Patents by Inventor Masayuki Iwasaki

Masayuki Iwasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4547450
    Abstract: A silver halide sensor type polymerizable light-sensitive material is disclosed. The material is comprised of a support having a silver halide photographic emulsion layer and a polymerizing layer adjacent to the emulsion layer. The polymerizing layer contains a nongaseous ethylenically unsaturated compound capable of undergoing addition polymerization upon reduction of the silver halide with a reducing compound. The material is capable of producing printing plates having good inking property and good printing durability. The material maintains the sensitivity and high resolving power of a silver halide photographic light-sensitive material.
    Type: Grant
    Filed: January 13, 1983
    Date of Patent: October 15, 1985
    Assignee: Fuji Photo Film Company
    Inventors: Minoru Maeda, Masayuki Iwasaki, Noriyuki Inoue, Mikio Totsuka
  • Patent number: 4543318
    Abstract: A photopolymerizable composition is described, comprising (1) a non-gaseous ethylenically unsaturated compound which has at least two ethylenically unsaturated terminal groups and is capable of forming a polymer, (2) a thermoplastic polymeric binder, (3) a photopolymerization initiator which is activated by actinic radiation, and (4) at least one of certain heterocyclic compounds. The composition is useful as a photoresist for producing printed circuit boards, printing plates, etc., by etching or plating, and the photoresist has superior adhesion with respect to the base.
    Type: Grant
    Filed: July 2, 1984
    Date of Patent: September 24, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Minoru Maeda, Masayuki Iwasaki, Fumiaki Shinozaki
  • Patent number: 4511645
    Abstract: A presensitized printing plate which has a photopolymerizing composition layer provided on at least one side of a support, with the photopolymerizing composition being constituted with (A) a polymer containing in its side chains groups represented by the following general formula (I) and carboxylic groups: ##STR1## (wherein R.sub.1 to R.sub.5 each represents a hydrogen atom, a halogeno group, a carboxyl group, a sulfo group, a nitro group, a cyano group, and amido group, an amino group, or an unsubstituted or a substituted alkyl, aryl, alkoxy, aryloxy, alkylamino, arylamino, alkylsulfonyl or arylsulfonyl group; and Z represents an oxygen atom, a sulfur atom, --NH-- or --NR-- (R=alkyl)), (B) a monomer or an olygomer having at least two polymerizable ethylenically unsaturated double bonds, and (C) a photopolymerization initiator.
    Type: Grant
    Filed: September 9, 1983
    Date of Patent: April 16, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Mitsuru Koike, Kesanao Kobayashi, Tadao Toyama, Hiroshi Misu, Koji Tamoto, Masayuki Iwasaki
  • Patent number: 4505793
    Abstract: A photopolymerizable composition is described, which comprises a polymerizable compound containing at least one ethylenically unsaturated double bond and a photopolymerization initiator wherein the photopolymerization initiator is a combination of a 3-keto-substituted cumarin compound and an active halogeno compound. This composition can be easily cured by irradiation with radiation and, therefore, is very useful in the preparation of light-sensitive materials.
    Type: Grant
    Filed: July 20, 1982
    Date of Patent: March 19, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Koji Tamoto, Akira Umehara, Teruo Nagano, Masayuki Iwasaki, Yoshimasa Aotani
  • Patent number: 4481276
    Abstract: A photopolymerizable composition having an improved sensitivity, which comprises a polymerizable compound having an ethylenically unsaturated bond and a photopolymerization initiator, wherein said photopolymerization initiator comprises a compound represented by general formula I ##STR1## wherein R.sup.1 and R.sup.2 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, or an aralkyl group; X represents a substituent having a Hammett's value of not more than 0.7; and Y represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an aralkyl group, an acyl group, or an alkoxycarbonyl group and a 1,3,5-triazine compound represented by general formula II ##STR2## wherein R.sup.3, R.sup.4, and R.sup.
    Type: Grant
    Filed: November 14, 1983
    Date of Patent: November 6, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shun-ichi Ishikawa, Koji Tamoto, Masayuki Iwasaki, Akira Umehara
  • Patent number: 4386120
    Abstract: The present invention relates to a process for producing polyacrylic acid salt granules easily soluble in water characterized in that a water-soluble powder of polyacrylic acid salt is granulated according to fluidized bed granulation method while an aqueous solution of the polyacrylic acid salt of a viscosity of 50-700 c.p.s. is sprayed thereon.
    Type: Grant
    Filed: June 24, 1981
    Date of Patent: May 31, 1983
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Fumihiro Sato, Masayuki Iwasaki, Takashi Terada, Hiroshi Ninomiya, Minoru Nakada
  • Patent number: 4279982
    Abstract: A photosensitive composition containing the 2-trihalomethyl-5-aryl-1,3,4-oxadiazole compound represented by the following general formula: ##STR1## wherein X represents a chlorine atom or a bromine atom and A represents a phenyl group, a naphthyl group or a phenyl or naphthyl group substituted by a halogen atom, an alkyl group, an alkoxy group, a nitro group, a cyano group or a methylenedioxy group.
    Type: Grant
    Filed: December 6, 1979
    Date of Patent: July 21, 1981
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masayuki Iwasaki, Akira Nagashima, Shigeru Sato
  • Patent number: 4232106
    Abstract: Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazole compounds represented by the following general formula (I): ##STR1## wherein W represents a substituted or unsubstituted aryl group, X represents a hydrogen atom, an alkyl group or an aryl group, Y represents a fluorine atom, a chlorine atom or a bromine atom, and n represents an integer of 1 to 3.
    Type: Grant
    Filed: November 16, 1978
    Date of Patent: November 4, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masayuki Iwasaki, Shigeru Sato, Yasuo Inoue, Akira Nagashima
  • Patent number: 4212970
    Abstract: Compounds represented by the following general formula: ##STR1## wherein W represents a phenyl group, a phenyl group substituted with a member selected from the group consisting of a halogen atom, a nitro group, a cyano group, an alkyl group containing 1 to 3 carbon atoms and an alkoxy group containing 1 to 4 carbon atoms, with the number of the substituents being 1 or 2 when said substituent is a halogen atom and 1 when said substituent is other than halogen, or an unsubstituted naphthyl group, and said phenyl group may take the form of ##STR2## X represents a hydrogen atom, an unsubstituted phenyl group or an alkyl group containing 1 to 3 carbon atoms, Y represents a halogen atom, and n represents an integer of 1 to 3. These compounds are useful as photo-initiators.
    Type: Grant
    Filed: November 22, 1978
    Date of Patent: July 15, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masayuki Iwasaki
  • Patent number: 4191573
    Abstract: A photosensitive image forming element comprising: a support; photosensitive layer therein which is rendered alkali-soluble upon exposure and which comprises (i) an azide compound having at least one alkali-soluble group in its molecular structure, and (ii) a polyamide.
    Type: Grant
    Filed: March 17, 1978
    Date of Patent: March 4, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tadao Toyama, Masayuki Iwasaki
  • Patent number: 4139384
    Abstract: A photosensitive lithographic printing plate comprising a support having thereon a photosensitive layer composed of a photosensitive diazo-oxide resin containing a hydroxystyrene unit and a hydroxystyrene unit having an o-quinoediazide group bonded through the oxygen of the hydroxystyrene. The photosensitive layer can contain an alkali-soluble resin. The photosensitive lithographic printing plate is stable mechanically, provides a large difference in solubility between the exposed areas and the unexposed areas of the layer, and has improved printability and sensitivity.
    Type: Grant
    Filed: April 21, 1977
    Date of Patent: February 13, 1979
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masayuki Iwasaki, Hiroshi Misu, Shizuo Miyano
  • Patent number: 4028111
    Abstract: A light-sensitive lithographic printing plate comprising a support with a hydrophilic surface having thereon a light-sensitive layer comprising a light-sensitive polyester containing o-quinonediazido groups as terminal groups.
    Type: Grant
    Filed: February 25, 1975
    Date of Patent: June 7, 1977
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masayuki Iwasaki, Hiroshi Misu, Shizuo Miyano