Abstract: According to one embodiment, a projector includes a light source unit, a light scanning unit, and a focus controller. The light source unit emits laser light. The light scanning unit includes a holder and a reflective surface. The holder is capable of a first rotation operation around a first direction. The reflective surface is held by the holder and is capable of a second rotation operation around a second direction intersecting the first direction. The light scanning unit scans the laser light by the first and second rotation operations. The focus controller is provided between the light source unit and the light scanning unit in an optical path of the laser light to modify a convergence of the laser light. An angle between a plane including the first and second directions, and an image surface is not less than 80 degrees and not more than 100 degrees.

Abstract: According to one embodiment, a pattern test apparatus includes a light source configured to apply test light to a test sample, a polarizing beam splitter which reflects or transmits the test light, an imaging device which receives light which has been reflected by the test sample and transmitted through or reflected by the polarizing beam splitter, an optical system which forms a Fourier transform plane of the test sample between the test sample and the polarizing beam splitter, and a polarizing controller disposed in the Fourier transform plane. The polarizing controller includes a first region which lets the test light through, and a second region which is greater than the first region and lets the light reflected by the test sample through, and the each regions have different retardation quantities.

Abstract: According to an embodiment, a light beam scanner includes a first mirror and an angular magnification unit. The first mirror makes a normal direction of a reflecting surface change repeatedly. The angular magnification unit is configured to return, when viewed from a first direction, reflected light from the first mirror to the first mirror so that light is reflected at substantially the same points on the first mirror for a plural number of times, and increase, when viewed from the first direction, an angle each time light is reflected from the first mirror, the angle being between the normal direction of the reflecting surface and a reflection direction of light. Light is emitted from the angular magnification unit after the light is reflected from the first mirror for a predetermined number of times.

Abstract: According to one embodiment, a pattern test apparatus includes a light source configured to apply test light to a test sample, a polarizing beam splitter which reflects or transmits the test light, an imaging device which receives light which has been reflected by the test sample and transmitted through or reflected by the polarizing beam splitter, an optical system which forms a Fourier transform plane of the test sample between the test sample and the polarizing beam splitter, and a polarizing controller disposed in the Fourier transform plane. The polarizing controller includes a first region which lets the test light through, and a second region which is greater than the first region and lets the light reflected by the test sample through, and the each regions have different retardation quantities.

Abstract: An LED lighting device of embodiment comprising an LED light source which generates an ultraviolet light or a visible light, an axisymmetric transparent member which is provided over the light source and which is transparent to visible light, and an axisymmetric light scattering member disposed in the transparent member apart from the light source. A distance of closest approach L2 between the light source and the light scattering member, and an area C of a light emitting surface of the light source satisfy the settled relation. A length L1 of the light scattering member, and an absorption coefficient ? (1/mm) of the light scattering member satisfy the settled relation. A diameter d1 of the bottom surface of the light scattering member, the distance of closest approach L2, and a refractive index n of the transparent member satisfy the settled relation.

Abstract: According to one embodiment, a projector includes a light source unit, a light scanning unit, and a focus controller. The light source unit emits laser light. The light scanning unit includes a holder and a reflective surface. The holder is capable of a first rotation operation around a first direction. The reflective surface is held by the holder and is capable of a second rotation operation around a second direction intersecting the first direction. The light scanning unit scans the laser light by the first and second rotation operations. The focus controller is provided between the light source unit and the light scanning unit in an optical path of the laser light to modify a convergence of the laser light. An angle between a plane including the first and second directions, and an image surface is not less than 80 degrees and not more than 100 degrees.

Abstract: An inspection method and apparatus comprising, a step of reflecting linearly-polarized light having a predetermined wavelength using an non-polarizing beam splitter after transmitting the linearly-polarized light through a half-wave plate, irradiating a sample with the linearly-polarized light having a polarization plane of a predetermined angle, causing the light reflected by the sample to be incident to an image capturing sensor through a lens, the non-polarizing beam splitter, and an analyzer, and acquiring an optical image of a pattern formed on the sample; acquiring a plurality of optical images by changing an angle of the analyzer or the half-wave plate, and obtaining an angle of the analyzer or the half-wave plate such that a value of (?/?A) becomes a minimum; and a step of inspecting whether a defect of the pattern exists, wherein the pattern is a repetitive pattern having a period at a resolution limit or less.

Abstract: An inspection apparatus comprising, an optical system emitting light having a predetermined wavelength, illuminating a sample while the light is converted into light having a polarization plane not in the range of ?5 degrees to 5 degrees and 85 degrees to 95 degrees with respect to a direction of a repetitive pattern on the sample, an optical system for acquiring an image and forming said image on an image sensor using a lens, a half-wave plate, a first image sensor, a second image sensor, an inspection analyzer, wherein these differ in a transmission axis direction, a processor that obtains an average gray level and a standard deviation in each predetermined unit region of the image, and a defect detector, wherein a resolution limit defined by a wavelength of the light source and a numerical aperture of the lens is a value in which the pattern is not resolved.

Abstract: According to one embodiment, a pattern test apparatus includes a light source configured to apply test light to a test sample, a polarizing beam splitter which reflects or transmits the test light, an imaging device which receives light which has been reflected by the test sample and transmitted through or reflected by the polarizing beam splitter, an optical system which forms a Fourier transform plane of the test sample between the test sample and the polarizing beam splitter, and a polarizing controller disposed in the Fourier transform plane. The polarizing controller includes a first region which lets the test light through, and a second region which is greater than the first region and lets the light reflected by the test sample through, and the each regions have different retardation quantities.

Abstract: A photomask inspection method that identifies a foreign particle such as dirt on a photomask with high sensitivity by suppressing erroneous identification due to an influence of noise is provided. The photomask inspection method includes acquiring image data of a photomask having regions with different layer structures on a surface thereof, creating inverted image data by subtracting the image data from pixel value data of the regions, creating offset inverted image data by raising pixel values of the inverted image data by a fixed amount, creating normalized correlation image data by computing a normalized correlation of the offset inverted image data and an offset Gaussian distribution-type kernel, and identifying foreign particles by comparing the normalized correlation image data and a predetermined threshold.

Abstract: This pattern inspection apparatus includes an inspection region information storage unit that stores an inspection region specified in a pattern region, a pattern surface height detection unit that detects a pattern surface height signal corresponding to a pattern surface height measurement position on the inspection sample, an autofocus mechanism that focuses on the inspection sample using the pattern surface height signal detected by the pattern surface height detection unit, a determination unit, and an autofocus mechanism control unit. When the determination unit determines that the pattern surface height measurement position is located within the inspection region, the autofocus mechanism control unit drives the autofocus mechanism, and the determination unit determines that the pattern surface height measurement position is not located within the inspection region, the autofocus mechanism control unit stops the autofocus mechanism.

Abstract: In an automatic focus adjusting mechanism, a test sample having a patterned surface is mounted on a mount table, and an light beam passing through a slit formed in a field stop is applied to the patterned surface of the test sample. The light beam reflected from the test sample is split into two segment light beams. Focus adjusting aperture stops having respective apertures formed rhomboid are provided across the optical paths of the segment light beams. The amounts of the segment light beams passing through the rhomboid apertures are detected by light receiving units. Based on the difference between the detected light amounts, the position of the mount table is controlled by the focus adjusting unit.

Abstract: Provided are a mask for EUV exposure and a mask blank for EUV exposure for manufacturing the same, so as to improve the contrast of ultraviolet inspection light and improve the inspection performance for the mask. This mask blank for EUV exposure includes a substrate, a reflecting layer which is provided on the substrate and reflects EUV light, and an absorbent layer which is provided on the reflecting layer and absorbs EUV light. Reflectance of light at a wavelength between 150 nm and 300 nm is greater at the absorbent layer than that of the reflecting layer. The mask for EUV exposure can be manufactured by processing this mask blank for EUV exposure.

Abstract: A lighting optical apparatus using a deep ultraviolet light source that are easy to adjust due to a configuration with fewer components, has high illuminant and illuminant uniformity on an irradiated surface are provided. The apparatus has a deep ultraviolet light source from which deep ultraviolet rays are emitted, a first double-sided cylindrical lens which has a cylindrical lens array on both sides with a configuration of cylinder axes intersecting at right angles, a second double-sided cylindrical lens which has a cylindrical lens array on both sides with a configuration of cylinder axes intersecting at right angles, and a condenser lens.

Abstract: In an automatic focus adjusting mechanism, a test sample having a patterned surface is mounted on a mount table, and an light beam passing through a slit formed in a field stop is applied to the patterned surface of the test sample. The light beam reflected from the test sample is split into two segment light beams. Focus adjusting aperture stops having respective apertures formed rhomboid are provided across the optical paths of the segment light beams. The amounts of the segment light beams passing through the rhomboid apertures are detected by light receiving units. Based on the difference between the detected light amounts, the position of the mount table is controlled by the focus adjusting unit.

Abstract: A photomask inspection method that identifies a foreign particle such as dirt on a photomask with high sensitivity by suppressing erroneous identification due to an influence of noise is provided. The photomask inspection method includes acquiring image data of a photomask having regions with different layer structures on a surface thereof, creating inverted image data by subtracting the image data from pixel value data of the regions, creating offset inverted image data by raising pixel values of the inverted image data by a fixed amount, creating normalized correlation image data by computing a normalized correlation of the offset inverted image data and an offset Gaussian distribution-type kernel, and identifying foreign particles by comparing the normalized correlation image data and a predetermined threshold.

Abstract: An optical quantizing unit includes an optical divider dividing 1st optical pulses to be quantized and sending the divided 1st optical pulses into a plurality of paths; a plurality of optical filters passing with different transmittances the divided 1st optical pulses; and an optical threshold filter sequentially receiving the 1st optical pulses, and sending 2nd optical pulses when light intensities of the 1st optical pulses are above a preset threshold value.

Abstract: A lighting system includes a first light source emitting first light rays; a second light source emitting second light rays, a first lens side which refracts the first and second light rays and collimates the refracted light rays; a second lens side which includes a plurality of first lenticules and refracts the first and second light rays; and a third lens side which includes a plurality of second lenticules and refracts the first and second light rays refracted by the second lens side.

Abstract: Provided are a mask for EUV exposure and a mask blank for EUV exposure for manufacturing the same, so as to improve the contrast of ultraviolet inspection light and improve the inspection performance for the mask. This mask blank for EUV exposure includes a substrate, a reflecting layer which is provided on the substrate and reflects EUV light, and an absorbent layer which is provided on the reflecting layer and absorbs EUV light. Reflectance of light at a wavelength between 150 nm and 300 nm is greater at the absorbent layer than that of the reflecting layer. The mask for EUV exposure can be manufactured by processing this mask blank for EUV exposure.

Abstract: An optical quantizing unit includes an optical divider dividing 1st optical pulses to be quantized and sending the divided 1st optical pulses into a plurality of paths; a plurality of optical filters passing with different transmittances the divided 1st optical pulses; and an optical threshold filter sequentially receiving the 1st optical pulses, and sending 2nd optical pulses when light intensities of the 1st optical pulses are above a preset threshold value.