Abstract: Disclosed herein is a sensor utilizing attenuated total reflection. The sensor includes a first dielectric block; a thin film layer, formed on a first face of the dielectric block, for placing a sample thereon; and a light source for emitting a light beam. The sensor further includes an optical incidence system for collimating the light beam, and making the collimated light beam enter the dielectric block at a predetermined incidence angle so that a condition for total internal reflection is satisfied at an interface between the dielectric block and the thin film layer; a photodetector for detecting the refractive index distribution of the sample obtained within a plane along the interface, by detecting an image carried by the light beam totally reflected at the interface; and an optical compensation system for compensating for image distortion produced by the dielectric block when the predetermined incidence angle of the light beam varies.

Abstract: A surface plasmon resonance measuring apparatus is provided with a dielectric block, a metal film formed on a surface of the dielectric block, a light source for emitting a light beam, an optical system for making the light beam enter the dielectric block at various angles of incidence so that a condition for total internal reflection is satisfied at an interface between the dielectric block and the thin film layer, and a photodetector for detecting the intensity of the light beam satisfying total internal reflection at the interface. In the measurement chip to be utilized in the surface plasmon resonance measuring apparatus, the dielectric block is formed from a synthetic resin in which, when said light beam is p-polarized outside said dielectric block and then strikes the interface, the intensity of a s-polarized component at the interface is 50% or less of the intensity of the light beam at the interface.

Abstract: A recording medium comprises a substrate and a recording layer overlaid on the substrate. The recording layer comprises a material, which has properties such that, when recording light having a predetermined wavelength &lgr;1 is irradiated to the material, the material is capable of being caused to change into a fluorescent material and such that, when excitation light having a wavelength &lgr;2 is then irradiated to the thus formed fluorescent material, the fluorescent material is capable of being caused to produce fluorescence. The wavelength &lgr;1 of the recording light and the wavelength &lgr;2 of the excitation light may be identical or different. The substrate may be constituted of a material having properties such that, when the excitation light is irradiated to the material, the material does not produce fluorescence having a wavelength identical with the wavelength of the fluorescence produced by the fluorescent material.

Abstract: An optical logic device comprises a dielectric block arranged such that a driving light is incident on one plane thereof at a total reflection critical angle through an interior thereof, a metallic film formed over the one plane of the dielectric block, and an optical functional film, a refractive index of which is changed by irradiation of light, formed over the metallic film such that the optical functional film is irradiated with a control light. A surface plasmon device is fabricated, which comprises a dielectric block arranged such that a driving light having a uniform intensity is incident on one plane thereof at a total reflection critical angle through an interior thereof, a metallic film formed over the one plane of the dielectric block, an optical functional film, a refractive index of which is changed by irradiation of light, formed over the metallic film such that the optical functional film is irradiated with a signal light subjected to space modulation.

Abstract: In a sensor: a thin film is formed on a face of the dielectric block and in contact with a specimen; a semiconductor laser unit as a light source emits a light beam; an optical system injects the light beam into the dielectric block so that the light beam is incident on a boundary between the dielectric block and the thin film at a plurality of incident angles which are greater than a critical angle for total reflection; and a light detecting unit detects a state of attenuated total reflection by measuring the intensity of the light beam totally reflected from the boundary. The semiconductor laser unit is driven with a driving current on which a high frequency component is superimposed.

Abstract: A sample analyzing apparatus includes a micro-aperture probe, which is provided with a light passage aperture having a diameter shorter than wavelengths of light, the light passage aperture being formed at a radiating end of the micro-aperture probe, and a light source, which produces light for sample analysis. An incidence optical system causes the light for sample analysis to enter into the micro-aperture probe from an entry end of the micro-aperture probe. A sample supporting member supports a sample at a position that is exposed to near field light radiated out of the radiating end of the micro-aperture probe. An image sensor receives light scattered by the sample and detects an intensity distribution pattern of the scattered light. A display device displays the detected intensity distribution pattern.

Abstract: A surface plasmon sensor which can be placed under a liquid sample or in a humid atmosphere during operation. The surface plasmon sensor is constituted of a dielectric block 11, a metal film 12 which is superposed on one surface of the dielectric block 11, a light source 14 for generating a light beam 13, a front optical system 15 which enables the light beam 13 to realize a variety of angles of incidence on an interface 11a between the dielectric block 11 and the metal film 12, each of the angles satisfying a condition for total reflection on the interface 11a, including those angles satisfying a condition for the surface plasmon resonance, and a photodetector 16 which detects a state of the surface plasmon resonance by measuring intensity of the light beam 13 after the light beam 13 is totally reflected at the interface 11a.

Abstract: Disclosed herein is a sensor utilizing attenuated total reflection. The sensor is equipped with a prism, a metal film formed on a surface of the prism, an optical system for making a light beam enter the prism at various angles of incidence so that the condition for total internal reflection is obtained at the interface between the prism and the metal film, and photodetectors for detecting the light beam satisfying total internal reflection at the interface. In the sensor, a super luminescent diode is employed as a light source that emits the light beam.

Abstract: A first resist layer (21) and a second resist layer (22) are formed on a base material (11) in the recited order, the first resist layer (21) being removable by etching and the second resist layer (22) being a photosensitive resist layer in which either exposed or unexposed regions become soluble in a developing solvent upon emission of light. Near-field light is then emitted to the second resist layer (22) by means (24) for emitting near-field light (27) according to a diffraction grating pattern upon reception of the light. Next, the diffraction grating pattern is formed in the second resist layer (22) by developing the second resist layer (22). The first resist layer (21) is etched with the pattern in the second resist layer (22) as an etching mask, and a diffraction grating pattern consisting of the first and second resist layers (21, 22) is formed.

Abstract: A surface plasmon sensor is formed by a dielectric block, a metal film which is formed on one face of the dielectric block and is brought into contact with a sample, a light source emitting a light beam, an optical system which causes the light beam to enter the dielectric block so that the light beam is reflected in total reflection at the interface of the dielectric block and the metal film and various angles of incidence of the light beam to the interface of the dielectric block and the metal film including an angle of incidence at which surface plasmon is generated can be obtained, and a photodetector which is able to detect the intensity of the light beam reflected in total reflection from the interface for the various angles of incidence. A laser provided with an oscillation wavelength stabilizing system for stabilizing the wavelength at which the laser oscillates is used as the light source.

Abstract: A photomask for use in near-field exposure includes a mask support which is transparent to exposure light; a shading film which is formed on one side of the mask support, and has at least one-opening arranged to form a predetermined pattern; and at least one filler which is transparent to the exposure light, and is arranged in the at least one opening with a predetermined height above the level of the boundary between the mask support and the shading film. The difference between the thickness of the shading film and the height of each of the at least one filler does not exceed 50 nanometers.

Abstract: A measuring apparatus includes a dielectric block, a film layer which is formed on a first face of the dielectric block and is brought into contact with a sample, an optical system which causes a light beam to enter the dielectric block through a second face so that the light beam is reflected in total internal reflection at the interface of the dielectric block and the film layer and various angles of incidence of the light beam to the interface can be obtained, and a photodetector which detects the intensity of the light beam which is reflected in total internal reflection at the interface and goes outside the dielectric block through a third face thereof. A measuring chip includes a single dielectric block having all the first to third faces and the film layer integrally formed on the first face of the dielectric block.

Abstract: A sample analyzing apparatus comprises a micro-aperture probe, which is provided with a light passage aperture having a diameter shorter than wavelengths of light, the light passage aperture being formed at a radiating end of the micro-aperture probe, and a light source, which produces light for sample analysis. An incidence optical system causes the light for sample analysis to enter into the micro-aperture probe from an entry end of the micro-aperture probe. A sample supporting member supports a sample at a position that is exposed to near field light radiated out of the radiating end of the micro-aperture probe. An image sensor receives light having been scattered by the sample and detects an intensity distribution pattern of the scattered light. A display device displays the detected intensity distribution pattern.

Abstract: A sample analyzing apparatus includes a micro-aperture probe, which is provided with a light passage aperture having a diameter shorter than wavelengths of light, the light passage aperture being formed at a radiating end of the micro-aperture probe, and a light source, which produces light for sample analysis. An incidence optical system causes the light for sample analysis to enter into the micro-aperture probe from an entry end of the micro-aperture probe. A sample supporting member supports a sample at a position that is exposed to near field light radiated out of the radiating end of the micro-aperture probe. An image sensor receives light scattered by the sample and detects an intensity distribution pattern of the scattered light. A display device displays the detected intensity distribution pattern.

Abstract: A surface plasmon sensor includes a dielectric block, a metal film having a sample supporting side which is faced toward a face of the dielectric block spaced therefrom and on which a sample is placed, a light source emitting a light beam, an optical system which causes the light beam to enter the dielectric block so that the light beam is reflected in total reflection at the face of the dielectric block and various angles of incidence of the light beam to the face of the dielectric block including an angle of incidence at which surface plasmon is generated can be obtained, and a sensor which detects the angle of incidence of the light beam at which attenuation in total reflection takes place and the amount of reflected light is reduced. A distance measuring light beam is caused to enter the dielectric block to be reflected in total reflection at the face of the dielectric block.

Abstract: A sample analyzer includes a light source for emitting light for analyzing a sample and a probe having at its one end a light outlet aperture which is smaller in diameter than the wavelength of the light emitted from the light source. An incident optical system causes the light emitted from the light source to enter the probe through the other end of the probe. A sample support supports the sample in a position where the sample is exposed to near field light emitted from the light outlet aperture of the probe. A diffusion panel receives scattered light generated by interaction between the surface of the sample and the near field light and visualizes the intensity distribution pattern of the scattered light. A CCD image taking device takes an image of the intensity distribution pattern of the scattered light visualized by the diffusion panel, and the image of the intensity distribution pattern of the scattered light taken by the image taking device is displayed on a CRT.

Abstract: A surface plasmon sensor comprises a prism, a metal film, which is formed on one surface of the prism and is brought into contact with a sample, and a light source for producing a light beam. An optical system causes the light beam to pass through the prism and to impinge upon an interface between the prism and the metal film such that various different angles of incidence may be obtained with respect to the interface. A photodetector detects an intensity of the light beam, which has been totally reflected from the interface, with respect to each of the various different angles of incidence. An electrode stands facing the metal film with a liquid sample intervening therebetween, and a DC voltage is applied across the electrode and the metal film. A substance contained in the liquid sample is thus analyzed quickly and with a high sensitivity.

Abstract: A surface plasmon sensor comprises a sensor unit, which is provided with a transparent substrate and a metal film, and a coupler, which carries out light beam coupling and is separate from the sensor unit. A light beam is entered from a light beam entry portion of the coupler, and an attenuated total reflection angle .theta..sub.sp is detected from the light beam, which has been totally reflected from an interface between the transparent substrate and the metal film and has then been radiated out of a light beam radiating portion of the coupler. The sensor unit is supported by a sensor unit attachment such that a distance between the transparent substrate and the coupler may be kept to be equal to a predetermined value. The space between the transparent substrate and the coupler is filled with a refractive index matching liquid. Fitting of the sensor unit in the surface plasmon sensor is easy to carry out, and the relationship between positions of the sensor unit and the coupler can be kept constant.

Abstract: A surface plasmon sensor comprises a prism, a metal film, which is formed on one surface of the prism and is brought into contact with a sample, and a light source for producing a light beam. An optical system causes the light beam to pass through the prism and to impinge upon an interface between the prism and the metal film such that various different angles of incidence may be obtained with respect to the interface. A photodetector detects an intensity of the light beam, which has been totally reflected from the interface, with respect to each of the various different angles of incidence. An electrode stands facing the metal film with a liquid sample intervening therebetween, and a DC voltage is applied across the electrode and the metal film. A substance contained in the liquid sample is thus analyzed quickly and with a high sensitivity.

Abstract: A surface plasmon sensor includes a prism, a metal film which is formed on one face of the prism and is brought into contact with a sample, a light source emitting a light beam, an optical system which causes the light beam to enter the prism so that various angles of incidence of the light beam to the interface between the prism and the metal film can be obtained, and a photodetector which is able to detect the intensity of the light beam reflected in total reflection from the interface for the various angles of incidence. A light deflector deflects the light beam so that the light beam impinges upon the interface between the prism and the metal film in a plurality of different positions in sequence.