Abstract: Radical polymerizable liquid resins contain unsaturated urethane of a specified structure and vinyl monomers at weight ratio of (unsaturated urethane)/(vinyl monomers)=10/90-90/10. The unsaturated urethane has (meth)acryloyl and higher aliphatic hydrocarbon groups in its molecule, and the vinyl monomers are copolymerizable with this unsaturated urethane.

Abstract: The cosmetic composition of this is an ultraviolet ray-absorbing cosmetic composition containing particles of cyclic imino ester which is excellent in ultraviolet ray absorbability, stable against water, sparingly soluble in organic solvents, fats and oils, sebum, etc., and further has only a low skin-irritating property. When this cosmetic composition is applied onto the skin, erythema is not formed on/in the skin even if it is exposed to sunlight for a long period, and further aging of the skin can be prevented.

Abstract: Unsaturated urethane having specified molecular structure shown by Formula (1) given below and vinyl monomers which are copolymerizable with such unsaturated urethane can form together polymerizable compositions which, as well as in-mold cured products therefrom, have improved characteristics such as compatibility between the constituents and water resistance: ##STR1## where X is a residual group obtained by removing the hydroxyl groups from a trihydric or tetrahydric polyol; R.sup.1 and R.sup.3 are each H or CH.sub.3 ; R.sup.2 is higher aliphatic hydrocarbon group with 5.about.21 carbon atoms; p and q are each 1 or 2; r is an integer 0.about.2 such that p+q+r=3 or 4 and p+r=2 or 3; and a is an integer 2.about.4.

Abstract: A heat-resistant lubricant composition for processing synthetic fibers includes 85% or more by weight of polyether compound of molecular weight between 500 and 10000 derivable from alkylene oxide with 2-4 carbon atoms and an organic compound having at least one active hydrogen in its molecule, 0.2-5% by weight of modified polysiloxane of molecular weight 2500 or greater modified by propylene oxide and/or ethylene oxide, and 0.05-10% by weight of phosphonium sulfonate of a specified structure.

Abstract: An antistatic resin composition with transparency contains 90-99.9 wt % of a synthetic resin selected from polycarbonate or polymethyl methacrylate and 0.1-10 wt % of a heat-resistant antistat containing phosphonium sulfonate shown by the general formula (I) below: ##STR1## where A is alkyl group with 1-36 carbon atoms, alkenyl group with 4-24 carbon atoms, phenyl group, phenyl group substituted by alkyl group with 1-18 carbon atoms, naphthyl group or naphthyl group substituted by alkyl group with 1-18 carbon atoms, R.sup.1, R.sup.2 and R.sup.3 are identical, each being an aliphatic hydrocarbon group with 1-8 carbon atoms or aromatic hydrocarbon group, and R.sup.4 is a hydrocarbon group with 1-18 carbon atoms.