Patents by Inventor Masato Fujita
Masato Fujita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120157611Abstract: The present invention provides an excellent optical pressure-sensitive adhesive sheet having an excellent adhesion property to an optical member. The present invention relates to an optical pressure-sensitive adhesive sheet comprising a pressure-sensitive adhesive layer, wherein a relative dielectric constant at a frequency of 1 MHz is 5 to 10, and an adhesion strength to a glass, which is measured with a peel angle of 180° and a tensile speed of 300 mm/min after 30 min of laminating the optical pressure-sensitive adhesive sheet to the glass, is 3 N/20 mm to 15 N/20 mm.Type: ApplicationFiled: December 14, 2011Publication date: June 21, 2012Applicant: NITTO DENKO CORPORATIONInventors: Hirofumi Katami, Tomohide Banba, Shou Takarada, Masato Fujita, Takahiro Nonaka, Hiroaki Kishioka
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Publication number: 20120128969Abstract: The present invention provides a laminated polyester film which can be prevented from suffering from occurrence of interference fringes owing to reflection of external light and is excellent in adhesion to various surface functional layers such as a hard coat. The laminated polyester film of the present invention comprises a polyester film and a coating layer formed on at least one surface of the polyester film which is produced by applying a coating solution comprising a compound having a condensed polycyclic aromatic structure and an oxazoline compound or an epoxy compound thereonto, which coating layer has a thickness of 0.04 to 0.15 ?m.Type: ApplicationFiled: May 31, 2010Publication date: May 24, 2012Inventors: Taishi Kawasaki, Masato Fujita
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Publication number: 20120128986Abstract: The present invention provides a laminated polyester film which can be suitably used in the applications requiring a good adhesion property to a hard coat layer, etc., for example, when employed as members constituting liquid crystal displays. The laminated polyester film of the present invention comprises a polyester film and a coating layer formed on at least one surface of the polyester film, which coating layer is produced by applying a coating solution comprising a polyester resin, an epoxy compound, an oxazoline compound and a melamine compound thereonto.Type: ApplicationFiled: May 24, 2010Publication date: May 24, 2012Inventors: Taishi Kawasaki, Masato Fujita
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Publication number: 20120128985Abstract: The present invention provides a laminated polyester film which is excellent in adhesion to a light diffusion layer or an anti-sticking layer, etc., when these layers are formed thereon. The laminated polyester film of the present invention comprises a polyester film and a coating layer formed on at least one surface of the polyester film, which coating layer is produced by applying a coating solution comprising an acrylic resin, an epoxy compound and an oxazoline compound thereonto. In the laminated polyester film of the present invention, a content of the acrylic resin in the coating layer is 20 to 90% by weight, a total content of the epoxy compound and the oxazoline compound in the coating layer is 10 to 80% by weight, and a weight ratio between the epoxy compound and the oxazoline compound (epoxy compound:oxazoline compound) is 1 to 10:1 to 10.Type: ApplicationFiled: June 29, 2010Publication date: May 24, 2012Applicant: MITSUBISHI PLASTICS ,INC.Inventors: Taishi Kawasaki, Masato Fujita
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Publication number: 20120121918Abstract: The present invention provides a laminated polyester film which can be suitably used in the applications requiring good adhesion to a micro-lens layer, a prism layer or the like, for example, in a backlight unit for liquid crystal displays, etc. The laminated polyester film of the present invention comprises a polyester film, and a coating layer formed on at least one surface of the polyester film by applying a coating solution comprising a urethane resin, an epoxy compound, an oxazoline compound and a melamine compound thereonto.Type: ApplicationFiled: May 24, 2010Publication date: May 17, 2012Inventors: Taishi Kawasaki, Masato Fujita
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Publication number: 20120094113Abstract: The present invention provide a laminated polyester film which is capable of ensuring a good dimensional stability without being subjected to such a surface saponification treatment with an alkali solution as required for triacetyl cellulose films, is available at low costs, exhibits a good adhesion property to adhesives and a high total light transmittance, and can be suitably used as a protective film for polarizing films. The laminated polyester film of the present invention comprises a polyester film; a coating layer formed on one surface of the polyester film which comprises an acrylic resin or a urethane resin as a main component; and a coating layer formed on the other surface of the polyester film which comprises a urethane resin having a polycarbonate structure. In the preferred embodiment of the present invention, the coating layer comprising the acrylic resin or the urethane resin as a main component has a thickness of 0.04 to 0.15 ?m, and the polyester film comprises an ultraviolet absorber.Type: ApplicationFiled: April 15, 2010Publication date: April 19, 2012Applicant: MITSUBISHI PLASTICS, INC.Inventors: Taishi Kawasaki, Toshihiro Koda, Masato Fujita
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Publication number: 20110262753Abstract: The present invention provides a laminated polyester film which can be suitably used in the applications requiring good adhesion to a prism layer, a light diffusion layer or the like, for example, in a backlight unit for liquid crystal displays, etc. The laminated polyester film of the present invention comprises a polyester film, a coating layer formed on one surface of the polyester film which comprises a urethane resin having a polycarbonate structure, and a coating layer formed on the other surface of the polyester film which comprises an acrylic resin or a urethane resin.Type: ApplicationFiled: September 28, 2009Publication date: October 27, 2011Inventors: Taishi Kawasaki, Toshihiro Koda, Masato Fujita
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Publication number: 20110212277Abstract: The present invention provides a biaxially stretched polyester film which can exhibit an excellent easy-bonding property to even a solvent-free ionizing radiation curing resin used in a lens layer, etc., and further is highly enhanced in antistatic property. The present invention relates to a biaxially stretched polyester film comprising a coating layer which comprises (A) a polyurethane resin comprising a compound formed by quaternarizing a tertiary amino group of a chain extender having the tertiary amino group in a molecule thereof and a polycarbonate polyol as constitutional component units, and (B) a cationic polymer antistatic agent, wherein the coating layer is formed on at least one surface of the film.Type: ApplicationFiled: October 5, 2009Publication date: September 1, 2011Inventors: Narihiro Masuda, Toshihiro Koda, Masato Fujita
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Publication number: 20110189489Abstract: The present invention provides a laminated polyester film which is capable of reducing occurrence of uneven interference owing to reflection of light and exhibiting good adhesion to a functional layer such as a light diffusion layer and an anti-sticking layer and which can be suitably used, for example, in a backlight unit for liquid crystal displays, etc. The laminated polyester film of the present invention comprises a polyester film and coating layers respectively formed on both surfaces of the polyester film, said coating layers each comprising a condensed polycyclic aromatic compound, and a urethane resin or an acrylic resin.Type: ApplicationFiled: September 7, 2009Publication date: August 4, 2011Inventors: Taishi Kawasaki, Masato Fujita
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Publication number: 20110070400Abstract: The present invention provides a release film comprising a polyester film which is capable of realizing a high-accuracy inspection of a polarizing plate without undergoing any of problems such as difficulty in detection of foreign matters or defects and likelihood of overlooking thereof when inspecting the polarizing plate by a Cross-Nicol method.Type: ApplicationFiled: February 2, 2009Publication date: March 24, 2011Applicant: MITSUBISHI PLASTICS, INC.Inventors: Kimihiro Isaki, Kazuniro Kunugihara, Masato Fujita
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Publication number: 20110054090Abstract: An object of the present invention is to provide a polyester film which is reduced in yellow discoloration, has a high quality and can be suitably used for optical filters (for example AR films, NIR films and EMI films), films for liquid crystal applications (for example diffraction films and prism films), materials for electric appliance, films for packaging, materials for graphic appliance (photograph materials), plate making films, OHP films or the like. The aspect of the present invention is a polyester film comprising at least one polyester layer comprising reclaimed resin of polyester film having a coating layer, which polyester layer comprising a phosphorus-based antioxidant having a starting temperature of loss on heat of not lower than 290° C.Type: ApplicationFiled: February 26, 2009Publication date: March 3, 2011Inventor: Masato Fujita
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Publication number: 20110051245Abstract: The present invention provides an optical laminated polyester film which can exhibit a good adhesion to a light diffusion plate, a prism layer and a hard coat layer as well as an excellent antistatic property without deterioration in transparency. The present invention relates to an optical biaxially oriented polyester film comprising a polyester film, a coating layer comprising a cationic polymer which is formed on one surface of the polyester film, and a layer formed on the other surface of the polyester film which is obtained by applying thereonto a coating agent comprising a polyurethane comprising a diol component having a polycarbonate structure, and a heat-crosslinking agent.Type: ApplicationFiled: March 3, 2009Publication date: March 3, 2011Inventors: Narihiro Masuda, Toshihiro Koda, Masato Fujita
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Publication number: 20110045288Abstract: The present invention relates to a polyester film having an excellent easy-adhesive property to a topcoat agent which can be suitably used in the applications in which a good adhesion to the topcoat agent is required. There is provided an easy-adhesive film comprising a polyester film and a coating layer formed on the polyester film by a coating/stretching method, wherein the coating layer comprises a polyurethane resin having a polycarbonate structure and a carboxyl group and exhibiting a glass transition point of not higher than 10° C., and further comprises not more than 20% by weight of a crosslinking agent having a heat-crosslinkable functional group in an amount of not less than 10 mmol/g.Type: ApplicationFiled: February 26, 2009Publication date: February 24, 2011Inventors: Toshihiro Koda, Masato Fujita
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Publication number: 20110045291Abstract: The present invention provides a polyester film which is excellent in easy-adhesive property to a topcoat agent, in particular, excellent in adhesion between a coating layer, a topcoat layer and a polyester base film even when the topcoat layer is formed of a solvent-free active energy radiation-curing resin. The present invention relates to an easy-adhesive polyester film comprising a polyester film and a coating layer formed on one surface of the polyester film which is obtained by applying a coating solution comprising a vinyl group-containing polyurethane resin thereonto.Type: ApplicationFiled: February 26, 2009Publication date: February 24, 2011Inventors: Toshihiro Koda, Masato Fujita
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Patent number: 7851371Abstract: A method for manufacturing a semiconductor device of the present invention includes: forming a first film, a second film and a third film in sequence on a silicon substrate; patterning a resist film formed on the third film by conducting an exposure and developing process for the resist film employing an exposure mask including a phase shifter; selectively dry-etching the third film through a mask of the resist film employing the second film as an etch stop to process the third film into a first pattern; further dry-etching the third film employing the second film as an etch stop to partially remove the third film, thereby processing the third film into a second pattern; patterning the second film employing the third film having the second pattern as a mask; and patterning the first film employing the patterned second film as a mask.Type: GrantFiled: February 10, 2009Date of Patent: December 14, 2010Assignee: Renesas Electronics CorporationInventors: Toshihisa Koretsune, Masato Fujita
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Publication number: 20100215902Abstract: A white coated polyester film is provided which has excellent adhesion to the ethylene-vinyl acetate (EVA) typically used as an encapsulation material in solar modules. The good adhesion properties are achieved with a polymeric coating which includes at least one polyurethane and a crosslinker.Type: ApplicationFiled: April 2, 2009Publication date: August 26, 2010Inventors: Thorsten Kiehne, Masato Fujita
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Publication number: 20090156014Abstract: A method for manufacturing a semiconductor device of the present invention includes: forming a first film, a second film and a third film in sequence on a silicon substrate; patterning a resist film formed on the third film by conducting an exposure and developing process for the resist film employing an exposure mask including a phase shifter; selectively dry-etching the third film through a mask of the resist film employing the second film as an etch stop to process the third film into a first pattern; further dry-etching the third film employing the second film as an etch stop to partially remove the third film, thereby processing the third film into a second pattern; patterning the second film employing the third film having the second pattern as a mask; and patterning the first film employing the patterned second film as a mask.Type: ApplicationFiled: February 10, 2009Publication date: June 18, 2009Applicant: NEC ELECTRONICS CORPORATIONInventors: Toshihisa KORETSUNE, Masato FUJITA
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Patent number: 7510980Abstract: A method for manufacturing a semiconductor device of the present invention includes: forming a first film, a second film and a third film in sequence on a silicon substrate; patterning a resist film formed on the third film by conducting an exposure and developing process for the resist film employing an exposure mask including a phase shifter; selectively dry-etching the third film through a mask of the resist film employing the second film as an etch stop to process the third film into a first pattern; further dry-etching the third film employing the second film as an etch stop to partially remove the third film, thereby processing the third film into a second pattern; patterning the second film employing the third film having the second pattern as a mask; and patterning the first film employing the patterned second film as a mask.Type: GrantFiled: November 21, 2006Date of Patent: March 31, 2009Assignee: NEC Electronics CorporationInventors: Toshihisa Koretsune, Masato Fujita
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Patent number: 7462566Abstract: In the process of forming a predetermined pattern in a process target film, a stacked hard mask film having a first film, a second film and a third film stacked in this order is formed on the process target film (S100), fine line patterns are formed in the third film through a fine-pattern-forming resist film while using the second film as an etching stopper (S102), and the fine-pattern-forming resist film is removed (S104). Subsequently, light exposure is carried out using a resist film (S106 to S110), and the second film, the first film and the process target film are then selectively dry-etched in a sequential manner, to thereby form the process target film into a predetermined pattern (S112). The first film remained on the process target film is then removed (S114).Type: GrantFiled: November 16, 2006Date of Patent: December 9, 2008Assignee: NEC Electronics CorporationInventors: Masato Fujita, Kensuke Taniguchi, Akira Mitsuiki
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Publication number: 20080214008Abstract: In a method of manufacturing a semiconductor device, a plurality of structures are formed on a substrate, and a coating film is formed over a whole surface of the substrate to cover the plurality of structures. A photoresist layer is formed to have an opening portion above a target structure of the plurality of structures, and the coating film on a side of the opening is etched to expose a part of the target structure by using the photoresist layer as a mask while maintaining the substrate in a state covered with the coating film. Also, a target portion as at least a portion of the target structure is etched while leaving the coating film, and the photoresist layer and the coating film are removed.Type: ApplicationFiled: December 26, 2007Publication date: September 4, 2008Applicant: NEC ELECTRONICS CORPORATIONInventors: Masashige Moritoki, Masato Fujita