Patents by Inventor Masato Ishizaki

Masato Ishizaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160297716
    Abstract: A mixed gas containing a precursor gas, an additive gas and a carrier gas is supplied to a preform stored in an electric furnace, and silicon carbide is deposited by chemical vapor deposition or chemical vapor phase impregnation to form a film. The preform includes multiple fiber bundles, and the fiber bundles include multiple fibers. This heat-resistant composite material includes a ceramic fiber preform impregnated with silicon carbide, and producing the composite material involves a step in which silicon carbide is deposited between the fibers to integrate the fibers which configure the fiber bundles, and a step in which silicon carbide is deposited between the fiber bundles to integrate the fiber bundles. Hereby, uniformity of embedding and growth rate of the silicon carbide film are both attained.
    Type: Application
    Filed: May 26, 2016
    Publication date: October 13, 2016
    Applicants: IHI Corporation, The University of Tokyo
    Inventors: Takeshi NAKAMURA, Masato ISHIZAKI, Kozue HOTOZUKA, Yasuyuki FUKUSHIMA, Yukihiro SHIMOGAKI, Takeshi MOMOSE, Hidetoshi SUGIURA, Kohei SHIMA, Yuichi FUNATO
  • Publication number: 20150152547
    Abstract: By using chemical vapor deposition or chemical vapor infiltration, silicon carbide is deposited on a preform 100 accommodated in a reaction furnace 11 for film formation, and the amount of additive gas added to raw material gas and carrier gas to be supplied to the reactive furnace 11 is used to control the growth rate and filling uniformity at film formation of silicon carbide. When the film formation of silicon carbide follows a first-order reaction, the amount of added additive gas is used to control the sticking probability of the film-forming species. When the film formation of silicon carbide follows a Langmuir-Hinshelwood rate formula, the amount of added additive gas is used to make a control so that a zero-order reaction region of the Langmuir-Hinshelwood rate formula is used.
    Type: Application
    Filed: February 12, 2015
    Publication date: June 4, 2015
    Applicants: IHI Corporation, The University of Tokyo
    Inventors: Takeshi NAKAMURA, Masato ISHIZAKI, Kenji FUCHIGAMI, Kozue HOTOZUKA, Yukihiro SHIMOGAKI, Takeshi MOMOSE, Yasuyuki FUKUSHIMA, Noboru SATO, Yuichi FUNATO, Hidetoshi SUGIURA
  • Patent number: 5104633
    Abstract: A method and apparatus for producing or manufacturing a high purity metallic silicon takes a process for generating silicon monoxide by causing reaction between a silicon dioxide containing material and molten state metallic silicon. The silicon monoxide thus generated is sucked for reduction by means of a reducing agent including a carbon containing material and a silicon containing material.
    Type: Grant
    Filed: December 18, 1989
    Date of Patent: April 14, 1992
    Assignees: Kawasaki Steel Corporation, Technical Research Division, Nippon Sheet Glass Co., Ltd.
    Inventors: Yasuhiko Sakaguchi, Fukuo Aratani, Kazuhiro Uchino, Mitsugi Yoshiyagawa, Kunio Miyata, Masato Ishizaki, Tetsuro Kawahara