Patents by Inventor Masaki Takeuchi

Masaki Takeuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8365248
    Abstract: A service providing device (400) includes: one-time PW generating processing section (435) which generates, for each operation device (300), authentication information for use in authentication processing carried out by the service providing device (400) in a case where the service providing device (400) is accessed by a display processing device (200); and an image data generating processing section (436) which (i) generates operation data including the authentication information generated and processing specifying information specifying the authentication processing, and (ii) transmits the operation data thus generated to the operation device (300).
    Type: Grant
    Filed: May 18, 2009
    Date of Patent: January 29, 2013
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Taichiro Morishita, Masaki Takeuchi, Tohru Sugayama, Junichi Shirakawa, Mitsunori Nojima, Yohhei Iwami, Akira Tojima
  • Publication number: 20130000720
    Abstract: A thin-film photovoltaic cell includes a rear-face electrode layer, a photoelectric conversion layer, and a transparent electrode layer stacked in order on one face of an insulating substrate. A first back-face electrode layer and a second back-face electrode layer are stacked in order on the other face of the insulating substrate. Further, the transparent electrode layer and the second back-face electrode layer are electrically connected to each other via first through holes passing through the insulating substrate, and the rear-face electrode layer and the first back-face electrode layer are electrically connected to each other via second through holes passing through the insulating substrate. In accordance with the present invention, the transparent electrode layer around the second through holes is separated by grooves, and the transparent electrode layer and the second back-face electrode layer are electrically insulated from each other.
    Type: Application
    Filed: September 1, 2011
    Publication date: January 3, 2013
    Applicant: FUJI ELECTRIC CO., LTD.
    Inventors: Masaki Takeuchi, Hiroaki Nakahara, Takehito Wada, Satoshi Sawayanagi
  • Publication number: 20120263816
    Abstract: A nanoimprint-mold release agent including an alkoxysilane compound represented by general formula (1) is provided wherein Rf and Rf? are each independently a fluoroalkyl group of 1 to 10 carbon atoms; R1 is a hydrogen atom or an aliphatic monovalent hydrocarbon group of 1 to 6 carbon atoms; R2 and R3 are each independently methyl group or ethyl group; X and Y are each independently an ether linkage or an ester linkage; a and b are each 0 or 1; m, n, and p are each an integer of 0 to 6; q is an integer of 1 to 6 and r is an integer of 0 to 2.
    Type: Application
    Filed: April 11, 2012
    Publication date: October 18, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Yamazaki, Daijitsu Harada, Masaki Takeuchi, Takayuki Honma, Ayumu Kiyomori, Tohru Kubota
  • Publication number: 20120264962
    Abstract: Disclosed are silazane compounds having two fluoroalkyl groups, represented by the following general formula (1): wherein Rf and Rf? are each a fluoroalkyl group, R1 is a hydrogen atoms or an aliphatic monovalent hydrocarbon group, R2 and R3 are each an aliphatic monovalent hydrocarbon group, R4 is a hydrogen atom or an aliphatic monovalent hydrocarbon group, a and b are each 0 or 1, m, n and p are each an integer of 0 to 6, q is an integer of 1 to 6, and r is 1 or 2. By treating an inorganic material with the silazane compound having two fluoroalkyl groups, high water and oil repellency and high sliding properties can be imparted to the inorganic material in good balance.
    Type: Application
    Filed: April 12, 2012
    Publication date: October 18, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Honma, Ayumu Kiyomori, Tohru Kubota, Daijitsu Harada, Hiroyuki Yamazaki, Masaki Takeuchi
  • Publication number: 20120264964
    Abstract: Alkoxysilane compounds having two fluoroalkyl groups and represented by the formula (1): wherein Rf and Rf? are each a fluoroalkyl group of 1 to 10 carbon atoms, R1 is a hydrogen atom or an aliphatic monovalent hydrocarbon group of 1 to 6 carbon atoms, R2 and R3 are each methyl group or ethyl group, X and Y are each an ether linkage or an ester linkage, a and b are each 0 or 1, m, n and p are each an integer of 0 to 6, q is an integer of 1 to 6, and r is an integer of 0 to 2. By treating an inorganic material with the alkoxysilane compound having ether linkage and two fluoroalkyl groups, high water and oil repellency and high sliding properties are imparted to the inorganic material. The alkoxysilane compounds are easily purified, owing to enhanced volatility by the branched structure.
    Type: Application
    Filed: April 11, 2012
    Publication date: October 18, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Honma, Ayumu Kiyomori, Tohru Kubota, Daijitsu Harada, Hiroyuki Yamazaki, Masaki Takeuchi
  • Publication number: 20120244275
    Abstract: A process for production of a flexible laminated sheet having one or more laminated bodies each provided with a metal foil formed on one side of a resin film. The process includes coating a varnish containing a polyamic acid and a solvent onto the metal foil, holding the coated film, drying in which at least a portion of the solvent in the varnish is removed to form a layer composed of a resin composition, and forming the resin in which the layer composed of the resin composition is heated to form a resin film containing a polyimide resin. The conditions for each step from the coating up to the resin film-forming are adjusted based on a target for the content of metal elements in the resin film.
    Type: Application
    Filed: March 27, 2012
    Publication date: September 27, 2012
    Inventors: Masahiko SUZUKI, Kazuhito OBATA, Katsuyuki MASUDA, Kenichi TOMIOKA, Masaki TAKEUCHI, Sumio YOSHIDA, Hirokazu SUZUKI, Yoshitsugu MATSUURA
  • Publication number: 20120209916
    Abstract: A network system includes a first communication device, a second communication device and a server. The communication device includes a storage unit storing first device information indicating a function of the communication device, and a communication unit for receiving second device information indicating a function of another communication device from the other communication device, transmitting the first and second device information to the server, and receiving first control information used by the first device from the server.
    Type: Application
    Filed: October 6, 2010
    Publication date: August 16, 2012
    Inventors: Akihiro Azuma, Masaki Takeuchi
  • Publication number: 20120207865
    Abstract: A circular mold-forming substrate of 125-300 mm diameter having a surface on which a topological pattern is to be formed is provided wherein the thickness of the substrate has a variation of up to 2 ?m within a circle having a diameter of 125 mm.
    Type: Application
    Filed: February 9, 2012
    Publication date: August 16, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daijitsu Harada, Masaki Takeuchi
  • Patent number: 8219388
    Abstract: A sensation of presence of voice chat in a virtual space is enhanced. A user speech synthesizer used in a virtual space sharing system where information processing devices share the virtual space. The user speech synthesizer comprises a speech data acquiring section (60) for acquiring speech data representing a speech uttered by the user of one of the information processing devices, an environment sound storage section (66) for storing an environment sound associated with one or more regions defined in the virtual space, a region specifying section (64) for specifying a region corresponding to the user in the virtual space, and an environment sound synthesizing section (68) for acquiring the environment sound associated with the specified region from the environment sound storage section (66), combining the acquired environment sound and the speech data and synthesizing synthesized speech data.
    Type: Grant
    Filed: June 7, 2006
    Date of Patent: July 10, 2012
    Assignee: Konami Digital Entertainment Co., Ltd.
    Inventors: Hiromasa Kaneko, Masaki Takeuchi
  • Patent number: 8168272
    Abstract: A storage container for containing a photomask-forming synthetic quartz glass substrate comprises inner walls facing the front and back surfaces of the glass substrate, and reservoirs provided on the container inner walls for receiving an absorber for components outgassing from the container. A ratio A/B is in the range of 1.0-120 m2/cm2 provided that A is the product (m2) of the total weight (g) of the absorber multiplied by the BET specific surface area (m2/g) of the absorber and B is the total area (cm2) of the front and back surfaces of the glass substrate.
    Type: Grant
    Filed: July 29, 2008
    Date of Patent: May 1, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mamoru Morikawa, Daijitsu Harada, Masaki Takeuchi
  • Publication number: 20120021675
    Abstract: A polishing slurry comprising a collagen derivative and a colloidal solution is effective for polishing of synthetic quartz glass substrates. It prevents formation of defects having a size that can be detected by a high-sensitivity flaw detector.
    Type: Application
    Filed: July 25, 2011
    Publication date: January 26, 2012
    Inventors: Harunobu Matsui, Daijitsu Harada, Masaki Takeuchi
  • Publication number: 20110318996
    Abstract: An electronic grade synthetic quartz glass substrate having a recess, channel or step is manufactured by machining at least one surface of a synthetic quartz glass substrate having a maximum birefringence of up to 3 nm/cm in its entirety to form a recess, channel or step, and removing the residual stress due to machining.
    Type: Application
    Filed: June 28, 2011
    Publication date: December 29, 2011
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daiyu Okafuji, Masaki Takeuchi, Hiroyuki Yamazaki
  • Publication number: 20110318995
    Abstract: An electronic grade synthetic quartz glass substrate is manufactured by machining a synthetic quartz glass substrate to form a recess, channel or step and polishing the bottom and side surfaces of the recess, channel or step to mirror finish by a working portion of a rotary polishing tool while keeping the working portion in contact with the bottom and side surfaces under independent constant pressures.
    Type: Application
    Filed: June 28, 2011
    Publication date: December 29, 2011
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daiyu Okafuji, Masaki Takeuchi, Hiroyuki Yamazaki
  • Publication number: 20110308737
    Abstract: A synthetic quartz glass substrate having a resist film coated thereon is treated by immersing it in a terpene-containing solvent until the resist film is released, and rinsing the substrate with water.
    Type: Application
    Filed: June 17, 2011
    Publication date: December 22, 2011
    Inventors: Harunobu MATSUI, Ryouhei Hasegawa, Masaki Takeuchi
  • Publication number: 20110287219
    Abstract: A synthetic quartz glass substrate has a surface of 6 inch squares including a central surface area of 132 mm squares. The central surface area of 132 mm squares has a flatness of up to 50 nm. A frame region obtained by subtracting the central surface area of 132 mm squares from the central surface area of 148 mm squares has a flatness of up to 150 nm.
    Type: Application
    Filed: May 23, 2011
    Publication date: November 24, 2011
    Inventors: Harunobu Matsui, Daijitsu Harada, Masaki Takeuchi
  • Publication number: 20110234355
    Abstract: There are many varieties of windings. Coils adopting an edgewise winding wire in which winding wires are wound around in the radial direction of the coil have a wide flux linkage area orthogonal to the electric wire, so that stray loss within the wire is increased, winding wire loss is increased and temperature is raised thereby. The present invention provides an arrangement in which a plurality of coil units are prepared and connected via external coupling terminals. At this time, winding is performed so that the contact faces of the coil units have equal potentials, so that there is no need to ensure an insulation distance between coils, and the coils can be downsized. Therefore, the mass of the respective coils can be reduced. Taps disposed on the respective coils are arranged to have equal potentials, according to which the external coupling terminals can double as tap switch terminals, so that there is no need to provide a dedicated tap switch.
    Type: Application
    Filed: February 4, 2011
    Publication date: September 29, 2011
    Inventors: Masaki TAKEUCHI, Atsushi Suzuki, Tatsuhito Azegami
  • Patent number: 7978044
    Abstract: A transformer includes a frame type iron core having plate-shaped magnetic members. At least one of the plate-shaped magnetic members has a large width and forms a magnetic circuit in which a magnetic flux is concentrated. Each of the plate-shaped magnetic members includes magnetic member pieces. Each adjacent pair of end surfaces of the magnetic member pieces are joined together to form a joint portion. Three or more joint portions, each of which is formed, by joining together adjacent end surfaces of an adjacent pair of the magnetic member pieces included in the plate-shaped magnetic member having the large width, are shifted from each other in the direction of a magnetic path of the magnetic circuit to increase an effective cross sectional area of the magnetic path. The magnetic member pieces included in the plate-shaped magnetic member having the large width have a high magnetic permeability to reduce a magnetic resistance of the magnetic circuit.
    Type: Grant
    Filed: December 30, 2009
    Date of Patent: July 12, 2011
    Assignee: Hitachi Industrial Equipment Systems Co., Ltd.
    Inventors: Masaki Takeuchi, Atsushi Suzuki
  • Publication number: 20110159785
    Abstract: A synthetic quartz glass substrate is prepared by (1) polishing a synthetic quartz glass substrate with a polishing slurry comprising colloidal particles, an ionic organic compound having an electric charge of the same type as the colloidal particles, and water, and (2) immersing the polished substrate in an acidic or basic solution for etching the substrate surface to a depth of 0.001-1 nm. The method produces a synthetic quartz glass substrate while preventing formation of defects of a size that is detectable by the high-sensitivity defect inspection tool, and providing the substrate with a satisfactory surface roughness.
    Type: Application
    Filed: December 13, 2010
    Publication date: June 30, 2011
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daijitsu Harada, Masaki Takeuchi
  • Patent number: 7964411
    Abstract: A sample concentrator for concentrating analytes in a solvent-containing liquid sample stream, including concentrator housing having a sample stream flow channel and a gas stream flow channel having an inlet and an outlet, a heater for gas in the gas stream conduit, and a hydrophilic ion exchange or non-ionic membrane barrier separating said gas stream flow channel and said sample stream flow channel. Solvent is evaporated from the liquid sample stream in said sample stream flow channel in or at the interface with said membrane, when the gas stream is at an elevated temperature. A regeneration step is used to regenerate the ion exchange membrane barrier.
    Type: Grant
    Filed: June 12, 2007
    Date of Patent: June 21, 2011
    Assignees: Dionex Corporation, Board of Regents, The University of Texas
    Inventors: Purnendu Dasgupta, Masaki Takeuchi, Kannan Srinivasan
  • Publication number: 20110143267
    Abstract: A photomask-forming glass substrate having a square major surface is provided wherein two strip regions are defined on the major surface near a pair of opposed sides such that each region spans between 2 mm and 10 mm inward of the side and excludes end portions extending 2 mm inward from the opposed ends of the side, a least squares plane is computed for each of the two strip regions, the angle included between normal lines to the least squares planes of two strip regions is within 10 seconds, and the height difference between two strip regions is up to 0.5 ?m.
    Type: Application
    Filed: December 10, 2010
    Publication date: June 16, 2011
    Inventors: Daijitsu Harada, Mamoru Morikawa, Masaki Takeuchi, Yukio Shibano