Patents by Inventor Masakazu Sakata
Masakazu Sakata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8201397Abstract: An SCR catalyst is provided in an exhaust pipe of an engine and a urea solution addition valve is provided upstream of the SCR catalyst in the exhaust pipe. An ECU controls urea solution addition quantity of the urea solution addition valve based on ammonia adsorption quantity to the SCR catalyst. The ECU calculates the ammonia adsorption quantity in the SCR catalyst based on time-series data of an ammonia balance between ammonia supply to the SCR catalyst accompanying the urea solution addition of the urea solution addition valve and ammonia consumption in the SCR catalyst. The ECU calculates NOx quantity introduced into the SCR catalyst or a parameter correlated with the NOx quantity and performs initialization of the ammonia adsorption quantity at timing decided based on a result of the calculation.Type: GrantFiled: May 22, 2009Date of Patent: June 19, 2012Assignees: Denso Corporation, Nippon SokenInventors: Osamu Shimomura, Masatoshi Maruyama, Masakazu Sakata
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Patent number: 8176730Abstract: An SCR catalyst is provided in an exhaust pipe of an engine and a urea solution addition valve is provided upstream of the SCR catalyst in the exhaust pipe. An ECU calculates ammonia adsorption quantity of the SCR catalyst and controls urea solution addition quantity, which is added by the urea solution addition valve, based on the ammonia adsorption quantity. The ECU obtains temperature of the SCR catalyst or temperature information correlated with the temperature through measurement or estimation. The ECU switches an execution mode of the urea solution addition control based on the catalyst temperature or the temperature information. Thus, reducing agent addition control can be performed suitably and eventually NOx purification in a NOx catalyst (i.e., SCR catalyst) can be performed suitably.Type: GrantFiled: June 2, 2009Date of Patent: May 15, 2012Assignees: Denso Corporation, Nippon Soken, Inc.Inventors: Osamu Shimomura, Masakazu Sakata, Masatoshi Maruyama
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Publication number: 20120042853Abstract: A controller for a pressure reducing valve is applied to a fuel injection system which is provided with a pressure reducing valve in a common-rail and a fuel pressure sensor detecting a fuel pressure in a fuel supply passage from the accumulator to an injection port of the fuel injector. The controller includes a fuel-pressure-variation detector for detecting a fuel pressure variation timing at which a detection value of the fuel pressure sensor is varied due to an opening operation or a closing operation of the pressure reducing valve. The controller further includes a response-delay-time computing portion for computing a response delay time of the pressure reducing valve based on a command timing and a fuel pressure variation timing.Type: ApplicationFiled: August 17, 2011Publication date: February 23, 2012Applicant: DENSO CORPORATIONInventor: Masakazu Sakata
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Publication number: 20120022767Abstract: An error detector includes an injector-memory provided to a fuel injector injecting a fuel into an internal combustion engine, and an ECU-memory provided to an ECU. The injector-memory stores a characteristic data indicative of injection characteristics of the fuel injector. The ECU-memory stores a characteristic data which is identical to the data stored in the injector-memory. The injector-memory further stores another characteristic data which is identical to the characteristic data stored in the injector-memory. The ECU compares three characteristic data stored in the injector-memory and the ECU-memory to determine whether three characteristic data are identical to each other, whereby an error is detected.Type: ApplicationFiled: July 25, 2011Publication date: January 26, 2012Applicant: DENSO CORPORATIONInventor: Masakazu SAKATA
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Patent number: 7923380Abstract: A substrate processing apparatus includes a processing chamber that processes a substrate, and a substrate placing base enclosed in the processing chamber, and a substrate transporting member that allows the substrate to wait temporarily on the substrate placing base, and exhaust holes provided so as to surround the substrate placing base, and a retracting space that allows the substrate transporting member to move in between lines each connecting the exhaust hole and an upper end of the substrate placing base and the substrate placing base.Type: GrantFiled: September 11, 2009Date of Patent: April 12, 2011Assignee: Hitachi Kokusai Electric Inc.Inventors: Hidehiro Yanai, Masakazu Sakata, Akira Takahashi
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Publication number: 20100257844Abstract: An exhaust gas purifying system for a diesel engine has an ECU, a passage of exhaust gas, a unit having SCR catalyst, a NOx sensor placed at a downstream side of the unit, and a urea water adding valve placed at an upstream side of the unit. The SCR catalyst in the unit selectively adsorbs ammonia, and selectively purifies NOx contained in an exhaust gas emitted from the diesel engine by the adsorbed ammonia. The ECU changes the urea water adding amount, and performs abnormality diagnosis based on the detection result of the NOx sensor while changing an adding amount of the urea water. The ECU uses a first condition to indicate the presence of an excess NOx amount in the exhaust gas, and a second condition to indicate there is no error cause by the ammonia adsorption on the SCR catalyst.Type: ApplicationFiled: April 13, 2010Publication date: October 14, 2010Applicant: DENSO CORPORATIONInventors: Osamu SHIMOMURA, Masakazu Sakata, Masatoshi Maruyama, Kazuharu Tochikawa
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Publication number: 20100150687Abstract: Provided is a substrate processing apparatus configured to attain conflicting purposes of high throughput and footprint reduction. The substrate processing apparatus comprises a carrying chamber, and a loadlock chamber and at least two process chambers that are arranged around the carrying chamber. The carrying chamber comprises a substrate carrying unit configured to carry a substrate between the loadlock chamber and the process chambers. The substrate carrying unit comprises a first arm provided with a first finger and a second finger, and leading ends of the first and second fingers extend horizontally in the same direction. Each of the process chambers comprises a first process unit and a second process unit, and the second process unit is disposed at a side of the process chamber distant from the carrying chamber with the first process unit being disposed therebetween.Type: ApplicationFiled: November 16, 2009Publication date: June 17, 2010Applicant: HITACHI-KOKUSAI ELECTRIC, INC.Inventors: Masakazu SAKATA, Akira TAKAHASHI, Hidehiro YANAI, Motonari TAKEBAYASHI, Shinya TANAKA
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Publication number: 20100068895Abstract: A substrate processing apparatus includes a processing chamber that processes a substrate, and a substrate placing base enclosed in the processing chamber, and a substrate transporting member that allows the substrate to wait temporarily on the substrate placing base, and exhaust holes provided so as to surround the substrate placing base, and a retracting space that allows the substrate transporting member to move in between lines each connecting the exhaust hole and an upper end of the substrate placing base and the substrate placing base.Type: ApplicationFiled: September 11, 2009Publication date: March 18, 2010Applicant: HITACHI KOKUSAI ELECTRIC INC.Inventors: Hidehiro Yanai, Masakazu Sakata, Akira Takahashi
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Publication number: 20100068414Abstract: A substrate processing apparatus includes a transport chamber and a processing chamber that processes substrates. The transport chamber has a first substrate transport member transporting the substrates from the transport chamber to the processing chamber. The processing chamber has a first processing unit which is adjacent to the transport chamber and has a first substrate placing base, a second processing unit which is adjacent to the other side of the transport chamber in the first processing unit and has a second substrate placing base, a second substrate transport member transporting the substrates between the first processing unit and the second processing unit, and a control unit controlling at least the second substrate transport member.Type: ApplicationFiled: September 11, 2009Publication date: March 18, 2010Applicant: HITACHI KOKUSAI ELECTRIC INC.Inventors: Akira Takahashi, Hidehiro Yanai, Masakazu Sakata
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Publication number: 20090293459Abstract: An SCR catalyst is provided in an exhaust pipe of an engine and a urea solution addition valve is provided upstream of the SCR catalyst in the exhaust pipe. An ECU calculates ammonia adsorption quantity of the SCR catalyst and controls urea solution addition quantity, which is added by the urea solution addition valve, based on the ammonia adsorption quantity. The ECU obtains temperature of the SCR catalyst or temperature information correlated with the temperature through measurement or estimation. The ECU switches an execution mode of the urea solution addition control based on the catalyst temperature or the temperature information. Thus, reducing agent addition control can be performed suitably and eventually NOx purification in a NOx catalyst (i.e., SCR catalyst) can be performed suitably.Type: ApplicationFiled: June 2, 2009Publication date: December 3, 2009Applicants: DENSO CORPORATION, NIPPON SOKEN, INC.Inventors: Osamu SHIMOMURA, Masakazu Sakata, Masatoshi Maruyama
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Publication number: 20090288397Abstract: An SCR catalyst is provided in an exhaust pipe of an engine and a urea solution addition valve is provided upstream of the SCR catalyst in the exhaust pipe. An ECU controls urea solution addition quantity of the urea solution addition valve based on ammonia adsorption quantity to the SCR catalyst. The ECU calculates the ammonia adsorption quantity in the SCR catalyst based on time-series data of an ammonia balance between ammonia supply to the SCR catalyst accompanying the urea solution addition of the urea solution addition valve and ammonia consumption in the SCR catalyst. The ECU calculates NOx quantity introduced into the SCR catalyst or a parameter correlated with the NOx quantity and performs initialization of the ammonia adsorption quantity at timing decided based on a result of the calculation.Type: ApplicationFiled: May 22, 2009Publication date: November 26, 2009Applicants: DENSO CORPORATION, NIPPON SOKEN, INC.Inventors: Osamu Shimomura, Masatoshi Maruyama, Masakazu Sakata
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Publication number: 20090288396Abstract: An exhaust emission control device is used for an engine and is applied to an exhaust gas purifying system. The system has an NOx catalyst disposed in an exhaust passage of the engine to promote selective purification of NOx in exhaust gas performed by ammonia, which is a reducing agent for reducing NOx, and a reducing agent adding device for adding the reducing agent to an upstream side of the catalyst in a flow direction of exhaust gas.Type: ApplicationFiled: May 14, 2009Publication date: November 26, 2009Applicants: DENSO CORPORATION, NIPPON SOKEN, INC.Inventors: Masakazu Sakata, Masatoshi Maruyama, Osamu Shimomura
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Publication number: 20060289882Abstract: An organic electroluminescent element comprising a cathode, an anode, an intermediate unit arranged between a cathode and an anode, a first light emitting unit arranged between a cathode and an intermediate unit, and a second light emitting unit arranged between an anode and an intermediate unit, wherein an electron extracting layer for extracting an electron from an adjacent layer adjoining a cathode side is provided in an intermediate unit, an absolute value of an energy level of a lowest unoccupied molecular orbital (LUMO) of an electron extracting layer |LUMO(A)|, and an absolute value of an energy level of a highest occupied molecular orbital (HOMO) of the adjacent layer |HOMO(B)| are in the relationship of |HOMO(B)|?|LUMO(A)|?1.5 eV, and an intermediate unit supplies a hole generated by extraction of an electron from an adjacent layer by an electron extracting layer and, at the same time, supplies the extracted electron to a second light emitting unit.Type: ApplicationFiled: July 29, 2005Publication date: December 28, 2006Inventors: Kazuki Nishimura, Yuji Hamada, Masahiro Iyori, Haruhisa Hashimoto, Masakazu Sakata, Hiroaki Izumi, Kaname Ito, Kaori Ishikawa, Hiroki Ishida
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Publication number: 20060028129Abstract: A hole injection electrode of a transparent conductive film such as indium-zinc-oxide is formed on a substrate, and a hole injection layer, a hole transport layer, a light emitting layer, and an electron transport layer are formed in this order on the hole injection electrode. Then, an electron injection electrode made of a material such as aluminum is formed on the electron transport layer. The hole injection layer is made for example of fluorocarbon (CFx). The thickness of the hole injection layer is preferably in the range from 30 ? to 90 ?.Type: ApplicationFiled: March 29, 2005Publication date: February 9, 2006Inventors: Takahisa Sakakibara, Masakazu Sakata, Masaya Nakai, Hiroshi Kanno, Kazuki Nishimura, Hiroaki Izumi
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Publication number: 20050084709Abstract: In an organic EL device whose any layer of organic compound layers contains a phenylamine derivative (NPB, for instance), the weight concentration of copper atoms contained in the organic compound layer is controlled to not higher than 500 ppm, the weight concentration of aluminum atoms contained in the organic compound layer is controlled to not higher than 800 ppm, and the weight concentration of iron atoms contained in the organic compound layer is controlled to not higher than 800 ppm. Furthermore, the weight concentration of nickel atoms contained in the organic compound layer is controlled to not higher than 900 ppm, and the weight concentration of sodium atoms contained in the organic compound layer is controlled to not higher than 1000 ppm.Type: ApplicationFiled: March 31, 2004Publication date: April 21, 2005Inventors: Yuji Hamada, Masakazu Sakata
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Patent number: 5845561Abstract: An apparatus for preparing a coffee beverage by supplying the ground coffee beans fed from a coffee mill for grinding coffee beans to an extractor to prepare the coffee beverage is disclosed, wherein a device for removing the silver skins out of the coffee beans ground by the coffee mill is provided therewith.Type: GrantFiled: April 16, 1997Date of Patent: December 8, 1998Assignee: Sanyo Electric Co., Ltd.Inventors: Noboru Chigira, Naoto Fukushima, Kazuhiro Uehara, Masakazu Sakata, Kouji Takeda
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Patent number: 5545400Abstract: A deodorant containing an azo metal complex expressed by the following structural formula 1, which is produced by mixing a solution in which azo compounds to be ligands are dissolved with a solution in which a metal salt is dissolved: ##STR1## In the structural formula 1, M represents a metal element, R.sub.1 and R.sub.2 represent aromatic compounds, which may be the same or different from each other, and R.sub.3 and R.sub.4 represent aromatic compounds or heterocyclic compounds, which may be the same or different from each other. In addition, either one or both of nitrogen atoms in an azo base in each of the legends may be coordinated to the metal M.Type: GrantFiled: June 1, 1995Date of Patent: August 13, 1996Assignee: Sanyo Electric Co., Ltd.Inventors: Masakazu Sakata, Hiroyuki Fujii, Yuji Hamada, Kenichi Shibata, Yoshitaka Nishio
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Patent number: 5059847Abstract: A surface acoustic wave device comprising a single crystal silicon substrate and a piezoelectric thin film of single crystal or C-axis-oriented polycrystalline aluminum nitride formed on the surface of the substrate. The C-axis of the piezoelectric thin film is set in a direction in which the projection vector of the C-axis on a plane containing the axis of propagation direction of a surface acoustic wave and a normal axis of the substrate makes an inclination angle .theta. of up to 60 degrees with the axis of propagation direction, whereby the device is given a coupling coefficient of at least 2% is given as maximum coupling coefficient of the device.Type: GrantFiled: April 10, 1990Date of Patent: October 22, 1991Assignee: Sanyo Electric Co., Ltd.Inventors: Toshiharu Tanaka, Kenichi Shibata, Kousuke Takeuchi, Masakazu Sakata, Hiroshi Okano, Kazuhiko Kuroki
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Patent number: 5036199Abstract: A liquid crystal chopper comprising a pair of electrically conductive substrates, a spacer keeping the substrates so as to define a space between the substrates, and a liquid crystal of DSM type which is enclosed in the space, with a dielectric anisotropy of -0.5 or more and not exceeding 0. An infrared sensor using the liquid crystal chopper in the above construction as a chopper mechanism to intermittently interrupt infrared rays incident upon the pyroelectric element. The infrared sensor has a short response time at the liquid crystal chopper and consumes less power.Type: GrantFiled: February 20, 1990Date of Patent: July 30, 1991Assignee: Sanyo Electric Co., Ltd.Inventors: Masakazu Sakata, Kenichi Shibata, Kousuke Takeuchi, Toshiharu Tanaka, Hiroshi Okano, Toshikazu Tsujino, Kazuhiko Kuroki
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Patent number: 4997244Abstract: An optical wavelength converting device includes a substrate, and a waveguide layer of a nonlinear organic material formed on one major surface of the substrate and having a thickness tapered along one axis parallel to the major surface, in which a waveguide with a desired thickness can be selected in a direction normal to the axis.Type: GrantFiled: November 16, 1989Date of Patent: March 5, 1991Assignee: Sanyo Electric Co., Ltd.Inventors: Yoshitaka Nishio, Yuji Hamada, Takanori Fujii, Masakazu Sakata, Yoshikazu Tsujino, Kazuhiko Kuroki