Patents by Inventor Masaki Ohwa
Masaki Ohwa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150056554Abstract: Compounds of formula (I), (II), and (III), wherein R1, R2, R?2 and R??2 for example are C1-C20alkyl, provided that at least one of R1, R2, R?2 and R??2 carries a specified substituent; R3, R4, and R5 for example independently of one another are hydrogen or a defined substituent provided that at least one of R3, R4 or R5 is other than hydrogen or C1-C20alkyl; R6, R7, R8, R?7, RV, R?8, R?6, R?7, R??6 and R??7 for example independently of one another have one of the meanings as given for R3, R4, and R5; and R9 for example is C1-C20alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.Type: ApplicationFiled: November 7, 2014Publication date: February 26, 2015Applicant: CIBA CORPORATIONInventors: Akira Matsumoto, Junichi Tanabe, Hisatoshi Kura, Masaki Ohwa
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Patent number: 8940464Abstract: Compounds of the formula (I), (II), and wherein R1, R2, R?2 and R??2 for example are C1-C20alkyl; R3, R4, and R5 for example independently of one another are hydrogen or a defined substituent provided that at least one of R3, R4 or R5 is other than hydrogen or C1-C20alkyl; R6, R7, R8, R?6, R?7, R?8, R?6, R?7, R??6 and R??7 for example independently of one another have one of the meanings as given for R3, R4, and R5; and R9 for example is C1-C20alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.Type: GrantFiled: November 8, 2006Date of Patent: January 27, 2015Assignee: BASF SEInventors: Akira Matsumoto, Junichi Tanabe, Hisatoshi Kura, Masaki Ohwa
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Patent number: 8916621Abstract: The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking.Type: GrantFiled: July 11, 2013Date of Patent: December 23, 2014Assignee: BASF SEInventors: Hisatoshi Kura, Kaori Sameshima, Kazuhiko Kunimoto, Peter Nesvadba, Masaki Ohwa
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Patent number: 8911921Abstract: Compounds of formula (I), (II), and (III), wherein R1, R2, R?2 and R??2 for example are C1-C20alkyl, provided that at least one of R1, R2, R?2 and R??2 carries a specified substituent; R3, R4, and R5 for example independently of one another are hydrogen or a defined substituent provided that at least one of R3, R4 or R5 is other than hydrogen or C1-C20alkyl; R6, R7, R8, R?7, RV, R?8, R?6, R?7, R??6 and R??7 for example independently of one another have one of the meanings as given for R3, R4, and R5; and R9 for example is C1-C20alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.Type: GrantFiled: April 24, 2008Date of Patent: December 16, 2014Assignee: Ciba CorporationInventors: Akira Matsumoto, Junichi Tanabe, Hisatoshi Kura, Masaki Ohwa
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Patent number: 8900779Abstract: The invention relates to a color filter composition comprising a) a photoresist binder, b) a transparent pigment, c) optionally a solvent and/or optionally a photoinitiator or a photolatent catalyst, d) a dispersant which is a polymer or copolymer obtainable by a process comprising the steps of a1) polymerizing in a first step one or more ethylenically unsaturated monomers in the presence of at least one nitroxylether having the structural element wherein X represents a group having at least one carbon atom and is such that the free radical X derived from X is capable of initiating polymerization; or a2) polymerizing in a first step one or more ethylenically unsaturated monomers in the presence of at least one stable free nitroxyl radical and a free radical initiator; wherein at least one monomer used in the steps a1) or a2) is a C1-C6 alkyl or hydroxy C1-C6 alkyl ester of acrylic or methacrylic acid; and a second step b) comprising the modification of the polymer or copolymer prepared under a1) or a2) by a tType: GrantFiled: July 2, 2007Date of Patent: December 2, 2014Assignee: Ciba CorporationInventors: Carsten Schellenberg, Clemens Auschra, Masaki Ohwa, Junichi Tanabe, Mamiko Takesue
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Patent number: 8586268Abstract: Compounds of the Formula (I) and (II) wherein M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2 or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is a direct bond, CR?3R?4, CS, O, S, SO, or SO2; Y is S or NR18; R1 for example is hydrogen, C3-C8cycloalkyl, phenyl or naphthyl, both of which are optionally substituted; R2 for example is C1-C20alkyl; R?2 has one of the meanings given for R2; R3 and R4 are for example hydrogen, halogen, C1-C20alkyl; R?3, R?4, R?3 and R?4 independently of one another have one of the meanings given for R3 and R4; and R5 is for example hydrogen, halogen, C1-C20alkyl; provided that in the compounds of the Formula (I) at least two oxime ester groups are present; exhibit an unexpectedly good performance in photopolymerization reactions.Type: GrantFiled: November 9, 2006Date of Patent: November 19, 2013Assignee: BASF SEInventors: Akira Matsumoto, Junichi Tanabe, Hisatoshi Kura, Masaki Ohwa
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Publication number: 20130302728Abstract: The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking.Type: ApplicationFiled: July 11, 2013Publication date: November 14, 2013Applicant: BASF SEInventors: Hisatoshi Kura, Kaori Sameshima, Kazuhiko Kunimoto, Peter Nesvadba, Masaki Ohwa
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Patent number: 8524425Abstract: Compounds of the formula (I) and (II) M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2 or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is a direct bond, CR?3R?4, CS, O, S, SO, or SO2; Y is S or NR18; R1 for example is hydrogen, C3-C8cycloalkyl, phenyl or napthyl, both of which are optionally substituted; R2 for example is C1-C20alkyl; R?2 has one of the meanings given for R2; R3 and R4 are for example hydrogen, halogen, C1-C20alkyl; R?3, R?4, R?3 and R?4 independently of one another have one of the meanings given for R3 and R4; and R5 is for example hydrogen, halogen, C1-C20alkyl; provided that in the compounds of the formula (I) at least two oxime ester groups are present and provided that at least one specified substituent R2 or R?2 is present; exhibit an unexpectedly good performance in photopolymerization reactions.Type: GrantFiled: April 28, 2008Date of Patent: September 3, 2013Assignee: BASF SEInventors: Akira Matsumoto, Junichi Tanabe, Hisatoshi Kura, Masaki Ohwa
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Patent number: 8507569Abstract: The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking.Type: GrantFiled: March 17, 2010Date of Patent: August 13, 2013Assignee: BASF SEInventors: Hisatoshi Kura, Kaori Sameshima, Kazuhiko Kunimoto, Peter Nesvadba, Masaki Ohwa
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Patent number: 8349548Abstract: Compounds of the formula (I), wherein A1 is formula (II); A2 is formula (III); A3 is formula (IV); A4 is formula (V); w, x, y and z independently of each other are an integer from 0-4, provided that the sum of x+y+z is an integer from 2-4, corresponding to the valency of Q; M1, M2, M3 and M4 for example are a direct bond, CO or O; Y for example is a direct bond or S; Q is a (x+y)-valent linking group; R1 is for example hydrogen, C1-C20alkyl or phenyl or naphthyl; R2 and R?2 for example are is hydrogen or C1-C20alkyl; R3, R4, R?3, R?4, R?3 and R?4 for example are hydrogen, halogen, phenyl, or C1-C20alkyl; and R24 is for example a direct bond; exhibit an unexpectedly good performance in photopolymerization reactions.Type: GrantFiled: April 28, 2008Date of Patent: January 8, 2013Assignee: BASF SEInventors: Akira Matsumoto, Junichi Tanabe, Hisatoshi Kura, Masaki Ohwa
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Publication number: 20120038996Abstract: The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking.Type: ApplicationFiled: March 17, 2010Publication date: February 16, 2012Applicant: BASF SEInventors: Hisatoshi Kura, Kaori Sameshima, Kazuhiko Kunimoto, Peter Nesvadba, Masaki Ohwa
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Patent number: 7905952Abstract: The invention pertains to pigment compositions comprising from 70 to 93%, preferably from 81 to 93%, of e copper phthalocyanine, from to 18% of an aminomethyl-substituted phthalocyanine, from 2 to 15% of an ammonium sulfonato phthalocyanine and less than 2% of other phthalocyanine compounds, preferably 5 made by wet-milling a mixture of a copper phthalocyanine and e copper phthalocyanine together with the aminomethyl-substituted phthalocyanine and a milling aid in an organic liquid and adding the ammonium sulfonato phthalocyanine before the milling aid and the organic liquid are separated from the wet-milled mixture.Type: GrantFiled: January 28, 2008Date of Patent: March 15, 2011Assignee: BASF SEInventors: HyeonKook Lee, JangWon Jung, Takashi Deno, Masaki Ohwa
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Patent number: 7829257Abstract: Photosensitive compositions comprising (A) an alkali soluble compound; (B) at least one compound, of formula I or II wherein R1 inter alia is C4-C9cycloalkanoyl, C3-C12alkenoyl, or benzoyl which is unsubstituted or substituted; Ar1 is either C6-C20aryl or C6-C20aryloyl each of which is unsubstituted or substituted; x is 2 or 3; M1 when x is 2, inter alia is a group phenylene or naphthylene, each of which optionally is substituted i.a.Type: GrantFiled: December 12, 2000Date of Patent: November 9, 2010Assignee: Ciba Specialty Chemicals Corp.Inventors: Hidetaka Oka, Kazuhiko Kunimoto, Hisatoshi Kura, Masaki Ohwa, Junichi Tanabe
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Publication number: 20100188765Abstract: Compounds of the Formula (I) and (II) wherein M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2 or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is a direct bond, CR?3R?4, CS, O, S, SO, or SO2; Y is S or NR18; R1 for example is hydrogen, C3-C8cycloalkyl, phenyl or naphthyl, both of which are optionally substituted; R2 for example is C1-C20alkyl; R?2 has one of the meanings given for R2; R3 and R4 are for example hydrogen, halogen, C1-C20alkyl; R?3, R?4, R?3 and R?4 independently of one another have one of the meanings given for R3 and R4; and R5 is for example hydrogen, halogen, C1-C20alkyl; provided that in the compounds of the Formula (I) at least two oxime ester groups are present; exhibit an unexpectedly good performance in photopolymerization reactions.Type: ApplicationFiled: November 9, 2006Publication date: July 29, 2010Inventors: Akira Matsumoto, Junichi Tanabe, Hisatoshi Kura, Masaki Ohwa
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Patent number: 7759043Abstract: Compounds of the formula (I), wherein R1, R2 and R10 independently of one another are C1-C20alkyl, phenyl, C1-C12alkylphenyl or phenyl-C1-C6alkyl; R3 and R4 independently of one another are hydrogen, C1-C20alkyl, NR6R7 or SR8, provided that at least one of R3 or R4 is NR6R7 or SR8; R5 is hydrogen or C1-C20alkyl; R6 and R7 independently of one another are C1-C20alkyl, or R6 and R7 together with the N-atom to which they are attached form a 5 or 6 membered ring, which optionally is interrupted by O, S or NR9 and which optionally additionally is substituted by one or more C1-C4alkyl; R8 is phenyl, biphenylyl, naphthyl, anthryl or phenanthryl, all of which optionally are substituted by one or more C1-C4alkyl; and R9 is hydrogen, C1-C20alkyl, C2-C4hydroxyalkyl or phenyl; exhibit an unexpectedly good performance in photopolymerization reactions.Type: GrantFiled: August 8, 2005Date of Patent: July 20, 2010Assignee: Ciba Specialty Chemicals Corp.Inventors: Junichi Tanabe, Kazuhiko Kunimoto, Hisatoshi Kura, Hidetaka Oka, Masaki Ohwa
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Publication number: 20100136491Abstract: Compounds of formula (I), (II), and (III), wherein R1, R2, R?2 and R??2 for example are C1-C20alkyl, provided that at least one of R1, R2, R?2 and R??2 carries a specified substituent; R3, R4, and R5 for example independently of one another are hydrogen or a defined substituent provided that at least one of R3, R4 or R5 is other than hydrogen or C1-C20alkyl; R6, R7, R8, R?7, RV, R?8, R?6, R?7, R??6 and R??7 for example independently of one another have one of the meanings as given for R3, R4, and R5; and R9 for example is C1-C20alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.Type: ApplicationFiled: April 24, 2008Publication date: June 3, 2010Inventors: Akira Matsumoto, Junichi Tanabe, Hisatoshi Kura, Masaki Ohwa
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Publication number: 20100136467Abstract: Compounds of the formula (I) and (II) M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is a direct bond, CR?3R?4, CS, O, S, SO, or SO2; Y is S or NR18; R1 for example is hydrogen, C3-C8cycloalkyl, phenyl or napthyl, both of which are optionally substituted; R2 for example is C1-C20alkyl; R?2 has one of the meanings given for R2; R3 and R4 are for example hydrogen, halogen, C1-C20alkyl; R?3, R?4, R?3 and R?4 indepedently of one another have one of the meanings given for R3 and R4; and R5 is for example hydrogen, halogen, C1-C20alkyl; provided that in the compounds of the formula (I) at least two oxime ester groups are present and provided that at least one specified substituent R2 or R?2 is present; exhibit an unexpectedly good performance in photopolymerization reactions.Type: ApplicationFiled: April 28, 2008Publication date: June 3, 2010Inventors: Akira Matsumoto, Junichi Tanabe, Hisatoshi Kura, Masaki Ohwa
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Publication number: 20100086881Abstract: Compounds of the formula (I), wherein A1 is formula (II); A2 is formula (III); A3 is formula (IV); A4 is formula (V); w, x, y and z independently of each other are an integer from 0-4, provided that the sum of x+y+z is an integer from 2-4, corresponding to the valency of Q; M1, M2, M3 and M4 for example are a direct bond, CO or O; Y for example is a direct bond or S; Q is a (x+y)-valent linking group; R1 is for example hydrogen, C1-C20alkyl or phenyl or naphthyl; R2 and R?2 for example are is hydrogen or C1-C20alkyl; R3, R4, R?3, R?4, R?3 and R?4 for example are hydrogen, halogen, phenyl, or C1-C20alkyl; and R24 is for example a direct bond; exhibit an unexpectedly good performance in photopolymerization reactions.Type: ApplicationFiled: April 28, 2008Publication date: April 8, 2010Inventors: Akira Matsumoto, Junichi Tanabe, Hisatoshi Kura, Masaki Ohwa
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Patent number: 7648738Abstract: Compounds of the formulae (I), (II), (III) and (IV), wherein Ch1 is e.g. the formula (V) or (VI); Ch2 is the formula (VII) or (VIII); Het1 is for example furyl, thienyl, pyrrolyl, pyridyl, benzothienyl, quinolyl or bithienyl; each of which is optionally substituted; Het2 and Het2? e.g. are furylene, thienylene, pyrrolylene, benzothienylene, quinolylene, furylenecarbonyl, thienylenecarbonyl, benzothienylenecarbonyl or bithienylenecarbonyl; each of which is optionally substituted; A1, and Ar1? i.a. are phenyl, naphthyl, benzoyl or naphthoyl, each of which is optionally substituted; Ar2 is for example phenylene, optionally substituted; M i.a. is C1-C20alkylene; R1 is for example C1-C12alkyl or phenyl; R2 and R2? for example are hydrogen or C1-C20 alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.Type: GrantFiled: November 24, 2003Date of Patent: January 19, 2010Assignee: Ciba Specialty Chemicals CorporationInventors: Junichi Tanabe, Hisatoshi Kura, Hidetaka Oka, Masaki Ohwa
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Publication number: 20090293769Abstract: The invention pertains to pigment compositions comprising from 70 to 93%, preferably from 81 to 93%, of e copper phthalocyanine, from to 18% of an aminomethyl-substituted phthalocyanine, from 2 to 15% of an ammonium sulfonato phthalocyanine and less than 2% of other phthalocyanine compounds, preferably 5 made by wet-milling a mixture of a copper phthalocyanine and e copper phthalocyanine together with the aminomethyl-substituted phthalocyanine and a milling aid in an organic liquid and adding the ammonium sulfonato phthalocyanine before the milling aid and the organic liquid are separated from the wet-milled mixture.Type: ApplicationFiled: January 28, 2008Publication date: December 3, 2009Applicant: CIBA CORPORATIONInventors: Hyeonkook Lee, JangWon Jung, Takashi Deno, Masaki Ohwa