the semiconductor light-emitting device includes a mask layer etching process on first and second mask layers provided on a Group-III nitride-based compound semiconductor substrate, the mask layer with a higher etching rate being closer to the p-type semiconductor layer; a semiconductor layer etching process; a side-etching process that selectively etches the side of the mask layer with the high etching rate to define a groove portion with a portion of the p-type semiconductor layer exposed; a ZrO2 film forming process that forms a ZrO2 film so as to cover the exposed p-type semiconductor layer; an Al2O3 film forming process that forms an Al2O3 film so as to cover the ZrO2 film; a mask layer removing process; and an electrode layer forming process.

Abstract: A method of manufacturing a semiconductor light emitting apparatus according to the invention includes: the mask layer forming step of forming two mask layers in descending order of etching rates from a side near a p-type semiconductor layer; the mask layer etching step; the semiconductor layer etching step; the side etching step of selectively etching a side surface of a mask layer having a high etching rate to form a groove portion in the p-type semiconductor layer; the insulating film forming step of forming an insulating film so as to cover the p-type semiconductor layer; the mask layer removing step; and the electrode layer forming step. A semiconductor light emitting apparatus according to the invention includes: a substrate; an n-type semiconductor layer; an active layer; a p-type semiconductor layer on which a mesa portion projecting above the active layer is formed; an insulating film which covers the mesa portion to expose an upper surface of the mesa portion; and an electrode layer.

Abstract: The size and orientation of a document are detected by determining the length in the horizontal scanning direction and the length in the vertical scanning direction of the document to be read through a reader. According to the detection result, it is determined whether the image of the document needs to be rotated or not so as to satisfy a condition where a shortest dimension among the transmittable widths in the horizontal scanning direction, at which no part of the image is missing, occurs and the dimension in the vertical scanning direction is minimized. According to the determination result, the document image which has been read through the reader is registered in an image memory and the registered image data is read out to transmit it to a receiver through a telephone line.

Abstract: A document terminated by error due to communication error during the reception is retransmitted starting from the error page to complete the document. The received document is stored in a memory. Each document is assigned with a sending station ID and a document ID which are stored in a RAM. When the reception is terminated by error, the data received so far is stored for a predetermined time and if the retransmission is made within the predetermined time, it is linked to the previously stored received data.

Abstract: The size and orientation of a document are detected by determining the length in the horizontal scanning direction and the length in the vertical scanning direction of the document to be read through a reader. According to the detection result, it is determined whether the image of the document needs to be rotated or not so as to satisfy a condition where a shortest dimension among the transmittable widths in the horizontal scanning direction, at which no part of the image is missing, occurs and the dimension in the vertical scanning direction is minimized. According to the determination result, the document image which has been read through the reader is registered in an image memory and the registered image data is read out to transmit it to a receiver through a telephone line.

Abstract: A communication apparatus detects an incoming-call during communication and rejects the incoming-call. If the apparatus detects the incoming-call during communication and rejects the incoming-call, delays calling for next transmission for a predetermined period after the current communication. If the apparatus detects the incoming-call within the predetermined period, it accepts the incoming-call. Thus, the apparatus can ensure an opportunity to accept an incoming-call without prolonging the entire communication time.

Abstract: An apparatus having the G4 method and the JPEG method allows for the selection of standard resolution (200 dpi.times.200 dp) or precision resolution (400 dpi.times.400 dpi) by using a resolution selection key of operation unit 26 in order to improve the operativity and extend the breadth of selection of image quality. For each selection of standard resolution or precision resolution, the resolution and code information for designating quantization table for use with JPEG are stored in RAM 16, with its memory area being backed up by a battery.