Patents by Inventor Masakazu Murakami

Masakazu Murakami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040220413
    Abstract: An optically active aziridine compound or amine compound is produced by using a specified Ru(salen)(CO) complex as a catalyst, and subjecting a specified olefin to an asymmetric aziridination or amination with a specified arylsulfonyl azide compound.
    Type: Application
    Filed: February 6, 2004
    Publication date: November 4, 2004
    Applicant: KYUSHU UNIVERSITY
    Inventors: Tsutomu Katsuki, Kazufumi Omura, Masakazu Murakami, Tatsuya Uchida, Ryo Irie
  • Publication number: 20040195965
    Abstract: To provide an aspect of a novel display device using a light emitting element which is composed of a cathode, an EL layer and an anode, and a manufacturing device of the display device. According to the present invention, dual-sided emission display can be performed in one sheet white color light emitting panel 1001 in which, for example, different images can be displayed on a topside screen and backside screen (full color display, monochrome display or area color display). Two polarizing plates 1002, 1003 are formed by shifting the position thereof with an angular deviation of 90 degrees each other so as to prevent outside light from passing through the pane, thereby realizing a black display when not displayed.
    Type: Application
    Filed: April 1, 2004
    Publication date: October 7, 2004
    Inventors: Shunpei Yamazaki, Hiroko Abe, Masakazu Murakami, Ryoji Nomura
  • Patent number: 6781162
    Abstract: To provide a light emitting device high in reliability with a pixel portion having high definition with a large screen. According to a light emitting device of the present invention, on an insulator (24) provided between pixel electrodes, an auxiliary electrode (21) made of a metal film is formed, whereby a conductive layer (20) made of a transparent conductive film in contact with the auxiliary electrode can be made low in resistance and thin. Also, the auxiliary electrode (21) is used to achieve connection with an electrode on a lower layer, whereby the electrode can be led out with the transparent conductive film formed on an EL layer. Further, a protective film (32) made of a film containing hydrogen and a silicon nitride film which are laminated is formed, whereby high reliability can be achieved.
    Type: Grant
    Filed: January 23, 2003
    Date of Patent: August 24, 2004
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Masaaki Hiroki, Masakazu Murakami, Hideaki Kuwabara
  • Patent number: 6776847
    Abstract: The purpose of the invention is to provide a film formation apparatus capable of forming an EL layer with a high purity and a high density, and a cleaning method. The invention is a formation of an EL layer with a high density by heating a substrate 10 by a heating means for heating a substrate, decreasing the pressure of a film formation chamber with a pressure decreasing means (a vacuum pump such as a turbo-molecular pump, a dry pump, or a cryopump) connected to the film formation chamber to 5×10−3 Torr (0.665 Pa) or lower, preferably 1×10−3 Torr (0.133 Pa) or lower, and carrying out film formation by depositing organic compound materials from deposition sources. In the film formation chamber, cleaning of deposition masks is carried out by plasma.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: August 17, 2004
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Masakazu Murakami
  • Patent number: 6772455
    Abstract: A foam generating apparatus includes a foam generation device for generating initial foam by jetting air into a foaming agent solution and a foam fining device for fining the initial foam to produce the foam for foam bathing. A foaming tool provided within a foaming chamber jets air from an opening to the bottom wall of the foaming chamber. The opening is covered with a net having an opening ratio between 27.7% and 49.5% and a number of air-jet openings per unit area between 9690/cm2 and 24800/cm2. From another point of view, the net attached to the opening has a mesh number between 250 mesh and 400 mesh.
    Type: Grant
    Filed: July 10, 2003
    Date of Patent: August 10, 2004
    Assignee: Aquapro Kabushiki Kaisha
    Inventors: Yoshiteru Takahata, Masakazu Murakami, Mamoru Sakata, Toshiyuki Sawae
  • Publication number: 20040139914
    Abstract: The present invention provides a vapor deposition system for a film forming systems that promote an efficiency of utilizing an EL material and is excellent in uniformity or throughput of forming an EL layer and a vapor deposition method. According to the present invention, vapor deposition is carried out in a deposition chamber by moving an evaporation source holder 903 on which six containers 911 filled with an evaporation material are set at a certain pitch with respect to the substrate. The evaporation holder 903 is transported from an installation chamber 905 by a transport mechanism 902b. A heater is provided in a turntable 907. Throughput can be improved by heating the evaporation holder 903 in advance of transporting containers into the evaporation holder 903.
    Type: Application
    Filed: August 29, 2003
    Publication date: July 22, 2004
    Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Shunpei Yamazaki, Masakazu Murakami, Hideaki Kuwabara
  • Publication number: 20040123804
    Abstract: The present invention provides a vapor deposition method and a vapor deposition system of film formation systems by which EL materials can be used more efficiently and EL materials having superior uniformity with high throughput rate are formed. According to the present invention, inside a film formation chamber, an evaporation source holder in a rectangular shape in which a plurality of containers sealing evaporation material is moved at a certain pitch to a substrate and the evaporation material is vapor deposited on the substrate. Further, a longitudinal direction of an evaporation source holder in a rectangular shape may be oblique to one side of a substrate, while the evaporation source holder is being moved. Furthermore, it is preferable that a movement direction of an evaporation source holder during vapor deposition be different from a scanning direction of a laser beam while a TFT is formed.
    Type: Application
    Filed: September 19, 2003
    Publication date: July 1, 2004
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Hideaki Kuwabara, Masakazu Murakami
  • Patent number: 6739919
    Abstract: An electrical connection box is comprised of a wiring base group constituted by a minimum number of wiring bases required to realize a wiring pattern suitable to specifications of the connection box. Each wring base includes a base body, wing portions provided on an outer periphery of the base body having end faces each formed with a coupling portion to which another wiring base of the same construction can be coupled, and guide portions integral with the wing portions and projecting circumferentially therefrom. In receiving a wire fed from a wiring head in a desired wire groove of the wing portions via a corresponding wire guide groove of the guide portions, the guide portion concerned prevents the wire from being dislocated from the wire groove, resulting in increased wiring speed, shortened wiring time and reduced manufacturing costs.
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: May 25, 2004
    Assignee: The Furukawa Electric Co., Ltd.
    Inventors: Masakazu Murakami, Tatsuo Satori, Kazuo Miyajima
  • Patent number: 6732430
    Abstract: A method of manufacturing a wiring member including winding an electric wire into a desired pattern in a set of wire holding members, each of the wire holding members inserted into a rotary shaft and containing a plurality of wire retaining sections; cutting the electric wire at a desired position; and removing the electric wire and wire holding members from the wire winding body.
    Type: Grant
    Filed: June 13, 2000
    Date of Patent: May 11, 2004
    Assignee: The Furukawa Electric Co., Ltd.
    Inventors: Masakazu Murakami, Shin Hasegawa, Tatsuo Satori
  • Publication number: 20040040504
    Abstract: The present invention provides an evaporation apparatus, which is one type of film formation apparatus and provides superior uniformity in EL layer film thickness, superior throughput, and improved utilization efficiency of EL materials and an evaporation method. The present invention is characterized in that an evaporation source holder, in which a container that encloses an evaporation material is disposed, is moved at a certain pitch with respect to a substrate during evaporation. Further, a film thickness monitor is integrated with the evaporation source holder for the movement. Furthermore, film thickness can be made uniform by adjusting the moving speed of the evaporation source holder in accordance with values measured by the film thickness monitor.
    Type: Application
    Filed: July 14, 2003
    Publication date: March 4, 2004
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Masakazu Murakami
  • Publication number: 20040035360
    Abstract: A manufacturing apparatus is provided, which can improve a utilization efficiency of an evaporation material, reduce manufacturing costs of a light emitting device having an organic light emitting element, and shorten manufacturing time necessary to manufacture a light emitting device. According to the present invention, a multi-chamber manufacturing apparatus having plural film forming chambers includes a first film forming chamber for subjecting a first substrate to evaporation and a second film forming chamber for subjecting a second substrate to evaporation. In each film forming chamber, plural organic compound layers are laminated, thereby improving the throughput. Further, it is possible that the respective substrates in the plural film forming chambers are subjected to evaporation in the same manner in parallel, while another film forming chamber undergoes cleaning.
    Type: Application
    Filed: May 15, 2003
    Publication date: February 26, 2004
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Masakazu Murakami
  • Publication number: 20040031442
    Abstract: The invention provides an evaporation system which is one of deposition devices promoting an efficiency of utilizing an EL material and excellent in uniformity and throughput of forming an EL layer and an evaporation method therefor. Further, the invention provides a method of efficiently vapor-depositing an EL material to a large area substrate. Further, the invention provides a system capable of avoiding an impurity from mixing to the EL material.
    Type: Application
    Filed: May 15, 2003
    Publication date: February 19, 2004
    Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Shunpei Yamazaki, Masakazu Murakami
  • Publication number: 20040016053
    Abstract: A foam generating apparatus includes a foam generation device for generating initial foam by jetting air into a foaming agent solution and a foam fining device for fining the initial foam to produce the foam for foam bathing. A foaming tool provided within a foaming chamber jets air from an opening to the bottom wall of the foaming chamber. The opening is covered with a net having an opening ratio between 27.7% and 49.5% and a number of air-jet openings per unit area between 9690/cm2 and 24800/cm2. From another point of view, the net attached to the opening has a mesh number between 250 mesh and 400 mesh.
    Type: Application
    Filed: July 10, 2003
    Publication date: January 29, 2004
    Applicant: AQUAPRO KABUSHIKI KAISHA
    Inventors: Yoshiteru Takahata, Masakazu Murakami, Mamoru Sakata, Toshiyuki Sawae
  • Publication number: 20030236016
    Abstract: A tubular bus bar is comprised of a conductive pipe member that is three-dimensionally bent, and first and second connections that are provided, e.g., at both ends of the pipe member. The pipe member is covered with an insulating tube, except for those portions at which the first and second connections are formed. The tubular bus bar is lightweight, easy to be recycled, high in power transfer efficiency, and easy to be assembled to an electrical equipment.
    Type: Application
    Filed: June 17, 2003
    Publication date: December 25, 2003
    Applicant: The Furukawa Electric Co., Ltd.
    Inventors: Masakazu Murakami, Hideyuki Fujinami
  • Publication number: 20030222575
    Abstract: Although an ink jet method known as a method of selectively forming a film of a high molecular species organic compound, can coat to divide an organic compound for emitting three kinds (R, G, B) of light in one step, film forming accuracy is poor, it is difficult to control the method and therefore, uniformity is not achieved and the constitution is liable to disperse. In contrast thereto, according to the invention, a film comprising a high molecular species material is formed over an entire face of a lower electrode connected to a thin film transistor by a coating method and thereafter, the film comprising the high molecular species material is etched by etching by plasma to thereby enable to selectively form a high molecular species material layer. Further, the organic compound layer is constituted by a material for carrying out luminescence of white color or luminescence of single color and combined with a color changing layer or a coloring layer to thereby realize full color formation.
    Type: Application
    Filed: March 4, 2003
    Publication date: December 4, 2003
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Masakazu Murakami, Satoshi Seo
  • Publication number: 20030219530
    Abstract: The inventors has been anticipated that there is no problem in employing electron gun deposition as a method of forming a metallic layer on the EL layer because the TFT is disposed blow the ET layer in the active matrix light-emitting device. However, since the TFT is extremely sensitive to ionized evaporated particles, the secondary electron, the reflecting electron, and so on generated by the electron gun, little damage was observed on the EL layer, but significant damages were found on the TFT when electron gun deposition is employed. The invention provides an active matrix light-emitting device having superior TFT characteristics (ON current, OFF current, Vth, S-value, and so on), in which an organic compound layer and a metallic layer (cathode or anode) are formed by means of resistive heating having least influence to the TFT.
    Type: Application
    Filed: February 21, 2003
    Publication date: November 27, 2003
    Inventors: Shunpei Yamazaki, Masakazu Murakami, Naomi Kawakami, Hisashi Ohtani
  • Publication number: 20030194484
    Abstract: In this embodiment, an interval distance between a desposition source holder 17 and an object on which deposition is performed (substrate 13) is reduced to 30 cm or less, preferably 20 cm or less, more preferably 5 to 15 cm, and a deposition source holder 17 is moved in an X direction or a Y direction in accordance with an insulator (also called a bank or a barrier) in deposition, and a shutter 15 is opened or closed to form a film. The present invention can cope with an increase in size of a deposition apparatus with a further increase in size of a substrate in the future.
    Type: Application
    Filed: April 9, 2003
    Publication date: October 16, 2003
    Applicant: Semiconductor Engergy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Masakazu Murakami
  • Publication number: 20030183830
    Abstract: A light emitting device having a high definition, a high aperture ratio and a high reliability is provided. The present invention realizes a high definition and a high aperture ratio for a flat panel display of full colors using luminescent colors of red, green and blue without being dependent upon the film formation method and deposition precision of an organic compound layer by forming the laminated sections 21, 22 by means of intentionally and partially overlapping different organic compound layers of adjacent light emitting elements. Moreover, the protective film 32a containing hydrogen is formed and the drawback in the organic compound layer is terminated with hydrogen, thereby realizing the enhancement of the brightness and the reliability.
    Type: Application
    Filed: January 22, 2003
    Publication date: October 2, 2003
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Masaaki Hiroki, Masakazu Murakami, Hideaki Kuwabara
  • Publication number: 20030184217
    Abstract: An ink jet method known as a method for selectively forming a layer made of a polymeric organic compound is advantageous in that a layer containing an organic compound can be separately colored for emitting light of three colors (R, G, B) at a time. However, this ink jet method is disadvantageous in its poor film formation accuracy, and therefore, it is difficult to control the formation of the film for obtaining the uniformity. As a result, the obtained film is likely to have unevenness. In the present invention, an layer containing an organic compound is formed on the entire surface of a lower electrode connected to a thin film transistor by application. After forming an upper electrode on the lower electrode, an layer containing an organic compound is etched in a self-aligned manner by plasma etching using the upper electrode as a mask so as to allow the selective formation of an layer containing an organic compound.
    Type: Application
    Filed: March 25, 2003
    Publication date: October 2, 2003
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Masakazu Murakami, Satoshi Seo
  • Publication number: 20030180457
    Abstract: A manufacturing system capable of enhancing reliability and luminance of a light emitting element is provided which uses an EL material of very high purity in evaporation. The system is also capable of using an EL material efficiently. Instead of a glass jar, a container (first container 11a) to be set in an evaporation apparatus is employed and a material maker (18) stores an EL material (12), or refines it by sublimation and stores, directly in the container. The container is then transferred to a light emitting device maker (19) for evaporation. With a manufacturing system as such, impurities are prevented from contaminating a highly pure EL material. This system also eliminates the trouble of transferring an EL material from a glass jar to a container. The container may be recovered by the material maker and the EL material remaining in the container may be collected for reuse by the manufacturing system.
    Type: Application
    Filed: February 3, 2003
    Publication date: September 25, 2003
    Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Masakazu Murakami, Hisashi Ohtani, Shunpei Yamazaki, Hideaki Kuwabara