Abstract: Disclosed is a mask defect repair apparatus that is capable of performing defect repair with high accuracy without exposure of a mask to air while being moved between the mask defect repair apparatus and an inspection device. The mask defect repair apparatus emits charged particle beams with an amount of irradiation therewith which is corrected by a correction unit while supplying gas to a defect of the mask, thereby forming a deposition film.

Abstract: Disclosed is a mask defect repair apparatus that is capable of performing defect repair with high accuracy without exposure of a mask to air while being moved between the mask defect repair apparatus and an inspection device. The mask defect repair apparatus emits charged particle beams with an amount of irradiation therewith which is corrected by a correction unit while supplying gas to a defect of the mask, thereby forming a deposition film.

Abstract: A charged particle beam apparatus includes a charged particle beam column for irradiating a sample with a charged particle beam, and a sample stage unit for moving the sample relative to the charged particle beam column. The sample stage unit includes a rotary stage section having a base portion and a rotary mover rotatable about a rotary axis relative to the base portion. A rotary connector is disposed coaxially with and rotatable about the rotary axis and fitted between the base portion and the rotary mover for electrically connecting wirings between relatively rotating elements. A connection electrode is disposed on the sample stage unit in electrical connection with the rotary connector. In the charged particle beam apparatus, the sample is able to be rapidly placed and replaced.

Abstract: Disclosed herein is a charged particle beam apparatus. The apparatus includes a charged particle beam column irradiating a sample with a charged particle beam, a sample stage unit moving the sample relative to the charged particle beam column, the sample stage unit including a rotary stage section having a base portion and a rotary mover rotating about a rotary axis relative to the base portion, a rotary connector placed coaxially with the rotary axis and fitted between the base portion and the rotary mover, and a first connection electrode disposed on the sample stage unit in electrical connection with the rotary connector. In the charged particle beam apparatus, the sample is able to be rapidly placed and replaced.

Abstract: A sample carrying device includes a sample carrying rod that carries a sample in the left-right direction in a sample compartment and a preparatory sample compartment, a support body that supports the sample carrying rod, a case that supports the support body such that the support body can rotate around a rotational axis perpendicular to the left-right direction, and an Q-ring disposed between the support body and the case for sealing the sample compartment and the preparatory sample compartment. The sample carrying rod can be switched between a use state where it can carry a sample and a stowed state where it has been moved in the up-down direction from the use state by rotation of the support body. The sample carrying device can easily stow a sample carrying rod in a small space.

Abstract: Disclosed herein is a composite charged particle beam apparatus including a focused ion beam column and an electron beam column, the apparatus preventing the electron beam column from being contaminated so as to emit an electron beam with high precision. The apparatus includes: a sample tray on which a sample is placed; a focused ion beam column irradiating the sample by using a focused ion beam; an electron beam column irradiating the sample by using an electron beam; a sample chamber receiving the sample tray, and the columns therein; an anti-contamination plate moving between an inserted position inserted into a space between a beam emission surface of the electron beam column and the sample tray, and an open position withdrawn from the space between the beam emission surface and the sample tray; and an operation unit operating the anti-contamination plate to move between the positions.

Abstract: Provided is a transport device in which a reduction in the size and a reduction in the cost of the entire device are possible. A transport unit which is interposed between a sub-chamber and a first treatment chamber is provided with: a transport bar which transports a sample along a right-left direction in a preliminary sample chamber; a support which supports the transport bar; a case which supports the support so as to be rotatable around a rotation axis intersecting the right-left direction; and a second O-ring which seals an inside of the case. The preliminary sample chamber and a first treatment space can communicate with each other through the inside of the case.

Abstract: Disclosed herein is a sample carrying device that can easily stow a sample carrying rod in a small space. The sample carrying device includes the sample carrying rod that carries a sample in the left-right direction in a sample compartment and a preparatory sample compartment, a support body that supports the sample carrying rod, a case that supports the support body such that the support body can rotate around a rotational axis perpendicular to the left-right direction, and a third O-ring that is disposed between the support body and the case and seals the sample compartment and the preparatory sample compartment. The sample carrying rod can be switched between the use state where it can carry a sample and the stowed state where it has been moved in the up-down direction from the use state by rotation of the support body.

Abstract: A charged particle beam apparatus includes: a sample chamber; a sample stage; an electron beam irradiation system for irradiating the sample with an electron beam; a focused ion beam irradiation system for irradiating the sample with a focused ion beam; a sample stage drive unit having a rotational axis orthogonal to at least one of an irradiation axis of the electron beam irradiation system and an irradiation axis of the focused ion beam irradiation system; and a sample transporting mechanism for transporting the sample to the sample stage. The sample transporting mechanism includes a transportation path provided in the sample stage drive unit in a direction parallel to the rotational axis of the sample stage drive unit, and is configured to transport the sample to the sample stage through the transportation path.

Abstract: An electron microscope has a focused ion beam column positioned relative to an electron beam column so that the focused ion beam substantially perpendicularly intersects the electron beam. A backscattered electron detector is positioned relative to the focused ion beam column so that the direction normal to a detection plane of the backscattered electron detector is substantially perpendicular to the direction of the focused ion beam. The backscattered electron detector is configured and positioned to detect backscattered electrons released in a spread of at least about 70 degrees in width from the surface of the section by irradiation of the section with the electron beam 1a.

Abstract: There is provided a composite charged particle beam apparatus, in which a first rotation axis of a rotatable stage intersects a beam irradiation axis of a FIB column and a beam irradiation axis of an SEM so as to be substantially perpendicular thereto, respectively, at a sample observing position, the rotatable stage is provided with a supporting member which can be rotated with respect to the first rotation axis, and the supporting member is connected to a movement mechanism which can dispose the sample at the sample observing position.

Abstract: There is provided a composite charged particle beam apparatus, in which a first rotation axis of a rotatable stage intersects a beam irradiation axis of a FIB column and a beam irradiation axis of an SEM so as to be substantially perpendicular thereto, respectively, at a sample observing position, the rotatable stage is provided with a supporting member which can be rotated with respect to the first rotation axis, and the supporting member is connected to a movement mechanism which can dispose the sample at the sample observing position.

Abstract: An electron microscope includes: an electron beam column for irradiating a specimen with an electron beam; a specimen stage that supports the specimen; a scattered electron detector for detected backscattered electrons released from the specimen; and a focused ion beam column for irradiating the specimen with a focused ion beam.

Abstract: A sample working/observing apparatus possesses a sample holding mechanism. The sample holding mechanism possesses a sample holder holding a sample, and a base detachably supporting the sample holder. Between these, there are detachably provided a rotation support part supporting so as to be rotatable, a slide support part supporting so as to be slidable from a rotation center toward an X-direction, and a butting support part supporting so as to be slidable in the X-direction and a Y-direction. In an upper face, there are provided an X-direction positioning pin and a Y-direction positioning pin, which are disposed along the Y-direction and the X-direction from the rotation center, and butt against one side and the other side of the sample.

Abstract: A thermal analysis apparatus possesses has a cylindrical furnace tube axially inserted in a cylindrical heating furnace, and a pair of sample holders extending axially inside the furnace tube. The furnace tube is supported by two axially spaced groups of butting members, each group having three or more butting members that are disposed in circumferentially spaced-apart relationship on the outside of the furnace tube and that butt against the furnace tube to restrain positional deviation thereof in a radial direction while permitting expansion and contraction thereof in the axial direction during heating of the furnace tube by the heating furnace.

Abstract: A sample working/observing apparatus possesses a sample holding mechanism. The sample holding mechanism possesses a sample holder holding a sample, and a base detachably supporting the sample holder. Between these, there are detachably provided a rotation support part supporting so as to be rotatable, a slide support part supporting so as to be slidable from a rotation center toward an X-direction, and a butting support part supporting so as to be slidable in the X-direction and a Y-direction. In an upper face, there are provided an X-direction positioning pin and a Y-direction positioning pin, which are disposed along the Y-direction and the X-direction from the rotation center, and butt against one side and the other side of the sample.

Abstract: An apparatus has a holder member (21) which holds a sample (3), and a removing beam source (13) which irradiates an inert ion beam onto a cross section (4) of the sample (3) held by a holder member (21) and removes a fracture layer on the cross section (4). Then, the removing beam source (13) is disposed on the holding end side of the sample (3) with respect to the normal L of the cross section (4) so that the irradiating direction of the inert ion beam is tilted at the tilt angle ? to the normal L with respect to the cross section (4).

Abstract: There is provided a liquid metal ion beam irradiation device for irradiating a specific portion of a sample 6 with a prescribed liquid metal ion beam so as to form a cross section, and a gaseous ion beam irradiation device 7 for scanning a prescribed region (observation region) of the cross section using a gaseous ion beam focused to a prescribed diameter and removing a damaged layer on the prescribed region.

Abstract: A thermal analysis apparatus possesses a support base, a heating furnace which is approximately like a cylinder, and whose inside can be raised in its temperature, till a predetermined heating temperature, a heating furnace fixation part fixing the heating furnace to the support base, a furnace tube which is approximately like the cylinder, inserted through the heating furnace while having an interstice, and has been fixed in its base end part to the support base by a fixation member, a fixation means which makes the furnace tube capable of expanding or contracting in an axial direction, and positioning-fixes it in a radial direction, a sample holding means which holds a sample in an inside of a heating part of the furnace tube, that is a range capable of being heated by the heating furnace, and a temperature measurement means measuring a temperature change of the sample.

Abstract: There is provided a liquid metal ion beam irradiation device for irradiating a specific portion of a sample 6 with a prescribed liquid metal ion beam 80 as to form a cross section, and a gaseous ion beam irradiation device 7 for scanning a prescribed region (observation region) of the cross section using a gaseous ion beam focused to a prescribed diameter and removing a damaged layer on the prescribed region.