Patents by Inventor Masaki Ohwa

Masaki Ohwa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040209186
    Abstract: New oxime sulfonate compounds of the formula (I) and (II), wherein R1 is C1-C12alkyl, C1-C4haloalkyl, hydrogen, OR9, NR10R11, SR12 or is phenyl which is unsubstituted or substituted by OH, C1-C18alkyl, halogen and/or C1-C12alkoxy; R2, R3, R4 and R5 are for example hydrogen or C1-C12alkyl; R6 is for example is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl or phenylsulfonyl; R′6 is for example phenylenedisulfonyl or diphenylenedisulfonyl; R7, R8 and R9 for example are hydrogen or C1-C6alkyl; R10 and R11, are for example hydrogen or C1-C18alkyl; R12 is for example hydrogen, phenyl or C1-C18alkyl; A is S, O, NR13, or a group of formula A1, A2 or A3, R21 and R22 independently of one other have one of the meanings given for R7; R23, R24, R25 and R26 independently of one another are for example hydrogen, C1-C4alkyl, halogen or phenyl; Z is CR22 or N; and Z1 is CR22 or N; and Z1 is CR22 or N; and Z1 is CH2-, S, O or NR13 are particularly suitable as photo-latent acids in resist applications.
    Type: Application
    Filed: November 26, 2003
    Publication date: October 21, 2004
    Inventors: Akira Matsumoto, Hitoshi Yamato, Toshikage Asakura, Masaki Ohwa, Peter Murer
  • Patent number: 6806024
    Abstract: Radically photopolymerizable compositions comprising (a) at least one ethylenically unsaturated photopolymerizable compound; (b) as photoinitiator, at least one compound of formulae (I, II, III, IV, V and/or VI), wherein m is 0 or 1; n is 0, 1, 2 or 3; x is 1 or 2; R1 is inter alia phenyl, naphthyl, anthracyl or phenanthryl, a heteroaryl radical, C2-C12alkenyl, C4-C8cycloalkenyl, or C6-C12bicycloalkenyl; R′1 is inter alia C2-C12alkylene, or phenylene; R2 has one of the meanings of R1 or inter alia is phenyl; y is 1 or 2; R3 if x is 1 inter alia is C1-C18alkylsulfonyl, or phenyl-C1-C3alkylsulfonyl, R3 if x is 2, is for example C2-C12alkylenedisulfonyl; R4 and R5 inter alia are hydrogen, halogen, or C1-C8alkyl; R6, R7, R8 inter alia are hydrogen, R26Y—, or phenyl; R9 inter alia is C5-C8cycloalkyl, or phenyl; A is for example —S—, —O—, or —NR10—; Q is C1-C8-alkylene optionally interrupted by —O—; X is —O— or —NR9—; R10 inter alia
    Type: Grant
    Filed: August 27, 2001
    Date of Patent: October 19, 2004
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Hisatoshi Kura, Hitoshi Yamato, Masaki Ohwa, Kurt Dietliker
  • Publication number: 20040192804
    Abstract: A photosensitive composition comprising, (A) an oligomer or polymer containing at least one carboxylic acid group in the molecule and having a molecular weight of 200′ooo or less; (B) at least one photoinitiator compound of formula I, R1, is lenear or banched C1-C12alkyl; R2 is linear or branched C1-C4alkyl; R3 and R4 independently of one another are linear or branched C1-C8alkyl; and (C) a monomeric, oligoneric or polymeric compound having at least one olefinic double bond, is especially suitable for preparting photoresists, in particular color filters.
    Type: Application
    Filed: January 20, 2004
    Publication date: September 30, 2004
    Inventors: Hisatoshi Kura, Hidetaka Oka, Masaki Ohwa
  • Publication number: 20040170924
    Abstract: Compounds of the formulae I, II and III 1
    Type: Application
    Filed: December 8, 2003
    Publication date: September 2, 2004
    Inventors: Kazuhiko Kunimoto, Junichi Tanabe, Hisatoshi Kura, Hidetaka Oka, Masaki Ohwa
  • Publication number: 20040053158
    Abstract: A chemically amplified photoresist composition comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) as photosensitive acid donor, at least one compound of the formula Ia, Ib, Ic, IIb or IIc wherein R1 is for example C1-Calkyl, C3-C30cycloalkyl, C1-C5haloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, C6-C12bicycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, or is a heteroaryl radical; all of which are unsubstituted or substituted; optionally some of the substituents form 5- or 6-membered rings with further substituents on the phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl ring or with one of the carbon atoms of the phenyl, naphtyl, anthracyl, phenanthryl, or heteroaryl ring; R′1 is for example C1-C12alkylene, C3-C30cycloalkylene, phenylene, naphtylene, diphenylene, or oxydiphenylene, wherein these radicals are unsubstituted or substituted; A and B for example are a direct bond; Ar1 and Ar2 independently
    Type: Application
    Filed: May 21, 2003
    Publication date: March 18, 2004
    Inventors: Hitoshi Yamato, Toshikage Asakura, Akira Matsumoto, Masaki Ohwa
  • Patent number: 6673850
    Abstract: Photoinitiators of formula (Ia) or (Ib) having chain transfer groups, wherein n is 1 or 2; PI is for example a group of formula (IIa); PI′ inter alia is a group of formula (IIIa); Ar is for example phenyl; Ar2 is inter alia phenylene; R1 and R2 are for example C1-C8alkyl, or R1 and R2 together C2-C9alkylene; M1 inter alia is —NR3R4 or —OH; M1′ is for example a group (c); R3′ is a direct bond, C1-C12alkylene, or phenylene; R3 is for example hydrogen, or C1-C12alkyl; R4 is e.g. C1-C12alkyl; A1 and A2 are for example a direct bond; CT is a chain transfer group; are useful for the preparation of macrophotoinitiators which can be employed for preparing block copolymers.
    Type: Grant
    Filed: October 18, 2001
    Date of Patent: January 6, 2004
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Hitoshi Yamato, Masaki Ohwa, Toshikage Asakura, Akira Matsumoto
  • Publication number: 20040002007
    Abstract: New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VII 1 2
    Type: Application
    Filed: March 10, 2003
    Publication date: January 1, 2004
    Inventors: Yamato Hitoshi, Toshikage Asakura, Akira Matsumoto, Masaki Ohwa
  • Patent number: 6596445
    Abstract: Oximeester compounds of the formulae I, II, III and IV wherein R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, C
    Type: Grant
    Filed: June 23, 1999
    Date of Patent: July 22, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Akira Matsumoto, Hidetaka Oka, Masaki Ohwa, Hisatoshi Kura, Jean-Luc Birbaum, Kurt Dietliker
  • Patent number: 6512020
    Abstract: Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g.
    Type: Grant
    Filed: March 28, 2001
    Date of Patent: January 28, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Toshikage Asakura, Hitoshi Yamato, Masaki Ohwa, Jean-Luc Birbaum, Kurt Dietliker, Junichi Tanabe
  • Patent number: 6485885
    Abstract: Compositions comprising (A) an oligomer or polymer containing at least one carboxylic acid group in the molecule; (B) at least one compound of formulas (I, II, III, IV, V or VI), wherein R1 inter alia is phenyl or alkyl; R2 is for example C2-C12alkonoyl which is unsubstituted or substituted or is benzoyl; R3, R4, R5, R6 and R7 independently of one another are for instance hydrogen, C1-C12alkyl, cyclohexyl or phenyl which is unsubstituted or substituted, or are benzyl, benzoyl, C2-C12alkanoyl or phenoxycarbonyl; R8 is for example hydrogen or C1-C12alkyl or a group (B); M is for example C1-C12alkylene, cyclohexylene or phenylene; M1 inter alia is a direct bond or C1-C12alkylenoxy; and Ar is a 5- or 6-membered aromatic heterocyclic ring; (C) a photopolymerizable reactive or unreactive diluent; and (D) as a thermosetting component an epoxy compound containing at least two epoxy groups in one molecule; are highly suitable as resists which are alkaline developable.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: November 26, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Hidetaka Oka, Masaki Ohwa, Akira Matsumoto, Hisatoshi Kura
  • Patent number: 6458864
    Abstract: Compounds with chain transfer groups of the formula I, II, III and IV wherein a is 1 or 2; Ar and Ar1 inter alia are phenyl; Ar2 inter alia is phenylene, these groups being unsubstituted or substituted; X is a direct bond, —O—, —S— or —N(R6)—; Y inter alia is hydrogen or C1-C12alkyl; M1 is —NR3R4 or —OH, or M1 is Ar when R1 and R2 are alkoxy, or aryloxy; R1 and R2 independently of one another e.g. are C1-C8alkyl; R3 and R4 for example are C1-C12alkyl, or together are C3-C7alkylene; R5 inter alia is C1-C6alkylene or a direct bond; R6 is for example hydrogen; and Z is a divalent radical, provided that at least one of the radicals Ar, Ar1, Ar2, R1, R2, R3, R4, R5 or Y is substituted by SH groups; are suitable for the thermal preparation of macrophotoinitiators which are polymerized photochemically to give block-copolymers.
    Type: Grant
    Filed: November 27, 2000
    Date of Patent: October 1, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Toshikage Asakura, Masaki Ohwa, Hitoshi Yamato, Asako Ito
  • Publication number: 20020020832
    Abstract: Photosensitive compositions comprising
    Type: Application
    Filed: December 12, 2000
    Publication date: February 21, 2002
    Inventors: Hidetaka Oka, Kazuhiko Kunimoto, Hisatoshi Kura, Masaki Ohwa, Junichi Tanabe
  • Publication number: 20010012596
    Abstract: Compounds of the formulae I, II, III, IV and V 1
    Type: Application
    Filed: December 12, 2000
    Publication date: August 9, 2001
    Inventors: Kazuhiko Kunimoto, Hidetaka Oka, Masaki Ohwa, Junichi Tanabe, Hisatoshi Kura, Jean-Luc Birbaum
  • Patent number: 6261738
    Abstract: Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g.
    Type: Grant
    Filed: March 23, 2000
    Date of Patent: July 17, 2001
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Toshikage Asakura, Hitoshi Yamato, Masaki Ohwa, Jean-Luc Birbaum, Kurt Dietliker, Junichi Tanabe
  • Patent number: 6022906
    Abstract: Compounds of the formulae I, II, III and IV ##STR1## wherein Ar for example is a phenyl, biphenyl or benzoylphenyl group, which is unsubstituted or substituted; Ar.sub.1, for example, has the same meanings as Ar; Ar.sub.2 is inter alia phenyl; X may be a direct bond; Y hydrogen, etc.; R.sub.1 and R.sub.2 for example C.sub.1 -C.sub.8 alkyl; R.sub.3 inter alia hydrogen or C.sub.1 -C.sub.12 alkyl; R.sub.4 is inter alia C.sub.1 -C.sub.12 alkyl; or R.sub.3 and R.sub.4 together are C.sub.3 -C.sub.7 alkylene; R.sub.5 is for example C.sub.1 -C.sub.6 alkylene; and Z is a divalent radical; provided that at least one of the radicals Ar, Ar.sub.1, Ar.sub.2, Ar.sub.3, R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 or Y is substituted by 1 to 5 SH groups, or provided that Y contains at least one --SS-- group, are photoinitiators for the polymerization of ethylenically unsaturated compounds.
    Type: Grant
    Filed: December 1, 1997
    Date of Patent: February 8, 2000
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Masaki Ohwa, Hitoshi Yamoto, Jean-Luc Birbaum, Hiroko Nakashima, Akira Matsumoto, Hidetaka Oka
  • Patent number: 5427715
    Abstract: A composition comprising a) at least one polyheteroaromatic compound or one polyaniline in oxidized, polycationic form, and b) at least one polyanion of a film-forming thermoplastic polymer having sulfonate-alkylated alcohol groups ##STR1## in structural repeating units, wherein the group --(C.sub.n H.sub.2n)-- is linear or branched C.sub.2 -C.sub.12 -alkylene that has from 2 to 5 carbon atoms in the carbon chain and is unsubstituted or substituted by C.sub.1 -C.sub.4 alkoxy. The composition is electrically conductive and can be processed thermoplastically. It can be used in the production of moulded articles or in the form of powders as a filler for plastics.
    Type: Grant
    Filed: April 8, 1993
    Date of Patent: June 27, 1995
    Assignee: Ciba-Geigy Corporation
    Inventors: Masaki Ohwa, Jurgen Finter, Wolfgang Wernet
  • Patent number: 5382382
    Abstract: A sheet-like heating element using an electrically conductive polymer complex consisting of a) a polycation of polyheteroaromatic compound; and b) a polyanion of thermoplastic polymer, containing a sulfated alcohol group in the repeating structural unit, having film-forming properties.
    Type: Grant
    Filed: March 11, 1993
    Date of Patent: January 17, 1995
    Assignee: Japat Ltd.
    Inventors: Toshikage Asakura, Wolfgang Wernet, Masaki Ohwa, Kenichiro Kai