Patents by Inventor Masamichi Fujito
Masamichi Fujito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10559581Abstract: To downsize a semiconductor device that includes a non-volatile memory and a capacitive element on a semiconductor substrate. In a capacitive element region of a main surface of a semiconductor substrate, fins protruding from the main surface are arranged along the Y direction while extending in the X direction. In the capacitive element region of the main surface of the semiconductor substrate, capacitor electrodes of the capacitive elements are alternately arranged along the X direction while intersecting the fins. The fins are formed in a formation step of other fins which are arranged in a memory cell array of the non-volatile memory of the semiconductor substrate. One capacitor electrode is formed in a formation step of a control gate electrode of the non-volatile memory. Another capacitor electrode is formed in a formation step of a memory gate electrode of the non-volatile memory.Type: GrantFiled: February 7, 2019Date of Patent: February 11, 2020Assignee: Renesas Electronics CorporationInventors: Tomohiro Yamashita, Tamotsu Ogata, Masamichi Fujito, Tomoya Saito
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Patent number: 10354735Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.Type: GrantFiled: August 29, 2018Date of Patent: July 16, 2019Assignee: Renesas Electronics CorporationInventors: Toshihiro Tanaka, Yukiko Umemoto, Mitsuru Hiraki, Yutaka Shinagawa, Masamichi Fujito, Kazufumi Suzukawa, Hiroyuki Tanikawa, Takashi Yamaki, Yoshiaki Kamigaki, Shinichi Minami, Kozo Katayama, Nozomu Matsuzaki
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Publication number: 20190172837Abstract: To downsize a semiconductor device that includes a non-volatile memory and a capacitive element on a semiconductor substrate. In a capacitive element region of a main surface of a semiconductor substrate, fins protruding from the main surface are arranged along the Y direction while extending in the X direction. In the capacitive element region of the main surface of the semiconductor substrate, capacitor electrodes of the capacitive elements are alternately arranged along the X direction while intersecting the fins. The fins are formed in a formation step of other fins which are arranged in a memory cell array of the non-volatile memory of the semiconductor substrate. One capacitor electrode is formed in a formation step of a control gate electrode of the non-volatile memory. Another capacitor electrode is formed in a formation step of a memory gate electrode of the non-volatile memory.Type: ApplicationFiled: February 7, 2019Publication date: June 6, 2019Inventors: Tomohiro YAMASHITA, Tamotsu OGATA, Masamichi FUJITO, Tomoya SAITO
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Patent number: 10249638Abstract: To downsize a semiconductor device that includes a non-volatile memory and a capacitive element on a semiconductor substrate. In a capacitive element region of a main surface of a semiconductor substrate, fins protruding from the main surface are arranged along the Y direction while extending in the X direction. In the capacitive element region of the main surface of the semiconductor substrate, capacitor electrodes of the capacitive elements are alternately arranged along the X direction while intersecting the fins. The fins are formed in a formation step of other fins which are arranged in a memory cell array of the non-volatile memory of the semiconductor substrate. One capacitor electrode is formed in a formation step of a control gate electrode of the non-volatile memory. Another capacitor electrode is formed in a formation step of a memory gate electrode of the non-volatile memory.Type: GrantFiled: February 24, 2018Date of Patent: April 2, 2019Assignee: Renesas Electronics CorporationInventors: Tomohiro Yamashita, Tamotsu Ogata, Masamichi Fujito, Tomoya Saito
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Publication number: 20180374542Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.Type: ApplicationFiled: August 29, 2018Publication date: December 27, 2018Inventors: Toshihiro TANAKA, Yukiko UMEMOTO, Mitsuru HIRAKI, Yutaka SHINAGAWA, Masamichi FUJITO, Kazufumi SUZUKAWA, Hiroyuki TANIKAWA, Takashi YAMAKI, Yoshiaki KAMIGAKI, Shinichi MINAMI, Kozo KATAYAMA, Nozomu MATSUZAKI
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Publication number: 20180329770Abstract: A flash memory refreshes at a time before a read error might occur. A controller performs a first read operation and a second read operation using a sense amplifier. In the second read operation, a bit line potential controller draws out a potential of a bit line feeding the sense amplifier so that, if memory cell degradation has occurred, the degradation can be detected. For example, when first data read by the first read operation and second data read by the second read operation are determined to be different, the memory cell is refreshed.Type: ApplicationFiled: July 11, 2018Publication date: November 15, 2018Applicant: Renesas Electronics CorporationInventors: Tomoya SAITO, Masamichi FUJITO, KOICHI ANDO, Takashi HASHIMOTO
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Publication number: 20180315768Abstract: To downsize a semiconductor device that includes a non-volatile memory and a capacitive element on a semiconductor substrate. In a capacitive element region of a main surface of a semiconductor substrate, fins protruding from the main surface are arranged along the Y direction while extending in the X direction. In the capacitive element region of the main surface of the semiconductor substrate, capacitor electrodes of the capacitive elements are alternately arranged along the X direction while intersecting the fins. The fins are formed in a formation step of other fins which are arranged in a memory cell array of the non-volatile memory of the semiconductor substrate. One capacitor electrode is formed in a formation step of a control gate electrode of the non-volatile memory. Another capacitor electrode is formed in a formation step of a memory gate electrode of the non-volatile memory.Type: ApplicationFiled: February 24, 2018Publication date: November 1, 2018Inventors: Tomohiro YAMASHITA, Tamotsu OGATA, Masamichi FUJITO, Tomoya SAITO
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Patent number: 10115469Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.Type: GrantFiled: October 27, 2017Date of Patent: October 30, 2018Assignee: Renesas Electronics CorporationInventors: Toshihiro Tanaka, Yukiko Umemoto, Mitsuru Hiraki, Yutaka Shinagawa, Masamichi Fujito, Kazufumi Suzukawa, Hiroyuki Tanikawa, Takashi Yamaki, Yoshiaki Kamigaki, Shinichi Minami, Kozo Katayama, Nozomu Matsuzaki
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Patent number: 10102913Abstract: A controlling method of a semiconductor device provided with a memory array including a plurality of complementary cells, each cell including a first memory element and a second memory element, for holding binary data depending on a difference of threshold voltage therebetween, the controlling method comprising: performing a prewrite procedure that writes ‘0’ or ‘1’ to both of the first memory element and the second memory element.Type: GrantFiled: August 2, 2017Date of Patent: October 16, 2018Assignee: RENESAS ELECTRONICS CORPORATIONInventors: Masamichi Fujito, Hiroshi Yoshida, Takanori Takahashi, Yasuhiko Taito
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Patent number: 10031792Abstract: The present invention aims at providing a flash memory that can perform a refresh operation at an appropriate time before a read error occurs.Type: GrantFiled: July 14, 2017Date of Patent: July 24, 2018Assignee: Renesas Electronics CorporationInventors: Tomoya Saito, Masamichi Fujito, Koichi Ando, Takashi Hashimoto
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Publication number: 20180067793Abstract: The present invention aims at providing a flash memory that can perform a refresh operation at an appropriate time before a read error occurs.Type: ApplicationFiled: July 14, 2017Publication date: March 8, 2018Applicant: Renesas Electronics CorporationInventors: Tomoya SAITO, Masamichi FUJITO, Koichi ANDO, Takashi HASHIMOTO
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Publication number: 20180047452Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.Type: ApplicationFiled: October 27, 2017Publication date: February 15, 2018Inventors: Toshihiro TANAKA, Yukiko UMEMOTO, Mitsuru HIRAKI, Yutaka SHINAGAWA, Masamichi FUJITO, Kazufumi SUZUKAWA, Hiroyuki TANIKAWA, Takashi YAMAKI, Yoshiaki KAMIGAKI, Shinichi MINAMI, Kozo KATAYAMA, Nozomu MATSUZAKI
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Publication number: 20170330630Abstract: A controlling method of a semiconductor device provided with a memory array including a plurality of complementary cells, each cell including a first memory element and a second memory element, for holding binary data depending on a difference of threshold voltage therebetween, the controlling method comprising: performing a prewrite procedure that writes ‘0’ or ‘1’ to both of the first memory element and the second memory element.Type: ApplicationFiled: August 2, 2017Publication date: November 16, 2017Inventors: Masamichi Fujito, Hiroshi Yoshida, Takanori Takahashi, Yasuhiko Taito
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Patent number: 9812211Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.Type: GrantFiled: August 1, 2016Date of Patent: November 7, 2017Assignee: Renesas Electronics CorporationInventors: Toshihiro Tanaka, Yukiko Umemoto, Mitsuru Hiraki, Yutaka Shinagawa, Masamichi Fujito, Kazufumi Suzukawa, Hiroyuki Tanikawa, Takashi Yamaki, Yoshiaki Kamigaki, Shinichi Minami, Kozo Katayama, Nozomu Matsuzaki
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Patent number: 9747990Abstract: A semiconductor device includes a memory array having a plurality of complementary cells, each including a first memory element and a second memory element, for holding binary data depending on a difference of threshold voltage therebetween, and a control circuit for initializing the complementary cells.Type: GrantFiled: May 27, 2016Date of Patent: August 29, 2017Assignee: Renesas Electronics CorporationInventors: Masamichi Fujito, Hiroshi Yoshida, Takanori Takahashi, Yasuhiko Taito
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Publication number: 20170047121Abstract: A semiconductor device includes a memory array having a plurality of complementary cells, each including a first memory element and a second memory element, for holding binary data depending on a difference of threshold voltage therebetween, and a control circuit for initializing the complementary cells.Type: ApplicationFiled: May 27, 2016Publication date: February 16, 2017Inventors: Masamichi FUJITO, Hiroshi YOSHIDA, Takanori TAKAHASHI, Yasuhiko TAITO
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Publication number: 20160336074Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.Type: ApplicationFiled: August 1, 2016Publication date: November 17, 2016Inventors: Toshihiro TANAKA, Yukiko UMEMOTO, Mitsuru HIRAKI, Yutaka SHINAGAWA, Masamichi FUJITO, Kazufumi SUZUKAWA, Hiroyuki TANIKAWA, Takashi YAMAKI, Yoshiaki KAMIGAKI, Shinichi MINAMI, Kozo KATAYAMA, Nozomu MATSUZAKI
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Patent number: 9412459Abstract: A semiconductor device includes a plurality of nonvolatile memory cells (1). Each of the nonvolatile memory cells comprises a MOS type first transistor section (3) used for information storage, and a MOS type second transistor section (4) which selects the first transistor section. The second transistor section has a bit line electrode (16) connected to a bit line, and a control gate electrode (18) connected to a control gate control line. The first transistor section has a source line electrode (10) connected to a source line, a memory gate electrode (14) connected to a memory gate control line, and a charge storage region (11) disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section.Type: GrantFiled: March 16, 2014Date of Patent: August 9, 2016Assignee: Renesas Electronics CorporationInventors: Toshihiro Tanaka, Yukiko Umemoto, Mitsuru Hiraki, Yutaka Shinagawa, Masamichi Fujito, Kazufumi Suzukawa, Hiroyuki Tanikawa, Takashi Yamaki, Yoshiaki Kamigaki, Shinichi Minami, Kozo Katayama, Nozomu Matsuzaki
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Patent number: 9170637Abstract: A data processing device, includes a central processing unit configured to operate in accordance with a program; a register capable of setting a first mode and a second mode; a non-volatile memory; a sequencer configured to control the non-volatile memory; and a first clock circuit for supplying a first clock to the central processing unit and the non-volatile memory, wherein the first mode is a mode in which the central processing unit is operated within a first range of an external supply voltage, wherein the second mode is a mode in which the central processing unit is operated within a second range of the external supply voltage, the second range includes the first range and a relatively low voltage lower than the lower limit voltage of the first range.Type: GrantFiled: April 13, 2015Date of Patent: October 27, 2015Assignee: Renesas Electronics CorporationInventors: Mamoru Sakugawa, Masamichi Fujito, Jun Setogawa, Masaru Takahashi, Shinsuke Yoshimura
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Publication number: 20150220130Abstract: A data processing device, includes a central processing unit configured to operate in accordance with a program; a register capable of setting a first mode and a second mode; a non-volatile memory; a sequencer configured to control the non-volatile memory; and a first clock circuit for supplying a first clock to the central processing unit and the non-volatile memory, wherein the first mode is a mode in which the central processing unit is operated within a first range of an external supply voltage, wherein the second mode is a mode in which the central processing unit is operated within a second range of the external supply voltage, the second range includes the first range and a relatively low voltage lower than the lower limit voltage of the first range.Type: ApplicationFiled: April 13, 2015Publication date: August 6, 2015Inventors: Mamoru SAKUGAWA, Masamichi FUJITO, Jun SETOGAWA, Masaru TAKAHASHI, Shinsuke YOSHIMURA