Abstract: According to one embodiment, a fluid controller includes a fluid channel deforming portion and a mixing portion provided downstream from the fluid channel deforming portion. The fluid channel deforming portion includes an upstream end portion, a first channel, a second channel and a channel terminating portion. At least one of the first and second channels is deformed between the upstream end portion and the channel terminating portion. A region of the second channel in a second cross-section, is increased more than a region of the second channel in the first cross-section, between the upstream end portion ad the channel terminating portion. The mixing portion mixes a plurality of fluids flowing through the fluid channel deforming portion.

Abstract: This automatic setting device for automatically setting control devices for a plurality of ship propulsion apparatuses for generating ship propulsion forces is provided with: an input operation setting unit that sets an input operation for a ship; a target behavior acquisition unit that acquires a target behavior of the ship corresponding to the input operation set by the input operation setting unit; a ship information acquisition unit that acquires ship information about the position and/or the bearing of the ship; an actual behavior calculation unit that calculates the actual behavior of the ship on the basis of the ship information acquired by the ship information acquisition unit; and a propulsion force setting unit that sets the magnitudes and the directions of the propulsion forces generated by the respective ship propulsion apparatuses on the basis of the actual behavior of the ship acquired by the actual behavior calculation unit and the target behavior of the ship acquired by the target behavior acq

Abstract: According to one embodiment, a flow channel structure may include a first flow channel, and a second flow channel that joins the first flow channel. An end of the second flow channel close to the first flow channel has a first region having a depth shallower than a depth of the first flow channel.

Abstract: A flow channel structure for removing a foreign substance, including a first flow channel, where the first flow channel has a first region having a depth shallower than a depth of another region. A method for removing a foreign substance in a fluid, including flowing the fluid to the first flow channel of the flow channel structure for removing a foreign substance.

Abstract: A dielectric barrier discharge electrode of an embodiment has: a dielectric; a first electrode provided to be exposed on the dielectric; a second electrode provided to be covered by the dielectric; and a third electrode provided to be covered by the dielectric in a neighborhood of the first electrode.

Abstract: According to one embodiment, a fluid controller includes a fluid channel deforming portion and a mixing portion provided downstream from the fluid channel deforming portion. The fluid channel deforming portion includes an upstream end portion, a first channel, a second channel and a channel terminating portion. At least one of the first and second channels is deformed between the upstream end portion and the channel terminating portion. A region of the second channel in a second cross-section, is increased more than a region of the second channel in the first cross-section, between the upstream end portion ad the channel terminating portion. The mixing portion mixes a plurality of fluids flowing through the fluid channel deforming portion.

Abstract: A dielectric barrier discharge device in an embodiment includes: a dielectric having a hollow-shaped flow path; a first electrode and a second electrode provided apart along the dielectric so as to cause a first region in which plasma is formed inside the flow path; and a power supply to apply a voltage between the first electrode and the second electrode. The dielectric includes a flow path area adjusting portion provided to project from an inner wall of the dielectric toward a center of the flow path in a manner that a first flow path cross-sectional area in the first region is smaller than a second flow path cross-sectional area in a second region other than the first region in the flow path.

Abstract: A dielectric barrier discharge electrode of an embodiment has: a dielectric; a first electrode provided to be exposed on the dielectric; a second electrode provided to be covered by the dielectric; and a third electrode provided to be covered by the dielectric in a neighborhood of the first electrode.

Abstract: According to one embodiment, an inspection apparatus includes a socket, a first arm, and a recognition device. The socket has at least one container holding part for holding a container containing an object. The first arm includes at least two links of which ends are connected. The first arm is able to install the container into the container holding part when the links are in a first posture and to reinstall the container into the container holding part when the links are in a second posture different from the first posture. The recognition device obtains at least recognition results indicating respective positions of the object when the container is installed into the container holding part in the first posture and the second posture.

Abstract: A gas processing apparatus of an embodiment includes a gas processing unit, a flow forming unit, an AC power supply, and first and second filters. The gas processing unit includes a plurality of stacks each having a dielectric substrate, a first to a third electrode. The flow forming unit forms a flow of a target gas flowing toward the gas processing unit. The AC power supply applies an AC voltage across the first, second electrodes and the third electrode so as to generate plasma induced flows of the target gas between the dielectric substrates. The first filter is disposed at an upstream of the gas processing unit, and removes ozone. The second filter is disposed at a downstream of the gas processing unit, and removes ozone.

Abstract: According to one embodiment, a plasma actuator includes an electrode member, an application electrode, a ground electrode, and a supporting member. The electrode member has a first surface facing a processing object and a second surface of an opposite side of the first surface. The application electrode is provided in the first surface. The ground electrode is provided in the second surface or an inner portion of the electrode member. The supporting member is provided in at least one of the electrode member and the application electrode to form a processing space between the processing object and the electrode member. The supporting member is capable of abutting on the processing object.

Abstract: A film forming apparatus includes: a support, a rotator, a gas supplier, and a radiation thermometer configured to measure a temperature of a surface of a substrate, wherein the radiation thermometer includes: a light source of an irradiation light to be irradiated to the surface of the substrate; a first light receiver configured to receive a reflected light from a first measurement region at a predetermined distance from the rotation center on the surface of the substrate; and a second light receiver configured to receive a heat radiation light from a second measurement region extending in a rotation direction of the substrate at the predetermined distance from the rotation center on the surface of the substrate.

Abstract: According to one embodiment, an automatic container processing apparatus includes a tube socket, an operation part, and a control device. The tube socket has a container holding part for holding a container. The operation part is capable of operating the container holding part of the tube socket. The control device controls the operation part. The container held by the container holding part is dropped by operating the operation part.

Abstract: According to one embodiment, an inspection apparatus includes a socket, a first arm, and a recognition device. The socket has at least one container holding part for holding a container containing an object. The first arm includes at least two links of which ends are connected. The first arm is able to install the container into the container holding part when the links are in a first posture and to reinstall the container into the container holding part when the links are in a second posture different from the first posture. The recognition device obtains at least recognition results indicating respective positions of the object when the container is installed into the container holding part in the first posture and the second posture.

Abstract: According to one embodiment, an automatic container processing apparatus includes a tube socket, an operation part, and a control device. The tube socket has a container holding part for holding a container. The operation part is capable of operating the container holding part of the tube socket. The control device controls the operation part. The container held by the container holding part is dropped by operating the operation part.

Abstract: A radiation thermometer has a broadband light source which generates broadband light; an optical filter which, when the broadband light is incident on the measuring target object, passes only light in a predetermined wavelength range of reflected light and heat radiation light from a measuring target object; a light receiver which receives the light in the predetermined wavelength range through the optical filter; and a calculator which calculates a temperature of the measuring target object by using reflected light intensity and heat radiation intensity of the light in the predetermined wavelength range received by the light receiver, wherein an emission spectrum of the broadband light is a spectrum with a full width at half maximum which is equal to or wider than the predetermined wavelength range, and with light intensity increasing while a wavelength thereof becomes longer in the predetermined wavelength range.

Abstract: In one embodiment, a plasma induced flow electrode structure has an electrode block, an insulating layer and an electrode layer. The electrode block has first and second surfaces and through holes penetrating between these first and second surfaces. The insulating layer is disposed on the first surface and inside the through holes. The electrode layer is disposed on the insulating layer of the first surface.

Abstract: A substrate processing apparatus has a process chamber, a long-shaped window on a wall surface of the process chamber, an irradiator configured to irradiate a first laser beam and a second laser beam to a substrate in the process chamber via the long-shaped window so that incident points of the first and second laser beams are aligned substantially along a long side direction of the window, a detector configured to have a light reception surface receiving the first and second laser beams reflected by the substrate and passing through the window, the detector being configured to detect incident positions of the first and second laser beams on the light reception surface, and a calculator configured to calculate a curvature of the substrate by using a relative position of the first laser beam and the second laser beam which are detected by the detector.

Abstract: In one embodiment, a plasma induced flow electrode structure has an electrode block, an insulating layer and an electrode layer. The electrode block has first and second surfaces and through holes penetrating between these first and second surfaces. The insulating layer is disposed on the first surface and inside the through holes. The electrode layer is disposed on the insulating layer of the first surface.

Abstract: A gas processing apparatus of an embodiment has stacks, gas flow paths, an AC power supply, and a flow limiter. The stacks are away from each other and in parallel. Each stack includes a dielectric substrate and a first to a third electrode. The first and second electrodes are respectively disposed on the first and second main surfaces of the dielectric substrate. The third electrode is disposed inside the dielectric substrates. The gas flow paths supply a target gas between the stacks, The AC power supply applies an AC voltage across the first and second electrodes and the third electrodes, so as to generate plasma induced flows of the target gas between the dielectric substrates. The flow limiter is disposed on a downstream side of the stacks and limits a flow rate of the target gas.