Abstract: A pattern inspection system for inspecting a pattern formed on a base, such as a photomask, by means of laser beam scanning which includes a device for detecting the body and edges of the pattern, a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern, and a device for eliminating pinholes and stains within the pattern.

Abstract: A recognition apparatus comprising an image sensor sensing an image of a pad pattern on an IC chip pattern, a pre-treatment circuit for converting the outputs of the image sensor into binary-coded signals in accordance with at least two slice levels, and a pattern detecting section for detecting the position and inclination of the pad pattern based on the images of the pad and chip patterns corresponding to the data stored in a memory; that is, the binary-coded signals generated in accordance with two slice levels. Two image sensors may be used for sensing the chip and pad data respectively.

Abstract: A pattern inspection system, for inspecting a pattern formed on a base, such as a photo-mask, by means of laser beam scanning, which includes a device for detecting the body and edges of the pattern a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern and a device for eliminating pinholes and stains within a pattern.