Abstract: A receptacle comprises a shell made of metal and a cage formed of one or more metal plates. The shell is attachable to a case made of metal. The cage is mountable on a board arranged in the case. The cage receives an internal module under a mated state where the receptacle is mated with a plug. The cage has a cage rear plate and is provided with a terminal made of metal and a contact portion made of metal. The terminal extends downward from the cage rear plate. The contact portion is nearer to the cage rear plate than to the front end of the cage in a front-rear direction. When the cage is mounted on the board and the shell is attached to the case, the shell covers the cage, the terminal is fixed to the board, and the contact portion is pressed against the shell.

Abstract: A connector includes a cable holding portion, a first holding member having a first male screw portion and a first guide portion, an optical connector, an optical module, a second holding member having a second male screw portion and a second guide portion, and a coupling nut having a female screw portion. In cooperation with each other, the first and second guide portions allow a relative movement of the first holding member with respect to the second holding member in the front-rear direction while regulating a relative movement of the first holding member with respect to the second holding member in a circumferential direction about an axis parallel to the front-rear direction. Relative positions of the first holding member and the second holding member in the front-rear direction are maintained by the female screw portion being meshed with both of the first and the second male screw portions.

Abstract: A data processing apparatus in which a trade-off between over-learning prevention and calculation load prevention is eliminated when creating a model formula is provided.

Abstract: The invention provides a plasma processing apparatus which includes a processing chamber, a radio frequency power source to supply a radio frequency power for plasma generation, a sample stage equipped with an electrostatic chuck electrode of a sample, a DC power source to apply a DC voltage to the electrode, and a control unit to change the DC voltage from a predetermined value to almost 0 V when a predetermined time elapses since the supplying of the radio frequency power is stopped. The predetermined value is a predetermined value indicating that a potential of the sample when the DC voltage is almost 0 V becomes almost 0 V. The predetermined time is a time defined on the basis of a time when charged particles generated by the plasma processing disappear or a time when an afterglow discharge disappears.

Abstract: The invention provides a plasma processing apparatus which includes a processing chamber, a radio frequency power source to supply a radio frequency power for plasma generation, a sample stage equipped with an electrostatic chuck electrode of a sample, a DC power source to apply a DC voltage to the electrode, and a control unit to change the DC voltage from a predetermined value to almost 0 V when a predetermined time elapses since the supplying of the radio frequency power is stopped. The predetermined value is a predetermined value indicating that a potential of the sample when the DC voltage is almost 0 V becomes almost 0 V. The predetermined time is a time defined on the basis of a time when charged particles generated by the plasma processing disappear or a time when an afterglow discharge disappears.

Abstract: A receptacle comprises a shell made of metal and a cage formed of one or more metal plates. The shell is attachable to a case made of metal. The cage is mountable on a board arranged in the case. The cage receives an internal module under a mated state where the receptacle is mated with a plug. The cage has a cage rear plate and is provided with a terminal made of metal and a contact portion made of metal. The terminal extends downward from the cage rear plate. The contact portion is nearer to the cage rear plate than to the front end of the cage in a front-rear direction. When the cage is mounted on the board and the shell is attached to the case, the shell covers the cage, the terminal is fixed to the board, and the contact portion is pressed against the shell.

Abstract: A plurality of optical fiber groups are housed in an optical fiber cable and which of the optical fiber groups optical fibers, which constitute the optical fiber groups, belong to can be identified depending on a covering of the optical fibers. Each of optical connectors (plug, receptacle) which are respectively attached to both ends of the optical fiber cable has regions, in which insertion holes in which the optical fibers are inserted and fixed one by one are formed to be arranged in a predetermined interval, in the same number as the number of the optical fiber groups, and even though the optical fibers in one optical fiber group are inserted and fixed in the insertion holes in an identical region, an arrangement order of the optical fibers in the region of the optical connector provided on one end is not maintained as an arrangement order of the optical fibers in the region of the optical connector provided on the other end.

Abstract: An optical connector includes a connector housing that holds a ferrule such that the ferrule is allowed to move backward along a connecting direction, and the optical fiber in the connector housing has at least one loop element each having a tangential line along the connecting direction and a pair of tangential line portions connected to the at least one loop element and is held in such a manner as not to prevent a radius of curvature of the at least one loop element from becoming larger as the ferrule moves backward along the connecting direction.

Abstract: Provided is a state prediction apparatus that predicts a state of the plasma processing apparatus, a first set of features that indicates the state of the plasma processing apparatus is determined based on monitored data of the plasma processing apparatus in a normal state, a second set of features that indicates the state of the plasma processing apparatus is determined based on monitored data of the plasma processing apparatus, the features in the second set are calculated by using the features in the first set, a model that predicts the state of the plasma processing apparatus is generated by using a subset of the first set of features, which is composed of the same kind of features selected in descending order of the calculated features in the second set, and the state of the plasma processing apparatus is predicted by using the generated model.

Abstract: A sample releasing method for releasing a sample subjected to plasma processing from a sample stage on which the sample is electrostatically attracted by applying DC voltage to an electrostatic chuck electrode, and the method includes: moving the sample subjected to the plasma processing upward above the sample stage; and after moving the sample, controlling the DC voltage such that an electric potential of the sample is to be smaller.

Abstract: A sample releasing method for releasing a sample subjected to plasma processing from a sample stage on which the sample is electrostatically attracted by applying DC voltage to an electrostatic chuck electrode, and the method includes: moving the sample subjected to the plasma processing upward above the sample stage; and after moving the sample, controlling the DC voltage such that an electric potential of the sample is to be smaller.

Abstract: A plasma processing apparatus includes a plasma processing chamber processing a sample using plasma, a radio frequency power supply supplying radio frequency power for generating the plasma, a sample stage including an electrode electrostatically chucking the sample, mounting the sample thereon, a DC power supply applying DC voltage to the electrode, and a control device shifting the DC voltage previously set, in a negative direction by a first shift amount during discharge of the plasma, shifting the DC voltage having been shifted in the negative direction by the first shift amount, in a positive direction by a second shift amount after the discharge of the plasma. The first shift amount has a value changing potential over a surface of the sample to 0 V, upon shifting the DC voltage in the positive direction. The second shift amount has a value obtained based on a floating potential of the plasma.

Abstract: A plasma processing apparatus includes a plasma processing chamber processing a sample using plasma, a radio frequency power supply supplying radio frequency power for generating the plasma, a sample stage including an electrode electrostatically chucking the sample, mounting the sample thereon, a DC power supply applying DC voltage to the electrode, and a control device shifting the DC voltage previously set, in a negative direction by a first shift amount during discharge of the plasma, shifting the DC voltage having been shifted in the negative direction by the first shift amount, in a positive direction by a second shift amount after the discharge of the plasma. The first shift amount has a value changing potential over a surface of the sample to 0 V, upon shifting the DC voltage in the positive direction. The second shift amount has a value obtained based on a floating potential of the plasma.

Abstract: A suspended-matter removing method and a suspended-matter removing apparatus are disclosed that require no sludge treatment facility, and inexpensively provide filtrate satisfying a water quality standard. The suspended-matter removing method includes: feeding a protrusion element to a filter layer formed by filling a solid filter material, adding a protrusion to a surface of the solid filter material; after feeding protrusion element, determining whether a protrusion has been added to the surface of the solid filter material, and when it is determined that the protrusion has been added, reducing a feeding amount of the protrusion element as compared with when adding the protrusion; forming a biofilm on the surface of the solid filter material; and passing water to be treated containing suspended matters through the filter layer having the solid filter material added with the protrusion in a state in which the feeding amount of the protrusion element is reduced.