Patents by Inventor Masaru Sakamoto

Masaru Sakamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6335167
    Abstract: Disclosed are new methods comprising the use of in situ hybridization to detect abnormal nucleic acid sequence copy numbers in one or more genomes wherein repetitive sequences that bind to multiple loci in a reference chromosome spread are either substantially removed and/or their hybridization signals suppressed. The invention termed Comparative Genomic Hybridization (CGH) provides for methods of determining the relative number of copies of nucleic acid sequences in one or more subject genomes or portions thereof (for example, a tumor cell) as a function of the location of those sequences in a reference genome (for example, a normal human genome). The intensity(ies) of the signals from each labeled subject nucleic acid and/or the differences in the ratios between different signals from the labeled subject nucleic acid sequences are compared to determine the relative copy numbers of the nucleic acid sequences in the one or more subject genomes as a function of position along the reference chromosome spread.
    Type: Grant
    Filed: May 14, 1999
    Date of Patent: January 1, 2002
    Assignee: The Regents of the University of California
    Inventors: Daniel Pinkel, Joe W. Gray, Anne Kallioniemi, Ollie-Pekka Kallioniemi, Frederic Waldman, Masaru Sakamoto
  • Publication number: 20010048096
    Abstract: Provided is an oxygen absorbing composition and an oxygen absorbing resin composition employing such oxygen absorbing composition, which demonstrate a favorable oxygen absorbing performance even in a low-humidity environment. Use of such oxygen absorbing composition and oxygen absorbing resin composition allows preservation of medicines or foods etc. which are in a dry state and disfavoring moisture.
    Type: Application
    Filed: June 3, 1999
    Publication date: December 6, 2001
    Inventors: MASARU SAKAMOTO, MASAKI NAGATA
  • Publication number: 20010016423
    Abstract: A method of manufacturing a semiconductor substrate includes the steps of laminating a first substrate having a single-crystal semiconductor region with a second substrate having an insulator region, and selectively removing the portion of the first substrate of the laminated substrates where lamination strength is weak.
    Type: Application
    Filed: August 19, 1997
    Publication date: August 23, 2001
    Inventor: MASARU SAKAMOTO
  • Patent number: 6222031
    Abstract: Disclosed is a process for preparing a water-soluble tricarboxypolysaccharide which includes the step of oxidizing an &agr;-bonding type polysaccharide with a ruthenium compound and an oxidizing agent. The water-soluble tricarboxypolysaccharide, having a high carboxyl group content, can easily and inexpensively be prepared in a high yield without any problem of a post-treatment after the reaction, and thus the present invention is desirable as an industrial preparation process of the water-soluble tricarboxpolysaccharide.
    Type: Grant
    Filed: January 27, 1998
    Date of Patent: April 24, 2001
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hidechika Wakabayashi, Toru Takahashi, Masaru Sakamoto, Rieko Sano
  • Patent number: 6128052
    Abstract: A semiconductor device comprises a substrate comprising a semiconductor monocrystalline substrate on one principal surface side of which a light-transmitting film is formed, the substrate being prepared by removing from the other principal surface side thereof a semiconductor monocrystalline region present right beneath the light-transmitting film, a non-monocrystalline semiconductor element formed on the light-transmitting film, and a monocrystalline semiconductor element formed in a semiconductor monocrystalline region remaining in the substrate, the non-monocrystalline semiconductor element and the monocrystalline semiconductor element being electrically connected.
    Type: Grant
    Filed: May 5, 1997
    Date of Patent: October 3, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tetsuo Asaba, Masaru Sakamoto, Yutaka Genchi
  • Patent number: 6067945
    Abstract: An engine generator includes an engine having an intake device and an exhaust device which are connected to an engine body, a generator connected to the engine, and a fuel tank for supplying fuel to the engine. The engine, the generator and the fuel tank are mounted on a frame. In this engine generator, the intake device and the exhaust device are connected to an upper portion of the engine body having a cylinder axis extending vertically to protrude to opposite sides from the engine body, and the fuel tank is disposed sideways of the engine body and the generator below the intake device or the exhaust device. Thus, when a vertical engine is used, the fuel tank can be effectively disposed to avoid the production of a wasteful space, thereby providing reductions in size, weight and cost.
    Type: Grant
    Filed: September 1, 1998
    Date of Patent: May 30, 2000
    Assignees: Sawafuji Electric Co., Ltd, Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Masahiro Fukuda, Toru Nishikura, Masaru Sakamoto, Akira Fukuda, Takao Tamechika, Tsutomu Hatsugai
  • Patent number: 6029100
    Abstract: There is provided a method for flue gas desulfurization which is capable of conducting minute control of oxidation and which is capable of maintaining the concentration of sulfurous acid in an absorbent liquid within a proper range in a highly reliable and efficient manner, even in the case where an abrupt change occurs in the operational conditions of the system. In the method for controlling the oxidation in flue gas desulfurization, the value of proportional sensitivity K in the feed back control process, which is based primarily on the oxidation-reduction potential, is increased depending on the deviation .epsilon. in a region where the detected oxidation reduction potential value PN is below the target oxidation reduction potential value SN in correspondence with the characteristic change of the oxidation-reduction potential against the concentration of sulfurous acid.
    Type: Grant
    Filed: February 11, 1997
    Date of Patent: February 22, 2000
    Assignee: Mitsubishi Jukogyo Kabushiki Kaisha
    Inventors: Koichiro Iwashita, Susumu Okino, Naohiko Ukawa, Masaru Sakamoto
  • Patent number: 5976790
    Abstract: Disclosed are new methods comprising the use of in situ hybridization to detect abnormal nucleic acid sequence copy numbers in one or more genomes wherein repetitive sequences that bind to multiple loci in a reference chromosome spread are either substantially removed and/or their hybridization signals suppressed. The invention termed Comparative Genomic Hybridization (CGH) provides for methods of determining the relative number of copies of nucleic acid sequences in one or more subject genomes or portions thereof (for example, a tumor cell) as a function of the location of those sequences in a reference genome (for example, a normal human genome). The intensity(ies) of the signals from each labeled subject nucleic acid and/or the differences in the ratios between different signals from the labeled subject nucleic acid sequences are compared to determine the relative copy numbers of the nucleic acid sequences in the one or more subject genomes as a function of position along the reference chromosome spread.
    Type: Grant
    Filed: November 27, 1995
    Date of Patent: November 2, 1999
    Assignee: The Regents of the University of California
    Inventors: Daniel Pinkel, Joe W. Gray, Anne Kallioniemi, Olli-Pekka Kallioniemi, Frederick Waldman, Masaru Sakamoto
  • Patent number: 5965362
    Abstract: Disclosed are new methods comprising the use of in situ hybridization to detect abnormal nucleic acid sequence copy numbers in one or more genomes wherein repetitive sequences that bind to multiple loci in a reference chromosome spread are either substantially removed and/or their hybridization signals suppressed. The invention termed Comparative Genomic Hybridization (CGH) provides for methods of determining the relative number of copies of nucleic acid sequences in one or more subject genomes or portions thereof (for example, a tumor cell) as a function of the location of those sequences in a reference genome (for example, a normal human genome). The intensity(ies) of the signals from each labeled subject nucleic acid and/or the differences in the ratios between different signals from the labeled subject nucleic acid sequences are compared to determine the relative copy numbers of the nucleic acid sequences in the one or more subject genomes as a function of position along the reference chromosome spread.
    Type: Grant
    Filed: November 27, 1995
    Date of Patent: October 12, 1999
    Assignee: The Regents of the University of California
    Inventors: Daniel Pinkel, Joe W. Gray, Anne Kallioniemi, Olli-Pekka Kallioniemi, Frederic Waldman, Masaru Sakamoto
  • Patent number: 5965949
    Abstract: An engine-driven generator incorporating an engine and a generator into a single unit, with the output shaft of the engine coaxially connected to the rotating shaft of the generator, via a frame structure formed by integrally combining two support members provided in parallel with the axial line of the output and rotating shafts with two handle members orthogonally intersecting the aforementioned axial line via upright members wherein base members are fixedly fitted between the support members below the engine and the generator in such a manner as to orthogonally intersecting the aforementioned support members; a generator mounting member, having a mounting hole in the axial direction, provided between a bulged portion integrally protruded on the lower part a rear bracket of the generator and a base member below the generator, and two engine mounting members provided between the engine and a base member below the engine are disposed at the apexes of a triangle, so that the engine and the generator are mounted
    Type: Grant
    Filed: January 23, 1998
    Date of Patent: October 12, 1999
    Assignee: Sawafuji Electric Co., Ltd.
    Inventors: Masahiro Fukuda, Tohru Yoshioka, Tohru Nishikura, Masaru Sakamoto
  • Patent number: 5856097
    Abstract: Disclosed are new methods comprising the use, of in situ hybridization to detect abnormal nucleic acid sequence copy numbers in one or more genomes wherein repetitive sequences that bind to multiple loci in a reference chromosome spread are either substantially removed and/or their hybridization signals suppressed. The invention termed Comparative Genomic Hybridization (CGH) provides for methods of determining the relative number of copies of nucleic acid sequences in one or more subject genomes or portions thereof (for example, a tumor cell) as a function of the location of those sequences in a reference genome (for example, a normal human genome). The intensity(ies) of the signals from each labeled subject nucleic acid and/or the differences in the ratios between different signals from the labeled subject nucleic acid sequences are compared to determine the relative copy numbers of the nucleic acid sequences in the one or more subject genomes as a function of position along the reference chromosome spread.
    Type: Grant
    Filed: November 27, 1995
    Date of Patent: January 5, 1999
    Assignee: The Regents of the University of California
    Inventors: Daniel Pinkel, Joe W. Gray, Anne Kallioniemi, Olli-Pekka Kallioniemi, Frederic Waldman, Masaru Sakamoto
  • Patent number: 5827755
    Abstract: A liquid crystal image display unit created on a substrate non-transparent to the light in the visible radiation area, characterized in that a portion beneath a liquid crystal pixel part on said substrate is removed, so that the light is made transmissive through said liquid crystal pixel part.
    Type: Grant
    Filed: August 22, 1995
    Date of Patent: October 27, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takao Yonehara, Mamoru Miyawaki, Akira Ishizaki, Junichi Hoshi, Masaru Sakamoto, Shigetoshi Sugawa, Shunsuke Inoue, Toru Koizumi, Tetsunobu Kohchi, Kiyofumi Sakaguchi, Takanori Watanabe
  • Patent number: 5739590
    Abstract: A semiconductor device is constructed to have an insulating layer containing an impurity provided upon a semiconductor substrate. This insulating layer contains a plurality of windows of different sizes. A first layer is provided in the windows. This first layer does not extend over a periphery of the windows to the surface of the insulating layer. Further, this semiconductor device is constructed such that the surface of the insulating layer and the first layer opposite the semiconductor substrate are flat. In addition, the semiconductor substrate in contact with the first layer also contains the impurity. The semiconductor device, having less surface unevenness that a conventional device, provides both improved and greater stability of device properties.
    Type: Grant
    Filed: June 1, 1995
    Date of Patent: April 14, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masaru Sakamoto, Masakazu Morishita, Shigeru Nishimura
  • Patent number: 5714790
    Abstract: A semiconductor device has an ITO film which is in contact with a semiconductor or a metal, the ITO film having an insulating film with SiN as the main constituent provided on or under at least a portion of the ITO film.
    Type: Grant
    Filed: April 17, 1996
    Date of Patent: February 3, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventor: Masaru Sakamoto
  • Patent number: 5663094
    Abstract: A semiconductor device having i) a common opening 110 reaching a conductive region 105 through at least one conductive layer 107 and ii) another conductive layer 109 deposited in the opening 101, the conductive layer 107 and the conductive region 105 being electrically connected in the common opening 110. Also disclosed is a process comprising previously forming a plurality of conductive regions 105 and 107, thereafter forming an opening 110 that opens at the conductive regions, and depositing another conductive region 109 in the opening 110 to electrically connect the respective conductive regions in the opening. This can achieve a wiring connection structure that enables prevention of an increase in the number of masks used to form openings for wiring connection, an increase in the number of steps and an increase in the area held by openings, to thereby enhance the degree of integration of semiconductor devices.
    Type: Grant
    Filed: December 8, 1994
    Date of Patent: September 2, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventor: Masaru Sakamoto
  • Patent number: 5663097
    Abstract: A method of fabricating semiconductor devices comprises the following process of: forming an electrode leading out window having its vertical side wall at a given position in the functional element formed on a semiconductor substrate; forming an insulating film on the surface of the side wall; and depositing an electrode metal in the leading out window.
    Type: Grant
    Filed: September 28, 1994
    Date of Patent: September 2, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masaru Sakamoto, Kei Fujita
  • Patent number: 5650664
    Abstract: A semiconductor apparatus exhibiting excellent contact characteristics, high operational speed and low electric power consumption is realized by forming a layer made of Ti or a Ti compound between an oxide containing indium such as a thin ITO film and a Si region.
    Type: Grant
    Filed: February 24, 1993
    Date of Patent: July 22, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventor: Masaru Sakamoto
  • Patent number: 5597741
    Abstract: A process for preparing a semiconductor device, in which a polycrystalline silicon film is formed on a monocrystalline semiconductor substrate and arsenic or phosphorus is injected as an impurity into the polycrystalline silicon film by an ion-injection method to make the polycrystalline silicon film an amorphous layer. The amorphous layer is heat-treated at a temperature of 600.degree. C. to 650.degree. C. to recrystallize the amorphous layer, thus forming a recrystallized layer having a grain size greater than that of the polycrystalline silicon film by solid phase growth. The recrystallized layer is heat-treated at a temperature of 800.degree. C. to 900.degree. C. to diffuse the impurity into the monocrystalline semiconductor substrate.
    Type: Grant
    Filed: February 17, 1995
    Date of Patent: January 28, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masaru Sakamoto, Masakazu Morishita, Shigeru Nishimura
  • Patent number: 5530266
    Abstract: A liquid crystal image display unit created on a substrate non-transparent to the light in the visible radiation area, characterized in that a portion beneath a liquid crystal pixel part on said substrate is removed, so that the light is made transmissive through said liquid crystal pixel part.
    Type: Grant
    Filed: May 13, 1994
    Date of Patent: June 25, 1996
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takao Yonehara, Mamoru Miyawaki, Akira Ishizaki, Junichi Hoshi, Masaru Sakamoto, Shigetoshi Sugawa, Shunsuke Inoue, Toru Koizumi, Tetsunobu Kohchi, Kiyofumi Sakaguchi, Takanori Watanabe
  • Patent number: 5476799
    Abstract: A process for preparing a semiconductor device forms an insulating thin film capable of tunnelling phenomenon of carriers on a semiconductor substrate and forms a polycrystalline semiconductor layer on the thin film. An impurity is injected to the surface of the polycrystalline semiconductor layer, the diffusion coefficient to the thin film being smaller than that to the polycrystalline semiconductor layer. The process effects a first heat treatment at a temperature of 800.degree. C. or less to diffuse the impurity injected into the polycrystalline semiconductor layer in the polycrystalline semiconductor layer, thereby forming a uniform or substantially uniform impurity containing region at least at the thin film side of the polycrystalline semiconductor layer, and, effects a second heat treatment the temperature of which is 950.degree. C.
    Type: Grant
    Filed: May 27, 1993
    Date of Patent: December 19, 1995
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masaru Sakamoto, Masakazu Morishita, Shigeru Nishimura