Patents by Inventor Masaya Ueno

Masaya Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200243641
    Abstract: A semiconductor device includes a semiconductor layer of a first conductivity type having a first main surface at one side and a second main surface at another side, a trench gate structure including a gate trench formed in the first main surface of the semiconductor layer, and a gate electrode embedded in the gate trench via a gate insulating layer, a trench source structure including a source trench formed deeper than the gate trench and across an interval from the gate trench in the first main surface of the semiconductor layer, a source electrode embedded in the source trench, and a deep well region of a second conductivity type formed in a region of the semiconductor layer along the source trench, a ratio of a depth of the trench source structure with respect to a depth of the trench gate structure being not less than 1.5 and not more than 4.
    Type: Application
    Filed: May 17, 2018
    Publication date: July 30, 2020
    Inventors: Minoru NAKAGAWA, Yuki NAKANO, Masatoshi AKETA, Masaya UENO, Seigo MORI, Kenji YAMAMOTO
  • Patent number: 10501710
    Abstract: A cleaner composition consisting essentially of (A) 90.0-99.9 wt % of an organic solvent and (B) 0.1-10.0 wt % of a C3-C6 alcohol, and containing (C) 20-300 ppm of sodium and/or potassium is effective for cleaning a surface of a silicon semiconductor substrate. A satisfactory degree of cleanness is achieved within a short time and at a high efficiency without causing corrosion to the substrate.
    Type: Grant
    Filed: April 18, 2017
    Date of Patent: December 10, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaya Ueno, Hideyoshi Yanagisawa
  • Patent number: 10370623
    Abstract: A cleaner composition consisting essentially of (A) 92.0 wt % to less than 99.9 wt % of an organic solvent, (B) 0.1 wt % to less than 8.0 wt % of a C3-C6 alcohol, and (C) 0.001-3.0 wt % of a quaternary ammonium salt is effective for removing any silicone adhesive residues on a silicon semiconductor substrate. A satisfactory degree of cleanness is achieved within a short time and at a high efficiency without causing corrosion to the substrate.
    Type: Grant
    Filed: April 17, 2017
    Date of Patent: August 6, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaya Ueno, Hideyoshi Yanagisawa
  • Patent number: 10260027
    Abstract: The invention provides a substrate detergent composition used for cleaning a surface of a substrate, comprising: (A) A quaternary ammonium salt: 0.1 to 2.0% by mass; (B) Water: 0.1 to 4.0% by mass; and (C) An organic solvent: 94.0 to 99.8% by mass. There can be provided a substrate detergent composition used for cleaning a surface of a substrate contaminated with a silicone component whose water contact angle is 100° or more.
    Type: Grant
    Filed: January 25, 2017
    Date of Patent: April 16, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaya Ueno, Hideyoshi Yanagisawa
  • Publication number: 20170306272
    Abstract: A cleaner composition consisting essentially of (A) 92.0 wt % to less than 99.9 wt % of an organic solvent, (B) 0.1 wt % to less than 8.0 wt % of a C3-C6 alcohol, and (C) 0.001-3.0 wt % of a quaternary ammonium salt is effective for removing any silicone adhesive residues on a silicon semiconductor substrate. A satisfactory degree of cleanness is achieved within a short time and at a high efficiency without causing corrosion to the substrate.
    Type: Application
    Filed: April 17, 2017
    Publication date: October 26, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaya Ueno, Hideyoshi Yanagisawa
  • Publication number: 20170306273
    Abstract: A cleaner composition consisting essentially of (A) 90.0-99.9 wt % of an organic solvent and (B) 0.1-10.0 wt % of a C3-C6 alcohol, and containing (C) 20-300 ppm of sodium and/or potassium is effective for cleaning a surface of a silicon semiconductor substrate. A satisfactory degree of cleanness is achieved within a short time and at a high efficiency without causing corrosion to the substrate.
    Type: Application
    Filed: April 18, 2017
    Publication date: October 26, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaya Ueno, Hideyoshi Yanagisawa
  • Publication number: 20170130174
    Abstract: The invention provides a substrate detergent composition used for cleaning a surface of a substrate, comprising: (A) A quaternary ammonium salt: 0.1 to 2.0% by mass; (B) Water: 0.1 to 4.0% by mass; and (C) An organic solvent: 94.0 to 99.8% by mass. There can be provided a substrate detergent composition used for cleaning a surface of a substrate contaminated with a silicone component whose water contact angle is 100° or more.
    Type: Application
    Filed: January 25, 2017
    Publication date: May 11, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaya UENO, Hideyoshi YANAGISAWA
  • Publication number: 20140357052
    Abstract: The invention provides a substrate detergent composition used for cleaning a surface of a substrate, comprising: (A) A quaternary ammonium salt: 0.1 to 2.0% by mass; (B) Water: 0.1 to 0.4% by mass; and (C) An organic solvent: 94.0 to 99.8% by mass. There can be provided a substrate detergent composition used for cleaning a surface of a substrate contaminated with a silicone component whose water contact angle is 100° or more.
    Type: Application
    Filed: May 13, 2014
    Publication date: December 4, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaya UENO, Hideyoshi YANAGISAWA
  • Patent number: 8754165
    Abstract: A heat-conductive silicone grease composition is provided comprising (A) a trialkoxysilyl-endcapped organopolysiloxane having a viscosity of 0.1-1,000 Pa·s at 25° C., (B) a specific organopolysiloxane, (C) a heat-conductive filler, and (D) a condensation catalyst. The composition is amenable to coat at the initial, thereafter increases its viscosity with moisture at room temperature rather than curing so that it remains flexible, easy to re-work, and anti-sagging, eliminates a need for cold storage and for hot application, avoids any undesired viscosity buildup, is easy to manufacture, and has good heat transfer.
    Type: Grant
    Filed: April 12, 2011
    Date of Patent: June 17, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Nobuaki Matsumoto, Ikuo Sakurai, Kunihiro Yamada, Masaya Ueno
  • Publication number: 20110248211
    Abstract: A heat-conductive silicone grease composition is provided comprising (A) a trialkoxysilyl-endcapped organopolysiloxane having a viscosity of 0.1-1,000 Pa·s at 25° C., (B) a specific organopolysiloxane, (C) a heat-conductive filler, and (D) a condensation catalyst. The composition is amenable to coat at the initial, thereafter increases its viscosity with moisture at room temperature rather than curing so that it remains flexible, easy to re-work, and anti-sagging, eliminates a need for cold storage and for hot application, avoids any undesired viscosity buildup, is easy to manufacture, and has good heat transfer.
    Type: Application
    Filed: April 12, 2011
    Publication date: October 13, 2011
    Inventors: NOBUAKI MATSUMOTO, IKUO SAKURAI, KUNIHIRO YAMADA, MASAYA UENO
  • Patent number: 7776953
    Abstract: A room temperature-curable organopolysiloxane composition is provided.
    Type: Grant
    Filed: June 4, 2007
    Date of Patent: August 17, 2010
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tsuneo Kimura, Masaya Ueno
  • Publication number: 20070282047
    Abstract: A room temperature-curable polyorganosiloxane composition is provided. The composition comprises (A) 100 parts by weight of a polyorganosiloxane represented by the following general formula (1): wherein R is a monovalent hydrocarbon group containing 1 to 5 carbon atoms, R1 is independently a substituted or unsubstituted monovalent hydrocarbon group containing 1 to 10 carbon atoms; n is an integer of at least 10; X is oxygen atom or an alkylene group containing 2 to 5 carbon atoms, and m is independently an integer of 0 or 1; or a mixture of such polyorganosiloxane, (B) 0.1 to 50 parts by weight of a partial hydrolysate of an organosilicon compound having at least 3 hydrolyzable groups bonded to silicon atom in one molecule; (C) 1 to 500 parts by weight of at least one filler, (D) 0.01 to 10 parts by weight of a curing catalyst, and (E) 0.1 to 10 parts by weight of a silane coupling agent.
    Type: Application
    Filed: June 4, 2007
    Publication date: December 6, 2007
    Inventors: Tsuneo Kimura, Masaya Ueno, Norio Kameda
  • Publication number: 20070282061
    Abstract: A room temperature-curable organopolysiloxane composition is provided.
    Type: Application
    Filed: June 4, 2007
    Publication date: December 6, 2007
    Inventors: Tsuneo Kimura, Masaya Ueno
  • Patent number: 6877344
    Abstract: An optical fiber is prepared by applying a liquid electron beam-curable resin composition to a bare optical fiber or a coated optical fiber having a primary or secondary coating on a bare optical fiber, irradiating electron beams to the resin composition on the optical fiber for curing while the optical fiber passes a zone under substantially atmospheric pressure, and providing a magnetic field and optionally an electric field in the zone for thereby improving the efficiency of electron irradiation. The method can comply with the increased drawing speed of the bare optical fiber and does not detract from the transmission properties of the optical fiber.
    Type: Grant
    Filed: February 20, 2002
    Date of Patent: April 12, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Ohba, Nobuo Kawada, Masaya Ueno
  • Publication number: 20020183411
    Abstract: An optical fiber coating material is provided in the form of an electron beam-curable resin composition comprising a polyurethane having at least two ethylenically unsaturated groups, a reactive diluent, and a compound having both nitrogen and sulfur atoms. The optical fiber coating material is sufficiently EB curable to minimize the dependency of gel fraction and Young's modulus on an EB dose and to comply with the high-speed drawing of optical fiber. The coating material is cured with EB under specific conditions to achieve a sufficient degree of cure and uniform properties without adversely affecting the transmission loss of the optical fiber.
    Type: Application
    Filed: April 25, 2002
    Publication date: December 5, 2002
    Inventors: Toshio Ohba, Nobuo Kawada, Masaya Ueno, Masatoshi Asano, Shigeru Konishi
  • Publication number: 20020112508
    Abstract: An optical fiber is prepared by applying a liquid electron beam-curable resin composition to a bare optical fiber or a coated optical fiber having a primary or secondary coating on a bare optical fiber, irradiating electron beams to the resin composition on the optical fiber for curing while the optical fiber passes a zone under substantially atmospheric pressure, and providing a magnetic field and optionally an electric field in the zone for thereby improving the efficiency of electron irradiation. The method can comply with the increased drawing speed of the bare optical fiber and does not detract from the transmission properties of the optical fiber.
    Type: Application
    Filed: February 20, 2002
    Publication date: August 22, 2002
    Inventors: Toshio Ohba, Nobuo Kawada, Masaya Ueno
  • Patent number: 6432489
    Abstract: Methods for curing a coating material, including a primary coating material, a secondary coating material, and a taping material, on an optical fiber. An optical fiber coating material having (A) 100 parts by weight of a polyether polyurethane bearing at least two ethylenically unsaturated groups with a Mn of 800-10,000, and (B) 1-40 parts by weight of a nitrogenous reactive diluent is cured by irradiating thereto electron beams, produced by driving electrons under an accelerating voltage of 50-190 kV, in a dose of 10-100 kGy. The method succeeds in effectively curing the optical fiber coating material into a cured coating having stable properties.
    Type: Grant
    Filed: March 15, 2001
    Date of Patent: August 13, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Ohba, Nobuo Kawada, Masaya Ueno
  • Publication number: 20010031319
    Abstract: An optical fiber coating material comprising (A) 100 parts by weight of a polyether polyurethane bearing at least two ethylenically unsaturated groups with a Mn of 800-10,000, and (B) 1-40 parts by weight of a nitrogenous reactive diluent is cured by irradiating thereto electron beams, produced by driving electrons under an accelerating voltage of 50-190 kV, in a dose of 10-100 kGy. The method succeeds in effectively curing the optical fiber coating material into a cured coating having stable properties.
    Type: Application
    Filed: March 15, 2001
    Publication date: October 18, 2001
    Inventors: Toshio Ohba, Nobuo Kawada, Masaya Ueno
  • Publication number: 20010016234
    Abstract: In connection with a unit (3) for irradiating electron beams to a curable coating on a filament (1) for curing the coating, x-ray shielding tubes (6 and 7) are disposed upstream of an inlet (3a) and downstream of an outlet (3b) of the irradiating unit (3), respectively, for shielding secondary x-rays resulting from the electron beam irradiation. Secondary x-rays emanating from electron beams irradiated to the curable coating on the filament can be shielded in a simple way. The invention helps establish a safe working environment without detracting from process efficiency.
    Type: Application
    Filed: February 16, 2001
    Publication date: August 23, 2001
    Inventors: Toshio Ohba, Nobuo Kawada, Masaya Ueno