Patents by Inventor Masashi Fujimoto
Masashi Fujimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8766126Abstract: A push button switch 1 is so constructed as to disengage the movable contacts 55b, 56b from the fixed contacts 55a, 56a through operation of the push button 2 held in the switch case 3. A first leaf spring 550 is provided in the switch case 3 to act as an opening-biasing means to bias the movable contacts 55b, 56b away from the fixed contacts 55a, 56a. The movable contact 55b is disposed at an end of the first leaf spring 550 and adapted to engage with and disengage from the fixed contact 55a. The first leaf spring 550 is adapted to be at a position where the movable contact 55b is open relative to and disengaged from the fixed contact 55a at zero displacement of the first leaf spring 550.Type: GrantFiled: November 8, 2010Date of Patent: July 1, 2014Assignee: IDEC CorporationInventors: Kenichi Kawaguchi, Masazumi Taniguchi, Atsushi Matsumoto, Masashi Fujimoto, Yasuo Onishi
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Patent number: 8708392Abstract: A retractable vehicle seat in which a seat main body disposed on a vehicle floor is flipped up laterally, so as to be retracted in a vehicle interior side wall of which the upper portion is inwardly inclined, may include a connection mechanism that is configured to rotatably connect the seat main body to a support stand. The connection mechanism includes a four-link mechanism having a stationary link integral with the support stand, an intermediate link integral with the seat main body, and a first link and a second link that connect these two links. The second link is configured to increase an angle between the first link and the intermediate link as the seat main body is flipped up.Type: GrantFiled: February 23, 2011Date of Patent: April 29, 2014Assignees: Toyota Boshoku Kabushiki Kaisha, Toyota Shatai Kabushiki KaishaInventors: Taiyou Otsuka, Toshio Araki, Eiji Mizutani, Ryo Hattori, Masashi Fujimoto, Shinji Yamada, Yasunori Takenaka
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Patent number: 8617797Abstract: A method for manufacturing a semiconductor device that includes a plurality of gate patterns in parallel with each other within one circuit block provided over a semiconductor substrate includes preparing a first photomask, performing a first photolithography process upon a photoresist layer within a circuit block by using the first photomask, preparing a second photomask that includes a trim photomask having at least one trim opening corresponding to a dummy gate pattern to remove a portion of the photoresist layer corresponding to the dummy gate pattern, and performing a second photolithography process upon the photoresist layer by using the second photomask.Type: GrantFiled: May 31, 2012Date of Patent: December 31, 2013Assignee: Renesas Electronics CorporationInventor: Masashi Fujimoto
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Publication number: 20130057040Abstract: A retractable vehicle seat in which a seat main body disposed on a vehicle floor is flipped up laterally, so as to be retracted in a vehicle interior side wall of which the upper portion is inwardly inclined, may include a connection mechanism that is configured to rotatably connect the seat main body to a support stand. The connection mechanism includes a four-link mechanism having a stationary link integral with the support stand, an intermediate link integral with the seat main body, and a first link and a second link that connect these two links. The second link is configured to increase an angle between the first link and the intermediate link as the seat main body is flipped up.Type: ApplicationFiled: February 23, 2011Publication date: March 7, 2013Applicants: TOYOTA SHATAI KABUSHIKI KAISHA, TOYOTA BOSHOKU KABUSHIKI KAISHAInventors: Taiyou Otsuka, Toshio Araki, Eiji Mizutani, Ryo Hattori, Masashi Fujimoto, Shinji Yamada, Yasunori Takenaka
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Patent number: 8304662Abstract: A buildup board includes a buildup layer having a multilayer structure and/or a core layer having a multilayer structure. The multilayer structure includes a signal wiring pattern, a pad connected to the signal wiring pattern, an insulating part arranged around the pad on the same layer as the pad, and a conductor arranged around the insulating part on the same layer as the pad. The multilayer structure has at least two different keepouts where the keepout is defined as a minimum interval between an outline of the pad and the conductor closest to the pad on the same layer.Type: GrantFiled: June 1, 2007Date of Patent: November 6, 2012Assignee: Fujitsu LimitedInventors: Akiyoshi Saitou, Takeshi Midorikawa, Toru Kuraishi, Chikayuki Kumagai, Masashi Fujimoto, Kenichiro Abe
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Publication number: 20120237879Abstract: A method for manufacturing a semiconductor device that includes a plurality of gate patterns in parallel with each other within one circuit block provided over a semiconductor substrate includes preparing a first photomask, performing a first photolithography process upon a photoresist layer within a circuit block by using the first photomask, preparing a second photomask that includes a trim photomask having at least one trim opening corresponding to a dummy gate pattern to remove a portion of the photoresist layer corresponding to the dummy gate pattern, and performing a second photolithography process upon the photoresist layer by using the second photomask.Type: ApplicationFiled: May 31, 2012Publication date: September 20, 2012Applicant: RENESAS ELECTRONICS CORPORATIONInventor: Masashi Fujimoto
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Publication number: 20120228108Abstract: A push button switch 1 is so constructed as to disengage the movable contacts 55b, 56b from the fixed contacts 55a, 56a through operation of the push button 2 held in the switch case 3. A first leaf spring 550 is provided in the switch case 3 to act as an opening-biasing means to bias the movable contacts 55b, 56b away from the fixed contacts 55a, 56a. The movable contact 55b is disposed at an end of the first leaf spring 550 and adapted to engage with and disengage from the fixed contact 55a. The first leaf spring 550 is adapted to be at a position where the movable contact 55b is open relative to and disengaged from the fixed contact 55a at zero displacement of the first leaf spring 550.Type: ApplicationFiled: November 8, 2010Publication date: September 13, 2012Applicant: IDEC CORPORATIONInventors: Kenichi Kawaguchi, Masazumi Taniguchi, Atsushi Matsumoto, Masashi Fujimoto, Yasuo Onishi
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Patent number: 8192919Abstract: A method for forming a plurality of gate patterns in parallel with each other on a photoresist layer within a circuit block includes forming extension gate patterns on both ends of the gate patterns and on both ends of a dummy gate pattern of the circuit block to reach an edge of the circuit block, and performing a first photolithography process upon the photoresist layer by using a phase shift photomask having first and second openings whose difference in phase is ?, the first and second openings alternating between the gate patterns including the extension gate patterns to form phase edges therein.Type: GrantFiled: June 8, 2010Date of Patent: June 5, 2012Assignee: Renesas Electronics CorporationInventor: Masashi Fujimoto
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Patent number: 7894660Abstract: An alignment mark is arranged to be within an image screen and the alignment mark is formed with rectangular patterns having varied dimensions from each other. The signal waveforms from each of the rectangular patterns are measured. The number of the rectangular patterns with normal waveforms is compared to the minimum required number of marks prescribed beforehand. The amount of deviation in alignment is calculated by excluding the abnormal measured result.Type: GrantFiled: April 16, 2007Date of Patent: February 22, 2011Assignee: Renesas Electronics CorporationInventor: Masashi Fujimoto
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Patent number: 7870514Abstract: A method of designing a pattern of a hole pattern having a configuration, in which grid of interval smaller than a minimum permissible pitch according to a design rule for a semiconductor integrated circuit is provided in a pattern drawing, a hole pattern is arranged on a first lattice point which is an intersection of the grid, and, at the same time, other hole patterns are not arranged on a second lattice point group which is on the periphery of the first lattice point, and is adjacent to the first lattice point is provided. And, the number of hole patterns, which may be arranged in a third lattice point group of a plurality of lattice points which are on the periphery of a second lattice point group and are within a predetermined distance from the first lattice point, is controlled.Type: GrantFiled: October 5, 2007Date of Patent: January 11, 2011Assignee: Renesas Electronics CorporationInventor: Masashi Fujimoto
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Publication number: 20100255423Abstract: A method for forming a plurality of gate patterns in parallel with each other on a photoresist layer within a circuit block includes forming extension gate patterns on both ends of the gate patterns and on both ends of a dummy gate pattern of the circuit block to reach an edge of the circuit block, and performing a first photolithography process upon the photoresist layer by using a phase shift photomask having first and second openings whose difference in phase is ?, the first and second openings alternating between the gate patterns including the extension gate patterns to form phase edges therein.Type: ApplicationFiled: June 8, 2010Publication date: October 7, 2010Applicant: NEC ELECTRONICS CORPORATIONInventor: Masashi Fujimoto
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Patent number: 7776514Abstract: In a method for forming a plurality of gate patterns in parallel with each other on a photoresist layer within one circuit block, at least one dummy gate pattern is formed in parallel with the gate patterns when a pitch between said gate patterns is larger than a predetermined maximum pitch, so that pitches between the gate patterns including the dummy gate pattern are smaller than the predetermined maximum pitch. Then, a photolithography process is performed upon the photoresist layer by using a phase shift photomask having first and second openings whose difference in phase is ?. The first and second openings alternate between the gate patterns including the dummy gate pattern to form phase edges therein.Type: GrantFiled: March 14, 2006Date of Patent: August 17, 2010Assignee: NEC Electronics CorporationInventor: Masashi Fujimoto
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Patent number: 7757578Abstract: A gear change control system of an automatic transmission, includes: a shift member, including a shaft portion having a selection axis oriented in a selecting direction, and a pair of arm portions formed on the shaft portion and projecting therefrom; shift rail members, having rail shaft portions, and having a shift axis oriented in a shifting direction; shift fork portions, formed on the rail shaft portions; shift lug members, formed on the rail shaft portions and including pillar-shaped portions. The arm portions swing about the selection axis to apply a pressure in the shifting direction from one side of the pillar-shaped portion by one of the arm portions to cause the shift fork portion to make a shifting operation, and to apply a pressure in the shifting direction from the other side of the pillar-shaped portion by the other arm portion to make a shift withdrawing operation.Type: GrantFiled: September 29, 2008Date of Patent: July 20, 2010Assignee: Mitsubishi Jidosha Kogyo Kabushiki KaishaInventors: Masanori Shintani, Masashi Fujimoto
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Patent number: 7694605Abstract: A gear change control system of an automatic transmission, include: a shift member, including a shaft portion which is disposed in such a manner that a selection axis thereof is oriented in a selecting direction and including an arm portion; shift fork portions, operable to make gear shifts of gears; shift rail members, connected to the sift fork portions and arranged in such a manner that shift axes thereof are oriented in a shifting direction; and shift lug members, projecting from the shift rail members and including pillar-shaped portions. The arm portion swings about the selection axis to apply a pressure in the shifting direction from one side of the pillar-shaped portion so as to cause the shift fork portion to perform a shift making operation, and to apply a pressure in the shifting direction from the other side of the pillar-shaped portion so as to cause the shift fork portion to perform a shift withdrawing operation.Type: GrantFiled: September 29, 2008Date of Patent: April 13, 2010Assignee: Mitsubishi Jidosha Kogyo Kabushiki KaishaInventors: Masashi Fujimoto, Masanori Shintani
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Publication number: 20090211389Abstract: A gear change control system of an automatic transmission, includes: a shift member, including a shaft portion disposed in such a manner that a selection axis is oriented in a selecting direction, and including a pair of arm portions formed on the shaft portion in such a manner as to project therefrom; shift rail members, having rail shaft portions, and arranged in such a manner that shift axes are oriented in a shifting direction; shift fork portions, formed on the rail shaft portions; shift lug members, formed on the rail shaft portions and including pillar-shaped portions.Type: ApplicationFiled: September 29, 2008Publication date: August 27, 2009Inventors: Masanori Shintani, Masashi Fujimoto
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Publication number: 20090205456Abstract: A gear change control system of an automatic transmission, include: a shift member, including a shaft portion which is s disposed in such a manner that a selection axis thereof is oriented in a selecting direction and including an arm portion; shift fork portions, operable to make gear shifts of gears; shift rail members, connected to the sift fork portions and arranged in such a manner that shift axes thereof are oriented in a shifting direction; and shift lug members, projecting from the shift rail members and including pillar-shaped portions. The arm portion swings about the selection axis to apply a pressure in the shifting direction from one side of the pillar-shaped portion so as to cause the shift fork portion to perform a shift making operation, and to apply a pressure in the shifting direction from the other side of the pillar-shaped portion so as to cause the shift fork portion to perform a shift withdrawing operation.Type: ApplicationFiled: September 29, 2008Publication date: August 20, 2009Inventors: Masashi Fujimoto, Masanori Shintani
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Patent number: 7558518Abstract: A fixing roller 30, which has an internal heating device and is supported to rotate around a cylindrical shaft 40, and a pressure roller 81 whose circumferential face presses against the fixing roller 30, and which is supported to rotate around the pressure roller axle 82, are mounted in a housing 11, so that, by passing paper P to which a toner image has been transferred, a fixing process is performed on this toner image. The fixing roller 30 is mounted in the housing 11 by heat resistant bushings 50, which are fitted on both ends of the cylindrical shaft 40. Annular grooves 41 are arranged on the cylindrical shaft 40 for receiving C-shaped retaining rings 70, for preventing the heat resistant bushings 50 from coming off. The heat resistant bushings 50 and the retaining rings 70 engage with each other to rotate in unison around the cylindrical shaft 40.Type: GrantFiled: April 25, 2008Date of Patent: July 7, 2009Assignee: Kyocera Mita CorporationInventor: Masashi Fujimoto
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Patent number: 7537864Abstract: A method of designing hole patterns for arranging hole patterns on a pattern drawing of a photomask used during an exposure process in semiconductor integrated circuit manufacturing, wherein a grid is provided on the pattern drawing with a space smaller than a minimum pitch allowed by the design rule of the semiconductor integrated circuit, and the hole patterns are provided at lattice points, which are the intersections of the grid. Flexibility of hole pattern arrangement is improved and the quality of hole pattern arrangement can be easily evaluated.Type: GrantFiled: December 27, 2004Date of Patent: May 26, 2009Assignee: NEC Electronics CorporationInventors: Masashi Fujimoto, Seiji Matsuura
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Patent number: 7534727Abstract: A predetermined pattern containing a plurality of gate patterns, in the process of formation thereof, is classified into fine gate patterns and the other patterns (S102), and a hard mask film is formed on a process target film (S106). Next, a first resist film having a fine first pattern is formed on the hard mask film, and the hard mask film is then patterned (S108). Thereafter, a resist film having a separate pattern is formed on the hard mask film, and a process target film is selectively dry-etched through the hard mask film and the resist film used as masks (S110 and S112).Type: GrantFiled: November 16, 2006Date of Patent: May 19, 2009Assignee: NEC Electronics CorporationInventor: Masashi Fujimoto
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Patent number: 7483665Abstract: A fixing device comprising a fixing roller, support rollers wrapped with a belt, bearings of the support rollers arranged at both ends thereof, pressing plates arranged between the bearings and each having a pair of tilted pressing surfaces that come in contact with the outer circumferential surfaces thereof, and pressing means for pressing the pressing plates toward the axis of the fixing roller. When pressed by the pressing means, the pressing plates press the support rollers toward the axis of the fixing roller via the tilted pressing surfaces and the outer circuferential surfaces of the bearings so that part of the region of the belt in the circumferential direction is press-contacted to part of the region on the outer circuferential surface of the fixing roller and, further, press the support rollers in a direction in which they separate away from each other to impart a tension to the belt.Type: GrantFiled: April 25, 2006Date of Patent: January 27, 2009Assignee: Kyocera Mita CorporationInventors: Daisuke Fujiwara, Masashi Fujimoto