Patents by Inventor Masato Fujita

Masato Fujita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120157611
    Abstract: The present invention provides an excellent optical pressure-sensitive adhesive sheet having an excellent adhesion property to an optical member. The present invention relates to an optical pressure-sensitive adhesive sheet comprising a pressure-sensitive adhesive layer, wherein a relative dielectric constant at a frequency of 1 MHz is 5 to 10, and an adhesion strength to a glass, which is measured with a peel angle of 180° and a tensile speed of 300 mm/min after 30 min of laminating the optical pressure-sensitive adhesive sheet to the glass, is 3 N/20 mm to 15 N/20 mm.
    Type: Application
    Filed: December 14, 2011
    Publication date: June 21, 2012
    Applicant: NITTO DENKO CORPORATION
    Inventors: Hirofumi Katami, Tomohide Banba, Shou Takarada, Masato Fujita, Takahiro Nonaka, Hiroaki Kishioka
  • Publication number: 20120128969
    Abstract: The present invention provides a laminated polyester film which can be prevented from suffering from occurrence of interference fringes owing to reflection of external light and is excellent in adhesion to various surface functional layers such as a hard coat. The laminated polyester film of the present invention comprises a polyester film and a coating layer formed on at least one surface of the polyester film which is produced by applying a coating solution comprising a compound having a condensed polycyclic aromatic structure and an oxazoline compound or an epoxy compound thereonto, which coating layer has a thickness of 0.04 to 0.15 ?m.
    Type: Application
    Filed: May 31, 2010
    Publication date: May 24, 2012
    Inventors: Taishi Kawasaki, Masato Fujita
  • Publication number: 20120128986
    Abstract: The present invention provides a laminated polyester film which can be suitably used in the applications requiring a good adhesion property to a hard coat layer, etc., for example, when employed as members constituting liquid crystal displays. The laminated polyester film of the present invention comprises a polyester film and a coating layer formed on at least one surface of the polyester film, which coating layer is produced by applying a coating solution comprising a polyester resin, an epoxy compound, an oxazoline compound and a melamine compound thereonto.
    Type: Application
    Filed: May 24, 2010
    Publication date: May 24, 2012
    Inventors: Taishi Kawasaki, Masato Fujita
  • Publication number: 20120128985
    Abstract: The present invention provides a laminated polyester film which is excellent in adhesion to a light diffusion layer or an anti-sticking layer, etc., when these layers are formed thereon. The laminated polyester film of the present invention comprises a polyester film and a coating layer formed on at least one surface of the polyester film, which coating layer is produced by applying a coating solution comprising an acrylic resin, an epoxy compound and an oxazoline compound thereonto. In the laminated polyester film of the present invention, a content of the acrylic resin in the coating layer is 20 to 90% by weight, a total content of the epoxy compound and the oxazoline compound in the coating layer is 10 to 80% by weight, and a weight ratio between the epoxy compound and the oxazoline compound (epoxy compound:oxazoline compound) is 1 to 10:1 to 10.
    Type: Application
    Filed: June 29, 2010
    Publication date: May 24, 2012
    Applicant: MITSUBISHI PLASTICS ,INC.
    Inventors: Taishi Kawasaki, Masato Fujita
  • Publication number: 20120121918
    Abstract: The present invention provides a laminated polyester film which can be suitably used in the applications requiring good adhesion to a micro-lens layer, a prism layer or the like, for example, in a backlight unit for liquid crystal displays, etc. The laminated polyester film of the present invention comprises a polyester film, and a coating layer formed on at least one surface of the polyester film by applying a coating solution comprising a urethane resin, an epoxy compound, an oxazoline compound and a melamine compound thereonto.
    Type: Application
    Filed: May 24, 2010
    Publication date: May 17, 2012
    Inventors: Taishi Kawasaki, Masato Fujita
  • Publication number: 20120094113
    Abstract: The present invention provide a laminated polyester film which is capable of ensuring a good dimensional stability without being subjected to such a surface saponification treatment with an alkali solution as required for triacetyl cellulose films, is available at low costs, exhibits a good adhesion property to adhesives and a high total light transmittance, and can be suitably used as a protective film for polarizing films. The laminated polyester film of the present invention comprises a polyester film; a coating layer formed on one surface of the polyester film which comprises an acrylic resin or a urethane resin as a main component; and a coating layer formed on the other surface of the polyester film which comprises a urethane resin having a polycarbonate structure. In the preferred embodiment of the present invention, the coating layer comprising the acrylic resin or the urethane resin as a main component has a thickness of 0.04 to 0.15 ?m, and the polyester film comprises an ultraviolet absorber.
    Type: Application
    Filed: April 15, 2010
    Publication date: April 19, 2012
    Applicant: MITSUBISHI PLASTICS, INC.
    Inventors: Taishi Kawasaki, Toshihiro Koda, Masato Fujita
  • Publication number: 20110262753
    Abstract: The present invention provides a laminated polyester film which can be suitably used in the applications requiring good adhesion to a prism layer, a light diffusion layer or the like, for example, in a backlight unit for liquid crystal displays, etc. The laminated polyester film of the present invention comprises a polyester film, a coating layer formed on one surface of the polyester film which comprises a urethane resin having a polycarbonate structure, and a coating layer formed on the other surface of the polyester film which comprises an acrylic resin or a urethane resin.
    Type: Application
    Filed: September 28, 2009
    Publication date: October 27, 2011
    Inventors: Taishi Kawasaki, Toshihiro Koda, Masato Fujita
  • Publication number: 20110212277
    Abstract: The present invention provides a biaxially stretched polyester film which can exhibit an excellent easy-bonding property to even a solvent-free ionizing radiation curing resin used in a lens layer, etc., and further is highly enhanced in antistatic property. The present invention relates to a biaxially stretched polyester film comprising a coating layer which comprises (A) a polyurethane resin comprising a compound formed by quaternarizing a tertiary amino group of a chain extender having the tertiary amino group in a molecule thereof and a polycarbonate polyol as constitutional component units, and (B) a cationic polymer antistatic agent, wherein the coating layer is formed on at least one surface of the film.
    Type: Application
    Filed: October 5, 2009
    Publication date: September 1, 2011
    Inventors: Narihiro Masuda, Toshihiro Koda, Masato Fujita
  • Publication number: 20110189489
    Abstract: The present invention provides a laminated polyester film which is capable of reducing occurrence of uneven interference owing to reflection of light and exhibiting good adhesion to a functional layer such as a light diffusion layer and an anti-sticking layer and which can be suitably used, for example, in a backlight unit for liquid crystal displays, etc. The laminated polyester film of the present invention comprises a polyester film and coating layers respectively formed on both surfaces of the polyester film, said coating layers each comprising a condensed polycyclic aromatic compound, and a urethane resin or an acrylic resin.
    Type: Application
    Filed: September 7, 2009
    Publication date: August 4, 2011
    Inventors: Taishi Kawasaki, Masato Fujita
  • Publication number: 20110070400
    Abstract: The present invention provides a release film comprising a polyester film which is capable of realizing a high-accuracy inspection of a polarizing plate without undergoing any of problems such as difficulty in detection of foreign matters or defects and likelihood of overlooking thereof when inspecting the polarizing plate by a Cross-Nicol method.
    Type: Application
    Filed: February 2, 2009
    Publication date: March 24, 2011
    Applicant: MITSUBISHI PLASTICS, INC.
    Inventors: Kimihiro Isaki, Kazuniro Kunugihara, Masato Fujita
  • Publication number: 20110054090
    Abstract: An object of the present invention is to provide a polyester film which is reduced in yellow discoloration, has a high quality and can be suitably used for optical filters (for example AR films, NIR films and EMI films), films for liquid crystal applications (for example diffraction films and prism films), materials for electric appliance, films for packaging, materials for graphic appliance (photograph materials), plate making films, OHP films or the like. The aspect of the present invention is a polyester film comprising at least one polyester layer comprising reclaimed resin of polyester film having a coating layer, which polyester layer comprising a phosphorus-based antioxidant having a starting temperature of loss on heat of not lower than 290° C.
    Type: Application
    Filed: February 26, 2009
    Publication date: March 3, 2011
    Inventor: Masato Fujita
  • Publication number: 20110051245
    Abstract: The present invention provides an optical laminated polyester film which can exhibit a good adhesion to a light diffusion plate, a prism layer and a hard coat layer as well as an excellent antistatic property without deterioration in transparency. The present invention relates to an optical biaxially oriented polyester film comprising a polyester film, a coating layer comprising a cationic polymer which is formed on one surface of the polyester film, and a layer formed on the other surface of the polyester film which is obtained by applying thereonto a coating agent comprising a polyurethane comprising a diol component having a polycarbonate structure, and a heat-crosslinking agent.
    Type: Application
    Filed: March 3, 2009
    Publication date: March 3, 2011
    Inventors: Narihiro Masuda, Toshihiro Koda, Masato Fujita
  • Publication number: 20110045288
    Abstract: The present invention relates to a polyester film having an excellent easy-adhesive property to a topcoat agent which can be suitably used in the applications in which a good adhesion to the topcoat agent is required. There is provided an easy-adhesive film comprising a polyester film and a coating layer formed on the polyester film by a coating/stretching method, wherein the coating layer comprises a polyurethane resin having a polycarbonate structure and a carboxyl group and exhibiting a glass transition point of not higher than 10° C., and further comprises not more than 20% by weight of a crosslinking agent having a heat-crosslinkable functional group in an amount of not less than 10 mmol/g.
    Type: Application
    Filed: February 26, 2009
    Publication date: February 24, 2011
    Inventors: Toshihiro Koda, Masato Fujita
  • Publication number: 20110045291
    Abstract: The present invention provides a polyester film which is excellent in easy-adhesive property to a topcoat agent, in particular, excellent in adhesion between a coating layer, a topcoat layer and a polyester base film even when the topcoat layer is formed of a solvent-free active energy radiation-curing resin. The present invention relates to an easy-adhesive polyester film comprising a polyester film and a coating layer formed on one surface of the polyester film which is obtained by applying a coating solution comprising a vinyl group-containing polyurethane resin thereonto.
    Type: Application
    Filed: February 26, 2009
    Publication date: February 24, 2011
    Inventors: Toshihiro Koda, Masato Fujita
  • Patent number: 7851371
    Abstract: A method for manufacturing a semiconductor device of the present invention includes: forming a first film, a second film and a third film in sequence on a silicon substrate; patterning a resist film formed on the third film by conducting an exposure and developing process for the resist film employing an exposure mask including a phase shifter; selectively dry-etching the third film through a mask of the resist film employing the second film as an etch stop to process the third film into a first pattern; further dry-etching the third film employing the second film as an etch stop to partially remove the third film, thereby processing the third film into a second pattern; patterning the second film employing the third film having the second pattern as a mask; and patterning the first film employing the patterned second film as a mask.
    Type: Grant
    Filed: February 10, 2009
    Date of Patent: December 14, 2010
    Assignee: Renesas Electronics Corporation
    Inventors: Toshihisa Koretsune, Masato Fujita
  • Publication number: 20100215902
    Abstract: A white coated polyester film is provided which has excellent adhesion to the ethylene-vinyl acetate (EVA) typically used as an encapsulation material in solar modules. The good adhesion properties are achieved with a polymeric coating which includes at least one polyurethane and a crosslinker.
    Type: Application
    Filed: April 2, 2009
    Publication date: August 26, 2010
    Inventors: Thorsten Kiehne, Masato Fujita
  • Publication number: 20090156014
    Abstract: A method for manufacturing a semiconductor device of the present invention includes: forming a first film, a second film and a third film in sequence on a silicon substrate; patterning a resist film formed on the third film by conducting an exposure and developing process for the resist film employing an exposure mask including a phase shifter; selectively dry-etching the third film through a mask of the resist film employing the second film as an etch stop to process the third film into a first pattern; further dry-etching the third film employing the second film as an etch stop to partially remove the third film, thereby processing the third film into a second pattern; patterning the second film employing the third film having the second pattern as a mask; and patterning the first film employing the patterned second film as a mask.
    Type: Application
    Filed: February 10, 2009
    Publication date: June 18, 2009
    Applicant: NEC ELECTRONICS CORPORATION
    Inventors: Toshihisa KORETSUNE, Masato FUJITA
  • Patent number: 7510980
    Abstract: A method for manufacturing a semiconductor device of the present invention includes: forming a first film, a second film and a third film in sequence on a silicon substrate; patterning a resist film formed on the third film by conducting an exposure and developing process for the resist film employing an exposure mask including a phase shifter; selectively dry-etching the third film through a mask of the resist film employing the second film as an etch stop to process the third film into a first pattern; further dry-etching the third film employing the second film as an etch stop to partially remove the third film, thereby processing the third film into a second pattern; patterning the second film employing the third film having the second pattern as a mask; and patterning the first film employing the patterned second film as a mask.
    Type: Grant
    Filed: November 21, 2006
    Date of Patent: March 31, 2009
    Assignee: NEC Electronics Corporation
    Inventors: Toshihisa Koretsune, Masato Fujita
  • Patent number: 7462566
    Abstract: In the process of forming a predetermined pattern in a process target film, a stacked hard mask film having a first film, a second film and a third film stacked in this order is formed on the process target film (S100), fine line patterns are formed in the third film through a fine-pattern-forming resist film while using the second film as an etching stopper (S102), and the fine-pattern-forming resist film is removed (S104). Subsequently, light exposure is carried out using a resist film (S106 to S110), and the second film, the first film and the process target film are then selectively dry-etched in a sequential manner, to thereby form the process target film into a predetermined pattern (S112). The first film remained on the process target film is then removed (S114).
    Type: Grant
    Filed: November 16, 2006
    Date of Patent: December 9, 2008
    Assignee: NEC Electronics Corporation
    Inventors: Masato Fujita, Kensuke Taniguchi, Akira Mitsuiki
  • Publication number: 20080214008
    Abstract: In a method of manufacturing a semiconductor device, a plurality of structures are formed on a substrate, and a coating film is formed over a whole surface of the substrate to cover the plurality of structures. A photoresist layer is formed to have an opening portion above a target structure of the plurality of structures, and the coating film on a side of the opening is etched to expose a part of the target structure by using the photoresist layer as a mask while maintaining the substrate in a state covered with the coating film. Also, a target portion as at least a portion of the target structure is etched while leaving the coating film, and the photoresist layer and the coating film are removed.
    Type: Application
    Filed: December 26, 2007
    Publication date: September 4, 2008
    Applicant: NEC ELECTRONICS CORPORATION
    Inventors: Masashige Moritoki, Masato Fujita