Patents by Inventor Masaki Takeuchi

Masaki Takeuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020179576
    Abstract: A glass substrate having a surface which has been leveled, preferably to a flatness of 0.04-1.3 nm/cm2 of the surface, by local plasma etching is provided. A glass substrate whose surface carries microscopic peaks and valleys is leveled by measuring the height of peaks and valleys on the substrate surface, and plasma etching the substrate surface while controlling the amount of plasma etching in accordance with the height of peaks.
    Type: Application
    Filed: April 19, 2002
    Publication date: December 5, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Takeuchi, Yukio Shibano
  • Publication number: 20020170680
    Abstract: The lamination apparatus of this invention enables the operator to keep working without paying attention to the remaining length of the laminating film. The lamination apparatus is used to make lamination layers with a transparent or semitransparent laminating film pasted on such printed matters as posters, advertising fliers or computer output media. The laminate apparatus comprise the following systems and units. Measuring system containing encoder 13 to measure the length of laminate film A pulled out from original roll. Input system 16 for the length of laminate film A set in advance. Calculation system to subtract pulled-out length of laminate film A from that of the original film roll 4. Display unit 17 to indicate the subtracted value of laminate film. Alarm system for issuing a warning when the subtracted value reaches some certain level or less.
    Type: Application
    Filed: February 22, 2002
    Publication date: November 21, 2002
    Inventors: Yasuhiro Shimizu, Masaki Takeuchi, Yasuaki Matsui, Masaki Koroyasu, Akira Okuno, Katsushige Tsukuya, Daimon Ueda
  • Publication number: 20020155361
    Abstract: A glass substrate is to be used as a photomask having a patterned light-shielding film on a surface thereof and thus exposed to light. The substrate is leveled by local plasma etching such that an exposure surface may have a flatness of 0.04-2.2 nm/cm2. Since the glass substrate is configured such that the exposure surface or hold surface of the resulting photomask is fully flat during the exposure step, it is suited for use as silica glass substrates for photomasks used in the photolithography of great interest in the fabrication of ICs, thus contributing to the achievement of finer patterns in the semiconductor field.
    Type: Application
    Filed: April 19, 2002
    Publication date: October 24, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Takeuchi, Yukio Shibano
  • Patent number: 6441539
    Abstract: A piezoelectric resonator includes a laminated structure having a piezoelectric laminate, at least one pair of electrodes and a substrate. The piezoelectric laminate includes at least one first piezoelectric layer having a positive temperature coefficient of a resonant frequency and at least one second piezoelectric layer which has a negative temperature coefficient of a resonant frequency. The at least one pair of electrodes interpose at least one of the first and second piezoelectric layers. The substrate supports the laminated structure and holds a portion of the laminated structure such that a suspended portion of the laminated structure vibrates in response to application of a voltage across the pair of electrodes.
    Type: Grant
    Filed: November 6, 2000
    Date of Patent: August 27, 2002
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Hidekazu Kitamura, Kazuhiro Inoue, Masaki Takeuchi
  • Publication number: 20020078710
    Abstract: A silica glass substrate is obtained by polishing, cleaning, drying and etching a silica glass substrate slice. When the substrate on one surface is treated with a reactive reagent, defects having a size of at least 0.3 &mgr;m in a direction parallel to the substrate major surface are absent on the substrate surface. The silica glass substrate, in which no submicron defects manifest on the substrate surface even when treated as by cleaning or etching, serves as a reticle for use in photolithographic IC fabrication, achieving an improved manufacturing yield in the semiconductor device fabrication and microelectronic system fields.
    Type: Application
    Filed: December 27, 2001
    Publication date: June 27, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Takeuchi, Atsushi Watabe, Tetsushi Tsukamoto, Yukio Shibano
  • Patent number: 6388032
    Abstract: A cyclic olefin polymer having a small content of a catalyst residue, a production process for the same and use of the same as an optical material. Catalysts used for polymerization and/or hydrogenation reaction for forming the cyclic olefin polymer are decomposed efficiently by adding at least one compound selected from the group consisting of an &agr;-oxyacid and &bgr;-oxyacid having one hydroxyl group and one carboxyl group in the molecule and derivatives obtained by substituting hydroxyl group thereof by an alkoxyl group, and the decomposition products are removed by rendering them insoluble in a reaction solvent used for the polymerization and/or hydrogenation reaction and precipitating them efficiently.
    Type: Grant
    Filed: April 14, 2000
    Date of Patent: May 14, 2002
    Assignee: Teijin Limited
    Inventors: Michio Yamaura, Kiyonari Hashidzume, Hideaki Nitta, Masaki Takeuchi, Kaoru Iwata
  • Publication number: 20020030420
    Abstract: A highly compact piezoelectric resonator having excellent resonant characteristics and very small resonant resistance includes an upper electrode disposed on one of two main surfaces of a piezoelectric film and a lower electrode disposed on the other main surface of the piezoelectric film. The upper electrode includes a first external-signal extracting electrode, a first leading electrode, and three first vibrating electrodes. The lower electrode includes a second external-signal extracting electrode, a second leading electrode, and three second vibrating electrodes. The three first vibrating electrodes are arranged substantially perpendicularly to the three second vibrating electrodes via the piezoelectric film. Vibrating sections are located at positions where the first vibrating electrodes are arranged substantially perpendicularly to the second vibrating electrodes.
    Type: Application
    Filed: August 28, 2001
    Publication date: March 14, 2002
    Inventors: Norimitsu Tsukai, Masaki Takeuchi, Yukio Yoshino
  • Publication number: 20020008443
    Abstract: A method for manufacturing a thin film is performed such that the internal stress is controlled while the preferred orientation property is maintained at a high value. An AlN piezoelectric thin film is formed on a substrate by a sputtering method using a mixed gas including Ar and nitrogen, wherein the mixed gas has a nitrogen flow rate ratio, that is, nitrogen flow rate relative to the sum of the Ar flow rate and the nitrogen flow rate, of about 10% to about 75%.
    Type: Application
    Filed: June 5, 2001
    Publication date: January 24, 2002
    Applicant: Murata Manufacturing Co., Ltd.
    Inventors: Hajime Yamada, Masaki Takeuchi
  • Publication number: 20010054941
    Abstract: A piezoelectric resonator using an nth-order mode of a thickness longitudinal vibration or a thickness-shear vibration includes a vibrating section having a piezoelectric layer, a pair of electrodes and a support member for holding the vibrating section. The pair of electrodes are provided on opposite sides of the piezoelectric layer, respectively, and the pair of electrodes partially overlap with each other via the piezoelectric layer to define an opposite electrode portion. The support member holds the vibrating section such that the vibrating section vibrates under an nth-order mode of a thickness longitudinal vibration or a thickness-shear vibration. The opposite electrode portion preferably has a substantially circular shape having a radius r or is a polygonal shape circumscribing the substantially circular shape. The radius r satisfies the inequality 20t/n≦r, where t is a thickness of the vibrating section.
    Type: Application
    Filed: June 25, 2001
    Publication date: December 27, 2001
    Applicant: Murata Manufacturing Co., Ltd.
    Inventors: Akihiko Shibata, Masaki Takeuchi, Noromitsu Tsukai
  • Patent number: 6232407
    Abstract: Process for producing a hydrogenated &agr;-olefin-dicyclopentadiene copolymer. The process includes a step of distilling of unreacted dicyclopentadiene or tetrahydrodicyclopentadiene which is a hydrogenated product of unreacted dicyclopentadiene from a mixture containing &agr;-olefin-dicyclopentadiene copolymer or its hydrogenated product in the presence of a high-boiling hydrocarbon solvent having a boiling point of 195 to 300° C. and an ignition point of 260° C. or more. Method for melt molding the hydrogenated &agr;-olefin-dicyclopentadiene copolymer is also proposed.
    Type: Grant
    Filed: June 10, 1999
    Date of Patent: May 15, 2001
    Assignees: Teijin Limited, Bayer A. G.
    Inventors: Kiyonari Hashidzume, Hideaki Nitta, Masaki Takeuchi, Michio Yamaura, Kaoru Iwata
  • Patent number: 6191243
    Abstract: &agr;-olefin-cycloolefin copolymers which (1) consist essentially of 0-31% by mole of an &agr;-olefin component represented by the following formula (A) wherein R1 is a hydrogen atom or a saturated aliphatic hydrocarbon group of 1-16 carbon atoms, and 61-100% by mole of a cycloolefin component represented by the following formula (B) wherein R2 is a hydrogen atom or a saturated aliphatic hydrocarbon group of 1-16 carbon atoms, and (2) have a reduced viscosity &eegr;sp/c which is in the range of 0.1-10 dl/g as measured in a 0.5 g/dl toluene solution at 30° C., hydrogenated copolymers thereof and a process for their production.
    Type: Grant
    Filed: September 15, 1998
    Date of Patent: February 20, 2001
    Assignees: Teijin Limited, Bayer Aktiengesellschaft
    Inventors: Hideaki Nitta, Kiyonari Hashidzume, Masaki Takeuchi, Kaoru Iwata
  • Patent number: 5498739
    Abstract: By reacting a chloromonosilane or chlorodisilane with a halogenated hydrocarbon in a liquid phase in the presence of metallic aluminum or an aluminum alloy, a hydrocarbon group is substituted for at least one chlorine atom of the chlorosilane for introducing hydrocarbon into the chlorosilane. Silanes having a high degree of hydrocarbon substitution can be easily synthesized from chlorosilanes under moderate conditions and with high volumetric efficiency. The reagents used are aluminum or aluminum alloys and halogenated hydrocarbons which are inexpensive and readily available.
    Type: Grant
    Filed: December 20, 1994
    Date of Patent: March 12, 1996
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Takeuchi, Akira Yamamoto, Mikio Endo
  • Patent number: 5440063
    Abstract: Dimethylchlorosilane and a triorganochlorosilane of the formula: R.sup.1 R.sup.2 R.sup.3 SiCl wherein R.sup.1, R.sup.2, and R.sup.3 are independently selected from monovalent hydrocarbon groups are concurrently prepared by reacting dimethyldichlorosilane with a SiH bond-containing silane compound of the formula: R.sup.1 R.sup.2 R.sup.3 SiH in the presence of a Lewis acid catalyst. The method is especially effective for concomitant preparation of dimethylchlorosilane and trimethylchlorosilane or t-butyldimethylchlorosilane in an inexpensive, simple, safe manner and in high yields.
    Type: Grant
    Filed: November 3, 1994
    Date of Patent: August 8, 1995
    Assignee: Shin-Etsu Chemical Company, Limited
    Inventors: Masaki Takeuchi, Akira Yamamoto, Mikio Endo, Tohru Kubota, Yasufumi Kubota
  • Patent number: 5338720
    Abstract: A triazole compound represented by the formula: ##STR1## wherein X denotes a hydrogen atom, a halogen or a lower alkyl group, Y denotes a halogen substituted lower alkoxy group, R.sub.1 and R.sub.2 which may be the same or different each denotes an ethyl or propyl group, and n is an integer of 0-4, and a herbicidal composition comprising the compound as an active ingredient. The above compounds have excellent properties in that they not only exhibit marked herbicidal activities in a low dose against various weeds of rice paddies and plowed fields but also cause no injury to crops.
    Type: Grant
    Filed: February 3, 1993
    Date of Patent: August 16, 1994
    Assignee: Chugai Seiyaku Kabushiki Kaisha
    Inventors: Masaki Takeuchi, Mitsuru Kanzaki
  • Patent number: 5258537
    Abstract: An organodisiloxane represented by the general formula: R.sup.1 R.sup.2 R.sup.3 SiOSiR.sup.4 R.sup.5 R.sup.6 is reacted with thionyl chloride in the presence of an ammonium salt represented by the general formula: R.sup.7 R.sup.8 R.sup.9 R.sup.10 NX wherein R.sup.1 to R.sup.5 and R.sup.10 may be the same or different and each represents a monovalent hydrocarbon group or a hydrogen atom; R.sup.7 to R.sup.9 may be the same or different and each represents a monovalent hydrocarbon group; and X represents a monovalent anion. Thus, organomonochlorosilanes represented by R.sup.1 R.sup.2 R.sup.3 SiCl and R.sup.4 R.sup.5 R.sup.6 SiCl can be obtained.
    Type: Grant
    Filed: February 11, 1993
    Date of Patent: November 2, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Takeuchi, Toshinobu Ishihara, Tohru Kubota, Mikio Endo
  • Patent number: 5147445
    Abstract: Novel triazole compounds represented by the general formulas I and II, a process for producing novel triazole compounds of the general formula I from novel triazole compounds of the general formula II as starting materials, and herbicides that include novel triazole compounds of the general formula I: ##STR1## where R.sub.1 and R.sub.2 which may be the same or different each represents a lower alkyl, cycloalkyl, alkenyl or alkynyl group, or R.sub.1 and R.sub.2, when taken together with the nitrogen atom to which they are bonded, represent an azacycloalkane having 4-6 carbon atoms;A represents a group represented by one of the following formulas: ##STR2## (where X is a hydrogen atom or an optionally hydroxyl substituted lower alkyl, cycloalkyl, alkoxy, alkoxycarbonyl, alkylcarbonyl, phenoxy, benzyl or .alpha.-hydroxybenzyl group, a halogen, a nitro group, an amino group or trifluoromethyl group; R.sub.
    Type: Grant
    Filed: January 25, 1991
    Date of Patent: September 15, 1992
    Assignee: Chugai Seiyaku Kabushiki Kaisha
    Inventors: Masaki Takeuchi, Mitsuhiro Yasuda, Mitsuru Kanzaki
  • Patent number: 4596801
    Abstract: Novel 4H-3,1-benzoxazine derivative of the formula: ##STR1## wherein X and Y each independently represent a halogen atom of a lower alkyl group; m and n each independently represent an integer of 0 to 2, and when m or n is 2, the plurality or each of X or Y may have the same or different meanings; R is a hydrogen atom, an alkyloxy group, an alkynyloxy group, an alkylthio group or an alkenylthio group, and a process for their production are provided. The compounds are highly effective against pathogenic fungi while being well tolerated by cultivated plants.
    Type: Grant
    Filed: March 13, 1984
    Date of Patent: June 24, 1986
    Assignee: Chugai Seiyaku Kabushiki Kaisha
    Inventors: Hiroshi Sugiyama, Keizo Hosoda, Yoshikazu Kumagai, Masaki Takeuchi, Masanori Okada
  • Patent number: 4435202
    Abstract: A plant growth regulator containing as an active ingredient one or more compounds represented by the formula ##STR1## wherein R, X, Y and Z are defined in the specification is disclosed. The plant growth regulator is effective for a wide variety of plants, particularly for grassy plants. In addition to such activity, the regulator of this invention acts on plants to thicken the foliage and to aid health growth without causing substantial phytotoxicity.
    Type: Grant
    Filed: March 29, 1982
    Date of Patent: March 6, 1984
    Assignee: Chugai Seiyaku Kabushiki Kaisha
    Inventors: Masuo Koizumi, Norio Shirakawa, Hiromi Tomioka, Masaki Takeuchi, Masanori Okada, Masahiro Yoshimoto, Yasushi Murakami, Yoshitaka Iwane
  • Patent number: 4377407
    Abstract: Isonicotinanilide derivatives of the formula ##STR1## (wherein R.sub.1 is a hydrogen atom or a lower alkyl group; X is a halogen atom or methyl; n is an integer of from 0 to 2; R.sub.2 is phenyl, halo-substituted phenyl or a lower alkyl group; and Q is ##STR2## provided that Q is ##STR3## or --CH.sub.2 --when R.sub.2 is phenyl or halo-substituted phenyl, and Q is ##STR4## when R.sub.2 is a lower alkyl group) a process for preparing the same and a plant growth regulator containing the same are disclosed. The derivatives of the formula above have good activity for regulating the growth of various plants, especially of grassy plants.
    Type: Grant
    Filed: September 28, 1981
    Date of Patent: March 22, 1983
    Assignee: Chugai Seiyaku Kabushiki Kaisha
    Inventors: Norio Shirakawa, Hiromi Tomioka, Masuo Koizumi, Masaki Takeuchi, Hiroshi Sugiyama, Masanori Okada, Masahiro Yoshimoto, Yoshitaka Iwane, Yasushi Murakami
  • Patent number: 4366119
    Abstract: A discrete type automated chemical analytic apparatus, wherein a carrier is made movable through a path defined above a reaction line in order to pipette a specimen and reagent into the selected one of a plurality of reaction tubes linearly mounted on the top run of an endless belt. A specimen container and reagent containers are set side by side above the extension of the reaction line. Nozzles are mounted on the carrier in a vertically movable state to draw out the contents of the specimen container and reagent containers. The carrier is moved to any selected point on the reaction line by a motor with the aid of a belt conveyor connected to said carrier, and a pair of pulleys across which the belt conveyor is stretched.
    Type: Grant
    Filed: March 16, 1981
    Date of Patent: December 28, 1982
    Assignee: Tokyo Shibaura Denki Kabushiki Kaisha
    Inventor: Masaki Takeuchi