Patents by Inventor Masaki Takeuchi
Masaki Takeuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20020179576Abstract: A glass substrate having a surface which has been leveled, preferably to a flatness of 0.04-1.3 nm/cm2 of the surface, by local plasma etching is provided. A glass substrate whose surface carries microscopic peaks and valleys is leveled by measuring the height of peaks and valleys on the substrate surface, and plasma etching the substrate surface while controlling the amount of plasma etching in accordance with the height of peaks.Type: ApplicationFiled: April 19, 2002Publication date: December 5, 2002Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Masaki Takeuchi, Yukio Shibano
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Publication number: 20020170680Abstract: The lamination apparatus of this invention enables the operator to keep working without paying attention to the remaining length of the laminating film. The lamination apparatus is used to make lamination layers with a transparent or semitransparent laminating film pasted on such printed matters as posters, advertising fliers or computer output media. The laminate apparatus comprise the following systems and units. Measuring system containing encoder 13 to measure the length of laminate film A pulled out from original roll. Input system 16 for the length of laminate film A set in advance. Calculation system to subtract pulled-out length of laminate film A from that of the original film roll 4. Display unit 17 to indicate the subtracted value of laminate film. Alarm system for issuing a warning when the subtracted value reaches some certain level or less.Type: ApplicationFiled: February 22, 2002Publication date: November 21, 2002Inventors: Yasuhiro Shimizu, Masaki Takeuchi, Yasuaki Matsui, Masaki Koroyasu, Akira Okuno, Katsushige Tsukuya, Daimon Ueda
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Publication number: 20020155361Abstract: A glass substrate is to be used as a photomask having a patterned light-shielding film on a surface thereof and thus exposed to light. The substrate is leveled by local plasma etching such that an exposure surface may have a flatness of 0.04-2.2 nm/cm2. Since the glass substrate is configured such that the exposure surface or hold surface of the resulting photomask is fully flat during the exposure step, it is suited for use as silica glass substrates for photomasks used in the photolithography of great interest in the fabrication of ICs, thus contributing to the achievement of finer patterns in the semiconductor field.Type: ApplicationFiled: April 19, 2002Publication date: October 24, 2002Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Masaki Takeuchi, Yukio Shibano
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Patent number: 6441539Abstract: A piezoelectric resonator includes a laminated structure having a piezoelectric laminate, at least one pair of electrodes and a substrate. The piezoelectric laminate includes at least one first piezoelectric layer having a positive temperature coefficient of a resonant frequency and at least one second piezoelectric layer which has a negative temperature coefficient of a resonant frequency. The at least one pair of electrodes interpose at least one of the first and second piezoelectric layers. The substrate supports the laminated structure and holds a portion of the laminated structure such that a suspended portion of the laminated structure vibrates in response to application of a voltage across the pair of electrodes.Type: GrantFiled: November 6, 2000Date of Patent: August 27, 2002Assignee: Murata Manufacturing Co., Ltd.Inventors: Hidekazu Kitamura, Kazuhiro Inoue, Masaki Takeuchi
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Publication number: 20020078710Abstract: A silica glass substrate is obtained by polishing, cleaning, drying and etching a silica glass substrate slice. When the substrate on one surface is treated with a reactive reagent, defects having a size of at least 0.3 &mgr;m in a direction parallel to the substrate major surface are absent on the substrate surface. The silica glass substrate, in which no submicron defects manifest on the substrate surface even when treated as by cleaning or etching, serves as a reticle for use in photolithographic IC fabrication, achieving an improved manufacturing yield in the semiconductor device fabrication and microelectronic system fields.Type: ApplicationFiled: December 27, 2001Publication date: June 27, 2002Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Masaki Takeuchi, Atsushi Watabe, Tetsushi Tsukamoto, Yukio Shibano
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Patent number: 6388032Abstract: A cyclic olefin polymer having a small content of a catalyst residue, a production process for the same and use of the same as an optical material. Catalysts used for polymerization and/or hydrogenation reaction for forming the cyclic olefin polymer are decomposed efficiently by adding at least one compound selected from the group consisting of an &agr;-oxyacid and &bgr;-oxyacid having one hydroxyl group and one carboxyl group in the molecule and derivatives obtained by substituting hydroxyl group thereof by an alkoxyl group, and the decomposition products are removed by rendering them insoluble in a reaction solvent used for the polymerization and/or hydrogenation reaction and precipitating them efficiently.Type: GrantFiled: April 14, 2000Date of Patent: May 14, 2002Assignee: Teijin LimitedInventors: Michio Yamaura, Kiyonari Hashidzume, Hideaki Nitta, Masaki Takeuchi, Kaoru Iwata
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Publication number: 20020030420Abstract: A highly compact piezoelectric resonator having excellent resonant characteristics and very small resonant resistance includes an upper electrode disposed on one of two main surfaces of a piezoelectric film and a lower electrode disposed on the other main surface of the piezoelectric film. The upper electrode includes a first external-signal extracting electrode, a first leading electrode, and three first vibrating electrodes. The lower electrode includes a second external-signal extracting electrode, a second leading electrode, and three second vibrating electrodes. The three first vibrating electrodes are arranged substantially perpendicularly to the three second vibrating electrodes via the piezoelectric film. Vibrating sections are located at positions where the first vibrating electrodes are arranged substantially perpendicularly to the second vibrating electrodes.Type: ApplicationFiled: August 28, 2001Publication date: March 14, 2002Inventors: Norimitsu Tsukai, Masaki Takeuchi, Yukio Yoshino
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Publication number: 20020008443Abstract: A method for manufacturing a thin film is performed such that the internal stress is controlled while the preferred orientation property is maintained at a high value. An AlN piezoelectric thin film is formed on a substrate by a sputtering method using a mixed gas including Ar and nitrogen, wherein the mixed gas has a nitrogen flow rate ratio, that is, nitrogen flow rate relative to the sum of the Ar flow rate and the nitrogen flow rate, of about 10% to about 75%.Type: ApplicationFiled: June 5, 2001Publication date: January 24, 2002Applicant: Murata Manufacturing Co., Ltd.Inventors: Hajime Yamada, Masaki Takeuchi
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Publication number: 20010054941Abstract: A piezoelectric resonator using an nth-order mode of a thickness longitudinal vibration or a thickness-shear vibration includes a vibrating section having a piezoelectric layer, a pair of electrodes and a support member for holding the vibrating section. The pair of electrodes are provided on opposite sides of the piezoelectric layer, respectively, and the pair of electrodes partially overlap with each other via the piezoelectric layer to define an opposite electrode portion. The support member holds the vibrating section such that the vibrating section vibrates under an nth-order mode of a thickness longitudinal vibration or a thickness-shear vibration. The opposite electrode portion preferably has a substantially circular shape having a radius r or is a polygonal shape circumscribing the substantially circular shape. The radius r satisfies the inequality 20t/n≦r, where t is a thickness of the vibrating section.Type: ApplicationFiled: June 25, 2001Publication date: December 27, 2001Applicant: Murata Manufacturing Co., Ltd.Inventors: Akihiko Shibata, Masaki Takeuchi, Noromitsu Tsukai
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Patent number: 6232407Abstract: Process for producing a hydrogenated &agr;-olefin-dicyclopentadiene copolymer. The process includes a step of distilling of unreacted dicyclopentadiene or tetrahydrodicyclopentadiene which is a hydrogenated product of unreacted dicyclopentadiene from a mixture containing &agr;-olefin-dicyclopentadiene copolymer or its hydrogenated product in the presence of a high-boiling hydrocarbon solvent having a boiling point of 195 to 300° C. and an ignition point of 260° C. or more. Method for melt molding the hydrogenated &agr;-olefin-dicyclopentadiene copolymer is also proposed.Type: GrantFiled: June 10, 1999Date of Patent: May 15, 2001Assignees: Teijin Limited, Bayer A. G.Inventors: Kiyonari Hashidzume, Hideaki Nitta, Masaki Takeuchi, Michio Yamaura, Kaoru Iwata
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Patent number: 6191243Abstract: &agr;-olefin-cycloolefin copolymers which (1) consist essentially of 0-31% by mole of an &agr;-olefin component represented by the following formula (A) wherein R1 is a hydrogen atom or a saturated aliphatic hydrocarbon group of 1-16 carbon atoms, and 61-100% by mole of a cycloolefin component represented by the following formula (B) wherein R2 is a hydrogen atom or a saturated aliphatic hydrocarbon group of 1-16 carbon atoms, and (2) have a reduced viscosity &eegr;sp/c which is in the range of 0.1-10 dl/g as measured in a 0.5 g/dl toluene solution at 30° C., hydrogenated copolymers thereof and a process for their production.Type: GrantFiled: September 15, 1998Date of Patent: February 20, 2001Assignees: Teijin Limited, Bayer AktiengesellschaftInventors: Hideaki Nitta, Kiyonari Hashidzume, Masaki Takeuchi, Kaoru Iwata
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Patent number: 5498739Abstract: By reacting a chloromonosilane or chlorodisilane with a halogenated hydrocarbon in a liquid phase in the presence of metallic aluminum or an aluminum alloy, a hydrocarbon group is substituted for at least one chlorine atom of the chlorosilane for introducing hydrocarbon into the chlorosilane. Silanes having a high degree of hydrocarbon substitution can be easily synthesized from chlorosilanes under moderate conditions and with high volumetric efficiency. The reagents used are aluminum or aluminum alloys and halogenated hydrocarbons which are inexpensive and readily available.Type: GrantFiled: December 20, 1994Date of Patent: March 12, 1996Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Masaki Takeuchi, Akira Yamamoto, Mikio Endo
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Patent number: 5440063Abstract: Dimethylchlorosilane and a triorganochlorosilane of the formula: R.sup.1 R.sup.2 R.sup.3 SiCl wherein R.sup.1, R.sup.2, and R.sup.3 are independently selected from monovalent hydrocarbon groups are concurrently prepared by reacting dimethyldichlorosilane with a SiH bond-containing silane compound of the formula: R.sup.1 R.sup.2 R.sup.3 SiH in the presence of a Lewis acid catalyst. The method is especially effective for concomitant preparation of dimethylchlorosilane and trimethylchlorosilane or t-butyldimethylchlorosilane in an inexpensive, simple, safe manner and in high yields.Type: GrantFiled: November 3, 1994Date of Patent: August 8, 1995Assignee: Shin-Etsu Chemical Company, LimitedInventors: Masaki Takeuchi, Akira Yamamoto, Mikio Endo, Tohru Kubota, Yasufumi Kubota
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Patent number: 5338720Abstract: A triazole compound represented by the formula: ##STR1## wherein X denotes a hydrogen atom, a halogen or a lower alkyl group, Y denotes a halogen substituted lower alkoxy group, R.sub.1 and R.sub.2 which may be the same or different each denotes an ethyl or propyl group, and n is an integer of 0-4, and a herbicidal composition comprising the compound as an active ingredient. The above compounds have excellent properties in that they not only exhibit marked herbicidal activities in a low dose against various weeds of rice paddies and plowed fields but also cause no injury to crops.Type: GrantFiled: February 3, 1993Date of Patent: August 16, 1994Assignee: Chugai Seiyaku Kabushiki KaishaInventors: Masaki Takeuchi, Mitsuru Kanzaki
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Patent number: 5258537Abstract: An organodisiloxane represented by the general formula: R.sup.1 R.sup.2 R.sup.3 SiOSiR.sup.4 R.sup.5 R.sup.6 is reacted with thionyl chloride in the presence of an ammonium salt represented by the general formula: R.sup.7 R.sup.8 R.sup.9 R.sup.10 NX wherein R.sup.1 to R.sup.5 and R.sup.10 may be the same or different and each represents a monovalent hydrocarbon group or a hydrogen atom; R.sup.7 to R.sup.9 may be the same or different and each represents a monovalent hydrocarbon group; and X represents a monovalent anion. Thus, organomonochlorosilanes represented by R.sup.1 R.sup.2 R.sup.3 SiCl and R.sup.4 R.sup.5 R.sup.6 SiCl can be obtained.Type: GrantFiled: February 11, 1993Date of Patent: November 2, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Masaki Takeuchi, Toshinobu Ishihara, Tohru Kubota, Mikio Endo
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Patent number: 5147445Abstract: Novel triazole compounds represented by the general formulas I and II, a process for producing novel triazole compounds of the general formula I from novel triazole compounds of the general formula II as starting materials, and herbicides that include novel triazole compounds of the general formula I: ##STR1## where R.sub.1 and R.sub.2 which may be the same or different each represents a lower alkyl, cycloalkyl, alkenyl or alkynyl group, or R.sub.1 and R.sub.2, when taken together with the nitrogen atom to which they are bonded, represent an azacycloalkane having 4-6 carbon atoms;A represents a group represented by one of the following formulas: ##STR2## (where X is a hydrogen atom or an optionally hydroxyl substituted lower alkyl, cycloalkyl, alkoxy, alkoxycarbonyl, alkylcarbonyl, phenoxy, benzyl or .alpha.-hydroxybenzyl group, a halogen, a nitro group, an amino group or trifluoromethyl group; R.sub.Type: GrantFiled: January 25, 1991Date of Patent: September 15, 1992Assignee: Chugai Seiyaku Kabushiki KaishaInventors: Masaki Takeuchi, Mitsuhiro Yasuda, Mitsuru Kanzaki
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Patent number: 4596801Abstract: Novel 4H-3,1-benzoxazine derivative of the formula: ##STR1## wherein X and Y each independently represent a halogen atom of a lower alkyl group; m and n each independently represent an integer of 0 to 2, and when m or n is 2, the plurality or each of X or Y may have the same or different meanings; R is a hydrogen atom, an alkyloxy group, an alkynyloxy group, an alkylthio group or an alkenylthio group, and a process for their production are provided. The compounds are highly effective against pathogenic fungi while being well tolerated by cultivated plants.Type: GrantFiled: March 13, 1984Date of Patent: June 24, 1986Assignee: Chugai Seiyaku Kabushiki KaishaInventors: Hiroshi Sugiyama, Keizo Hosoda, Yoshikazu Kumagai, Masaki Takeuchi, Masanori Okada
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Patent number: 4435202Abstract: A plant growth regulator containing as an active ingredient one or more compounds represented by the formula ##STR1## wherein R, X, Y and Z are defined in the specification is disclosed. The plant growth regulator is effective for a wide variety of plants, particularly for grassy plants. In addition to such activity, the regulator of this invention acts on plants to thicken the foliage and to aid health growth without causing substantial phytotoxicity.Type: GrantFiled: March 29, 1982Date of Patent: March 6, 1984Assignee: Chugai Seiyaku Kabushiki KaishaInventors: Masuo Koizumi, Norio Shirakawa, Hiromi Tomioka, Masaki Takeuchi, Masanori Okada, Masahiro Yoshimoto, Yasushi Murakami, Yoshitaka Iwane
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Patent number: 4377407Abstract: Isonicotinanilide derivatives of the formula ##STR1## (wherein R.sub.1 is a hydrogen atom or a lower alkyl group; X is a halogen atom or methyl; n is an integer of from 0 to 2; R.sub.2 is phenyl, halo-substituted phenyl or a lower alkyl group; and Q is ##STR2## provided that Q is ##STR3## or --CH.sub.2 --when R.sub.2 is phenyl or halo-substituted phenyl, and Q is ##STR4## when R.sub.2 is a lower alkyl group) a process for preparing the same and a plant growth regulator containing the same are disclosed. The derivatives of the formula above have good activity for regulating the growth of various plants, especially of grassy plants.Type: GrantFiled: September 28, 1981Date of Patent: March 22, 1983Assignee: Chugai Seiyaku Kabushiki KaishaInventors: Norio Shirakawa, Hiromi Tomioka, Masuo Koizumi, Masaki Takeuchi, Hiroshi Sugiyama, Masanori Okada, Masahiro Yoshimoto, Yoshitaka Iwane, Yasushi Murakami
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Patent number: 4366119Abstract: A discrete type automated chemical analytic apparatus, wherein a carrier is made movable through a path defined above a reaction line in order to pipette a specimen and reagent into the selected one of a plurality of reaction tubes linearly mounted on the top run of an endless belt. A specimen container and reagent containers are set side by side above the extension of the reaction line. Nozzles are mounted on the carrier in a vertically movable state to draw out the contents of the specimen container and reagent containers. The carrier is moved to any selected point on the reaction line by a motor with the aid of a belt conveyor connected to said carrier, and a pair of pulleys across which the belt conveyor is stretched.Type: GrantFiled: March 16, 1981Date of Patent: December 28, 1982Assignee: Tokyo Shibaura Denki Kabushiki KaishaInventor: Masaki Takeuchi