Abstract: In an active region, a first parallel pn layer in which first first-conductivity-type regions and first second-conductivity-type regions are disposed to repeatedly alternate with one another is provided while in a termination region, a second parallel pn layer in which second first-conductivity-type regions and second second-conductivity-type regions are disposed to repeatedly alternate with one another, a first semiconductor region of the second conductivity type and configuring a voltage withstanding structure, and a second semiconductor region of the second conductivity type are provided. An impurity concentration of each of the plurality of first first-conductivity-type regions and the plurality of second first-conductivity-type regions is reduced in proportion to an impurity concentration of a region directly thereabove. The region directly thereabove is the first semiconductor region or the second semiconductor region.

Abstract: A silicon carbide semiconductor device includes a parallel pn layer that includes a standard portion and first and second portions. The standard portion is located at a center of the parallel pn layer in a depth direction and charge balanced. The first and second portions are respectively located closer to the first and second main surfaces than is the standard portion. In the first portion, an amount of a second-conductivity-type charge is greater than that of the first-conductivity-type regions, and continuously increases with a first gradient in a first direction from the standard portion toward the first main surface. In the second portion, an amount of charge of the first-conductivity-type regions is greater than that of the second-conductivity-type regions, and the amount of charge of the second-conductivity-type regions continuously decreases with a second gradient in a second direction from the standard portion toward the second main surface.

Abstract: In an active region, a first parallel pn layer is provided in which a plurality of first first-conductivity-type regions and a plurality of first second-conductivity-type regions are disposed so as to repeatedly alternate with one another; in a termination region, a second parallel pn layer is provided in which a plurality of second first-conductivity-type regions and a plurality of second second-conductivity-type regions are disposed so as to repeatedly alternate one another; in the termination region, a first semiconductor region of a second conductivity type, is selectively provided between a first main surface of a semiconductor substrate and the second parallel pn layer, the first semiconductor region configuring a voltage withstanding structure and surrounding a periphery of the active region. An other second-conductivity-type region between the first semiconductor region and the plurality of second second-conductivity-type regions in a thickness direction is provided and has a thickness of 0.

Abstract: A silicon carbide semiconductor device, including a semiconductor substrate, a first semiconductor region, a plurality of second semiconductor regions, a plurality of third semiconductor regions, a plurality of trenches, a plurality of gate electrodes respectively provided in the trenches, a first conductive film, a first electrode, a second electrode, a plurality of first high-concentration regions, a plurality of second high-concentration regions, and a second conductive film. The first semiconductor region has a first portion and a plurality of second portions respectively at positions facing the plurality of second high-concentration regions in a depth direction. The second conductive film forms a Schottky contact with the plurality of second portions of the first semiconductor region, such that each junction surface between the second conductive film and the first semiconductor region forms a Schottky barrier of a Schottky barrier diode.

Abstract: A semiconductor device has: a silicon carbide semiconductor substrate of a first conductivity type; a first semiconductor layer of the first conductivity type; a first semiconductor region of a second conductivity type; a second semiconductor region of the first conductivity type; a trench; a gate insulating film; a gate electrode; a third semiconductor region of the first conductivity type, and a fourth semiconductor region of the second conductivity type. The third semiconductor region is provided between the gate insulating film on a sidewall of the trench and the first semiconductor region. The fourth semiconductor region is provided between the first semiconductor region and the third semiconductor region, and has an impurity concentration higher than that of the first semiconductor region.

Abstract: A silicon carbide semiconductor device, including a semiconductor substrate having an active region and a termination region that surrounds the active region in a top view, a first parallel pn layer provided in the semiconductor substrate in the active region, a second parallel pn layer provided in the semiconductor substrate in the termination region, a device structure provided in the active region, a first electrode electrically connected to the device structure, a second electrode, a first semiconductor region selectively provided in the termination region, and a second semiconductor region provided between the second parallel pn layer and the first semiconductor region, and in contact with the first semiconductor region. The second parallel pn layer is provided apart from the first semiconductor region, at a position deeper than the first semiconductor region and closer to an end of the semiconductor substrate than an outer end of the first semiconductor region.

Abstract: By a first ion-implantation of a p-type impurity, first and second p+-type regions for mitigating electric field of trench bottoms are formed in surface regions of an n?-type epitaxial layer that constitutes an n?-type drift region. Thereafter, a second ion-implantation of an n-type impurity for reverting a portion of each of the first p+-type regions to the n?-type, and a third ion-implantation of an n-type impurity for an entire surface of the n?-type epitaxial layer, are performed. By the second ion-implantation, first current spreading layer (CSL) portions that constituting n-type current spreading regions are formed facing the first p+-type regions in the depth direction. By the third ion-implantation, the first CSL portions have a predetermined n-type impurity concentration, and second CSL portions constituting the n-type current spreading regions are formed between the first and second p+-type regions and are in contact with the first CSL portions.

Abstract: A semiconductor device having a connecting region between an active region and an edge region. The semiconductor device including a semiconductor substrate, a first semiconductor layer provided on the semiconductor substrate, a second semiconductor layer provided on the first semiconductor layer, a plurality of first semiconductor regions selectively provided in the second semiconductor layer, a plurality of first and second trenches penetrating through the first semiconductor regions and the second semiconductor layer, a plurality of gate electrodes provided in the first trenches, via a plurality of gate insulating films, respectively, and a plurality of Schottky electrodes respectively provided in the second trenches. The semiconductor substrate, the first and second semiconductor layers, the first semiconductor regions, the first trenches, the gate electrodes and the gate insulating films are provided in the active region.

Abstract: A silicon carbide semiconductor device, including a semiconductor substrate; a first semiconductor region and a second semiconductor region provided in the semiconductor substrate; a plurality of third semiconductor regions selectively provided in the semiconductor substrate, a plurality of first and second trenches penetrating through the second and third semiconductor regions and reaching the first semiconductor region; a plurality of gate electrodes respectively provided in the first trenches; a plurality of conductive films respectively embedded in the second trenches, junction interfaces between the first semiconductor region and the conductive films forming a plurality of Schottky barriers; a first electrode and a second electrode; and a plurality of Schottky barrier diodes that respectively include the plurality of Schottky barriers.

Abstract: In an entire intermediate region between an active region and an edge termination region, a p+-type region is provided between a p-type base region and a parallel pn layer. The p+-type region is formed concurrently with and in contact with p+-type regions for mitigating electric field near bottoms of gate trenches. The p+-type region has portions that face, respectively, n-type regions and p-type regions of a parallel pn layer in a depth direction Z and at the portions, has protrusions that protrude toward the parallel pn layer. N-type current spreading regions extend in the entire intermediate region from the active region and are between the p+-type region and the parallel pn layer, positioned between protrusions of the p+-type region. The impurity concentration of the n-type current spreading regions in the gate region is higher than that of those in other regions. Thus, avalanche capability may be enhanced.

Abstract: One object is to provide a semiconductor device capable of reducing loss during turn-on and degradation of forward voltage. A vertical MOSFET includes a semiconductor substrate 2 of a first conductivity type, a first semiconductor layer 1 of the first conductivity type, a second semiconductor layer 16 of a second conductivity type, first semiconductor regions 17 of the first conductivity type, first trenches 31 and a second trench 32, gate electrodes 20 provided in the first trenches 31 via a gate insulating film 19, and a Schottky electrode 29 provided in the second trench 32. The first trenches 31 are provided in a striped pattern, in a plan view and the second trench 32 surrounds the first trenches 31.

Abstract: One object is to provide a semiconductor device capable of suppressing forward voltage degradation and loss during turn-on. A vertical MOSFET includes a semiconductor substrate 2 of a first conductivity type, a first semiconductor layer of the first conductivity type, a second semiconductor layer 16 of a second conductivity type, first semiconductor regions 17 of the first conductivity type, second semiconductor regions 3 of the second conductivity type, third semiconductor regions 4 of the second conductivity type, first trenches 31 and second trenches 32, gate electrodes 20 provided in the first trenches 31 via a gate insulating film 19, and Schottky metal 26 provided in the second trenches 32.

Abstract: A size reduction of an image pickup module by using resin molding, including a reduction in height, area, or the like thereof is achieved in an actual product. Provided is a module, including a substrate; a semiconductor component in which a first surface of a semiconductor device manufactured by chip-size packaging is provided and fixed along a plate-shaped translucent member, and a second surface of the semiconductor device is fixed with the second surface caused to face the substrate; a frame portion made of resin and formed on the substrate to surround the semiconductor component; and an interposition member which is made of resin and with which a gap between the semiconductor component and the substrate is filled. The interposition member is connected and fixed to the frame portion to be integrated therewith.

Abstract: A size reduction of an image pickup module by using resin molding, including a reduction in height, area, or the like thereof is achieved in an actual product. Provided is a module, including a substrate; a semiconductor component in which a first surface of a semiconductor device manufactured by chip-size packaging is provided and fixed along a plate-shaped translucent member, and a second surface of the semiconductor device is fixed with the second surface caused to face the substrate; a frame portion made of resin and formed on the substrate to surround the semiconductor component; and an interposition member which is made of resin and with which a gap between the semiconductor component and the substrate is filled. The interposition member is connected and fixed to the frame portion to be integrated therewith.

Abstract: A semiconductor device having a substrate including a photodiode; a resin layer formed on an upper surface of the substrate, the resin layer not covering a light receiving region of the photodiode, the resin layer including at least one groove surrounding the light receiving region; and a molding resin portion formed by mold-sealing the photodiode with the resin layer thereon so as not to cover the light receiving region.

Abstract: A semiconductor device having a substrate including a photodiode; a resin layer formed on an upper surface of the substrate, the resin layer not covering a light receiving region of the photodiode, the resin layer including at least one groove surrounding the light receiving region; and a molding resin portion formed by mold-sealing the photodiode with the resin layer thereon so as not to cover the light receiving region.

Abstract: A method for manufacturing a semiconductor device, includes the steps of: forming a resin layer on an upper surface of a substrate including a photodiode such that the resin layer does not cover a light receiving region of the photodiode; forming at least one groove in the resin layer so as to surround the light receiving region; and subsequently mold-sealing the photodiode by loading the substrate into a mold and filling the mold with a molding resin.

Abstract: A channel (1) formed in a substrate (41) branches into channels (2, 3) at a branch point (43). On this branch point, obstacles (8) having a columnar structure are aligned at certain intervals.

Abstract: A channel formed on a chip is opened without contaminating contents of the channel. Channels (107a) and (107b) provided on a substrate (103) are covered by pressing a lid (113) composed of a resin layer (102) and a plate-like lid (101) to a surface of the substrate (103). A fixing device has a retainer plate (104), which retains the plate-like lid (101) of a chip (112), a board (108) on which the substrate (103) is placed, and a screw (106). When covering the channels (107a) and (107b), the screw (106) is fastened and the lid (113) is pressed to the substrate (103) to be fixed. And, when opening an upper portion of the channels (107a) and (107b), the screw (106) is turned upward and a pressure is released, and the lid (113) is removed from the upper potion of the substrate (103).

Abstract: A method for manufacturing a semiconductor device, includes the steps of: forming a resin layer on an upper surface of a substrate including a photodiode such that the resin layer does not cover a light receiving region of the photodiode; forming at least one groove in the resin layer so as to surround the light receiving region; and subsequently mold-sealing the photodiode by loading the substrate into a mold and filling the mold with a molding resin.