Abstract: In a water treatment apparatus, a tilted plate is disposed at an incline relative to a horizontal plane. Water to be treated is passed over the upper surface of the tilted plate. A discharge forming body is disposed across a gas layer above a water film formed by the water to be treated flowing over the tilted plate. A droplet forming apparatus exerts power on the water film so that at least some of the water to be treated shoots upward in the form of droplets.

Abstract: A water treatment apparatus including: discharge treatment units each including a ground electrode and a discharge electrode opposing the ground electrode, and water to be treated is treated by forming a discharge between the ground electrode and the discharge electrode, and generating ozone by the discharge, and moreover causing the water to be treated to contact the discharge; a water reservoir portion that collects, in the interior of the treatment tank, the water to be treated having been subject to water treatment by one of the discharge treatment units; and an ozone supply section that supplies the ozone in the treatment tank to the water to be treated in the water reservoir portion are provided, and wherein the water to be treated passes through the plurality of discharge treatment units as a continuous flow.

Abstract: In a water treatment apparatus, a tilted plate is disposed at an incline relative to a horizontal plane. Water to be treated is passed over the upper surface of the tilted plate. A discharge forming body is disposed across a gas layer above a water film formed by the water to be treated flowing over the tilted plate. A droplet forming apparatus exerts power on the water film so that at least some of the water to be treated shoots upward in the form of droplets.

Abstract: A water treatment device generates a bubble in water to be treated inside a treatment tank, and treats the water to be treated through use of radicals that are generated by bubble electric discharge caused via the bubble. The water treatment device includes main electrodes for forming a main discharge area between a first main electrode and a second main electrode, auxiliary electrodes for forming a preliminary discharge area between a first auxiliary electrode and a second auxiliary electrode, and a bubble generator generating a bubble in water to be treated through use of an externally supplied gas. When a bubble generated by the bubble generator passes through the preliminary discharge area, discharge is caused via the bubble, and, when the bubble in an excited state subsequently passes through the main discharge area, the bubble causes discharge again to generate radicals.

Abstract: A water treatment apparatus, upper surfaces of two of the consecutively arranged ground electrodes are alternately inclined in opposite directions with respect to a horizontal plane, a gap is formed between a lower surface of an upper side ground electrode and an upper surface of a lower side ground electrode, a voltage is applied to a discharge electrode provided in the gap, thereby forming discharges both in air between the discharge electrode and the lower surface of the upper side ground electrode and in air between the discharge electrode and the upper surface of the lower side ground electrode, and water to be treated is caused to continuously flow downward from the ground electrode of an uppermost part to the ground electrode of a lowermost part along the respective upper surfaces such that the water to be treated is treated.

Abstract: A water treatment apparatus, upper surfaces of two of the consecutively arranged ground electrodes are alternately inclined in opposite directions with respect to a horizontal plane, a gap is formed between a lower surface of an upper side ground electrode and an upper surface of a lower side ground electrode, a voltage is applied to a discharge electrode provided in the gap, thereby forming discharges both in air between the discharge electrode and the lower surface of the upper side ground electrode and in air between the discharge electrode and the upper surface of the lower side ground electrode, and water to be treated is caused to continuously flow downward from the ground electrode of an uppermost part to the ground electrode of a lowermost part along the respective upper surfaces such that the water to be treated is treated.

Abstract: A water treatment apparatus including: discharge treatment units each including a ground electrode and a discharge electrode opposing the ground electrode, and water to be treated is treated by forming a discharge between the ground electrode and the discharge electrode, and generating ozone by the discharge, and moreover causing the water to be treated to contact the discharge; a water reservoir portion that collects, in the interior of the treatment tank, the water to be treated having been subject to water treatment by one of the discharge treatment units; and an ozone supply section that supplies the ozone in the treatment tank to the water to be treated in the water reservoir portion are provided, and wherein the water to be treated passes through the plurality of discharge treatment units as a continuous flow.

Abstract: A water treatment device generates a bubble in water to be treated inside a treatment tank, and treats the water to be treated through use of radicals that are generated by bubble electric discharge caused via the bubble. The water treatment device includes main electrodes for forming a main discharge area between a first main electrode and a second main electrode, auxiliary electrodes for forming a preliminary discharge area between a first auxiliary electrode and a second auxiliary electrode, and a bubble generator generating a bubble in water to be treated through use of an externally supplied gas. When a bubble generated by the bubble generator passes through the preliminary discharge area, discharge is caused via the bubble, and, when the bubble in an excited state subsequently passes through the main discharge area, the bubble causes discharge again to generate radicals.

Abstract: An apparatus including a vacuum chamber having a substrate holding unit that holds a substrate and a plasma electrode facing the substrate, a first gas supply unit that supplies a H2 gas to the vacuum chamber at a constant flow rate, a second gas supply unit that opens or closes a valve to turn on or off the supply of a SiH4 gas, a high-frequency power source that applies a high frequency voltage to the plasma electrode, a shield box that is connected to a ground so as to surround the plasma electrode outside the vacuum chamber, and a control unit that controls the valve such that the SiH4 gas is periodically supplied to the vacuum chamber and modulates the amplitude of high frequency power in synchronization with the opening or closing of the valve, and the valve is provided in the shield box.

Abstract: A magnetic field detection device including a magnetic body (magnetic flux guide) provided for adjusting a magnetic field to be applied to a magneto-resistance element. A shape of an on-substrate magnetic body in plan view is a tapered shape on one end portion side and a substantially funnel shape on another end portion side opposite the one end portion, the another end portion being larger in width than the one end portion, and a magneto-resistance element is disposed in front of an output-side end portion. In the on-substrate magnetic body, a contour of a tapered portion is not linear like a funnel, but has a curved shape in which a first curved portion protruding outward with a gentle curvature and a second curved portion protruding inward with a curvature similar to that of the first curved portion are continuously formed.

Abstract: An apparatus including a vacuum chamber having a substrate holding unit that holds a substrate and a plasma electrode facing the substrate, a first gas supply unit that supplies a H2 gas to the vacuum chamber at a constant flow rate, a second gas supply unit that opens or closes a valve to turn on or off the supply of a SiH4 gas, a high-frequency power source that applies a high frequency voltage to the plasma electrode, a shield box that is connected to a ground so as to surround the plasma electrode outside the vacuum chamber, and a control unit that controls the valve such that the SiH4 gas is periodically supplied to the vacuum chamber and modulates the amplitude of high frequency power in synchronization with the opening or closing of the valve, and the valve is provided in the shield box.

Abstract: An apparatus including a vacuum chamber having a substrate holding unit that holds a substrate and a plasma electrode facing the substrate, a first gas supply unit that supplies a H2 gas to the vacuum chamber at a constant flow rate, a second gas supply unit that opens or closes a valve to turn on or off the supply of a SiH4 gas, a high-frequency power source that applies a high frequency voltage to the plasma electrode, a shield box that is connected to a ground so as to surround the plasma electrode outside the vacuum chamber, and a control unit that controls the valve such that the SiH4 gas is periodically supplied to the vacuum chamber and modulates the amplitude of high frequency power in synchronization with the opening or closing of the valve, and the valve is provided in the shield box.

Abstract: Ferromagnetic layers have magnetizations oriented to such directions as to cancel each other, so that the net magnetization of the ferromagnetic layers is substantially zero. That is, the ferromagnetic layers are exchange-coupled with a nonmagnetic layer interposed therebetween, thereby forming an SAF structure. Since the net magnetization of the ferromagnetic layers forming the SAF structure is substantially zero, the magnetization of a recording layer is determined by the magnetization of a ferromagnetic layer. Therefore, the ferromagnetic layer is made of a CoFeB alloy having high uniaxial magnetic anisotropy, and the ferromagnetic layers are made of a CoFe alloy having a high exchange-coupling force.

Abstract: An apparatus including a vacuum chamber having a substrate holding unit that holds a substrate and a plasma electrode facing the substrate, a first gas supply unit that supplies a H2 gas to the vacuum chamber at a constant flow rate, a second gas supply unit that opens or closes a valve to turn on or off the supply of a SiH4 gas, a high-frequency power source that applies a high frequency voltage to the plasma electrode, a shield box that is connected to a ground so as to surround the plasma electrode outside the vacuum chamber, and a control unit that controls the valve such that the SiH4 gas is periodically supplied to the vacuum chamber and modulates the amplitude of high frequency power in synchronization with the opening or closing of the valve, and the valve is provided in the shield box.

Abstract: Ferromagnetic layers have magnetizations oriented to such directions as to cancel each other, so that the net magnetization of the ferromagnetic layers is substantially zero. That is, the ferromagnetic layers are exchange-coupled with a nonmagnetic layer interposed therebetween, thereby forming an SAF structure. Since the net magnetization of the ferromagnetic layers forming the SAF structure is substantially zero, the magnetization of a recording layer is determined by the magnetization of a ferromagnetic layer. Therefore, the ferromagnetic layer is made of a CoFeB alloy having high uniaxial magnetic anisotropy, and the ferromagnetic layers are made of a CoFe alloy having a high exchange-coupling force.

Abstract: In remote plasma cleaning, it is difficult to locally excite a plasma because the condition is not suitable for plasma excitation different from that at the time of film formation and a method using light has a problem of fogginess of a detection window that cannot be avoided in a CVD process and is not suitable for a mass production process.

Abstract: A magnetic field detection apparatus capable of changing the detection range and detection sensitivity as desired for a specific application is disclosed. A magnetoresistance effect element is applied a bias magnetic field and an external magnetic field. The bias magnetic field and the external magnetic field are generated on the same straight line, and therefore the bias magnetic field functions to hamper the external magnetic field applied to the magnetoresistance effect element. Thus, the magnetization of the free layer of the magnetoresistance effect element is suppressed, and the rotational angle of the magnetized vector is reduced. As a result, the characteristic of the resistance value of the magnetoresistance effect element to the external magnetic field is shifted by an amount equivalent to the bias magnetic field.

Abstract: Ferromagnetic layers have magnetizations oriented to such directions as to cancel each other, so that the net magnetization of the ferromagnetic layers is substantially zero. That is, the ferromagnetic layers are exchange-coupled with a nonmagnetic layer interposed therebetween, thereby forming an SAF structure. Since the net magnetization of the ferromagnetic layers forming the SAF structure is substantially zero, the magnetization of a recording layer is determined by the magnetization of a ferromagnetic layer. Therefore, the ferromagnetic layer is made of a CoFeB alloy having high uniaxial magnetic anisotropy, and the ferromagnetic layers are made of a CoFe alloy having a high exchange-coupling force.

Abstract: A magnetic field detection device including a magnetic body (magnetic flux guide) provided for adjusting a magnetic field to be applied to a magneto-resistance element. A shape of an on-substrate magnetic body in plan view is a tapered shape on one end portion side and a substantially funnel shape on another end portion side opposite the one end portion, the another end portion being larger in width than the one end portion, and a magneto-resistance element is disposed in front of an output-side end portion. In the on-substrate magnetic body, a contour of a tapered portion is not linear like a funnel, but has a curved shape in which a first curved portion protruding outward with a gentle curvature and a second curved portion protruding inward with a curvature similar to that of the first curved portion are continuously formed.

Abstract: A magnetic field detector includes: a magnet; a detecting magnetic resistance element having a layer structure containing a ferromagnetic layer, the resistance being changed when a direction of magnetization of the ferromagnetic layer is changed; and a reference magnetic resistance element having substantially the same layer structure as that of the detecting magnetic resistance element. A magnetic field, the magnetic intensity of which is higher than the saturation magnetic field, is impressed by the magnet in a direction which is sensed by the ferromagnetic layer of the reference magnetic resistance element.