Abstract: A vaporization method and a vaporizer capable of greatly reducing the number of fine particles scattered in a film after film formation. A raw material solution is brought into contact with a heated carrier gas and carried to a subsequent step. The vaporizer includes: a vaporization chamber; a carrier gas passage communicating with the vaporization chamber; a raw material solution lead-in port through which the raw material solution is led into the passage; and elements for heating the carrier gas.

Abstract: There is provided a data output apparatus, data output method, program, and storage medium which preferably execute a printing process using print data input to the printing apparatus via an external storage device without decreasing the speed of the printing process while ensuring a security of classified information contained in the print data. Print data stored in a detachable external storage device such as a removable medium is input, and then the print data is developed to image data printable by the printing apparatus. The developed image data is printed out on a printing medium. Upon the development process of the print data to the image data, the development process is executed while switching the first mode to execute the development process using a storage area of the external storage device and the second mode to execute the development process using a storage area of the printing apparatus.

Abstract: A vaporizer that does not cause clogging or other failure, permits long-term use and enables stable supply of raw materials to a reaction section. In particular, a vaporizer which not only enables continuous and stable supply of raw materials adjusted to stoichiometric ratios but also exerts an effect of reducing the amount of carbon residue in a formed film; and a relevant disperser, film formation unit, method of vaporization, method of dispersion and method of film formation. The vaporizer may be one comprising vaporizing a raw material solution contained in a carrier gas characterized in that elements for causing the carrier gas before containing the raw material solution to contain the solvent of the raw material solution is disposed therein.

Abstract: The invention proposes a method for devising a production plan of a product to be produced through multiple production steps having different characteristics in a supply chain across multiple companies and/or multiple factories. The method divides a production step of the product into multiple production steps in advance based on a constraint to be considered when the production plan therefor is devised, defines identifiers for the multiple production steps, prestores the defined identifiers in a storage portion as step identification information, and prestores step information having at least correspondences between the production steps and items.

Abstract: Disclosed is a vaporizer constituted of a dispersing section 8 and a vaporizing section 22. The dispersing section 8 comprises a gas introduction port 4 for introducing a carrier gas 3 under pressure into a gas passage, means for feeding raw material solutions 5a and 5b to the gas passage, and a gas outlet 7 for delivering the carrier gas containing the raw material solutions to the vaporizing section 22. The vaporizing section 22 comprises a vaporizing tube 20 having one end connected to a reaction tube of the MOCVD system and having the other end connected to the gas outlet 7 of the dispersing section 8, and heating means for heating the vaporizing tube 20. The vaporizing section 22 serves to heat and vaporize the raw material solution containing carrier gas 3 delivered from the dispersing section 8. The dispersing section 8 includes a dispersing section body 1 having a cylindrical hollow portion, and a rod 10 having an outer diameter smaller than the inner diameter of the cylindrical hollow portion.

Abstract: To provide a vaporizer which can be used long time without blockage, and possible to stably supply raw materials to reaction part.

Abstract: Disclosed is a vaporizer constituted of a dispersing section 8 and a vaporizing section 22. The dispersing section 8 comprises a gas introduction port 4 for introducing a carrier gas 3 under pressure into a gas passage, means for feeding raw material solutions 5a and 5b to the gas passage, and a gas outlet 7 for delivering the carrier gas containing the raw material solutions to the vaporizing section 22. The vaporizing section 22 comprises a vaporizing tube 20 having one end connected to a reaction tube of the MOCVD system and having the other end connected to the gas outlet 7 of the dispersing section 8, and heating means for heating the vaporizing tube 20. The vaporizing section 22 serves to heat and vaporize the raw material solution containing carrier gas 3 delivered from the dispersing section 8. The dispersing section 8 includes a dispersing section body 1 having a cylindrical hollow portion, and a rod 10 having an outer diameter smaller than the inner diameter of the cylindrical hollow portion.

Abstract: Disclosed is a vaporizer constituted of a dispersing section 8 and a vaporizing section 22. The dispersing section 8 comprises a gas introduction port 4 for introducing a carrier gas 3 under pressure into a gas passage, means for feeding raw material solutions 5a and 5b to the gas passage, and a gas outlet 7 for delivering the carrier gas containing the raw material solutions to the vaporizing section 22. The vaporizing section 22 comprises a vaporizing tube 20 having one end connected to a reaction tube of the MOCVD system and having the other end connected to the gas outlet 7 of the dispersing section 8, and heating means for heating the vaporizing tube 20. The vaporizing section 22 serves to heat and vaporize the raw material solution containing carrier gas 3 delivered from the dispersing section 8. The dispersing section 8 includes a dispersing section body 1 having a cylindrical hollow portion, and a rod 10 having an outer diameter smaller than the inner diameter of the cylindrical hollow portion.

Abstract: To print a satisfactory image output according to a kind of image without pressure of memory resources and a decrease of transfer speed due to an increase of image data capacity, a CPU of an image processing apparatus expands print data received from an external apparatus into image data, generates an attribute signal representing an attribute of the image data expanded based on the print data, stores the image data of which the data capacity has been reduced by decreasing the number of gradations and the generated attribute signal in a frame memory, and transmits the image data stored in the frame memory to an image forming apparatus according to the attribute of the image data in a state that the attribute signal has been added to the stored image data.

Abstract: Disclosed is a vaporizer constituted of a dispersing section 8 and a vaporizing section 22. The dispersing section 8 comprises a gas introduction port 4 for introducing a carrier gas 3 under pressure into a gas passage, means for feeding raw material solutions 5a and 5b to the gas passage, and a gas outlet 7 for delivering the carrier gas containing the raw material solutions to the vaporizing section 22. The vaporizing section 22 comprises a vaporizing tube 20 having one end connected to a reaction tube of the MOCVD system and having the other end connected to the gas outlet 7 of the dispersing section 8, and heating means for heating the vaporizing tube 20. The vaporizing section 22 serves to heat and vaporize the raw material solution containing carrier gas 3 delivered from the dispersing section 8. The dispersing section 8 includes a dispersing section body 1 having a cylindrical hollow portion, and a rod 10 having an outer diameter smaller than the inner diameter of the cylindrical hollow portion.

Abstract: The wet treatment liquid feed nozzle of the invention comprises an introducing path having an introducing port, a discharging path having a discharging port, a crossing section formed by causing the introducing path and the discharging path to cross at the other ends thereof, a nozzle assembly having an opening section opening to an object to be treated, provided at the crossing section, and pressure control means, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated and the atmospheric pressure provided at least on the discharging path side so that the wet treatment liquid having been in contact with the object to be treated via the opening section does not flow to outside the discharging path.

Abstract: A substrate body transfer apparatus, and an operating method therefor, capable of inserting and extracting substrate body into and from a cassette using air conveyance without employing a transfer mechanism such as those in which direct contact is made with the substrate body when inserting or extracting a thin plate-shaped substrate body into or from a cassette. The substrate body transfer apparatus is employed when thin plate-shaped substrate body are extracted from or inserted into cassettes which store the substrate body.

Abstract: An air stream transfer apparatus capable of preventing particles in a transfer passage from adhering to an object to be processed and removing the particles. The apparatus includes that of a transfer face and a transfer passage partition both constituting a transfer passage, which are made of an electroconductive material and each have a thin insulating layer on the surface. A planer dust collecting electrode is opposed to an object to be processed and mechanism is provided for bringing the dust collecting electrode and the face to be cleared of dust close to each other while jetting air. A mechanism is provided for applying voltages between the transfer face and the dust collecting electrode and between the transfer passage partition and the dust collecting electrode and between the transfer passage partition and the dust collecting electrode.

Abstract: A substrate body transfer apparatus which is capable of isolating the atmospheres of an external processing apparatus and an air conveyance apparatus and preventing the mutual contamination thereof, and which is capable of conducting the transfer of substrate bodies at a low level of particulate matter and contamination which satisfies the ultra-clean level. The substrate body transfer apparatus is provided with a vacuum container having an entrance and exit which communicate with the interior space of an air conveyance apparatus and the interior space of an external processing apparatus; a horizontal disc-shaped upper part valve and lower part valve are housed within the vacuum container and after the substrate body has been placed in a space surrounded by the upper and lower valves and this space has been sealed, the space is evacuated or the gas therein is replaced.

Abstract: The present invention uses a transportation robot furnished with a storage chamber 3 that can store substrate wafers S under an inert gas atmosphere, and when transporting substrate wafers S between transportation chambers 2 installed on processing apparatus 1 and holding an inert gas atmosphere, connection chamber 4 is disposed between storage chamber 3 and transportation chamber 2 when placing and removing substrate wafers S between storage chamber 3 of transportation robot 30 and the transportation chamber 2 of processing apparatus 1, and after introducing inert gas into the connection chamber 4 at low pressure, opening the gate valves GV1 and GV2 between storage chamber 3 and transportation chamber 2.

Abstract: An air stream transfer apparatus capable of preventing particles in a transfer passage from adhering to an object to be processed and removing the particles. The apparatus includes that of a transfer face and a transfer passage partition both constituting a transfer passage, which are made of an electroconductive material and each have a thin insulating layer on the surface. A planer dust collecting electrode is opposed to an object to be processed and mechanism is provided for bringing the dust collecting electrode and the face to be cleared of dust close to each other while jetting air. A mechanism is provided for applying voltages between the transfer face and the dust collecting electrode and between the transfer passage partition and the dust collecting electrode and between the transfer passage partition and the dust collecting electrode.

Abstract: The wet treatment liquid feed nozzle of the invention comprises an introducing path 10 having an introducing port 7, a discharging path 12 having a discharging port 15, a crossing section 14 formed by causing the introducing path 10 and the discharging path 12 to cross at the other ends thereof, a nozzle assembly 50 having an opening section 6 opening to an object to be treated 1, provided at the crossing section 14, and pressure control means 13, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated 1 and the atmospheric pressure provided at least on the discharging path 12 side so that the wet treatment liquid having been in contact with the object to be treated 1 via the opening section 6 does not flow to outside the discharging path 12.

Abstract: A transport system for transporting substrate wafer, for making semiconductor integrated circuits and liquid crystal display panels and the like advanced devices, is presented.

Abstract: The wet treatment liquid feed nozzle of the invention comprises an introducing path 10 having an introducing port 7, a discharging path 12 having a discharging port 15, a crossing section 14 formed by causing the introducing path 10 and the discharging path 12 to cross at the other ends thereof, a nozzle assembly 50 having an opening section 6 opening to an object to be treated 1, provided at the crossing section 14, and pressure control means 13, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated 1 and the atmospheric pressure provided at least on the discharging path 12 side so that the wet treatment liquid having been in contact with the object to be treated 1 via the opening section 6 does not flow to outside the discharging path 12.

Abstract: A process of using a transport system for transporting substrate wafer, for making semiconductor integrated circuits and liquid crystal display panels and the like advanced devices, is presented. The object is to prevent surface degradation which may be inflicted on the surface to interfere with proper processing of the substrate. The substrate wafers are delivered to process chambers always in clean surface conditions. A method illustrated utilizes a purge gas containing an inert gas or a mixture of an inert gas and oxygen for flowing inside the tunnel space, and a semiconductor laser detection system to detect the contamination levels within the tunnel space, and the transport parameters are controlled according to the measured data.