Patents by Inventor Masaru Matsushima
Masaru Matsushima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120261589Abstract: In the case of inspecting samples having different sizes by means of a semiconductor inspecting apparatus, a primary electron beam bends since distribution is disturbed on an equipotential surface at the vicinity of the sample at the time of inspecting vicinities of the sample, and what is called a positional shift is generated. A potential correcting electrode is arranged outside the sample and at a position lower than the sample lower surface, and a potential lower than that of the sample is applied. Furthermore, a voltage to be applied to the potential correcting electrode is controlled corresponding to a distance between the inspecting position and a sample outer end, sample thickness and irradiation conditions of the primary electron beam.Type: ApplicationFiled: June 29, 2012Publication date: October 18, 2012Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Go MIYA, Seiichiro KANNO, Hiroyuki KITSUNAI, Masaru MATSUSHIMA, Toru SHUTO
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Publication number: 20120256087Abstract: There is provided a technique that is capable of attracting a sample without making the voltage applied to an electrostatic chuck unnecessarily large. Attraction experiments with respect to the electrostatic chuck are performed using a testing sample whose degree of warp and pattern of warp are known, and a critical application voltage at which the attraction state changes from “bad” to “good” is found. When measuring an inspection target sample, the flatness of the inspection target sample is measured, and the degree of warp and pattern of warp of the inspection target sample are detected. Based on the degree of warp and pattern of warp of the inspection target sample and on the known critical application voltage, the application voltage for the electrostatic chuck is set.Type: ApplicationFiled: December 24, 2010Publication date: October 11, 2012Applicant: Hitachi High-Technologies CorporationInventors: Seiichiro Kanno, Hiroyuki Kitsunai, Masaru Matsushima
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Patent number: 8232522Abstract: In the case of inspecting samples having different sizes by means of a semiconductor inspecting apparatus, a primary electron beam bends since distribution is disturbed on an equipotential surface at the vicinity of the sample at the time of inspecting vicinities of the sample, and what is called a positional shift is generated. A potential correcting electrode is arranged outside the sample and at a position lower than the sample lower surface, and a potential lower than that of the sample is applied. Furthermore, a voltage to be applied to the potential correcting electrode is controlled corresponding to a distance between the inspecting position and a sample outer end, sample thickness and irradiation conditions of the primary electron beam.Type: GrantFiled: June 23, 2009Date of Patent: July 31, 2012Assignee: Hitachi High-Technologies CorporationInventors: Go Miya, Seiichiro Kanno, Hiroyuki Kitsunai, Masaru Matsushima, Toru Shuto
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Publication number: 20120145920Abstract: Disclosed is a smaller and lighter stage device which can be applied to a device such as a length measurement SEM for inspecting and/or evaluating a semiconductor, and in which the effect of a magnetic field on an electron beam can be reduced. Linear motors 110, 111, 112, 113 are disposed on four sides of a base 104 to be distanced from an electron beam projection position (the center of the stage device), respectively. The base 104 has dimensions substantially equivalent to minimum dimensions determined by the size of a top table 101 and a movable stroke. Linear motor stators 110, 112 are configured to have a “C-shaped” structure whose opening faces outside of the stage device, respectively. Further, a movable table is coupled to the top table via linear guides 107, 109 composed of a nonmagnetic material or roller mechanisms composed of a nonmagnetic material.Type: ApplicationFiled: September 17, 2010Publication date: June 14, 2012Applicant: Hitachi High-Technologies CorporationInventors: Hironori Ogawa, Masahiro Koyama, Nobuo Shibata, Masaru Matsushima, Shuichi Nakagawa, Katsunori Onuki, Yoshimasa Fukushima
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Publication number: 20120070066Abstract: The charged particle beam device has a problem that a symmetry of equipotential distribution is disturbed near the outer edge of a specimen, an object being evaluated, causing a charged particle beam to deflect there. An electrode plate installed inside the specimen holding mechanism of electrostatic attraction type is formed of an inner and outer electrode plates arranged concentrically. The outer electrode plate is formed to have an outer diameter larger than that of the specimen. The dimensions of the electrode plates are determined so that an overlapping area of the outer electrode plate and the specimen is substantially equal to an area of the inner electrode plate. The inner electrode plate is impressed with a voltage of a positive polarity with respect to a reference voltage and of an arbitrary magnitude, and the outer electrode is impressed with a voltage of a negative polarity and of an arbitrary magnitude.Type: ApplicationFiled: June 3, 2010Publication date: March 22, 2012Applicant: Hitachi High-Technologies CorporationInventors: Hiroyuki Kitsunai, Seiichiro Kanno, Masaru Matsushima, Shuichi Nakagawa, Go Miya
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Publication number: 20120006401Abstract: The invention relates to a solar cell module protective sheet which has two or more gas barrier films, each provided with a deposited layer formed of an inorganic oxide on at least one surface of a base film, in which a material constituting the solar cell module protective sheet is formed of a material transmitting light rays of a wavelength contributing to the generation of electric power, and the solar cell module protective sheet is used as a front sheet, a solar cell module using the solar cell module protective sheet, and the like. According to the invention, it is possible to provide a solar cell module protective sheet having high dampproofness and enabling stable long-term use of a solar cell when the solar cell module protective sheet is used as a front sheet or a back sheet of the solar cell module, and a solar cell module using the solar cell module protective sheet.Type: ApplicationFiled: March 5, 2010Publication date: January 12, 2012Applicants: MITSUBISHI PLASTICS, INC., LINTEC CORPORATIONInventors: Yasunari Takanashi, Masaru Matsushima
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Publication number: 20110303844Abstract: It is an object of the present invention to provide an electron microscope for properly applying a retarding voltage to a sample which is brought into electrical conduction.Type: ApplicationFiled: October 15, 2009Publication date: December 15, 2011Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Seiichiro Kanno, Hiroyuki Kitsunai, Masaru Matsushima, Toru Shuto, Kazuyuki Ikenaga
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Patent number: 8076651Abstract: A specimen stage apparatus has a braking structure which can generate a braking force enough to stop a specimen stage while keeping a movable table from increasing in its weight. The specimen stage apparatus has an X guide fixed on an X base and representing a guide structure in X direction, an X table constrained by the X guide to be movable in X direction, an X actuator having its movable part fixed to the X table and an X brake fixed to the X base and representing a braking structure for the X table. A controller carries out positioning control in which it generates a braking force by pushing the X brake against the bottom surface of the X table to stop a specimen stage and turning off the servo-control of the X actuator after stoppage of the specimen stage.Type: GrantFiled: March 31, 2009Date of Patent: December 13, 2011Assignee: Hitachi High-Technologies CorporationInventors: Masahiro Koyama, Hironori Ogawa, Nobuo Shibata, Masaru Matsushima, Toshinori Kobayashi, Shuichi Nakagawa
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Publication number: 20110095185Abstract: In the case of inspecting samples having different sizes by means of a semiconductor inspecting apparatus, a primary electron beam bends since distribution is disturbed on an equipotential surface at the vicinity of the sample at the time of inspecting vicinities of the sample, and what is called a positional shift is generated. A potential correcting electrode is arranged outside the sample and at a position lower than the sample lower surface, and a potential lower than that of the sample is applied. Furthermore, a voltage to be applied to the potential correcting electrode is controlled corresponding to a distance between the inspecting position and a sample outer end, sample thickness and irradiation conditions of the primary electron beam.Type: ApplicationFiled: June 23, 2009Publication date: April 28, 2011Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Go Miya, Seiichiro Kanno, Hiroyuki Kitsunai, Masaru Matsushima, Toru Shuto
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Publication number: 20090250625Abstract: A specimen stage apparatus has a braking structure which can generate a braking force enough to stop a specimen stage while keeping a movable table from increasing in its weight. The specimen stage apparatus has an X guide fixed on an X base and representing a guide structure in X direction, an X table constrained by the X guide to be movable in X direction, an X actuator having its movable part fixed to the X table and an X brake fixed to the X base and representing a braking structure for the X table. A controller carries out positioning control in which it generates a braking force by pushing the X brake against the bottom surface of the X table to stop a specimen stage and turning off the servo-control of the X actuator after stoppage of the specimen stage.Type: ApplicationFiled: March 31, 2009Publication date: October 8, 2009Inventors: Masahiro KOYAMA, Hironori Ogawa, Nobuo Shibata, Masaru Matsushima, Toshinori Kobayashi, Shuichi Nakagawa
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Patent number: 7435974Abstract: An electron microscope is disclosed, wherein a specimen stage includes a base having an X-slide guide member, a center table adapted to move along the X-slide guide member, and an X rod for driving the center table. A gap is formed in the coupling between the guide unit of the center table and the X rod. A control unit performs the position control operation to monitor the measurement of a position detector such as a laser interferometer, stop driving the center table at a designated stop position, and separate the table and the X rod from each other using the gap.Type: GrantFiled: September 14, 2006Date of Patent: October 14, 2008Assignee: Hitachi High-Technologies CorporationInventor: Masaru Matsushima
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Publication number: 20070057196Abstract: An electron microscope is disclosed, wherein a specimen stage includes a base having an X-slide guide member, a center table adapted to move along the X-slide guide member, and an X rod for driving the center table. A gap is formed in the coupling between the guide unit of the center table and the X rod. A control unit performs the position control operation to monitor the measurement of a position detector such as a laser interferometer, stop driving the center table at a designated stop position, and separate the table and the X rod from each other using the gap.Type: ApplicationFiled: September 14, 2006Publication date: March 15, 2007Inventor: Masaru Matsushima
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Patent number: 5530605Abstract: A slider support mechanism of a leaf-spring type movable only in a direction perpendicular to a surface of a disk and having a torsional rigidity equal to or more than 100 gfmm/rad and a spring constant within a range of 0.01-0.5 mg/.mu.m acts a load of 20-100 mg on a magnetic head slider to permit the slider to run in a liquid flying or contact condition. The load equal to or less than 100 mg is stably loaded on the magnetic head slider. Further, the magnetic head slider is not substantially rotated with respect to the magnetic disk surface. Accordingly, a slider running system of a liquid flying type or a solid contact type having a flying amount of 10-40 nm is made possible. Thus, the magnetic disk apparatus of high-density recording and high reliability is provided.Type: GrantFiled: June 7, 1994Date of Patent: June 25, 1996Assignee: Hitachi, Ltd.Inventors: Tetsuya Hamaguchi, Yukio Katou, Masaaki Matsumoto, Masaru Matsushima
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Patent number: 5446191Abstract: A 1-cyclohexyl-1-methylethylperoxy carbonate represented by the formula: ##STR1## (wherein n.sub.1 stands for 1 or 2 and, when n.sub.1 is 1, R.sub.1 stands for an alkyl group of up to 14 carbon atoms, an aralkyl group of up to 14 carbon atoms, an alkoxyalkyl group of up to 14 carbon atoms, a cycloalkyl group of up to 14 carbon atoms, or an aryl group of up to 14 carbon atoms, and when n.sub.1 is 2, R.sub.1 stands for an alkylene group of up to 16 carbon atoms, an aralkylene group of up to 16 carbon atoms, an oxaalkylene group of up to 16 carbon atoms, a cycloalkylene group of up to 16 carbon atoms, or a phenylene group of up to 16 carbon atoms) is a novel compound. It is produced by causing a chloroformate represented by the formula: ##STR2## (wherein n.sub.2 has the same meaning as n.sub.1 in the preceding formula) to react with 1-cyclohexyl-1-methylethylhydroperoxide.Type: GrantFiled: February 2, 1994Date of Patent: August 29, 1995Assignee: NOF CorporationInventors: Shuji Suyama, Tooru Nishikawa, Masaru Matsushima, Hiroshi Okada
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Patent number: 4315997Abstract: A styrene resin composition which is admixed with a styrene-vinyl acetate block copolymer is improved in the fluidity without degrading the mechanical strength and electric insulation resistance. Said vinyl acetate block polymer can easily be obtained by using a polymeric peroxide having ester bonds in the molecule thereof, notwithstanding that a copolymer of a styrene and a vinyl acetate could not be prepared easily by the prior art.Type: GrantFiled: July 2, 1980Date of Patent: February 16, 1982Assignee: Nippon Oil and Fats Co., Ltd.Inventors: Norihisa Ujikawa, Masaharu Nakayama, Masaru Matsushima
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Patent number: 4303762Abstract: A composition of matter which is prepared by blended with an unsaturated resin with a block copolymer which is obtained by employing a polymeric peroxide has dispersion stability during long storage found in no conventional one.A hardened moulding product obtained from the aforementioned composition matters is small in its volume shrinkage and exhibit smoothness and gloss to the surface thereof even it is employed after long period storage.Type: GrantFiled: November 24, 1980Date of Patent: December 1, 1981Assignee: Nippon Oil and Fats Co., Ltd.Inventors: Masaharu Nakayama, Masaru Matsushima, Shigeki Banno, Nobuo Kanazawa
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Patent number: 4283512Abstract: A copolymer having peroxy bonds in the molecule thereof which is obtained by copolymerizing an diacyl type polymeric peroxide having ester bonds therein with one or more monomers having double bonds therein, may have a broad range of average molecular weight and a lot of peroxy bonds therein, and it may be used as an useful polymerization initiator in producing a block copolymer.Type: GrantFiled: November 27, 1979Date of Patent: August 11, 1981Assignee: Nippon Oil and Fats Co., Ltd.Inventors: Masaru Matsushima, Takeshi Komai, Masaharu Nakayama
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Patent number: 4260692Abstract: When polystyrenes having peroxy bonds therein are charged into a polymerization system of methyl methacrylate series monomers, the said polystyrenes act as an opaquing agent and a polymerization initiator.The obtained opaque or translucent plate is splendid in optical and mechanical properties.Type: GrantFiled: October 29, 1979Date of Patent: April 7, 1981Assignee: Nippon Oil and Fats Co., Ltd.Inventors: Takeshi Komai, Masaru Matsushima
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Patent number: 4238381Abstract: A non-aqueous liquid dispersion of polymers is obtained by a first step of copolymerizing one or more vinyl-type monomers with one or more polymerized peroxides, capable of further polymerization followed by a second step of copolymerizing the resulting copolymer having peroxy bonds therein with one or more vinyl-type monomers different than the one or ones used in the first copolymerization step, in an organic liquid which dissolves the polymers of the vinyl-type monomers of the first copolymerization but does not dissolve the polymers of the vinyl-type monomers used in the second copolymerization. The dispersion is splendid in dispersion stability and it is very useful as a thermosetting, film-type, coating composition.Type: GrantFiled: July 2, 1979Date of Patent: December 9, 1980Assignee: Nippon Oil and Fats Co., Ltd.Inventors: Takeshi Komai, Masaru Matsushima
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Patent number: 4169848Abstract: Polymeric diacyl peroxides containing ester groups in the molecules are insensitive to impact, friction and heat. Accordingly, they can be safely produced and handled. They are useful as industrial polymerization initiators and they dissolve promptly in vinyl-type monomers.Type: GrantFiled: May 24, 1978Date of Patent: October 2, 1979Assignee: Nippon Oil and Fats Co., Ltd.Inventors: Takeshi Komai, Masaru Matsushima