Patents by Inventor Masayoshi Yajima

Masayoshi Yajima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090111278
    Abstract: A manufacturing method for a semiconductor device includes retaining a wafer in a reaction chamber, supplying first process gas including source gas and second process gas containing H2 or inert gas onto the wafer in a rectified state alternately in a predetermined cycle, rotating the wafer, and heating the wafer to form a film on the wafer.
    Type: Application
    Filed: October 24, 2008
    Publication date: April 30, 2009
    Inventors: Masayoshi YAJIMA, Yoshikazu Moriyama
  • Publication number: 20090068851
    Abstract: A susceptor of the present invention includes an inner susceptor having a diameter smaller than a diameter of a wafer w and a protruding part for placing the wafer w on a surface thereof, and an outer susceptor having an opening in the central portion thereof, a first step section for placing the inner susceptor so as to block the opening and a second step section provided above the first step section for placing the wafer.
    Type: Application
    Filed: September 10, 2008
    Publication date: March 12, 2009
    Inventors: Hironobu Hirata, Yoshikazu Moriyama, Masayoshi Yajima, Shinichi Mitani